Patents by Inventor Fridrich Vazan

Fridrich Vazan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210285087
    Abstract: The present disclosure enables high-resolution direct patterning of a material on a substrate by establishing and maintaining a separation between a shadow mask and a substrate based on the thickness of a plurality of standoffs. The standoffs function as a physical reference that, when in contact between the substrate and shadow mask determine the separation between them. Embodiments are described in which the standoffs are affixed to an element selected from the shadow mask, the substrate, the mask chuck, and the substrate chuck.
    Type: Application
    Filed: May 28, 2021
    Publication date: September 16, 2021
    Inventors: Evan P. DONOGHUE, Fridrich VAZAN, Kerry TICE, Ilyas I. KHAYRULLIN, Tariq ALI, Qi WANG, Laurie SZIKLAS, Amalkumar P. GHOSH
  • Patent number: 11121321
    Abstract: Aspects of the present disclosure are directed to systems, method, and structures including a high-resolution shadow mask with tapered aperture/pixel openings that advantageously overcomes problems plaguing the prior art namely shadowing, sagging, and fragility.
    Type: Grant
    Filed: November 1, 2018
    Date of Patent: September 14, 2021
    Assignee: eMagin Corporation
    Inventors: Evan P. Donoghue, Ilyas I. Khayrullin, Kerry Tice, Tariq Ali, Qi Wang, Fridrich Vazan, Amalkumar P. Ghosh
  • Patent number: 11035033
    Abstract: The present disclosure enables high-resolution direct patterning of a material on a substrate by establishing and maintaining a separation between a shadow mask and a substrate based on the thickness of a plurality of standoffs. The standoffs function as a physical reference that, when in contact between the substrate and shadow mask determine the separation between them. Embodiments are described in which the standoffs are affixed to an element selected from the shadow mask, the substrate, the mask chuck, and the substrate chuck.
    Type: Grant
    Filed: October 24, 2018
    Date of Patent: June 15, 2021
    Assignee: eMagin Corporation
    Inventors: Evan P. Donoghue, Fridrich Vazan, Kerry Tice, Ilyas I. Khayrullin, Tariq Ali, Qi Wang, Laurie Sziklas, Amalkumar P. Ghosh
  • Publication number: 20200407839
    Abstract: A linear evaporation apparatus, system and method including a conductance chamber including a linear output section configured to emit a linear source deposition flux therethrough, an evaporative vapor communication conduit including an evaporative vapor mixing chamber and a plurality of crucible-receiving apertures at distal ends from the evaporative vapor mixing chamber, wherein the evaporative vapor mixing chamber is in communication with the conductance chamber and configured to transmit the linear source deposition flux therethrough, and a plurality of crucibles, each of the plurality of crucibles corresponding to one of the plurality of crucible-receiving apertures at the distal ends from the evaporative vapor mixing chamber, each of the plurality of crucibles configured to hold a material and heat the material to a corresponding material evaporation temperature, each of the plurality of crucibles further including a vapor pressure activated lid configured to open at a predetermined material vapor press
    Type: Application
    Filed: September 16, 2020
    Publication date: December 31, 2020
    Inventors: Tariq ALI, Ilyas I. KHAYRULLIN, Amalkumar P. GHOSH, Evan P. DONOGHUE, Qi WANG, Fridrich VAZAN, Kerry TICE, Laurie SZIKLAS
  • Patent number: 10815563
    Abstract: A linear evaporation apparatus, system and method including a conductance chamber including a linear output section configured to emit a linear source deposition flux therethrough, an evaporative vapor communication conduit including an evaporative vapor mixing chamber and a plurality of crucible-receiving apertures at distal ends from the evaporative vapor mixing chamber, wherein the evaporative vapor mixing chamber is in communication with the conductance chamber and configured to transmit the linear source deposition flux therethrough, and a plurality of crucibles, each of the plurality of crucibles corresponding to one of the plurality of crucible-receiving apertures at the distal ends from the evaporative vapor mixing chamber, each of the plurality of crucibles configured to hold a material and heat the material to a corresponding material evaporation temperature, each of the plurality of crucibles further including a vapor pressure activated lid configured to open at a predetermined material vapor press
    Type: Grant
    Filed: September 7, 2018
    Date of Patent: October 27, 2020
    Assignee: eMagin Corporation
    Inventors: Tariq Ali, Ilyas I. Khayrullin, Amalkumar P. Ghosh, Evan P. Donoghue, Qi Wang, Fridrich Vazan, Kerry Tice, Laurie Sziklas
  • Patent number: 10644239
    Abstract: The method for producing an OLED micro-display on a silicon wafer uses a collimating shadow mask formed on a silicon substrate. The mask is fabricated by depositing a material layer on the front side and on the back side of the substrate and etching a portion of the layer on the back side of the substrate to a reduced thickness of at least 20 microns. At least one opening is created in the etched portion of the substrate. The substrate beneath the opening is removed to create the mask. The mask is situated at a location spaced from the surface of the silicon wafer and exposed to a linear evaporation source. Organic layers are then deposited on the silicon wafer in a location aligned with the mask opening.
