Patents by Inventor Eugene F. Bielby

Eugene F. Bielby has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5108512
    Abstract: The present invention is a process for the cleaning of the inner surfaces of a chemical vapor deposition reactor used in the production of polycrystalline silicon. The process comprises impacting the surfaces to be cleaned with solid carbon dioxide pellets. The carbon dioxide pellets dislodge silicon deposits from the surface of the reactor without damaging the surface of the reactor and without providing a source for contamination of polycrystalline silicon produced in the cleaned reactor. The present process is particularly useful for the cleaning of the inner surfaces of chemical vapor deposition reactors used in the production of semi-conductor grade silicon.
    Type: Grant
    Filed: September 16, 1991
    Date of Patent: April 28, 1992
    Assignee: Hemlock Semiconductor Corporation
    Inventors: David M. Goffnett, Mark D. Richardson, Eugene F. Bielby
  • Patent number: D289891
    Type: Grant
    Filed: September 17, 1984
    Date of Patent: May 19, 1987
    Inventor: Eugene F. Bielby