Patents by Inventor Franklin Chau-Nan Hong

Franklin Chau-Nan Hong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Manufacturing method of anti-glare film
    Patent number: 11061172
    Abstract: A manufacturing method of an anti-glare film is provided. The manufacturing method includes spraying a solution on a substrate to form a plurality of droplets on the substrate, wherein the solution includes a curable resin, a plurality of particles, and a solvent; and curing the plurality of droplets to form an anti-glare film.
    Type: Grant
    Filed: December 26, 2018
    Date of Patent: July 13, 2021
    Assignee: E Ink Holdings Inc.
    Inventors: Ching-Huan Liao, Hsin-Tao Huang, Franklin Chau-Nan Hong, Cyun-Jhe Yan, Wen-De Zheng, Yu-Lun Hsiao
  • MANUFACTURING METHOD OF ANTI-GLARE FILM
    Publication number: 20190204481
    Abstract: A manufacturing method of an anti-glare film is provided. The manufacturing method includes spraying a solution on a substrate to form a plurality of droplets on the substrate, wherein the solution includes a curable resin, a plurality of particles, and a solvent; and curing the plurality of droplets to form an anti-glare film.
    Type: Application
    Filed: December 26, 2018
    Publication date: July 4, 2019
    Inventors: Ching-Huan LIAO, Hsin-Tao HUANG, Franklin Chau-Nan HONG, Cyun-Jhe YAN, Wen-De ZHENG, Yu-Lun HSIAO
  • Preparation of carbon molecular sieve membranes on porous substrate
    Patent number: 6730364
    Abstract: A method for preparing carbon molecular sieve membrane is invented. A thin carbon-containing film is first deposited on a porous substrate. The thin film is then bombarded by high energy ions for surface modification. The surface modified film is then baked or calcined at a high temperature. The carbon molecular sieve membrane prepared according to the present invention can be used for gas separation as well as liquid separation, ions or solvents, etc., exhibiting improved permeance and improved selectivity simultaneously in gas separation. The ion bombardment includes generating plasma and ions in a gas phase, and applying a negative bias voltage to the substrate.
    Type: Grant
    Filed: March 28, 2002
    Date of Patent: May 4, 2004
    Assignee: National Science Council
    Inventors: Franklin Chau-Nan Hong, Liang-Chun Wang, Yoou-Bin Guo
  • Preparation of carbon molecular sieve membranes on porous substrate
    Publication number: 20030185998
    Abstract: A method for preparing carbon molecular sieve membrane is invented. A thin carbon-containing film is first deposited on a porous substrate. The thin film is then bombarded by high energy ions for surface modification. The surface modified film is then baked or calcined at a high temperature. The carbon molecular sieve membrane prepared according to the present invention can be used for gas separation as well as liquid separation, ions or solvents, etc., exhibiting improved permeance and improved selectivity simultaneously in gas separation. The ion bombardment includes generating plasma and ions in a gas phase, and applying a negative bias voltage to the substrate.
    Type: Application
    Filed: March 28, 2002
    Publication date: October 2, 2003
    Applicant: NATIONAL SCIENCE COUNCIL
    Inventors: Franklin Chau-Nan Hong, Liang-Chun Wang, Yoou-Bin Guo