Patents by Inventor Georg Soumagne

Georg Soumagne has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11337292
    Abstract: A tin trap device may include a housing including a gas inlet port into which gas containing tin flows from a chamber device, an internal space which communicates with the gas inlet port, and a gas exhaust port which exhausts the gas while communicating with the internal space; a multiple tube including a plurality of tube members, arranged on a flow path of the gas traveling to the gas exhaust port from the gas inlet port through the internal space, and having a temperature at which the tin deposited from the gas adheres to the tube member; and a gas travel direction changing member configured to change a travel direction of at least fastest gas of the gas traveling from the gas inlet port to the multiple tube.
    Type: Grant
    Filed: August 26, 2021
    Date of Patent: May 17, 2022
    Assignee: Gigaphoton Inc.
    Inventors: Gouta Niimi, Georg Soumagne
  • Publication number: 20220141945
    Abstract: A tin trap device may include a housing including a gas inlet port into which gas containing tin flows from a chamber device, an internal space which communicates with the gas inlet port, and a gas exhaust port which exhausts the gas while communicating with the internal space; a multiple tube including a plurality of tube members, arranged on a flow path of the gas traveling to the gas exhaust port from the gas inlet port through the internal space, and having a temperature at which the tin deposited from the gas adheres to the tube member; and a gas travel direction changing member configured to change a travel direction of at least fastest gas of the gas traveling from the gas inlet port to the multiple tube.
    Type: Application
    Filed: August 26, 2021
    Publication date: May 5, 2022
    Applicant: Gigaphoton Inc.
    Inventors: Gouta NIIMI, Georg SOUMAGNE
  • Patent number: 11145429
    Abstract: An extreme ultraviolet chamber apparatus includes: a chamber; an EUV condensing mirror arranged in the chamber; a first nozzle arranged in an outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a first direction along a reflective surface of the EUV condensing mirror; a second nozzle arranged in the outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a second direction away from the EUV condensing mirror; and an exhaust port arranged in the chamber.
    Type: Grant
    Filed: March 17, 2020
    Date of Patent: October 12, 2021
    Assignee: Gigaphoton Inc.
    Inventors: Atsushi Ueda, Gota Niimi, Georg Soumagne
  • Publication number: 20200312479
    Abstract: An extreme ultraviolet chamber apparatus includes: a chamber; an EUV condensing mirror arranged in the chamber; a first nozzle arranged in an outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a first direction along a reflective surface of the EUV condensing mirror; a second nozzle arranged in the outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a second direction away from the EUV condensing mirror; and an exhaust port arranged in the chamber.
    Type: Application
    Filed: March 17, 2020
    Publication date: October 1, 2020
    Applicant: Gigaphoton Inc.
    Inventors: Atsushi UEDA, Gota NIIMI, Georg SOUMAGNE
  • Patent number: 10455679
    Abstract: The extreme ultraviolet light generation device includes a chamber having a first through-hole that allows a pulse laser beam to enter the chamber, a target supply unit held by the chamber and configured to output a target toward a predetermined region in the chamber, a shield member surrounding the predetermined region in the chamber and having a target path that allows the target outputted from the target supply unit to pass toward the predetermined region, and a tubular member surrounding at least a part of an upstream portion of the trajectory of the target outputted from the target supply unit toward the predetermined region, the upstream portion being upstream from the target path of the shield member.
    Type: Grant
    Filed: December 10, 2017
    Date of Patent: October 22, 2019
    Assignee: Gigaphoton Inc.
    Inventors: Takashi Saito, Yoshifumi Ueno, Georg Soumagne
  • Patent number: 10136510
    Abstract: An extreme ultraviolet light generation device may include a chamber in which extreme ultraviolet light is generated from plasma, the plasma generated by irradiation of a target supplied in a plasma generation region inside of the chamber with laser light; a condenser mirror collecting the extreme ultraviolet light and guiding it to outside of the chamber; a first etching gas supply unit blowing an etching gas to a reflective surface of the condenser mirror and the plasma generation region; a magnet forming a magnetic field in the chamber; a port that intersects a central axis of the magnetic field and that takes in suspended substances generated in the chamber; and an ejection path that is in communication with the port and that ejects the suspended substances taken from the port to the outside of the chamber.
    Type: Grant
    Filed: May 1, 2017
    Date of Patent: November 20, 2018
    Assignee: Gigaphoton Inc.
