Abstract: A radiation-sensitive mixture which contains (a) a compound of the formula (I) ##STR1## where R.sup.1 is an optionally substituted alkyl radical, R.sup.2 is a hydrogen atom or an optionally substituted alkyl radical containing 1 to 4 carbon atoms, R.sup.3 is an n-valent, optionally polymeric aliphatic or aromatic radical and n is a number from 1 to 100; and b) a compound which forms a strong acid on exposure to actinic radiation.

Abstract: The invention relates to a positive-working radiation-sensitive mixture containing a) a polymeric binder having acid-labile groups and b) a compound which forms a strong acid on irradiation, in which the binder simultaneously contains units of the formulae I, II and IIIR.sup.1 --OH (I),R.sup.1 --O--CO.sub.2 R.sup.2 (II)R.sup.1 --O--CH.sub.2 --CHR.sup.3 --OH (III).The mixture is used to coat radiation-sensitive recording material which can be used to produce printing plates and photoresists.

Abstract: Compounds of the formula ##STR1## are suitable as photoinitiators in free-radical-polymerizable mixtures and are notable for a reduced tendency to diffusion and sublimation than comparable known compounds.

Abstract: The invention relates to aromatic or heteroaromatic mono- or bis-diazonium 1,1,2,3,3,3-hexafluoro-propanesulfonates. They are employed in positive-working or negative-working radiation-sensitive mixtures which are used for coating radiation-sensitive recording material.

Abstract: A positive-working recording material is disclosed that has an aluminum base and a mat-finished radiation-sensitive layer that contains a 1,2-naphthoquinone-2-diazide as radiation-sensitive compound and a binder which is insoluble in water but soluble or swellable in aqueous alkali. The radiation-sensitive 1,2-naphthoquinone-2-diazide is an ester of 1,2-naphthoquinone-2-diazide-4- or -5-sulfonic acid and a phenolic compound that contains at least 2, preferably at least 3, phenolic hydroxyl groups, which ester has a phenolic hydroxyl group content of at least 0.5 mmol/g and a diazo unit content of at least 1.5 mmol/g. The binder is a phenol/formaldehyde novolak that contains at least 5 mmol/g phenolic hydroxyl groups, the phenol component of which contains at least 30 mol percent m-cresol and at least 10 mol percent of at least one xylenol and which has a weight-average M.sub.w of 2,000 to 12,000 (determined by means of GPC with polystyrene as standard).

Abstract: A photosensitive material for the production of color proofing films for multicolor printing, having(A) a transparent, flexible film support,(B) a photopolymerizable layer which contains(B1) a polymeric binder,(B2) a free-radical-polymerizable compound,(B3) a substituted bistrihalomethyl-s-triazine having an absorption maximum in the range from 300 to 380 nm and an absorbance of greater than 11,000 at the absorption maximum, and an absorbance of less than 1400 at 400 nm and above, as photoinitiator, and(B4) a dye or a colored pigment in a primary color of multicolor printing, and(C) a thermoplastic adhesive layer on the photo-sensitive layer.The material is processed by lamination onto an image-receiving material, exposure of the material and peeling apart of film support and image-receiving material, leaving the unexposed layer areas on the image-receiving material together with the adhesive layer. To produce a multicolored image, these steps are repeated with at least one further single-color sheet.

Abstract: A radiation-sensitive mixture which contains (a) a compound of the formula (I) ##STR1## where R.sup.1 is an optionally substituted alkyl radical, R.sup.2 is a hydrogen atom or an optionally substituted alkyl radical containing 1 to 4 carbon atoms, R.sup.3 is an n-valent, optionally polymeric aliphatic or aromatic radical and n is a number from 1 to 100; and b) a compound which forms a strong acid on exposure to actinic radiation.

Abstract: A photosensitive material for the production of color proofing films for multicolor printing, having(A) a transparent, flexible film support,(B) a photopolymerizable layer which contains(B1) a polymeric binder,(B2) a free-radical-polymerizable compound,(B3) a substituted bistrihalomethyl-s-triazine having an absorption maximum in the range from 300 to 380 nm and an absorbance of greater than 11,000 at the absorption maximum, and an absorbance of less than 1400 at 400 nm and above, as photoinitiator, and(B4) a dye or a colored pigment in a primary color of multicolor printing, and(C) a thermoplastic adhesive layer on the photosensitive layer.The material is processed by lamination onto an image-receiving material, exposure of the material and peeling apart of film support and image-receiving material, leaving the unexposed layer areas on the image-receiving material together with the adhesive layer. To produce a multicolored image, these steps are repeated with at least one further single-color sheet.

