Abstract: An apparatus having a first and second zones, for destroying hazardous compounds of a first and second types respectively present in a gas stream. The first zone has a first live electrode and a ground electrode. The first live electrode and the ground electrode define a first gas passage. These electrodes are excitable at a first energy level for generating a first electric field capable of generating a plasma in a gas flowing through the first gas passage. The second zone has a second live electrode spaced apart from the ground electrode. The second live electrode defines with the ground electrode a second gas passage communication with a downstream end of the first gas passage. The second live electrode is excitable at a second energy level for generating with the ground electrode a second electric field capable of sustaining the plasma in the gas flowing through the second gas passage.

Abstract: In the production of coatings on semiconductor wafers, fragile equipment is used and also difficulties in obtaining uniform coatings arise. The invention provides a form of boat for holding wafers and a manifold structure for feeding gases to the boats, and wafers which are less fragile cheaper and easier to manufacture and give more uniform coatings. The boats are relatively short, of semi-cylindrical form with slots through which gas can flow, and with rails for positioning and holding wafers at correct heights. The manifolds have apertures which are spaced at varying distances along the manifold as compared to the conventional longitudinal slot. The invention is particularly applicable to producing oxide coatings and polycrystalline silicon coatings on silicon wafers.

Abstract: A device for supplying gases to a perforated vessel, particularly a boat or boats for processing semiconductor elements by their exposure to the gases, comprises at least one tubular perforated gas manifold disposed under the perforated part of the boat and supported on a manifold raiser. The vessel is supported on two cylindrical support members which closely abut the boat and the manifolds which in turn abut the manifold raiser along the working length of the boat and the supporting members. A relatively small gas expansion cavity is thereby created between the manifold(s) and the boat which improves the manufacturing process.

Abstract: In the production of coatings on semiconductor wafers, fragile equipment is used and also difficulties in obtaining uniform coatings arise. The invention provides a form of boat for holding wafers and a manifold structure for feeding gases to the boats, and wafers which are less fragile cheaper and easier to manufacture and give more uniform coatings. The boats are relatively short, of semi-cylindrical form with slots through which gas can flow, and with rails for positioning and holding wafers at correct heights. The manifolds have apertures which are spaced at varying distances along the manifold as compared to the conventional longitudinal slot. The invention is particularly applicable to producing oxide coatings and polycrystalline silicon coatings on silicon wafers.