Patents by Inventor Fuminori Higuchi

Fuminori Higuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7951274
    Abstract: A diamond electrode includes a conductive silicon substrate having a plurality of pores. The diamond electrode also includes a conductive diamond covering the conductive silicon substrate. The inner wall surfaces of the plurality of pores are at an angle of 60° to 85° with respect to a substrate of the conductive silicon substrate.
    Type: Grant
    Filed: October 25, 2006
    Date of Patent: May 31, 2011
    Assignee: Sumitomo Electric Hardmetal Corp.
    Inventors: Shigeru Yoshida, Katsuhito Yoshida, Toshiya Takahashi, Takahisa Iguchi, Fuminori Higuchi
  • Publication number: 20100038235
    Abstract: The present invention provides a diamond electrode that, in waste water treatment or production of functional water by using electrolysis, does not cause contamination of a solution or release of toxic substances, achieves enhancement of the energy efficiency, has excellent durability, and can endure prolonged use without damage. The present invention further provides a treatment device where the above electrode is used, and a method for manufacturing the above electrode. In a diamond electrode according to the present invention, the electrode includes a conductive diamond film covering one surface of a substrate. Assuming that the thickness of the substrate is T (?m) and the thickness of the conductive diamond film is t1 (?m), the ratio between them is 0.0010?t1/T?0.022 and 10?t1?70.
    Type: Application
    Filed: October 15, 2008
    Publication date: February 18, 2010
    Applicant: SUMITOMO ELECTRIC HARDMETAL CORP.
    Inventors: Shigeru Yoshida, Toshiya Takahashi, Yuichiro Seki, Katsuhito Yoshida, Fuminori Higuchi
  • Publication number: 20090301865
    Abstract: A diamond electrode includes a conductive silicon substrate having a plurality of pores. The diamond electrode also includes a conductive diamond covering the conductive silicon substrate. The inner wall surfaces of the plurality of pores are at an angle of 60° to 85° with respect to a substrate of the conductive silicon substrate.
    Type: Application
    Filed: October 25, 2006
    Publication date: December 10, 2009
    Applicant: SUMITOMO ELECTRIC HARDMETAL CORP.
    Inventors: Shigeru Yoshida, Katsuhito Yoshida, Toshiya Takahashi, Takahisa Iguchi, Fuminori Higuchi
  • Patent number: 5079224
    Abstract: The superconductive thin film is made in the procedures that; in a vacuum vessel having an internal pressure maintained at least lower than 10.sup.-2 torr, each metal of the component elements of the superconductive thin film to be made is charged into a crucible so as to be heated as a simple substance respectively so that the evaporated metallic element is spouted from the crucible as a cluster beam, the spouted evaporation metallic element is ionized and accelerated through an electric field, impinging to a substrate while spouting oxygen gas toward the substrate, controlling the heating of the crucible so that the amount of the respective metallic evaporation beams is made to be a predetermined mole ratio, whereby the superconductive thin film is formed on the substrate.
    Type: Grant
    Filed: October 15, 1990
    Date of Patent: January 7, 1992
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventor: Fuminori Higuchi
  • Patent number: 4584053
    Abstract: A process for preparing a large ZnSe single crystal, comprising vacuum sealing polycrystalline ZnSe prepared by a chemical vapor deposition in a capable and hot isostatically pressing polycrystalline ZnSe in the capsule, by which the ZnSe single crystal having such high qualities as to be used as a substrate on which an epitaxial layer of ZnSe can be grown.
    Type: Grant
    Filed: June 22, 1984
    Date of Patent: April 22, 1986
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Hirokuni Namba, Hajime Osaka, Koichi Kamon, Fuminori Higuchi