Patents by Inventor Gi-cheon Yoon
Gi-cheon Yoon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8384844Abstract: When a defective pixel causing light leakage is detected in a flat display panel, an optical modulation region is formed in a substrate by emitting a laser beam such that a virtual image is displayed at a position corresponding to the defective pixel. Accordingly, quality of the flat display panel may be improved thereby increasing manufacturing process yield.Type: GrantFiled: March 30, 2010Date of Patent: February 26, 2013Assignee: Samsung Electronics Co., Ltd.Inventors: Sung Jin Lee, Jun Ho Lee, Gi Cheon Yoon
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Publication number: 20100253877Abstract: When a defective pixel causing light leakage is detected in a flat display panel, an optical modulation region is formed in a substrate by emitting a laser beam such that a virtual image is displayed at a position corresponding to the defective pixel. Accordingly, quality of the flat display panel may be improved thereby increasing manufacturing process yield.Type: ApplicationFiled: March 30, 2010Publication date: October 7, 2010Inventors: Sung Jin Lee, Jun Ho Lee, Gi Cheon Yoon
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Patent number: 7447559Abstract: In an apparatus and a method of forming a photoresist pattern, a photoresist-coating section coats a substrate with a photoresist composition to form a photoresist film. A light is irradiated onto the photoresist film by using an exposure section, and a developing section develops the photoresist film. A residue-sensing section senses a residue of the developed photoresist film to generate information of the residue corresponding to the sensed residue. A residue-removing section sprays a solvent in a region of the residue corresponding to the information of the residue to dissolve the residue, and the residue-removing section absorbs the residue dissolved by the solvent. Therefore, the residue is effectively removed by spraying the solvent in the region of the residue and absorbing the residue dissolved by the solvent.Type: GrantFiled: October 6, 2004Date of Patent: November 4, 2008Assignee: Samsung Electronics Co., Ltd.Inventors: Gi-Cheon Yoon, Geun-Soo An
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Patent number: 7393159Abstract: An inline transfer system and method are provided for the secure transport and efficient processing of substrates such as glass substrates or semiconductor devices. A rotary conveyor is provided that includes a plurality of air nozzles which inject air to move a substrate above the plurality of air nozzles without the plurality of air nozzles making contact with the substrate. At least two independent processing units are operably coupled to the rotary conveyor. Advantageously, because a plurality of substrates may be processed in parallel, greater efficiency and flexibility are provided. Because the substrate can be moved without physical contact between the structure of the air nozzles and the substrate, the transfer is secure, clean, and efficient.Type: GrantFiled: June 7, 2004Date of Patent: July 1, 2008Assignee: Samsung Electronics Co., Ltd.Inventors: Won-Kie Chang, Gi-Cheon Yoon, Geun-Soo An
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Publication number: 20070013642Abstract: A system is provided for transferring a substrate of a flat panel display between the processing stations of a flat panel display manufacturing line. The system includes a transfer device that transfers a transfer container in which a substrate is loaded, a container loading and unloading device that loads and unloads the containers on and from the transfer device, and a substrate loading and unloading device that transfers the substrates between the container and processing equipment located at the respective stations. The transfer device includes a track mounted on a facility floor and a plurality of wheeled carriages that move programmably along the track by means of linear motors. The system enables substrate transfer time to be reduced substantially, yet provides robust protection of the substrates throughout the transfer process.Type: ApplicationFiled: July 13, 2006Publication date: January 18, 2007Inventors: Gi-Cheon Yoon, Hwan-Gerl Hwang, Yoo-Seok Kim, Jin-Gi Kim, In-Ho Lee, Hyung Lee, Sung-Il Jung
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Publication number: 20060271216Abstract: In a production line for automatically conducting a process of manufacturing semiconductors or TFT-LCDs, short-range wireless (SRW) terminals are given to the workers arranged at the respective facilities to effect a signal transmission in accordance with a SRW communication protocol, and SRW access points are arranged at predetermined locations in the production line. The respective SRW terminals are connected to a central control server through the SRW access points at the relevant areas, and the call switching with respect to a plurality of other terminals is given thereto through the central control server. When a facility abnormality is detected, the occurrence of the abnormality is notified to the SRW terminal of the person in charge to speedily cope with the abnormality. A handover is selectively made between the SRW access points such that the worker continuously holds the communication using the SRW terminal even while moving.Type: ApplicationFiled: May 31, 2006Publication date: November 30, 2006Inventors: In-Shik Shim, Min-Woo Yang, Gi-Cheon Yoon
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Patent number: 7134222Abstract: A transfer apparatus is provided for the transport of transfer objects such as glass substrates or semiconductor devices in which cleanliness and secure transport are of major concern. A plurality of air nozzles inject air through the plurality of air nozzles to hold a transfer object in place above or below the plurality of air nozzles without the plurality of air nozzles making contact with the transfer object. The plurality of air nozzles are positioned perpendicular to the transfer object to stop and/or engage the transfer object in a rest position. The plurality of air nozzles are inclined to a specified angle to move the transferred object in a desired direction. Advantageously, because the transfer object is moved without physical contact between the structure of the air nozzles and the transfer object, the transfer is secure, clean, and efficient.Type: GrantFiled: June 7, 2004Date of Patent: November 14, 2006Assignee: Samsung Electronics Co., Ltd.Inventors: Geun-Soo An, Gi-Cheon Yoon
