Patents by Inventor Futoshi Oikawa

Futoshi Oikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10960651
    Abstract: A laminate, comprising an intermediate layer and a covering material A and a covering material B that are disposed on respective sides of the intermediate layer, the covering material A being disposed with an orientation direction at an angle of 20° or less with respect to an orientation direction of the covering material B.
    Type: Grant
    Filed: December 28, 2017
    Date of Patent: March 30, 2021
    Assignee: SHOWA DENKO MATERIALS CO., LTD.
    Inventors: Futoshi Oikawa, Masashi Takahashi, Tomomi Kawamura
  • Publication number: 20200331244
    Abstract: A laminate, comprising an intermediate layer and a covering material A and a covering material B that are disposed on respective sides of the intermediate layer, the covering material A being disposed with an orientation direction at an angle of 20° or less with respect to an orientation direction of the covering material B.
    Type: Application
    Filed: December 28, 2017
    Publication date: October 22, 2020
    Inventors: Futoshi OIKAWA, Masashi TAKAHASHI, Tomomi KAWAMURA
  • Patent number: 8697240
    Abstract: A photocurable resin composition including: (A) a urethane (meth)acrylate oligomer having a polyoxyalkylene structure, (B) a (meth)acrylic polymer, (C) a (meth)acrylic monomer, and (D) a photopolymerization initiator, wherein the component (A) is produced using monomer components including (a1) a polyoxyalkylene polyol, (a2) a polyisocyanate, and (a3) a hydroxyl group-containing mono(meth)acrylate compound, a relationship N (=n1/n2) between the total mass n1 of the monomer components and the total equivalent weight n2 of acryloyl groups within the all monomer components is 4,000 or greater, and the component (A) is substantially free of unreacted isocyanate groups.
    Type: Grant
    Filed: July 15, 2010
    Date of Patent: April 15, 2014
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Yoshinobu Ogawa, Futoshi Oikawa, Hiromasa Kawai
  • Publication number: 20120114953
    Abstract: A photocurable resin composition including: (A) a urethane (meth)acrylate oligomer having a polyoxyalkylene structure, (B) a (meth)acrylic polymer, (C) a (meth)acrylic monomer, and (D) a photopolymerization initiator, wherein the component (A) is produced using monomer components including (a1) a polyoxyalkylene polyol, (a2) a polyisocyanate, and (a3) a hydroxyl group-containing mono(meth)acrylate compound, a relationship N (=n1/n2) between the total mass n1 of the monomer components and the total equivalent weight n2 of acryloyl groups within the all monomer components is 4,000 or greater, and the component (A) is substantially free of unreacted isocyanate groups.
    Type: Application
    Filed: July 15, 2010
    Publication date: May 10, 2012
    Inventors: Yoshinobu Ogawa, Futoshi Oikawa, Hiromasa Kawai