Patents by Inventor Ernst Lobach

Ernst Lobach has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060263275
    Abstract: The chamber of a cabinet, e.g. a climate controlled cabinet, is provided for a controlled storage or preparation of biological samples or goods. A high pressure mercury lamp in the chamber allows to efficiently generate UV-radiation, ozone and heat and to sterilize the chamber.
    Type: Application
    Filed: May 9, 2006
    Publication date: November 23, 2006
    Applicant: Liconic AG
    Inventor: Ernst Lobach
  • Patent number: 5146284
    Abstract: In an interferometer for measuring displacements of a movable structural component, comprising a measurement interferometer arrangement (1), a partial beam traverses a measurement branch of variable optical length and is guided by an adjustable reflector system (11) connected to the movable structural component. The measurement interferometer arrangement (1) is arranged, together with the adjustable reflector system (11) including the whole measurement branch, in a sealed housing (3) which also contains a wavelength measuring device (2) for measuring the wavelength of the partial beam which travels through the measurement branch in a gaseous medium. A ventilator device (14) produces an air current in the housing (3), so that identical conditions, in particular identical temperature, pressure and humidity, always prevail in the medium in the measurement branch and in the spatially separate wavelength measuring device (2).
    Type: Grant
    Filed: January 16, 1991
    Date of Patent: September 8, 1992
    Assignee: Werner Tabarelli
    Inventors: Werner Tabarelli, Ernst Lobach
  • Patent number: 4621922
    Abstract: To adjust a device for the projection copying of masks on a semiconductor substrate, adjustment marks are illuminated with wideband adjustment light in order to make variations in the intensity of the reflected signal in the area of a mark field. The color defect created by the wideband nature of the adjustment light is eliminated by an achromatization device which covers only a part of the total picture field which contains the adjustment marks.
    Type: Grant
    Filed: August 10, 1984
    Date of Patent: November 11, 1986
    Assignee: Perkin-Elmer Censor Anstalt
    Inventors: Werner Tabarelli, Ernst Lobach
  • Patent number: 4619524
    Abstract: To adjust a device for the projection copying of masks on a semiconductor substrate, adjustment marks are illuminated with wideband adjustment light in order to eliminate variations in the intensity of the reflected signal in the area of a mark field. The color defect created by the wideband nature of the ajustment light is determined by spectroscopic means and taken into account when making the adjustment.
    Type: Grant
    Filed: October 2, 1984
    Date of Patent: October 28, 1986
    Assignee: Perkin-Elmer Censor Anstalt
    Inventors: Werner Tabarelli, Ernst Lobach
  • Patent number: 4540277
    Abstract: In order to determine magnification and/or alignment in a device for the projection printing of a pattern on a mask onto a substrate an adjustment plate insertable below the projection lens is provided, said adjustment plate being provided with light-transmitting zones conjugated with recesses in the mask in respect of the projection lens in the exposure light, photometer means being arranged below said light-transmitting zones.
    Type: Grant
    Filed: June 24, 1983
    Date of Patent: September 10, 1985
    Assignee: Perkin-Elmer Censor Anstalt
    Inventors: Herbert Mayer, Ernst Lobach
  • Patent number: 4379831
    Abstract: A planar, solid, light-transmitting coating (7) is applied directly to a photoresist layer (6) before the exposure of the latter in the production of integrated circuits by photolithography. Any dust particles will thus be held separated from the photoresist layer (6) by a distance at which they are less effective optically. The probability of the occurrence of standing waves is reduced by increasing the total thickness of the combined layer (6+7) covering the semiconductor (5) proper.
    Type: Grant
    Filed: May 21, 1981
    Date of Patent: April 12, 1983
    Assignee: Censor Patent- und Versuchs-Anstalt
    Inventor: Ernst Lobach
  • Patent number: 4362385
    Abstract: In a process and an arrangement for the copying of masks on a workpiece, especially for the projection copying on a semiconductor substrate for the production of integrated circuitries, a mask pattern is imaged on respective different, predetermined areas of the workpiece by a shifting of the workpiece in the image plane. In order to increase the accuracy of the individual imagings, the alignment error between the image of the mask pattern and the predetermined area of the workpiece is determined during the imagings of the mask pattern on the workpiece. The predetermined value of the displacement of the workpiece to the area for a subsequent imaging or the position of the mask is corrected to the extent of the alignment error.
    Type: Grant
    Filed: October 14, 1980
    Date of Patent: December 7, 1982
    Assignee: Censor Patent-und Versuchsanstalt
    Inventor: Ernst Lobach
  • Patent number: 4172581
    Abstract: A vacuum metering valve comprises a housing having an inlet and a discharge space from the inlet with a flow passage between the inlet and outlet having a valve seat with a valve member which is mounted in the housing for movement toward and away from the seat. The construction includes mechanical means for adjusting the position of the valve member in relation to the seat and in addition temperature control means are provided for varying the position in reference to the seat in accordance with temperature variations. Temperature variations are produced by suitable means for heating and cooling an auxiliary member which is disposed for example between a mechanical adjustment device and the valve member.
    Type: Grant
    Filed: September 15, 1976
    Date of Patent: October 30, 1979
    Assignee: Balzers Patent- und Beteiligungs-Aktiengesellschaft
    Inventor: Ernst Lobach
  • Patent number: 4047030
    Abstract: The arrangement is for the mass-spectrometric detection of ions in the presence of a disturbing background, and is of the type including a source of ions, a mass-spectrometric separating system, a detector for the presence of ions, and a focusing device for the ions interposed between the source and the detector. The focusing device comprises an asymmetric electrostatic focusing lens arrangement having semi-cylindrical electrodes defining a lens axis, an ion entrance aperture, and an ion exit aperture. In three embodiments of the electrostatic focusing lens, the ion entrance aperture is eccentric to the axis of the lens. In a fourth embodiment, the ion entrance and exit apertures are coaxial with the lens axis and a pair of intermediate electrodes define an ion aperture which is eccentric relative to the axis of the lens.
    Type: Grant
    Filed: September 24, 1975
    Date of Patent: September 6, 1977
    Assignee: Balzers Patent-und Beteiligungs-Aktiengesellschaft
    Inventor: Ernst Lobach