Abstract: A maskless lithography system is disclosed that includes an array of blazed diffractive zone plates, each of which focuses an energy beam into an array of images in order to create a permanent pattern on an adjacent substrate in certain embodiments. In further embodiments, an array of apodized diffractive elements may also be used.

Abstract: A system and method are disclosed for providing error correction in an imaging system. The system includes an error determination unit for determining an amount of error associated with a spot at (x,y) in a binary pattern to be imaged, a determination unit for determining the location of a nearest exposed spot at (xi, yi) for each spot at (x,y), and a dose modification unit for modifying an exposure dose at the nearest exposed spot at (xi, yi) for each spot at (x,y).

Abstract: An adjustable lens is disclosed for use in an optical profilometer system. The adjustable lens includes a plurality of elements that are mutually spaced from another in a first position and provides a first focal point for an incident electromagnetic field having a first frequency incident at a first angle with respect to the plurality of elements. The adjustable lens also includes an actuation unit for changing the focal point of the plurality of elements to provide a second focal point for the incident electromagnetic field having the first frequency incident at the first angle with respect to the plurality of elements.

Abstract: A maskless lithography system is disclosed that includes an array of focusing elements, each of which focuses an energy beam from an array of sources into an array of focal spots in order to create a permanent pattern on an adjacent substrate.

Abstract: The electromechanical micro-switch device includes first and second fixed electrodes. A movable electrode is positioned with respect to the first and second fixed electrodes so that the position of the movable electrode can be selectively placed in one of two opposing states defined by the fixed electrodes. The stored elastic potential energy of the movable electrode and its flexible supporting structure is used for switching between the two states. An electrostatic hold voltage is used to hold the movable electrode in the two switch states.

Abstract: An electro-mechanical switch structure includes at least one fixed electrode and a free electrode which is movable in the structure with a voltage potential applied between each fixed electrode and the free, movable electrode. The voltage potentials applied between each fixed electrode and the movable electrode are modulated to actuate the electro-mechanical switch structure.

Abstract: An optical manipulation system is disclosed that includes an array of focusing elements, which focuses the energy beamlets from an array of beamlet sources into an array of focal spots in order to individually manipulate a plurality of samples on an adjacent substrate.

Abstract: A maskless lithography system is disclosed that includes an array of focusing elements, each of which focuses an energy beam from an array of sources into an array of focal spots in order to create a permanent pattern on an adjacent substrate.

Abstract: A volume diffractive composite is disclosed for providing illumination at a first output angle. The volume diffractive composite comprises a first plurality of grating elements that are mutually spaced from another in a first position with a first spacing period along a first plane, and an actuation unit for changing at least one of the position or the spacing period of the first plurality of grating elements to a second position or spacing period to provide illumination at a second output angle.

Abstract: A method is disclosed for forming an array of focusing elements for use in a lithography system. In accordance with an embodiment, the method includes the steps of providing a master element that includes at least one diffractive pattern at a first location with respect to a target surface, illuminating the master element to produce a first diffractive pattern on the target surface at the first location, moving the master element with respect to the target surface to a second location with respect to the target surface, and illuminating the master element to produce a second diffractive pattern on the target surface at the second location.

Abstract: A maskless lithography system is disclosed that includes an array of focusing elements, each of which focuses an energy beam from an array of sources into an array of focal spots in order to create a permanent pattern on an adjacent substrate.

Abstract: A photonic bandgap microcavity is provided. The microcavity includes a membrane structure that can experience strain. A photonic bandgap waveguide element is formed on the membrane structure having a defect so that when the membrane structure is strained, the photonic bandgap waveguide element is tuned to a selective amount.

Abstract: A microphotonic device is provided. The microphotonic device includes a membrane structure that can experience strain. A waveguide element is formed on the membrane structure so that when the membrane structure is strained, the waveguide element elements are tuned to a selective amount.

Abstract: A maskiess lithography system is disclosed that includes an array of blazed diffractive zone plates, each of which focuses an energy beam into an array of images in order to create a permanent pattern on an adjacent substrate in certain embodiments. In further embodiments, an array of apodized diffractive elements may also be used.

Abstract: A holographic imaging spectrometer, apparatus, and/or method enables the projection of a two-dimensional (2D) slice (having spectral information) of a four-dimensional (4D) probing object. A 4D probing source object is illuminated to emit an optical field. A holographic element having one or more recorded holograms receives and diffracts the optical field into a diffracted plane beam having spectral information. Collector optics (e.g., an imaging lens) focuses the diffracted plane beam having spectral information to a 2D slice (having spectral information) of the 4D probing source object. The focused 2D slice having spectral information is projected onto a 2D detector array surface. In addition, the holographic element may have multiple multiplexed holograms that are arranged to diffract light from the corresponding slice of the 4D probing source object to a non-overlapping section of the detector.

Abstract: An adjustable lens is disclosed for use in an optical profilometer system. The adjustable lens includes a plurality of elements that are mutually spaced from another in a first position and provides a first focal point for an incident electromagnetic field having a first frequency incident at a first angle with respect to the plurality of elements. The adjustable lens also includes an actuation unit for changing the focal point of the plurality of elements to provide a second focal point for the incident electromagnetic field having the first frequency incident at the first angle with respect to the plurality of elements.

Abstract: A resonator system is disclosed for use in illuminating an input to a diffractive element. The system includes a source of an electromagnetic field having a wavelength of &lgr;, and first and second optical elements, each of which is at least partially reflecting. The first and second optical elements are separated from one another such that the optical path between the optical elements has a distance ( 2 ⁢ m + 1 ) ⁢ λ 4 , wherein m is an integer.

Abstract: A resonator system is disclosed for use in illuminating an input to a diffractive element. The system includes a source of an electromagnetic field having a wavelength of &lgr;, and first and second optical elements, each of which is at least partially reflecting.

Abstract: A resonator system is disclosed for use in illuminating a diffractive element. The system includes a source of an electromagnetic field having a wavelength of &lgr;, and first and second optical elements, each of which is at least partially reflecting.

Abstract: A micro-opto-electro-mechanical systems (MOEMS) modulator based on the phenomenon of frustrated total internal reflection (FTIR). The modulator effects amplitude and phase modulation at the boundary of a waveguide. Wavelength-specific switching is achieved by spatially separating the wavelength channels by dispersing a broadband input signal into its wavelength components through a grating. In exemplary embodiments, an array of micro-fabricated actuators is used to switch or modulate wavelengths individually. Applications include wavelength and space-resolved phase and amplitude modulation of optical beams, and re-configurable add/drop switching of dense wavelength-division multiplexed (DWDM) optical communication signals.