Abstract: An ultrasound receiving apparatus of the present invention includes an ultrasound generation member. The ultrasound generation member is a sheet-shaped light absorbing member which is in acoustic contact with an acoustic liquid disposed between the subject and the ultrasound receiving array so as to acoustically combine the subject and the ultrasound receiving array, and is stretched in the acoustic liquid to be located between the subject and the ultrasound receiving array.

Abstract: The present invention employs an information processing apparatus, comprising: an information processing unit configured to: acquire concentration information, which indicates a spatial distribution of concentration of a substance constituting an object and which originates from a photoacoustic wave generated by light irradiation of the object; and correct, based on the concentration in a specific position of the object in the concentration information, the concentration in a deep region of the object deeper than the specific position in the concentration information.

Abstract: An ultrasonic apparatus includes an ultrasonic wave generating member having a light absorbing member that generates an ultrasonic wave when irradiated by a light from a light irradiating portion, and a transducer that detects the ultrasonic wave and converts the ultrasonic wave into an electric signal. The ultrasonic wave generating member includes an area that has a different light absorption coefficient in an irradiation area irradiated by the light from the light irradiating portion. Furthermore, in an area in which the light absorbing member is disposed, when an area irradiated by the light from the light irradiating portion is referred to as a transmitted ultrasonic wave generating area, the transmitted ultrasonic wave generating area functions as a surface sound source.

Abstract: A photoacoustic ultrasonic imaging apparatus includes a light emitting portion configured to emit pulsed light; a photoacoustic sound source configured to absorb the pulsed light and generate photoacoustic waves to be transmitted toward a subject; a plurality of transducers configured to receive photoacoustic waves reflected by the subject and output electric signals; and an information processor configured to output a photoacoustic ultrasonic echo image of the subject by using the electric signals. The information processor is configured to calculate the photoacoustic ultrasonic echo image on the basis of positional information on the photoacoustic sound source.

Abstract: An object information acquiring apparatus includes a light source, a light absorbing member configured to absorb light radiated from the light source to generate a transmit-ultrasound wave that is a planar wave, a detecting element configured to receive an acoustic wave to output an electric signal, an information processing unit configured to acquire characteristic information on an object using the electric signal. The detecting element receives an ultrasound wave resulting from reflection or scattering of the transmit-ultrasound wave in the object, as an acoustic wave.

Abstract: An object information acquiring apparatus comprises a light irradiation unit configured to irradiate an object with light; a sound generating member arranged between the object and the light irradiation unit and configured to generate a substantially planar ultrasonic wave based on the irradiated light; an acoustic wave probe configured to acquire an acoustic wave generated inside the object due to the light and convert the acoustic wave into a first electric signal; and an information generating unit configured to generate information concerning optical characteristics of an interior of the object, based on the first electric signal, wherein the sound generating member allows a part of the light irradiated from the light irradiation unit to pass through the sound generating member to the object.

Abstract: An object information acquiring apparatus includes: an acoustic wave generating member which absorbs light and generates an acoustic wave; an irradiating unit which irradiates an object or the acoustic wave generating member with light; a detector which detects an acoustic wave propagating from the object; a signal processing unit which generates object information that is information of the inside of the object, based on a signal output from the detector; and a switching unit which performs switching between a first mode in which a first acoustic wave generated inside the object due to irradiation of the light is detected by the detector and a second mode in which a second acoustic wave generated by the acoustic wave generating member due to irradiation of the light and having propagated inside the object is detected by the detector.

Abstract: A method of manufacturing a mirror includes a first step of arranging, on a substrate, a shape adjusting layer having a layer thickness which changes by heat, a second step of arranging, on the shape adjusting layer, a reflection layer including a first layer, a second layer, and a barrier layer which is arranged between the first layer and the second layer, and prevents a diffusion of a material of the first layer and a material of the second layer, and a third step of bringing a shape of the reflection layer close to a target shape by changing a layer thickness profile of the shape adjusting layer after the second step, the third step including a process of partially annealing the shape adjusting layer.

Abstract: An adjusting method of an X-ray apparatus has a reflection structure, wherein assuming that one end plane of the reflection structure is an inlet port of the X-ray and the other end plane is an outlet port of the X-ray, a pitch of the reflection substrates at the outlet port is wider than that at the inlet port. When the X-ray source exists at a position where a glancing angle at the time when the X-ray enters the inlet port exceeds a critical angle, an intensity of the X-ray emitted from each passage is detected. On the basis of the detected X-ray intensity, a relative position of the X-ray source and the reflection structure is adjusted.