Abstract: The invention relates to a positive-working radiation-sensitive mixture containing a) a polymeric binder having acid-labile groups and b) a compound which forms a strong acid on irradiation, in which the binder simultaneously contains units of the formulae I, II and IIIR.sup.1 --OH (I) ,R.sup.1 --O--CO.sub.2 R.sup.2 (II)R.sup.1 --O--CH.sub.2 --CHR.sup.3 --OH (III).The mixture is used to coat radiation-sensitive recording material which can be used to produce printing plates and photoresists.

Abstract: The invention relates to N,N-disubstituted sulfonamides of the formulae R.sup.1 [--N(CO--OR.sup.2)--SO.sub.2 --R.sup.3 ].sub.n (I) and R.sup.1 [--SO.sub.2 --N(CO--OR.sup.2)--R.sup.3 ].sub.n (II), in which R.sup.1 --for n=1--is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14) aryl or (C.sub.7 -C.sub.20)aralkyl radial, for n>1--the 2-, 3- or 4-valent radical of a (C.sub.1 -C.sub.20)alkane or (C.sub.6 -C.sub.7)cycloalkane, a non-condensed or condensed mono- or polynuclear (C.sub.6 -C.sub.18)aromatic compound, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, (C.sub.3 -C.sub.11)alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical.

Abstract: The invention relates to 2,3,4-trihydroxy-3'-methyl-, -ethyl-, -propyl- or -isopropylbenzophenone which is completely esterified with (1,2-naphthoquinone 2-diazide)-4-sulfonic acid and/or (7-methoxy-1,2-naphthoquinone 2-diazide)-4-sulfonic acid, a radiation-sensitive mixture prepared therewith, and a radiation-sensitive recording material comprising a substrate and a radiation-sensitive layer which is composed of the mixture according to the invention.

Abstract: A photosensitive material comprising (A) a flexible transparent film support, (B) a colored photosensitive layer which contains an organic binder (B1) a dye or a colored pigment (B2), a compound (B3), which forms a strong acid on exposure to radiation, and a compound (B4) which has at least one group cleavable by the acid, and (C) an adhesion-promoting layer which contains a thermoplastic polymer which has a softening temperature in the range from 40.degree. to 200.degree. C., wherein the adhesion (a.sub.1) of the unexposed photosensitive layer (B) to the adhesion-promoting layer (C) is less than the adhesion (a.sub.3) of the unexposed photosensitive layer (B) to the film support (A) and than the cohesions of the layers (B) and (C), and the adhesion (a.sub.3 ') of the exposed photosensitive layer (B) to the film support (A) is less than the adhesion (a.sub.

Abstract: A photosensitive material comprising (A) a flexible transparent film support, (B) a colored photosensitive layer which contains an organic binder (B1) a dye or a colored pigment (B2), a compound (B3), which forms a strong acid on exposure to radiation, and a compound (B4) which has at least one group cleavable by the acid, and (C) an adhesion-promoting layer which contains a thermoplastic polymer which has a softening temperature in the range from 40.degree. to 200.degree. C., wherein the adhesion (a.sub.1) of the unexposed photosensitive layer (B) to the adhesion-promoting layer (C) is less than the adhesion (a.sub.3) of the unexposed photosensitive layer (B) to the film support (A) and than the cohesions of the layers (B) and (C), and the adhesion (a.sub.3 ') of the exposed photosensitive layer (B) to the film support (A) is less than the adhesion (a.sub.

Abstract: The invention relates to monomers of the formulae R.sup.1 -SO.sub.2 -N(CO-OR.sup.2)-R3-O-CO-CR.sup.4 =CH.sub.2 and R.sup.1 -N(CO-OR.sup.2) -SO.sub.2 -R.sup.3 -O-CO-CR.sup.4 =CH.sub.2, in which R.sup.1 is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical, individual methylene groups in the radicals containing alkyl being optionally replaced by heteroatoms, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, C.sub.3 -C.sub.11) alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20)aralkyl radical and R.sup.4 is a hydrogen atom or a methyl group. It further relates to polymers having at least 5 mol % of units with pendent groups of the formula(e) -R.sup.3 -N(CO-OR.sup.2)-SO.sub.2 -R.sup.1 (I) and/or -R.sup.3 -SO.sub.2 -N(CO-OR.sup.2)-R.sup.

Abstract: The invention relates to a radiation-sensitive mixture comprising a) a binder which is insoluble in water but soluble or at least swellable in aqueous alkaline solution, b) a compound which forms an acid under the action of actinic radiation and c) a compound which contains at least one C-O-C or C-O-Si bond which can be cleaved by an acid, wherein said mixture additionally contains 0.1 to 70 mol %, based on the maximum amount of acid which can theoretically be produced from the compound b), of at least one compound having at least one nitrogen atom in an amine or amide bond. The mixture is used in particular in the production of electronic components. The invention also relates to a recording material having a substrate and a radiation-sensitive coating.

