Patents by Inventor Gerardus Nicolaas Anne van Veen

Gerardus Nicolaas Anne van Veen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10493559
    Abstract: Laser processing is enhanced by using endpointing or by using a charged particle beam together with a laser. End-pointing uses emissions, such as photons, electrons, ions, or neutral particles, from the substrate to determine when the material under the laser has changed or is about to change. Material removed from the sample can be deflected to avoid deposition onto the laser optics.
    Type: Grant
    Filed: July 8, 2009
    Date of Patent: December 3, 2019
    Assignee: FEI Company
    Inventors: Marcus Straw, David H. Narum, Milos Toth, Mark Utlaut, Guido Knippels, Gerardus Nicolaas Anne Van Veen
  • Patent number: 9524850
    Abstract: A holder assembly comprises a first and a separable second part, the first part detachable from the second part, the first part comprising a tube and an environmental cell interface and the second part comprising an electron microscope interface, as a result of which the first part can be cleaned at high temperatures without exposing the second part to said high temperature. By forming the holder assembly from detachable parts, one part can be cleaned by heating it to a high temperature of, for example, 1000° C., clogging in the tubes can be removed by reduction of carbon, while keeping the other part (often comprising mechanical fittings, ball bearing, sliders, or such like) cool. The cleaning can be enhanced by blowing, for example, oxygen or hydrogen through the tubes.
    Type: Grant
    Filed: February 15, 2013
    Date of Patent: December 20, 2016
    Assignee: FEI COMPANY
    Inventors: Hendrik Willem Zandbergen, Pleun Dona, Gerardus Nicolaas Anne van Veen
  • Publication number: 20150279615
    Abstract: A multi-beam apparatus for inspecting or processing a sample with a multitude of focused beams uses a multitude of detectors for detecting secondary radiation emitted by the sample when is irradiated by the multitude of beams. Each detector signal comprises information caused by multiple beams, the apparatus equipped with a programmable controller for processing the multitude of detector signals to a multitude of output signals, using weight factors so that each output signal represents information caused by a single beam. The weight factors are dynamic weight factors depending on the scan position of the beams with respect to the detectors and the distance between sample and detectors.
    Type: Application
    Filed: March 25, 2015
    Publication date: October 1, 2015
    Applicant: FEI Company
    Inventors: Pavel Potocek, Cornelis S. Kooijman, Hendrik Nicolaas Slingerland, Gerardus Nicolaas Anne Van Veen, Faysal Boughorbel, Albertus Aemillius Seyno Sluijterman, Jacob Simon Faber
  • Patent number: 8884247
    Abstract: A method and system for creating an asymmetrical lamella for use in an ex situ TEM, SEM, or STEM procedure is disclosed. The shape of the lamella provides for easy orientation such that a region of interest in the lamella can be placed over a hole in a carbon film providing minimal optical and spectral interference from the carbon film during TEM, SEM, or STEM procedure of chemical analysis.
    Type: Grant
    Filed: September 25, 2012
    Date of Patent: November 11, 2014
    Assignee: FEI Company
    Inventors: Thomas G. Miller, Jason Arjavac, Damon Heer, Michael Strauss, Gerardus Nicolaas Anne van Veen
  • Publication number: 20140084157
    Abstract: A method and system for creating an asymmetrical lamella for use in an ex situ TEM, SEM, or STEM procedure is disclosed. The shape of the lamella provides for easy orientation such that a region of interest in the lamella can be placed over a hole in a carbon film providing minimal optical and spectral interference from the carbon film during TEM, SEM, or STEM procedure of chemical analysis.
    Type: Application
    Filed: September 25, 2012
    Publication date: March 27, 2014
    Applicant: FEI Company
    Inventors: Thomas G. Miller, Jason Arjavac, Damon Heer, Michael Strauss, Gerardus Nicolaas Anne van Veen
  • Publication number: 20130099114
    Abstract: A detector with a Silicon Diode and an amplifier, and a feedback element in the form of, for example, a resistor or a diode, switchably connected to the output of the amplifier. When the feedback element is selected via a switch, the detector operates in a Current Measurement Mode for determining electron current, and when the element is not selected the detector operates in its well-known Pulse Height Measurement Mode for determining the energy of X-ray quanta.
    Type: Application
    Filed: July 9, 2012
    Publication date: April 25, 2013
    Applicant: FEI Company
    Inventors: Cornelis Sander Kooijman, Gerardus Nicolaas Anne Van Veen
  • Patent number: 8288724
    Abstract: The invention relates to a dark-field detector for an electron microscope. The detector comprises a photodiode for detecting the scattered electrons, with an inner electrode and an outer electrode. As a result of the resistive behavior of the surface layer the current induced by a scattered electron, e.g. holes, are divided over the electrodes, so that a current I1 and I2 is induced, the sum of the current proportional to the energy of the impinging electron and the normalized ratio a function of the radial position where the electron impinges.
    Type: Grant
    Filed: December 3, 2009
    Date of Patent: October 16, 2012
    Assignee: FEI Company
    Inventors: Cornelis Sander Kooijman, Gerardus Nicolaas Anne van Veen, Albertus Aemillius Seyno Sluijterman
  • Publication number: 20100258721
    Abstract: The invention relates to a dark-field detector for an electron microscope. The detector comprises a photodiode for detecting the scattered electrons, with an inner electrode and an outer electrode. As a result of the resistive behaviour of the surface layer the current induced by a scattered electron, e.g. holes, are divided over the electrodes, so that a current I1 and I2 is induced, the sum of the current proportional to the energy of the impinging electron and the normalized ratio a function of the radial position where the electron impinges.
    Type: Application
    Filed: December 3, 2009
    Publication date: October 14, 2010
    Applicant: FEI COMPANY
    Inventors: CORNELIS SANDER KOOIJMAN, Gerardus Nicolaas Anne van Veen, Albertus Aemillius Seyno Sluijterman