Patents by Inventor Genichiro Matsuda
Genichiro Matsuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11731177Abstract: The peeling member is disposed inside the inner tank. The switching mechanism is provided for switching between the state of rotating the peeling member in the interlocking manner with the inner tank and the state of being disconnected the peeling member from the inner tank. With the peeling member disconnected from the inner tank, one of them is rotated, the used paper diaper stored is peeled off from the inner surface of the inner tank, and then, the used paper diaper processed in the processing tank is discharged from the bottom of the processing tank to the take-out unit via the opening and closing unit.Type: GrantFiled: September 17, 2020Date of Patent: August 22, 2023Assignee: PANASONIC CORPORATIONInventors: Genichiro Matsuda, Hidenao Kataoka, Naofumi Hino
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Patent number: 11642708Abstract: Provided is a used paper diaper processing apparatus in which a water absorption function of a superabsorbent polymer that absorbs water contained in excrement is lowered and water is removed by mixing the superabsorbent polymer and a chemical containing divalent metal ions in an outer tank, and in which weight is reduced by dehydration after an amount of water contained in a used paper diaper is lowered. In the apparatus, a lower portion of the outer tank can be opened and closed, so that weight reduction processing and a series of operations including taking-out are possible. Since an operator is not required to take out the used paper diaper after processing directly from the outer tank, it is possible to reduce work and hygiene burdens on the operator.Type: GrantFiled: February 19, 2020Date of Patent: May 9, 2023Assignee: PANASONIC HOLDINGS CORPORATIONInventors: Genichiro Matsuda, Hidenao Kataoka, Naofumi Hino
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Publication number: 20230015513Abstract: A used paper diaper processing apparatus includes at an upper portion of a processing tank, a plurality of holding units capable of holding used paper diapers, and a continuous put-into unit including a holding unit rotation drive unit that rotationally drives each of the holding units at a put-into position I above an opening connected to the processing tank and a standby position II other than the put-into position. When the holding unit is rotated by the holding unit rotation drive unit and positioned at the put-into position, the used paper diaper held by the holding unit is put into the processing tank from the opening.Type: ApplicationFiled: July 13, 2022Publication date: January 19, 2023Inventors: Genichiro MATSUDA, Hidenao KATAOKA, Naofumi HINO
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Publication number: 20210222363Abstract: A processing liquid is generated by mixing a chemical and water in a processing liquid generation region disposed below an inner tank. By further supplying water to raise a water level, the processing liquid is supplied from below the inner tank. This prevents a used paper diaper from coming into contact with water containing no chemical.Type: ApplicationFiled: January 8, 2021Publication date: July 22, 2021Inventors: Genichiro MATSUDA, Hidenao KATAOKA, Naofumi HINO
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Publication number: 20210220836Abstract: In a processing tank where a processing liquid is stored up to a first water level, first stirring processing that removes water from a used paper diaper is performed to remove the water from the used paper diaper. Then, the processing liquid is stored up to a second water level higher than the first water level, and second stirring processing that separates excrement contained in the used paper diaper from the used paper diaper is performed to separate the excrement from the used paper diaper. After that, dehydration processing is performed.Type: ApplicationFiled: January 6, 2021Publication date: July 22, 2021Inventors: Genichiro MATSUDA, Hidenao KATAOKA, Naofumi HINO
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Patent number: 11059729Abstract: A liquid treatment device that achieves an effective treatment by forcibly contacting a swirl flow of a hydrogen peroxide-containing treated liquid with a liquid to be treated that has been processed to contain copper ions or iron ions includes a rod-like first electrode, a plate-like second electrode formed of a copper- or iron-containing metal, and a first treatment vessel that causes a liquid to swirl and generate a gas phase in a swirl flow of the liquid. A pulse voltage is applied to the generated gas phase to generate a plasma. The second electrode serves as an anode, and reaches inside of a supply section for a liquid to be treated. The liquid to be treated containing the generated copper ions or iron ions is forcibly brought into contact with hydrogen peroxide generated by the plasma. In this way, the Fenton's reaction effectively takes place, and the liquid treatment performance improves.Type: GrantFiled: November 26, 2018Date of Patent: July 13, 2021Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Takahiro Kitai, Genichiro Matsuda, Gaku Miyake, Yoshio Yamada, Naofumi Hino
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Publication number: 20210086242Abstract: The peeling member is disposed inside the inner tank. The switching mechanism is provided for switching between the state of rotating the peeling member in the interlocking manner with the inner tank and the state of being disconnected the peeling member from the inner tank. With the peeling member disconnected from the inner tank, one of them is rotated, the used paper diaper stored is peeled off from the inner surface of the inner tank, and then, the used paper diaper processed in the processing tank is discharged from the bottom of the processing tank to the take-out unit via the opening and closing unit.Type: ApplicationFiled: September 17, 2020Publication date: March 25, 2021Inventors: Genichiro MATSUDA, Hidenao KATAOKA, Naofumi HINO