    Type: Grant
    Filed: November 16, 2015
    Date of Patent: May 5, 2020
    Assignee: eMagin Corporation
    Inventors: Amalkumar Ghosh, Fridrich Vazan
  • Publication number: 20200131617
    Abstract: The present disclosure enables high-resolution direct patterning of a material on a substrate by establishing and maintaining a separation between a shadow mask and a substrate based on the thickness of a plurality of standoffs. The standoffs function as a physical reference that, when in contact between the substrate and shadow mask determine the separation between them. Embodiments are described in which the standoffs are affixed to an element selected from the shadow mask, the substrate, the mask chuck, and the substrate chuck.
    Type: Application
    Filed: October 24, 2018
    Publication date: April 30, 2020
    Inventors: Evan P. DONOGHUE, Fridrich VAZAN, Kerry TICE, Ilyas I. KHAYRULLIN, Tariq ALI, Qi WANG, Laurie SZIKLAS, Amalkumar P. GHOSH
  • Patent number: 10636969
    Abstract: An apparatus and method for performing material deposition on an active-matrix organic light emitting diode (AMOLED) display array on a substrate, includes aligning a shadow mask to a first position relative to the substrate; initially depositing a first material through the shadow mask onto the substrate at a first material deposition position relative to the first position of the aligned shadow mask and at a first deposition height; incrementing the position the shadow mask to a second position relative to the first material deposition position; and subsequently depositing one of the first material or a second material through the shadow mask onto the substrate at a second material deposition position relative to the first material deposition position, wherein the second material deposition position having an identical deposition pattern as the first material deposition position on account of the shadow mask.
    Type: Grant
    Filed: May 1, 2018
    Date of Patent: April 28, 2020
    Assignee: eMagin Corporation
    Inventors: Evan P. Donoghue, Kerry Tice, Ilyas I. Khayrullin, Fridrich Vazan, Tariq Ali, Laurie Sziklas, Amalkumar P. Ghosh
  • Patent number: 10522794
    Abstract: A method of active alignment of a shadow mask to a substrate includes a first alignment by moving the shadow mask and the substrate a first distance in a vertical direction, capturing a first alignment image, determining at least one of a first correction distance and a first rotational correction angle, and aligning the shadow mask and the substrate by moving the first correction distance and rotating the first rotational correction angle. The method further includes performing a first material deposition process on the substrate and continuously capturing a first series of alignment images during the generation of the first material deposition flow. During the generation of the first material deposition flow the first series of alignment images are analyzed to determine a second correction distance and a second rotational correction angle and determining whether second distance and/or rotational correction angle is greater than or equal to a predetermined value to cause a second alignment process to occur.
    Type: Grant
    Filed: November 1, 2018
    Date of Patent: December 31, 2019
    Assignee: eMagin Corporation
    Inventors: Ilyas I. Khayrullin, Evan P. Donoghue, Kerry Tice, Tariq Ali, Qi Wang, Fridrich Vazan, Amalkumar P. Ghosh
  • Patent number: 10386731
    Abstract: A direct-deposition system capable of forming a high-resolution pattern of material on a substrate is disclosed. Vaporized atoms from an evaporation source pass through a pattern of through-holes in a shadow mask to deposit on the substrate in the desired pattern. The shadow mask is held in a mask chuck that enables the shadow mask and substrate to be separated by a distance that can be less than ten microns. As a result, the vaporized atoms that pass through the shadow mask exhibit little or no lateral spread (i.e., feathering) after passing through its apertures and the material deposits on the substrate in a pattern that has very high fidelity with the aperture pattern of the shadow mask.
    Type: Grant
    Filed: May 23, 2017
    Date of Patent: August 20, 2019
    Assignee: eMagin Corporation
    Inventors: Amalkumar P. Ghosh, Fridrich Vazan, Munisamy Anandan, Evan Donoghue, Ilyas I. Khayrullin, Tariq Ali, Kerry Tice
  • Publication number: 20190131590
    Abstract: A method of active alignment of a shadow mask to a substrate includes a first alignment by moving the shadow mask and the substrate a first distance in a vertical direction, capturing a first alignment image, determining at least one of a first correction distance and a first rotational correction angle, and aligning the shadow mask and the substrate by moving the first correction distance and rotating the first rotational correction angle. The method further includes performing a first material deposition process on the substrate and continuously capturing a first series of alignment images during the generation of the first material deposition flow. During the generation of the first material deposition flow the first series of alignment images are analyzed to determine a second correction distance and a second rotational correction angle and determining whether second distance and/or rotational correction angle is greater than or equal to a predetermined value to cause a second alignment process to occur.