    Inventors: Shinji Nagai, Georg Soumagne, Toshihiro Nishisaka
  • Publication number: 20180103534
    Abstract: The extreme ultraviolet light generation device includes a chamber having a first through-hole that allows a pulse laser beam to enter the chamber, a target supply unit held by the chamber and configured to output a target toward a predetermined region in the chamber, a shield member surrounding the predetermined region in the chamber and having a target path that allows the target outputted from the target supply unit to pass toward the predetermined region, and a tubular member surrounding at least a part of an upstream portion of the trajectory of the target outputted from the target supply unit toward the predetermined region, the upstream portion being upstream from the target path of the shield member.
    Type: Application
    Filed: December 10, 2017
    Publication date: April 12, 2018
    Applicant: Gigaphoton Inc.
    Inventors: Takashi SAITO, Yoshifumi UENO, Georg SOUMAGNE
  • Publication number: 20170336282
    Abstract: A spheroidal mirror reflectivity measuring apparatus for extreme ultraviolet light may include an extreme ultraviolet light source, an optical system, and a first photosensor. The extreme ultraviolet light source may be configured to output extreme ultraviolet light to a spheroidal mirror that includes a spheroidal reflection surface. The optical system may be configured to allow the extreme ultraviolet light to travel to the spheroidal reflection surface via a first focal position of the spheroidal mirror. The first photosensor may be provided at a second focal position of the spheroidal mirror, and may be configured to detect the extreme ultraviolet light that has passed through the first focal position and then has been reflected by the spheroidal reflection surface.
    Type: Application
    Filed: August 9, 2017
    Publication date: November 23, 2017
    Applicants: The University of Tokyo, GIGAPHOTON INC.
    Inventors: Yohei KOBAYASHI, Hakaru MIZOGUCHI, Junichi FUJIMOTO, Katsunori ISOMOTO, Osamu WAKABAYASHI, Georg SOUMAGNE
  • Publication number: 20170238407
    Abstract: An extreme ultraviolet light generation device may include a chamber in which extreme ultraviolet light is generated from plasma, the plasma generated by irradiation of a target supplied in a plasma generation region inside of the chamber with laser light; a condenser mirror collecting the extreme ultraviolet light and guiding it to outside of the chamber; a first etching gas supply unit blowing an etching gas to a reflective surface of the condenser mirror and the plasma generation region; a magnet forming a magnetic field in the chamber; a port that intersects a central axis of the magnetic field and that takes in suspended substances generated in the chamber; and an ejection path that is in communication with the port and that ejects the suspended substances taken from the port to the outside of the chamber.
    Type: Application
    Filed: May 1, 2017
    Publication date: August 17, 2017
    Applicant: Gigaphoton Inc.
    Inventors: Shinji NAGAI, Georg SOUMAGNE, Toshihiro NISHISAKA
  • Patent number: 9661730
    Abstract: An extreme ultraviolet light generation apparatus may include: a chamber; a target supply unit configured to output a target toward a predetermined region inside the chamber; a first gas supply unit configured to blow out gas in a first direction toward a trajectory of the target between the target supply unit and the predetermined region; and a focusing optical system configured to concentrate a pulse laser beam to the predetermined region.
    Type: Grant
    Filed: May 10, 2016
    Date of Patent: May 23, 2017
    Assignee: Gigaphoton, Inc.
    Inventors: Atsushi Ueda, Takayuki Yabu, Osamu Wakabayashi, Georg Soumagne, Takashi Saito
  • Publication number: 20170127505
    Abstract: An extreme ultraviolet light generation system may comprise a chamber, a target supply unit configured to supply, to a predetermined region in the chamber, a target having an atomic density of 8.0×1017 atoms/cm3 or higher and 1.3×1018 atoms/cm3 or lower, and a laser apparatus configured to irradiate the predetermined region with a pulse laser beam having an energy density of 10.5 J/cm2 or higher and 52.3 J/cm2 or lower in the predetermined region.
    Type: Application
    Filed: January 6, 2017
    Publication date: May 4, 2017
    Applicants: Institute for Laser Technology, Gigaphoton Inc.
    Inventors: Atsushi SUNAHARA, Georg SOUMAGNE, Yoshifumi UENO, Hideo HOSHINO
  • Publication number: 20160255707
    Abstract: An extreme ultraviolet light generation apparatus may include: a chamber; a target supply unit configured to output a target toward a predetermined region inside the chamber; a first gas supply unit configured to blow out gas in a first direction toward a trajectory of the target between the target supply unit and the predetermined region; and a focusing optical system configured to concentrate a pulse laser beam to the predetermined region.
    Type: Application
    Filed: May 10, 2016
    Publication date: September 1, 2016
    Applicant: Gigaphoton Inc.