Abstract: The invention relates to monomers of the formulaeR.sup.1 --SO.sub.2 --N(CO--OR.sup.2)--R3--O--CO--CR.sup.4 .dbd.CH.sub.2 and R.sup.1 --N(CO--OR.sup.2)--SO.sub.2 --R.sup.3 --O--CO--CR.sup.4 .dbd.CH.sub.2,in which R.sup.1 is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20) aralkyl radical, individual methylene groups in the radicals containing alkyl being optionally replaced by heteroatoms, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, (C.sub.3 -C.sub.11 )alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.4)aryl or (C.sub.7 -C.sub.20)aralkyl radical and R.sup.4 is a hydrogen atom or a methyl group. It further relates to polymers having at least 5 mol % of units with pendent groups of the formula(e) --R.sub.3 --N(CO--OR.sup.2)--SO.sub.2 --R.sup.1 (I) and/or --R.sup.3 --SO.sub.2 --N(CO--OR.sup.2)--R.sup.

Abstract: A light-sensitive mixture which contains a resinous binder which is insoluble in water but soluble or at least swellable in aqueous-alkaline solutions, and an o-naphthoquinonediazide-sulfonic acid ester, the o-naphthoquinonediazide-sulfonic acid ester being of the formula I ##STR1## in which R is hydrogen or an alkyl or aryl radical andR.sub.1 is hydrogen or a 1,2-naphthoquinone-2-diazide-4-sulfonyl, 1,2-naphthoquinone-2-diazide-5-sulfonyl or 7-methoxy-1,2-naphthoquinone-2-diazide-4-sulfonyl radical,and the number of the identical or different naphthoquinonediazide-sulfonyl radicals, defined as R.sub.1, in the molecule being 1 to 5; is useful in the preparation of light-sensitive resist materials. The resist material produced using the light-sensitive mixture has a high light sensitivity and very good developer resistance to alkaline developers and can be developed without any problems with aqueous, weakly alkaline solutions.

Abstract: The invention relates to a process for preparing organic monomeric or polymeric compounds carrying tert-butyloxycarbonyl groups, wherein a monomeric or polymeric organic compound, which possesses at least one heteroatom with an acidic proton, such as an aliphatic or aromatic alcohol, an amide, imide or lactam, is reacted with di-tert-butyl dicarbonate in an inert solvent in the presence of about 0.01 to about 10 mol percent, relative to the compound to be converted, of a catalyst at a temperature from about 0.degree. to about 80.degree. C. The reaction solution can be used for further processing, or the reaction product can be isolated by evaporation of the solvent or by precipitation in water and drying. The compounds are preferably used in light-sensitive coatings.

Abstract: A photopolymerizable material having(A) a flexible, transparent film support;(B) a colored, polymerizable layer containing an organic binder, a free-radical-polymerizable compound, containing at least one terminal ethylenically unsaturated group, and a dye or colored pigment;(C) an adhesion layer containing a thermoplastic polymer and having a T.sub.g of from 25.degree. to 100.degree. C.; and(D) an uncolored photopolymerizable layer which contains a polymeric organic binder, a free-radical-polymerizable compound containing at least one terminal ethylenically unsaturated group and a photopolymerization initiator between the film support (A) and the colored polymerizable layer (B),where the cohesion of layers (B), (C) and (D) and the adhesion of these layers to one another and to the film support (A) provides the relationship wherein the adhesion (a.sub.2) of the photopolymerizable layer (D) to the colored layer (B) in the unexposed state is lower than: (i) the adhesion (a.sub.

Abstract: The invention relates to a usually positive-working radiation-sensitive mixture which contains as essential components a binder which is insoluble in water and soluble in aqueous-alkaline solutions, a 1,2-quinone diazide and a compound which diminishes the developer solubility of the exposed regions by heat treatment, in which the compound which diminishes the developer solubility which is present is at least one urethane of the formula I: ##STR1## in which R.sub.1 is hydrogen or methyl,R.sub.2 is hydrogen, alkyl, substituted or unsubstituted aryl, or substituted or unsubstituted arylaminocarbonyl,R.sub.3 is substituted or unsubstituted arylene or arylenealkylene,Q is hydrogen, --CH.sub.4-p, or --CR.sub.5 R.sub.6 in which R.sub.5 and R.sub.6 can be identical or different and are selected from the group consisting of hydrogen, alkyl and aryl, carbonyl, oxygen, sulfur or sulfonyl,m is 1, 2 or 3,n is at least 1 and not more than 50, andis 1, 2 or 3.