Patents by Inventor Gary L. Fong

Gary L. Fong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5958510
    Abstract: A method and apparatus are disclosed for forming thin polymer layers on semiconductor substrates. In one embodiment, the method and apparatus include the sublimation of stable dimer parylene material, the pyrolytic conversion of such gaseous dimer material into reactive monomers, and for the optional blending of the resulting gaseous parylene monomers with one or more polymerizable materials in gaseous form capable of copolymerizing with the parylene monomers to form a low dielectric constant polymerized parylene material. An apparatus is also disclosed which provides for the distribution of the polymerizable gases into the deposition chamber, for cooling the substrate down to a temperature at which the gases will condense to form a polymerized dielectric material, for heating the walls of the deposition chamber to inhibit formation and accumulation of polymerized residues thereon, and for recapturing unreacted monomeric vapors exiting the deposition chamber.
    Type: Grant
    Filed: January 8, 1996
    Date of Patent: September 28, 1999
    Assignee: Applied Materials, Inc.
    Inventors: Visweswaren Sivaramakrishnam, Bang C. Nguyen, Gayathri Rao, Stuardo Robles, Gary L. Fong, Vicente Lim, Peter W. Lee
  • Patent number: 5882414
    Abstract: The present invention provides a method and apparatus for introducing gases into a processing chamber and cleaning isolated surfaces thereof. In one embodiment, the apparatus provides a gas distribution system which comprises a face plate and a blocker plate located adjacent the face plate wherein the blocker plate is electrically insulated from the face plate. An RF power source is electrically connected to the face plate and a switch that selectively connects the blocker plate to the RF power source or grounds the blocker plate. When the power source is applied to the faceplate and the blocker plate is grounded, an energy potential is formed between the face plate and the blocker plate. The energy potential is sufficient to strike a plasma from cleaning gases introduced into the gas distribution system to clean the apertures and surfaces of both the face plate and the blocker plate.
    Type: Grant
    Filed: September 9, 1996
    Date of Patent: March 16, 1999
    Assignee: Applied Materials, Inc.
    Inventors: Gary L. Fong, Quoc Truong, Visweswaren Sivaramakrishman
  • Patent number: 5725675
    Abstract: A method and apparatus is provided to prevent energy transfer to a gas which is flown through a gas line disposed between a biased member and grounded member. In one aspect of the invention, a semi-conductive sleeve, such as a silicon carbide sleeve, is provided which is disposed about a gas line and is in contact with the gas inlet manifold and the gas outlet manifold and has a resistance less than that of the gas which is flown through the gas line.
    Type: Grant
    Filed: April 16, 1996
    Date of Patent: March 10, 1998
    Assignee: Applied Materials, Inc.
    Inventors: Gary L. Fong, Vincente Lim, Visweswaren Sivaramakrishnan