    Type: Application
    Filed: November 1, 2018
    Publication date: May 2, 2019
    Inventors: Ilyas I. KHAYRULLIN, Evan P. DONOGHUE, Kerry TICE, Tariq ALI, Qi WANG, Fridrich VAZAN, Amalkumar P. GHOSH
  • Publication number: 20190131528
    Abstract: Aspects of the present disclosure are directed to systems, method, and structures including a high-resolution shadow mask with tapered aperture/pixel openings that advantageously overcomes problems plaguing the prior art namely shadowing, sagging, and fragility.
    Type: Application
    Filed: November 1, 2018
    Publication date: May 2, 2019
    Inventors: Evan P. DONOGHUE, Ilyas I. KHAYRULLIN, Kerry TICE, Tariq ALI, Qi WANG, Fridrich VAZAN, Amalkumar P. GHOSH
  • Publication number: 20190106782
    Abstract: A linear evaporation apparatus, system and method including a conductance chamber including a linear output section configured to emit a linear source deposition flux therethrough, an evaporative vapor communication conduit including an evaporative vapor mixing chamber and a plurality of crucible-receiving apertures at distal ends from the evaporative vapor mixing chamber, wherein the evaporative vapor mixing chamber is in communication with the conductance chamber and configured to transmit the linear source deposition flux therethrough, and a plurality of crucibles, each of the plurality of crucibles corresponding to one of the plurality of crucible-receiving apertures at the distal ends from the evaporative vapor mixing chamber, each of the plurality of crucibles configured to hold a material and heat the material to a corresponding material evaporation temperature, each of the plurality of crucibles further including a vapor pressure activated lid configured to open at a predetermined material vapor press
    Type: Application
    Filed: September 7, 2018
    Publication date: April 11, 2019
    Inventors: Tariq ALI, Ilyas I. KHAYRULLIN, Amalkumar P. GHOSH, Evan P. DONOGHUE, Qi WANG, Fridrich VAZAN, Kerry TICE, Laurie SZIKLAS
  • Patent number: 10147906
    Abstract: A high efficacy multi-layer seal structure formed on an organic light emitting diode device and the process for depositing the same. A thin film seal is formed over the substrate having OLED layers, and includes a first metallic layer formed over the substrate, an inorganic layer formed over the first metallic layer, and a second metallic layer formed of the inorganic layer. The metallic layers comprise one or more oxide or nitride layers, each oxide or nitride comprising a metal. The inorganic layer comprises a metal oxide, a metal nitride or a metal oxynitride. The process for forming the multi-layer seal structure includes depositing the first metallic layer over the substrate using atomic layer deposition, depositing the inorganic layer over the first metallic layer using sputtering, and then depositing the second metallic layer over the inorganic layer using atomic layer deposition.
    Type: Grant
    Filed: February 6, 2015
    Date of Patent: December 4, 2018
    Assignee: eMagin Corporation
    Inventors: Amalkumar Ghosh, Fridrich Vazan
  • Publication number: 20180340252
    Abstract: A system and method for reducing attractive forces between a deposition mask and a substrate is provided that enables high-resolution direct deposition of a patterned layer of material on a substrate using electrostatic chucks for holding the substrate and the shadow mask. A charge-dissipating shadow mask is utilized that comprises a thin conductive layer on the surface of the membrane of the shadow mask. The conductive layer helps to dissipate the charge that accumulates on the membrane of the shadow mask, thereby reducing the attractive forces between the substrate and the shadow mask. As a result, the shadow mask and substrate can be placed in closer proximity to each other than would be possible without the charge-dissipating shadow mask, thereby reducing feathering effects and enabling higher resolution direct deposition.
    Type: Application
    Filed: May 24, 2018
    Publication date: November 29, 2018
    Inventors: Fridrich VAZAN, Evan P. DONOGHUE, Kerry TICE, Ilyas I. KHAYRULLIN, Tariq ALI, Qi WANG, Amalkumar P. GHOSH
  • Publication number: 20180315925
    Abstract: A shadow mask that includes compensation layer operative for at least partially correcting gravity-induced sag of a shadow-mask membrane is disclosed. The compensation layer is formed on a surface of the shadow-mask membrane such that the compensation layer is characterized by a residual stress that gives rise to a first bending moment in the membrane, where the first bending moment is directed in the opposite direction to a second bending moment in the membrane that is induced by the effect of gravity.