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Patent number: 7042553Abstract: Disclosed herein is an apparatus for conveying substrates, which is capable of efficiently conveying large substrates and has a function to temporarily store the substrate in a buffer unit. The apparatus includes a substrate support unit, a conveying unit, and the buffer unit. The substrate support unit supports the substrate thereon. The conveying unit sequentially conveys the substrate support unit to a plurality of processing units. The buffer unit is provided at a predetermined portion of the conveying unit to move the substrate support unit upward away from the conveying unit in a vertical direction, thus temporarily storing the substrate support unit therein while spacing the substrate support unit apart from the conveying unit. The substrate conveying apparatus thus efficiently conveys the substrates, regardless of sizes of the substrates, while temporarily storing the substrates to buffer a difference in the processing time.Type: GrantFiled: June 4, 2004Date of Patent: May 9, 2006Assignee: Samsung Electronics Co., Ltd.Inventors: Geun-soo An, Gi-cheon Yoon
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Publication number: 20060078408Abstract: An air current generated at a movement road does not flow into a shelf while a crane moves along the movement road since a system for manufacturing a flat display panel includes: a shelf positioned to both sides of a movement road, and accommodating a cassette; and a crane, moving along the movement road, transferring the cassette to the shelf and extracting the cassette therefrom; and a blocking pate mounted to both side portions of the crane so as to prevent air current from flowing into the crane.Type: ApplicationFiled: October 7, 2005Publication date: April 13, 2006Inventors: Won-Kie Chang, Gi-Cheon Yoon, Geun-Soo An, Young-Min Kee
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Publication number: 20050112507Abstract: In an apparatus and a method of forming a photoresist pattern, a photoresist-coating section coats a substrate with a photoresist composition to form a photoresist film. A light is irradiated onto the photoresist film by using an exposure section, and a developing section develops the photoresist film. A residue-sensing section senses a residue of the developed photoresist film to generate information of the residue corresponding to the sensed residue. A residue-removing section sprays a solvent in a region of the residue corresponding to the information of the residue to dissolve the residue, and the residue-removing section absorbs the residue dissolved by the solvent. Therefore, the residue is effectively removed by spraying the solvent in the region of the residue and absorbing the residue dissolved by the solvent.Type: ApplicationFiled: October 6, 2004Publication date: May 26, 2005Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Gi-Cheon Yoon, Geun-Soo An
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Publication number: 20050105992Abstract: A substrate stocking apparatus is provided, which includes: a plurality of stockers, each stocker including a plurality of shelf plates that includes a plurality of supporting pins supporting the substrate and a plurality of vertical frames fixing and connecting the shelf plates; and an indexer taking a substrate into and out of the stockers.Type: ApplicationFiled: October 7, 2004Publication date: May 19, 2005Inventors: Geun-Soo An, Gi-Cheon Yoon
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Publication number: 20050073667Abstract: Disclosed herein is an apparatus for conveying substrates, which is capable of efficiently conveying large substrates and has a function to temporarily store the substrate in a buffer unit. The apparatus includes a substrate support unit, a conveying unit, and the buffer unit. The substrate support unit supports the substrate thereon. The conveying unit sequentially conveys the substrate support unit to a plurality of processing units. The buffer unit is provided at a predetermined portion of the conveying unit to move the substrate support unit upward away from the conveying unit in a vertical direction, thus temporarily storing the substrate support unit therein while spacing the substrate support unit apart from the conveying unit. The substrate conveying apparatus thus efficiently conveys the substrates, regardless of sizes of the substrates, while temporarily storing the substrates to buffer a difference in the processing time.Type: ApplicationFiled: June 4, 2004Publication date: April 7, 2005Inventors: Geun-soo An, Gi-cheon Yoon
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Publication number: 20050063791Abstract: An inline transfer system and method are provided for the secure transport and efficient processing of substrates such as glass substrates or semiconductor devices. A rotary conveyor is provided that includes a plurality of air nozzles which inject air to move a substrate above the plurality of air nozzles without the plurality of air nozzles making contact with the substrate. At least two independent processing units are operably coupled to the rotary conveyor. Advantageously, because a plurality of substrates may be processed in parallel, greater efficiency and flexibility are provided. Because the substrate can be moved without physical contact between the structure of the air nozzles and the substrate, the transfer is secure, clean, and efficient.Type: ApplicationFiled: June 7, 2004Publication date: March 24, 2005Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Won-Kie Chang, Gi-Cheon Yoon, Geun-Soo An
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Publication number: 20050050752Abstract: A transfer apparatus is provided for the transport of transfer objects such as glass substrates or semiconductor devices in which cleanliness and secure transport are of major concern. A plurality of air nozzles inject air through the plurality of air nozzles to hold a transfer object in place above or below the plurality of air nozzles without the plurality of air nozzles making contact with the transfer object. The plurality of air nozzles are positioned perpendicular to the transfer object to stop and/or engage the transfer object in a rest position. The plurality of air nozzles are inclined to a specified angle to move the transferred object in a desired direction. Advantageously, because the transfer object is moved without physical contact between the structure of the air nozzles and the transfer object, the transfer is secure, clean, and efficient.Type: ApplicationFiled: June 7, 2004Publication date: March 10, 2005Applicant: SAMSUNG ELECTRONICS CO., LTDInventors: Geun-Soo An, Gi-Cheon Yoon