Abstract: Methods and systems for chemical management. In one embodiment, a blender is coupled to a processing system and configured to supply an appropriate solution or solutions to the system. Solutions provided by the blender are then reclaimed from the system and subsequently reintroduced for reuse. The blender may be operated to control the concentrations of various constituents in the solution prior to the solution being reintroduced to the system for reuse. Some chemicals introduced to the system may be temperature controlled. A back end vacuum pump subsystem separates gases from liquids as part of a waste management system.

Abstract: Methods and systems for chemical management. In one embodiment, a blender is coupled to a processing system and configured to supply an appropriate solution or solutions to the system. Solutions provided by the blender are then reclaimed from the system and subsequently reintroduced for reuse. The blender may be operated to control the concentrations of various constituents in the solution prior to the solution being reintroduced to the system for reuse. Some chemicals introduced to the system may be temperature controlled. A back end vacuum pump subsystem separates gases from liquids as part of a waste management system.

Abstract: Methods and systems for chemical management. In one embodiment, a blender is coupled to a processing system and configured to supply an appropriate solution or solutions to the system. Solutions provided by the blender are then reclaimed from the system and subsequently reintroduced for reuse. The blender may be operated to control the concentrations of various constituents in the solution prior to the solution being reintroduced to the system for reuse. Some chemicals introduced to the system may be temperature controlled. A back end vacuum pump subsystem separates gases from liquids as part of a waste management system.

Abstract: Methods and systems for chemical management. In one embodiment, a blender is coupled to a processing system and configured to supply an appropriate solution or solutions to the system. Solutions provided by the blender are then reclaimed from the system and subsequently reintroduced for reuse. The blender may be operated to control the concentrations of various constituents in the solution prior to the solution being reintroduced to the system for reuse. Some chemicals introduced to the system may be temperature controlled. A back end vacuum pump subsystem separates gases from liquids as part of a waste management system.

Abstract: Methods and systems for chemical management. In one embodiment, a blender is coupled to a processing system and configured to supply an appropriate solution or solutions to the system. Solutions provided by the blender are then reclaimed from the system and subsequently reintroduced for reuse. The blender may be operated to control the concentrations of various constituents in the solution prior to the solution being reintroduced to the system for reuse. Some chemicals introduced to the system may be temperature controlled. A back end vacuum pump subsystem separates gases from liquids as part of a waste management system.

Abstract: Methods and systems for chemical management. In one embodiment, a blender is coupled to a processing system and configured to supply an appropriate solution or solutions to the system. Solutions provided by the blender are then reclaimed from the system and subsequently reintroduced for reuse. The blender may be operated to control the concentrations of various constituents in the solution prior to the solution being reintroduced to the system for reuse. Some chemicals introduced to the system may be temperature controlled. A back end vacuum pump subsystem separates gases from liquids as part of a waste management system.

Abstract: Methods and systems for chemical management. In one embodiment, a blender is coupled to a processing system and configured to supply an appropriate solution or solutions to the system. Solutions provided by the blender are then reclaimed from the system and subsequently reintroduced for reuse. The blender may be operated to control the concentrations of various constituents in the solution prior to the solution being reintroduced to the system for reuse. Some chemicals introduced to the system may be temperature controlled. A back end vacuum pump subsystem separates gases from liquids as part of a waste management system.

Abstract: Methods and systems for chemical management. In one embodiment, a blender is coupled to a processing system and configured to supply an appropriate solution or solutions to the system. Solutions provided by the blender are then reclaimed from the system and subsequently reintroduced for reuse. The blender may be operated to control the concentrations of various constituents in the solution prior to the solution being reintroduced to the system for reuse. Some chemicals introduced to the system may be temperature controlled. A back end vacuum pump subsystem separates gases from liquids as part of a waste management system.

Abstract: Methods and systems for chemical management. In one embodiment, a blender is coupled to a processing system and configured to supply an appropriate solution or solutions to the system. Solutions provided by the blender are then reclaimed from the system and subsequently reintroduced for reuse. The blender may be operated to control the concentrations of various constituents in the solution prior to the solution being reintroduced to the system for reuse. Some chemicals introduced to the system may be temperature controlled. A back end vacuum pump subsystem separates gases from liquids as part of a waste management system.

Abstract: A system for providing gas to a container includes a source of gas under pressure, a container, and a pressure regulating device. The pressure-regulating device includes an inlet intended to be connected to a source of the gas under pressure, an outlet, connected by a duct to the inlet and intended to be placed in communication with the container, a first valve for limiting the pressure at the outlet to a predetermined maximum value Ps, which valve is a delivery valve placed in a first passage which connects the duct to an orifice for discharging inert gas. The device also includes a second valve for keeping the pressure at the outlet above a predetermined minimum value Pi, which valve is an intake valve placed in a second passage which connects the duct to an orifice that lets fluid into this duct.

Abstract: The liquid to be delivered leaves a container (3A, 3B) maintained at a first overpressure P1, from where it is transferred to an intermediate storage tank (11) maintained at a predetermined intermediate pressure P2>P1. Several small-volume delivery containers (12A, 12B), each of which may be pressurized either to a delivery pressure P3>P2 or to a filling pressure P4<P2, are connected in parallel downstream of this tank. The invention has applicability to the delivery of ultrapure chemicals intended for the microelectronics industry.

Abstract: This pressure-regulating device (12) for supplying a gas to a container (4) comprises an inlet (14) intended to be connected to a source (7) of the said gas under pressure, an outlet (16), connected by a duct (31) to the said inlet (14) and intended to be placed in communication with the container (4), a first valve (36) for limiting the pressure at the said outlet (16) to a predetermined maximum value Ps, which valve (36) is a delivery valve placed in a first passage (34) which connects the said duct (31) to an orifice (27) for discharging inert gas. The device (12) also comprises a second valve (39) for keeping the pressure at the said outlet (16) above a predetermined minimum value Pi, which valve (39) is an intake valve placed in a second passage (35) which connects the said duct (31) to an orifice (27) that lets fluid into this duct.

Abstract: A system for providing gas to a container includes a source of gas under pressure, a container, and a pressure regulating device. The pressure-regulating device includes an inlet intended to be connected to a source of the gas under pressure, an outlet, connected by a duct to the inlet and intended to be placed in communication with the container, a first valve for limiting the pressure at the outlet to a predetermined maximum value Ps, which valve is a delivery valve placed in a first passage which connects the duct to an orifice for discharging inert gas. The device also includes a second valve for keeping the pressure at the outlet above a predetermined minimum value Pi, which valve is an intake valve placed in a second passage which connects the duct to an orifice that lets fluid into this duct.

Abstract: System for diluting an ultrapure concentrated chemical including: (i) a first tank which contains the chemical in concentrated form having a predetermined purity P, (ii) a supply of ultrapure water of purity at least equal to P, (iii) a second tank for mixing the concentrated chemical with the ultrapure water to obtain a solution of diluted chemical whose purity is at least equal to P, (iv) a structure for adjusting the titre of the solution of diluted, chemical to a desired final concentration.

Abstract: An apparatus for delivering abrasive suspensions includes a reservoir containing an abrasive suspension, a loop for delivering the abrasive suspension to a point of use, the loop being connected to the reservoir, a pumping arrangement for circulating the abrasive suspension in the loop and for ensuring its return into the reservoir, the loop and the reservoir being arranged for recovering the abrasive suspension after circulation in the loop at a recovery point of the reservoir, and a control system for controlling the pumping arrangement so as to maintain a continuous circulation of the suspension.