    Type: Application
    Filed: May 1, 2018
    Publication date: November 1, 2018
    Inventors: Fridrich VAZAN, Evan P. DONOGHUE, Ilyas I. KHAYRULLIN, Tariq ALI, Kerry TICE, Amalkumar P. GHOSH
  • Publication number: 20180315926
    Abstract: An apparatus and method for performing material deposition on an active-matrix organic light emitting diode (AMOLED) display array on a substrate, includes aligning a shadow mask to a first position relative to the substrate; initially depositing a first material through the shadow mask onto the substrate at a first material deposition position relative to the first position of the aligned shadow mask and at a first deposition height; incrementing the position the shadow mask to a second position relative to the first material deposition position; and subsequently depositing one of the first material or a second material through the shadow mask onto the substrate at a second material deposition position relative to the first material deposition position, wherein the second material deposition position having an identical deposition pattern as the first material deposition position on account of the shadow mask.
    Type: Application
    Filed: May 1, 2018
    Publication date: November 1, 2018
    Inventors: Evan P. DONOGHUE, Kerry TICE, Ilyas I. KHAYRULLIN, Fridrich VAZAN, Tariq ALI, Laurie SZIKLAS, Amalkumar P. GHOSH
  • Patent number: 10072328
    Abstract: A direct-deposition system capable of forming a high-resolution pattern of material on a substrate is disclosed. Vaporized atoms from an evaporation source pass through an aperture pattern of a shadow mask to deposit on the substrate in the desired pattern. Prior to reaching the shadow mask, the vaporized atoms pass through a collimator that operates as a spatial filter that blocks any atoms not travelling along directions that are nearly normal to the substrate surface. As a result, the vaporized atoms that pass through the shadow mask exhibit little or no lateral spread (i.e., feathering) after passing through its apertures and the material deposits on the substrate in a pattern that has very high fidelity with the aperture pattern of the shadow mask. The present invention, therefore, mitigates the need for relatively large space between regions of deposited material normally required in the prior art, thereby enabling high-resolution patterning.
    Type: Grant
    Filed: May 17, 2017
    Date of Patent: September 11, 2018
    Assignee: eMagin Corporation
    Inventors: Amalkumar P. Ghosh, Fridrich Vazan, Munisamy Anandan, Evan Donoghue, Ilyas I. Khayrullin, Tariq Ali, Kerry Tice
  • Publication number: 20170342543
    Abstract: A direct-deposition system forming a high-resolution pattern of material on a substrate is disclosed. Vaporized atoms from an evaporation source pass through a pattern of through-holes in a shadow mask to deposit on the substrate in the desired pattern. The shadow mask is held in a mask chuck that enables the shadow mask and substrate to be separated by a distance that can be less than ten microns. Prior to reaching the shadow mask, vaporized atoms pass through a collimator that operates as a spatial filter that blocks any atoms not travelling along directions that are nearly normal to the substrate surface. Vaporized atoms that pass through the shadow mask exhibit little or no lateral spread after passing through through-holes and the material deposits on the substrate in a pattern that has very high fidelity with the through-hole pattern of the shadow mask.
    Type: Application
    Filed: July 20, 2017
    Publication date: November 30, 2017
    Inventors: Amalkumar P. GHOSH, Fridrich VAZAN, Munisamy ANANDAN, Evan DONOGHUE, Ilyas I. KHAYRULLIN, Tariq ALI, Kerry TICE
  • Publication number: 20170342542
    Abstract: A direct-deposition system capable of forming a high-resolution pattern of material on a substrate is disclosed. Vaporized atoms from an evaporation source pass through an aperture pattern of a shadow mask to deposit on the substrate in the desired pattern. Prior to reaching the shadow mask, the vaporized atoms pass through a collimator that operates as a spatial filter that blocks any atoms not travelling along directions that are nearly normal to the substrate surface. As a result, the vaporized atoms that pass through the shadow mask exhibit little or no lateral spread (i.e., feathering) after passing through its apertures and the material deposits on the substrate in a pattern that has very high fidelity with the aperture pattern of the shadow mask. The present invention, therefore, mitigates the need for relatively large space between regions of deposited material normally required in the prior art, thereby enabling high-resolution patterning.
    Type: Application
    Filed: May 17, 2017
    Publication date: November 30, 2017
    Inventors: Amalkumar P. GHOSH, Fridrich VAZAN, Munisamy ANANDAN, Evan DONOGHUE, Ilyas I. KHAYRULLIN, Tariq ALI, Kerry TICE