Abstract: A filter reflects first light having a first wavelength, and transmits second light having a second wavelength shorter than the first wavelength. The filter includes a plurality of plate members positioned parallel to each other with gaps therebetween in a first direction. An enveloping surface formed by end surfaces of the plurality of plate members forms a flat surface, which is nonparallel to the first direction. The filter transmits the second light to the second direction.

Abstract: An optical device includes a wavelength separation filter configured to separate incident light into light having a first wavelength and light having a second wavelength, the wavelength separation filter including a blazed grating whose cross-sectional shape is a saw-tooth shape formed by one-dimensionally arranging a plurality of grating elements, wherein the blazed grating is configured to exert a first power on the light having the first wavelength, of the light having the first wavelength and the light having the second wavelength, by gradually changing angles surfaces of the plurality of grating elements make with a base plane, and to exert a second power on the light having the second wavelength, of the light having the first wavelength and the light having the second wavelength, by gradually changing lengths of the plurality of grating elements along a direction in which the plurality of grating elements are arranged.

Abstract: A filter reflects first light having a first wavelength, and transmits second light having a second wavelength shorter than the first wavelength. The filter includes a plurality of plate members positioned parallel to each other with gaps therebetween in a first direction. An enveloping surface formed by end surfaces of the plurality of plate members forms a flat surface, which is nonparallel to the first direction. The filter transmits the second light to the second direction.

Abstract: An adjusting method of an X-ray apparatus has a reflection structure, wherein assuming that one end plane of the reflection structure is an inlet port of the X-ray and the other end plane is an outlet port of the X-ray, a pitch of the reflection substrates at the outlet port is wider than that at the inlet port. When the X-ray source exists at a position where a glancing angle at the time when the X-ray enters the inlet port exceeds a critical angle, an intensity of the X-ray emitted from each passage is detected. On the basis of the detected X-ray intensity, a relative position of the X-ray source and the reflection structure is adjusted.

Abstract: A filter reflects first light having a first wavelength, and transmits second light having a second wavelength shorter than the first wavelength. The filter includes a plurality of plate members positioned parallel to each other with gaps therebetween in a first direction. An enveloping surface formed by end surfaces of the plurality of plate members forms a flat surface, which is nonparallel to the first direction. The filter transmits the second light to the second direction.

Abstract: A method of manufacturing a mirror includes a first step of arranging, on a substrate, a shape adjusting layer having a layer thickness which changes by heat, a second step of arranging, on the shape adjusting layer, a reflection layer including a first layer, a second layer, and a barrier layer which is arranged between the first layer and the second layer, and prevents a diffusion of a material of the first layer and a material of the second layer, and a third step of bringing a shape of the reflection layer close to a target shape by changing a layer thickness profile of the shape adjusting layer after the second step, the third step including a process of partially annealing the shape adjusting layer.

Abstract: An optical device includes a wavelength separation filter configured to separate incident light into light having a first wavelength and light having a second wavelength, the wavelength separation filter including a blazed grating whose cross-sectional shape is a saw-tooth shape formed by one-dimensionally arranging a plurality of grating elements, wherein the blazed grating is configured to exert a first power on the light having the first wavelength, of the light having the first wavelength and the light having the second wavelength, by gradually changing angles surfaces of the plurality of grating elements make with a base plane, and to exert a second power on the light having the second wavelength, of the light having the first wavelength and the light having the second wavelength, by gradually changing lengths of the plurality of grating elements along a direction in which the plurality of grating elements are arranged.

Abstract: A multilayer mirror used for EUV light includes a substrate, a reflection layer for reflecting the EUV light, a stress compensation layer, formed between the substrate and the reflection layer, for compensating a deformation of the substrate by the reflection layer, wherein the substrate has a first area, in which the stress compensation layer is layered but no reflection layer is layered.

Abstract: An exposure apparatus 1 comprises a collecting mirror 104 configured to collect emitted light from plasma 101, an illumination optical system which includes illumination system mirrors 201 to 204 and is configured to illuminate a reticle 301 light collected by the collecting mirror 104 using the second reflective optical element 201 to 204, and a projection optical system configured to project a pattern of the reticle 301 onto a wafer 308. At a predetermined temperature, a first wavelength where a reflectance of light entering the collecting mirror 104 or the illumination system mirrors 201 to 204 at a predetermined angle is peaked is shorter than a second wavelength where a reflectance of light in the projection optical system is peaked.

Abstract: An exposure mirror includes a substrate and an effective region for EUV light including an aperiodic multilayer film formed on the substrate. The exposure mirror is provided with a first evaluation region composed of a periodic multilayer film formed in a region different from the effective region on the substrate.

Abstract: An optical element includes plural multilayer mirrors, wherein the multilayer mirrors are renewable.