Abstract: A method for manufacturing a semiconductor device comprises: forming a lower electrode on a semiconductor substrate, sputtering a ferroelectric film on the lower electrode using a target, thermal treating the ferroelectric film in an atmosphere containing oxygen in accordance with an accumulated period of use of the target for fabricating the ferroelectric film, and forming an upper electrode on the ferroelectric film.

Abstract: A semiconductor device includes a substrate and a ferroelectric capacitor including a lower electrode, a ferroelectric film, and an upper electrode. The upper electrode includes a first layer formed of an oxide whose stoichiometric composition is expressed as AOx1 and whose actual composition is expressed as AOx2; a second layer formed on the first layer and formed of an oxide whose stoichiometric composition is expressed as BOy1 and whose actual composition is expressed as BOy2; and a metal layer formed on the second layer. The second layer is higher in ratio of oxidation than the first layer. The composition parameters x1, x2, y1, and y2 satisfy y2/y1>x2/x1, and the second layer includes an interface layer of the stoichiometric composition formed at an interface with the metal layer. The interface layer is higher in ratio of oxidation than the rest of the second layer.

Abstract: A semiconductor device includes a substrate and a ferroelectric capacitor including a lower electrode, a ferroelectric film, and an upper electrode. The upper electrode includes a first layer formed of an oxide whose stoichiometric composition is expressed as AOx1 and whose actual composition is expressed as AOx2; a second layer formed on the first layer and formed of an oxide whose stoichiometric composition is expressed as BOy1 and whose actual composition is expressed as BOy2; and a metal layer formed on the second layer. The second layer is higher in ratio of oxidation than the first layer. The composition parameters x1, x2, y1, and y2 satisfy y2/y1>x2/x1, and the second layer includes an interface layer of the stoichiometric composition formed at an interface with the metal layer. The interface layer is higher in ratio of oxidation than the rest of the second layer.

Abstract: A semiconductor device includes a semiconductor element placed over a substrate, a heat conducting material placed over the semiconductor element, and a radiator placed over the heat conducting material. The radiator has a plurality of projections which are arranged outside a region opposite to the semiconductor element and which protrude toward the substrate. Even if the heat conducting material flows out from over the semiconductor element at fabrication time, the heat conducting material which flows out is made by the plurality of projections to adhere to and spread along the radiator. As a result, the outflow or scattering of the heat conducting material toward the substrate or an electric trouble caused by it is prevented.

Abstract: A semiconductor memory includes a sense amplifier which operates in response to activation of a sense amplifier enable signal and determines logic held in a nonvolatile memory cell according to a voltage of a bit line, the voltage varying with a cell current flowing through a real cell transistor, a replica cell transistor coupled in series between a first node and a ground line, and a timing generation unit. The timing generation unit activates the sense amplifier enable signal when the first node coupled to the ground line via the replica cell transistor changes from a high level to a low level. The replica cell transistor includes a control gate receiving a constant voltage and a floating gate coupled to the control gate. Thus, the activation timing of the sense amplifier can be optimally set in accordance with the electric characteristic of the memory cell.

Abstract: A semiconductor storage device includes: memory cells including a transistor and a capacitor; bit lines; word lines; and sense amplifiers including first and second sense amplifiers, wherein the memory cells includes: a first memory cell group sharing a first auxiliary word line; and a second memory cell group sharing a second auxiliary word line, wherein the word lines includes a first word line coupled to the first auxiliary word line and a second word line coupled to the second auxiliary word line, the first word line is coupled to the first auxiliary word line in a first word line contact region, the second word line is coupled to the second auxiliary word line in a second word line contact region, the bit lines includes first and second bit lines coupled to the first sense amplifier on both sides of the first word line contact region.

Abstract: In a constant voltage circuit including: an error amplifier circuit amplifying a difference voltage between an output voltage and a reference voltage; and an output transistor controlling the output voltage based on an output of the error amplifier circuit, a voltage proportional to a leakage current detected by a monitoring transistor is generated by an oscillation circuit and a charge pump circuit and is supplied to a back gate of the output transistor.

Abstract: A semiconductor device includes a capacitor, the capacitor includes a lower electrode, which includes platinum, provided above a semiconductor substrate; a first ferroelectric film, which includes lead zirconate titanate added with La, provided on the lower electrode; a second ferroelectric film, which includes lead zirconate titanate added with La, Ca, and Sr, provided directly on the first ferroelectric film, the second ferroelectric film having a thickness smaller than that of the first ferroelectric film and includes amounts of Ca and Sr greater than amounts of Ca and Sr that may be present in the first ferroelectric film; and an upper electrode, which includes a conductive oxide, provided on the second ferroelectric film.

Abstract: There is disclosed current-mode time-interleaved sampling circuitry configured to be driven by substantially sinusoidal clock signals. Such circuitry may be incorporated in ADC circuitry, for example as integrated circuitry on an IC chip. The disclosed circuitry is capable of calibrating itself without being taken off-line.

Abstract: An electro-static discharge protection device including a gate electrode formed on a substrate. First and second diffusion regions of a first conductivity type are formed in the substrate with the gate electrode located in between. A first silicide layer is formed in the first diffusion region. A silicide block region is formed between the gate electrode and the first silicide layer. A third diffusion region is formed below the first silicide layer to partially overlap the first diffusion region. The third diffusion region and first silicide layer have substantially the same shapes and dimensions. The third diffusion region and a portion below the gate electrode located at the same depth as the third diffusion region contain impurities of a second conductivity type. The third diffusion region has an impurity concentration that is higher than that of the portion below the gate electrode.

