Patents by Inventor Esra ALTINOK

Esra ALTINOK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200048495
    Abstract: A process for forming a fingerprint-resistant coating on a substrate comprising activating the substrate by exposure to a plasma, and then depositing on the activated substrate at least one alkyl backbone monolayer, and hydroxyl-polyhedral oligomeric silsesquioxane (OH-POSS) nanoparticles.
    Type: Application
    Filed: October 21, 2019
    Publication date: February 13, 2020
    Inventors: Miguel GALVEZ, Bong June ZHANG, Esra ALTINOK
  • Publication number: 20190389886
    Abstract: Functionalized fluoro polyhedral oligomeric silsesquioxane (F-POSS) materials as additives to improve liquid repellence of various polymers, the additive including at least one functionalized F-POSS material, wherein the functional group is at least one material selected from the group consisting of amines, isocyanates, epoxies, carboxylic acids, and esters.
    Type: Application
    Filed: August 26, 2019
    Publication date: December 26, 2019
    Inventors: Cheng DIAO, Esra ALTINOK, Bong June ZHANG, Perry L. CATCHINGS, SR.
  • Publication number: 20190367773
    Abstract: A process for forming a fingerprint-resistant coating on a substrate comprising activating the substrate by exposure to a plasma, and then depositing on the activated substrate an alkyl silane, a POSS, or a mixture thereof.
    Type: Application
    Filed: May 24, 2019
    Publication date: December 5, 2019
    Inventors: Miguel GALVEZ, Bong June ZHANG, Esra ALTINOK
  • Patent number: 10450481
    Abstract: A process for forming a fingerprint-resistant coating on a substrate comprising activating the substrate by exposure to a plasma, and then depositing on the activated substrate at least one alkyl backbone monolayer, and hydroxyl-polyhedral oligomeric silsesquioxane (OH—POSS) nanoparticles.
    Type: Grant
    Filed: June 6, 2017
    Date of Patent: October 22, 2019
    Assignee: NBD NANOTECHNOLOGIES, INC.
    Inventors: Miguel Galvez, Bong June Zhang, Esra Altinok
  • Patent number: 10392409
    Abstract: Functionalized fluoro polyhedral oligomeric silsesquioxane (F-POSS) materials as additives to improve liquid repellence of various polymers, the additive including at least one functionalized F-POSS material, wherein the functional group is at least one material selected from the group consisting of amines, isocyanates, epoxies, carboxylic acids, and esters.
    Type: Grant
    Filed: March 28, 2017
    Date of Patent: August 27, 2019
    Assignee: NBD NANOTECHNOLOGIES, INC.
    Inventors: Cheng Diao, Esra Altinok, Bong June Zhang, Perry L. Catchings, Sr.
  • Publication number: 20170349785
    Abstract: A process for forming a fingerprint-resistant coating on a substrate comprising activating the substrate by exposure to a plasma, and then depositing on the activated substrate at least one alkyl backbone monolayer, and hydroxyl-polyhedral oligomeric silsesquioxane (OH—POSS) nanoparticles.
    Type: Application
    Filed: June 6, 2017
    Publication date: December 7, 2017
    Inventors: Miguel GALVEZ, Bong June ZHANG, Esra ALTINOK
  • Publication number: 20170275437
    Abstract: Functionalized fluoro polyhedral oligomeric silsesquioxane (F-POSS) materials as additives to improve liquid repellence of various polymers, the additive including at least one functionalized F-POSS material, wherein the functional group is at least one material selected from the group consisting of amines, isocyanates, epoxies, carboxylic acids, and esters.
    Type: Application
    Filed: March 28, 2017
    Publication date: September 28, 2017
    Inventors: Cheng DIAO, Esra ALTINOK, Bong June ZHANG, Perry L. CATCHINGS, SR.