    Inventors: Atsushi UEDA, Takayuki YABU, Osamu WAKABAYASHI, Georg SOUMAGNE, Takashi SAITO
  • Publication number: 20140021376
    Abstract: An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material.
    Type: Application
    Filed: July 3, 2013
    Publication date: January 23, 2014
    Applicant: GIGAPHOTON INC.
    Inventors: Hiroshi KOMORI, Yoshifumi UENO, Georg SOUMAGNE
  • Patent number: 8592787
    Abstract: An EUV light source is configured for generating an EUV light for an exposure device. The EUV light source includes a chamber, a target supply device configured for supplying a target into the chamber, an optical system for introducing laser light from a driver laser into the chamber and irradiating the target with the laser light to turn the target into plasma from which EUV light is emitted, and an EUV collector mirror in the chamber. The EUV collector mirror may include a multilayered reflecting surface with grooves and collect the EUV light from the plasma to a focal spot. The grooves can be arranged in a concentric fashion, and be configured for diffracting at least light at a wavelength which is the same as that of the laser light from the driver laser.
    Type: Grant
    Filed: April 2, 2012
    Date of Patent: November 26, 2013
    Assignee: Gigaphoton Inc.
    Inventors: Masato Moriya, Osamu Wakabayashi, Georg Soumagne
  • Patent number: 8586953
    Abstract: An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material.
    Type: Grant
    Filed: February 9, 2012
    Date of Patent: November 19, 2013
    Assignee: Gigaphoton Inc.
    Inventors: Hiroshi Komori, Yoshifumi Ueno, Georg Soumagne
  • Patent number: 8513630
    Abstract: In an extreme ultraviolet light source apparatus generating an extreme ultraviolet light from a plasma generated by irradiating a target, which is a droplet D of molten Sn, with a laser light, and controlling the flow direction of ion generated at the generation of the extreme ultraviolet light by a magnetic field or an electric field, an ion collection cylinder 20 is arranged for collecting the ion, and ion collision surfaces Sa and Sb of the ion collection cylinder 20 are provided with or coated with Si, which is a metal whose sputtering rate with respect to the ion is less than one atom/ion.
    Type: Grant
    Filed: October 17, 2011
    Date of Patent: August 20, 2013
    Assignee: Gigaphoton Inc.
    Inventors: Yoshifumi Ueno, Georg Soumagne, Shinji Nagai, Akira Endo, Tatsuya Yanagida
  • Patent number: 8507885
    Abstract: The exposure device is able to supply only EUV radiation to a mask, while eliminating radiation other than the EUV radiation. A multi layer made from a plurality of Mo/Si pair layers is provided upon the front surface of a mirror, and blazed grooves are formed in this multi layer. Radiation which is incident from a light source device is incident upon this mirror, and is reflected or diffracted. Since the reflected EUV radiation (including diffracted EUV radiation) and the radiation of other wavelengths are reflected or diffracted at different angles, accordingly their directions of progression are different. By eliminating the radiation of other wavelengths with an aperture and/or a dumper, it is possible to irradiate a mask only with EUV radiation of high purity.
    Type: Grant
    Filed: June 12, 2012
    Date of Patent: August 13, 2013
    Assignee: Gigaphoton Inc.
    Inventors: Masato Moriya, Osamu Wakabayashi, Georg Soumagne
  • Patent number: 8492738
    Abstract: An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.
    Type: Grant
    Filed: May 7, 2012
    Date of Patent: July 23, 2013
    Assignee: Gigaphoton, Inc.
    Inventors: Yoshifumi Ueno, Osamu Wakabayashi, Tamotsu Abe, Akira Sumitani, Hideo Hoshino, Akira Endo, Georg Soumagne
  • Patent number: 8354657
    Abstract: In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The apparatus includes a chamber, a target supply unit for supplying a target material into the chamber, a collector mirror for collecting extreme ultra violet light radiated from plasma generated by irradiating the target material with a laser beam to output the extreme ultra violet light, an electromagnet arranged outside of the chamber, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the electromagnet extend.
    Type: Grant
    Filed: March 14, 2011
    Date of Patent: January 15, 2013
    Assignees: Gigaphoton Inc., Osaka University
    Inventors: Georg Soumagne, Yoshifumi Ueno, Hiroshi Komori, Akira Sumitani, Katsunobu Nishihara, Young Gwang Kang, Masanori Nunami
  • Publication number: 20120261596
    Abstract: An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material.
    Type: Application
    Filed: February 9, 2012
    Publication date: October 18, 2012
    Applicant: Komatsu Ltd./Gigaphoton Inc.
    Inventors: Hiroshi KOMORI, Yoshifumi UENO, Georg SOUMAGNE