Abstract: There is disclosed current-mode time-interleaved sampling circuitry configured to be driven by substantially sinusoidal clock signals. Such circuitry may be incorporated in ADC circuitry, for example as integrated circuitry on an IC chip. The disclosed circuitry is capable of calibrating itself without being taken off-line.

Abstract: An image processing apparatus including a decoding unit configured to decode encoded stereoscopic dynamic image data containing a consecutive picture pair having a disparity, for each block into which the picture has been divided, and to detect a decoding error, an estimation unit configured to perform first estimation processing of estimating, as a disparity of an error block between an error picture including an error block in which the decoding error has been detected and a paired picture thereof, a disparity of a corresponding-location corresponding to the error block between an approximate picture and a paired picture thereof, and a correction unit configured to correct the decoding error by applying, to the error block, a block located at a position shifted by an amount of the estimated disparity from the corresponding-location in the paired picture of the error picture.

Abstract: A data transfer system includes a transmission circuit, which operates by a first clock signal, and a receiving circuit, which operates by a second clock signal different from the first clock signal. The transmission circuit includes an output circuit that outputs a poll signal, of which a level is logically inverted in accordance with a transmission timing of transmission data from the transmission circuit to the receiving circuit. A first signal generating circuit receives the transmission data at a plurality of timings and generates plural sets of reception data corresponding to the plurality of timings. A second signal generating circuit receives the poll signal at the plurality of timings and generates synchronous poll signals corresponding to the plurality of timings. A data selecting circuit compares levels of the synchronous poll signals with each other and selects one of the sets of reception data based on the comparison result.

Abstract: A method for designing a semiconductor device includes arranging at least a pattern of a first active region in which a first transistor is formed and a pattern of a second active region in which a second transistor is formed; arranging at least a pattern of a gate wire which intersects the first active region and the second active region; extracting at least a first region in which the first active region and the gate wire are overlapped with each other; arranging at least one pattern of a compressive stress film on a region including the first active region; and obtaining by a computer a layout pattern of the semiconductor device, when the at least one pattern of the compressive stress film is arranged, end portions of the at least one pattern thereof are positioned based on positions of end portions of the first region.

Abstract: A SRAM includes a first CMOS inverter of first and second MOS transistors connected in series, a second CMOS inverter of third and fourth MOS transistors connected in series and forming a flip-flop circuit together with the first CMOS inverter, and a polysilicon resistance element formed on a device isolation region, each of the first and third MOS transistors is formed in a device region of a first conductivity type and includes a second conductivity type drain region at an outer side of a sidewall insulation film of the gate electrode with a larger depth than a drain extension region thereof, wherein a source region is formed deeper than a drain extension region, the polysilicon gate electrode has a film thickness identical to a film thickness of the polysilicon resistance element, the source region and the polysilicon resistance element are doped with the same dopant element.

Abstract: A substrate is provided with a first wiring layer 111, an interlayer insulating film 132 on the first wiring layer 111, a hole 112A formed in the interlayer insulating film, a first metal layer 112 covering the hole 112A, a second metal layer 113 formed in the hole 112A, a dielectric insulating film 135 on the first metal layer 112, and second wiring layers 114-116 on the dielectric insulating film 135, wherein the first metal layer 112 constitutes at least part of the lower electrode, an area, facing the lower electrode, of the second wiring layers 114-116 constitutes the upper electrode, and a capacitor 160 is constructed of the lower electrode, the dielectric insulating film 135 and the upper electrode P1.

Abstract: There is disclosed current-mode time-interleaved sampling circuitry configured to be driven by substantially sinusoidal clock signals. Such circuitry may be incorporated in ADC circuitry, for example as integrated circuitry on an IC chip. The disclosed circuitry is capable of calibrating itself without being taken off-line.

Abstract: There is provided a method for manufacturing a semiconductor device, including, forming a first insulating film on a semiconductor substrate, forming a capacitor on the first insulating film, forming a second insulating film covering the capacitor, forming a metal wiring on the second insulating film, forming a first capacitor protective insulating film covering the metal wiring and the second insulating film, forming an insulating sidewall on a side of the metal wiring, forming a third insulating film on the insulating sidewall, forming a hole by etching the third insulating film under a condition that an etching rate of the insulating sidewall would be lower than that of the third insulating film, and forming a conductive plug inside the hole.

Abstract: A DC-DC converter or the like capable of generating a stable output voltage is provided. A control circuit 11 of a current mode step-down DC-DC converter 1 includes a slope compensation circuit SC and an offset circuit IF1. The slope compensation circuit SC adds an increase gradient m2 due to slope compensation to an increase gradient of a coil current waveform Vsense in a range wherein an ON period Ton of a switch SW1 exceeds ½ of an operating cycle T. An offset circuit IF1 applies an offset voltage Voffset which becomes smaller depending on the ON period Ton in excess of ½ of an operating cycle T, to a coil current waveform Vsense.

Abstract: Memory cells adjacent to each other in a second direction are formed in a first p-type well region, a first n-type well region, and a second p-type well region arranged in a first direction. Each memory cell includes a first transfer transistor and a first driver transistor formed in the first p-type well region, a second transfer transistor and a second driver transistor formed in the second p-type well region, and first and second load transistors formed in the first n-type well region. In an SRAM, gate electrodes of the first and second transfer transistors of the memory cells adjacent to each other in the second direction are electrically connected to first and second word lines, respectively. The first and second word lines are electrically connected to the first and second p-type well regions, respectively.