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Patent number: 10934183Abstract: A liquid processing apparatus includes a processing tank, a liquid introduction port, a discharge portion, a first electrode, a second electrode, and a power supply. The liquid introduction port is disposed on a first end side of the processing tank, causes a liquid to swirl in the processing tank by introducing the liquid into the processing tank in a tangential direction of the processing tank, and generates a gas phase in a swirling flow of the liquid. The first electrode has a rod shape and is disposed at the first end on a central axis of the processing tank. The second electrode is disposed so as to be exposed to the discharge portion of the processing tank. A voltage is applied between the first electrode and the second electrode to generate plasma in the gas phase.Type: GrantFiled: February 12, 2019Date of Patent: March 2, 2021Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Gaku Miyake, Genichiro Matsuda
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Patent number: 10875790Abstract: An apparatus for producing reforming liquid includes a treatment tank in which an introduced liquid is swirled so as to generate a gas phase in the vicinity of a swirling center of a swirling flow of the liquid, a first electrode which has at least a portion which is disposed in the treatment tank and comes into contact with the liquid in the treatment tank, a second electrode which is disposed so as to come into contact with the liquid in the treatment tank and a power source which is configured to apply a voltage between the first electrode and the second electrode so as to generate plasma in the gas phase. A reformed liquid is produced in a manner that the plasma is generated in the gas phase so as to form a reformed component, and the formed reformed component is dissolved and dispersed in the liquid.Type: GrantFiled: May 17, 2017Date of Patent: December 29, 2020Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Gaku Miyake, Takahiro Kitai, Masanori Minamio, Yoshio Yamada, Genichiro Matsuda
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Patent number: 10843942Abstract: There is provided a liquid treatment apparatus which includes a treatment tank which generates a gas phase in a swirling flow of liquid, by swirling an introduced liquid and which treats liquid by applying a pulse voltage to a generated gas phase to generate plasma, in which an insulator which is an insulating space forming member is disposed on a wall surface of one end of the treatment tank so as to prevent a swirling flow from being affected, faces the space connected via the through-hole of the insulator, and thus the first electrode is disposed.Type: GrantFiled: February 1, 2018Date of Patent: November 24, 2020Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Gaku Miyake, Yoshio Yamada, Genichiro Matsuda, Takahiro Kitai
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Patent number: 10792671Abstract: A disassembling apparatus that shatters an object by means of pulsed discharge includes a container that can be filled with a liquid, an anode that is disposed within the container, a cathode that is disposed such that the object can be placed so as to straddle the anode and the cathode, object scattering prevention means that encloses an object disassembling region above the anode and the cathode, and a pulsed power supply that applies a high voltage pulse between the anode and the cathode.Type: GrantFiled: May 22, 2017Date of Patent: October 6, 2020Assignee: Panasonic CorporationInventors: Noriyuki Suzuki, Genichiro Matsuda, Syougo Utumi, Yuichi Hata, Takao Namihira
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Publication number: 20200269292Abstract: Provided is a used paper diaper processing apparatus in which a water absorption function of a superabsorbent polymer that absorbs water contained in excrement is lowered and water is removed by mixing the superabsorbent polymer and a chemical containing divalent metal ions in an outer tank, and in which weight is reduced by dehydration after an amount of water contained in a used paper diaper is lowered. In the apparatus, a lower portion of the outer tank can be opened and closed, so that weight reduction processing and a series of operations including taking-out are possible. Since an operator is not required to take out the used paper diaper after processing directly from the outer tank, it is possible to reduce work and hygiene burdens on the operator.Type: ApplicationFiled: February 19, 2020Publication date: August 27, 2020Inventors: Genichiro MATSUDA, Hidenao KATAOKA, Naofumi HINO
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Patent number: 10723637Abstract: A liquid treatment apparatus including: a tubular treatment tank whose end along a central axis is closed and sectional shape orthogonal to the central axis is a circular shape; a first electrode disposed on one end of the central axis of the treatment tank and having a bar shape; a second electrode disposed on the other end thereof; a power supply applying voltage between the first electrode and the second electrode; a rotation mechanism rotating the first electrode about a central axis of the first electrode; and an air introduction portion introducing the liquid to the one end of the central axis of the treatment tank from a tangential direction of the circular sectional shape of the treatment tank, and causing liquid to swirl about the central axis of the treatment tank therein to generate a gas phase in a swirling flow of the liquid.Type: GrantFiled: January 29, 2018Date of Patent: July 28, 2020Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Genichiro Matsuda, Takahiro Kitai, Gaku Miyake, Yoshio Yamada
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Patent number: 10723638Abstract: A liquid treatment device includes a rod-shaped first electrode; a plate-shaped second electrode configured from a metal containing copper or iron; and a treatment vessel in which introduced liquid swirls, and generates a gas phase in a swirl flow of the liquid. A plasma is generated by applying a pulse voltage to the generated gas phase, and a negative DC voltage is applied between the first electrode and the second electrode serving as a cathode and an anode, respectively. Under the applied negative voltage, the plate-like second electrode generates copper ions or iron ions, and the copper or iron ions undergo Fenton's reaction with the hydrogen peroxide generated by the plasma so that liquid can be efficiently treated.Type: GrantFiled: November 14, 2018Date of Patent: July 28, 2020Assignee: Panasonic Intellectual Property Management Co., Ltd.Inventors: Genichiro Matsuda, Takahiro Kitai, Gaku Miyake, Yoshio Yamada
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Patent number: 10654730Abstract: A liquid processing apparatus includes a processing tank, a first electrode, an insulator, a liquid introduction port, a discharge portion, a second electrode, an opening portion, and a power supply. The first electrode is disposed at the first end of the processing tank. The insulator covers at least a part of a side surface of the first electrode disposed to protrude from an inner wall of the first end of the processing tank into the processing tank. The liquid introduction port causes a liquid to swirl by introducing the liquid in a tangential direction of the processing tank and generates a gas phase in a swirling flow of the liquid. An outer diameter of the insulator is smaller than an outer diameter of a gas-phase generating space where the gas phase is generated in the processing tank.Type: GrantFiled: January 30, 2019Date of Patent: May 19, 2020Assignee: Panasonic Intellectual Property Management Co., Ltd.Inventors: Genichiro Matsuda, Gaku Miyake, Hiromi Matsumoto, Yoshio Yamada, Yukiko Kitahara
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Patent number: 10610821Abstract: Plasma is generated in a gas phase in a processing tub to produce a reforming component, the produced reforming component is dissolved in a liquid and is dispersed in the liquid to produce a reforming liquid, the produced reforming liquid is discharged from the processing tub to be stored in the storage tub, and gas is supplied from a gas supplier into the reforming liquid in the storage tub. The supplied gas has a bubble shape, comes into contact with the reforming liquid stored in the storage tub, and is deodorized.Type: GrantFiled: April 18, 2018Date of Patent: April 7, 2020Assignee: Panasonic Intellectual Property Management Co., Ltd.Inventors: Gaku Miyake, Genichiro Matsuda, Takahiro Kitai, Yoshio Yamada
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Patent number: 10561760Abstract: A space modification apparatus includes a treatment tank configured to generate a gas phase around a rotating center of a rotating flow of a liquid by rotating the liquid, a first electrode of which at least a part is in the treatment tank so as to be in contact with the liquid in the treatment tank, a second electrode in contact with the liquid in the treatment tank, and a power source configured to apply a voltage between the first electrode and the second electrode to generate plasma in the gas phase to generate modification components, the modification components being dissolved and dispersed in the liquid, and a modification liquid being generated and retained in a storage tank. The modification liquid is sprayed or scattered from a nozzle into a treatment target space via a supply pump in the form of mist.Type: GrantFiled: April 20, 2018Date of Patent: February 18, 2020Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Takahiro Kitai, Genichiro Matsuda, Yoshio Yamada, Gaku Miyake
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Publication number: 20200010340Abstract: There is provided a liquid treatment apparatus which includes a treatment tank which generates a gas phase in a swirling flow of liquid, by swirling an introduced liquid and which treats liquid by applying a pulse voltage to a generated gas phase to generate plasma, in which an insulator which is an insulating space forming member is disposed on a wall surface of one end of the treatment tank so as to prevent a swirling flow from being affected, faces the space connected via the through-hole of the insulator, and thus the first electrode is disposed.Type: ApplicationFiled: February 1, 2018Publication date: January 9, 2020Inventors: GAKU MIYAKE, YOSHIO YAMADA, GENICHIRO MATSUDA, TAKAHIRO KITAI
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Publication number: 20190352199Abstract: A liquid processing apparatus includes a processing tank, a first electrode, an insulator, a liquid introduction port, a discharge portion, a second electrode, an opening portion, and a power supply. The first electrode is disposed at the first end of the processing tank. The insulator covers at least a part of a side surface of the first electrode disposed to protrude from an inner wall of the first end of the processing tank into the processing tank. The liquid introduction port causes a liquid to swirl by introducing the liquid in a tangential direction of the processing tank and generates a gas phase in a swirling flow of the liquid. An outer diameter of the insulator is smaller than an outer diameter of a gas-phase generating space where the gas phase is generated in the processing tank.Type: ApplicationFiled: January 30, 2019Publication date: November 21, 2019Inventors: GENICHIRO MATSUDA, GAKU MIYAKE, HIROMI MATSUMOTO, YOSHIO YAMADA, YUKIKO KITAHARA
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Publication number: 20190292076Abstract: A liquid processing apparatus includes a processing tank, a liquid introduction port, a discharge portion, a first electrode, a second electrode, and a power supply. The liquid introduction port is disposed on a first end side of the processing tank, causes a liquid to swirl in the processing tank by introducing the liquid into the processing tank in a tangential direction of the processing tank, and generates a gas phase in a swirling flow of the liquid. The first electrode has a rod shape and is disposed at the first end on a central axis of the processing tank. The second electrode is disposed so as to be exposed to the discharge portion of the processing tank. A voltage is applied between the first electrode and the second electrode to generate plasma in the gas phase.Type: ApplicationFiled: February 12, 2019Publication date: September 26, 2019Inventors: GAKU MIYAKE, GENICHIRO MATSUDA