Abstract: A method adapted to transfer a sample container such as a capped sample tube is disclosed. In one aspect, the method includes gripping a sample tube body with a first gripper pair and a cap with a second gripper pair of a gripper apparatus. In another aspect, a seating member may contact the cap to aid in the positioning of the sample container. Apparatus and systems for carrying out the method are provided, as are other aspects.

Abstract: A method adapted to transfer a sample container such as a capped sample tube is disclosed. In one aspect, the method includes gripping a sample tube body with a first gripper pair and a cap with a second gripper pair of a gripper apparatus. In another aspect, a seating member may contact the cap to aid in the positioning of the sample container. Apparatus and systems for carrying out the method are provided, as are other aspects.

Abstract: An apparatus and method of transferring and loading a reticle onto a receiving station (for example, a reticle exposure stage). The reticle is first retrieved from a storage facility with an end effector having a reticle plate coupled to a mounting plate. The mounting plate connects the end effector to a robotic arm. The reticle is aligned in an out-of-plane position in an off-line alignment station. The alignment is in compliance with the alignment requirement at the receiving station. The reticle is mounted onto the reticle plate after undergoing the alignment at the off-line alignment station. The reticle is then transferred from the off-line alignment station to the receiving station while maintaining the previous alignment at the off-line alignment station. The apparatus further provides rigidity of the mounted reticle to ensure compliance with the alignment requirement at the receiving station.

Abstract: A substrate protection and transport system and method for transitioning a substrate from atmospheric pressure to vacuum in a lithography tool. The system includes one or more removable substrate transport cassettes that support a substrate. The cassette can include a base portion and top portion, and can include a seal. Each cassette has at least one vent and at least one filter. The system further includes a box having a base and lid. The box holds one or more cassette-substrate arrangements. A storage rack having shelves for holding the box-cassette-substrate arrangement is also provided. Further, an entry-exit module having a loadlock is provided for transitioning the cassette-substrate arrangement from atmospheric pressure to vacuum. The entry-exit module can include a shuttle and/or elevator for transporting the cassette-substrate arrangement.

Abstract: An apparatus and method of transferring and loading a reticle onto a receiving station (for example, a reticle exposure stage). The reticle is first retrieved from a storage facility with an end effector having an reticle plate coupled to a mounting plate. The mounting plate connects the end effector to a robotic arm. The reticle is aligned in an out-of-plane position in an off-line alignment station. The alignment is in compliance with the alignment requirement at the receiving station. The reticle is mounted onto the reticle plate after undergoing the alignment at the off-line alignment station. The reticle is then transferred from the off-line alignment station to the receiving station while maintaining the previous alignment at the off-line alignment station. The apparatus further provides rigidity of the mounted reticle to ensure compliance with the alignment requirement at the receiving station.

Abstract: A substrate protection and transport system and method for transitioning a substrate from atomospheric pressure to vacuum in a lithography tool. The system includes one or more removable substrate transport cassettes. Each cassette has at least one vent and at least one filter. The system further includes an end effector coupled to a robotic arm to enable the substrate to be positioned within one of the cassettes, thereby forming a cassette-substrate arrangement. The system further includes a box having a base and a lid. The box holds one or more of the cassette-substrate arrangements. In this way, a box-cassette-substrate arrangement is provided. An out of vacuum storage rack having shelves for holding the box-cassette-substrate arrangement is also provided. Still further, an entry-exit module having a loadlock is provided for transitioning the cassette-substrate arrangement from atmospheric pressure to vacuum.

Abstract: A reticle protection and transport system and method for a lithography tool. The system includes an indexer that stores a plurality of reticles and a removable reticle cassette. The removable reticle cassette is comprised of an inner chamber and an outer chamber. The system further includes an end effector coupled to a robotic arm. The end effector engages one of the plurality of reticles to enable the reticle to be positioned within the removable reticle cassette and thereafter transported. The system further includes a seal, coupled to the end effector and the robotic arm. To transport the reticle, the reticle is first loaded onto the end effector. Next, the end effector is used to create an arrangement wherein the reticle is loaded into the removable reticle cassette. Importantly, the reticle and removable reticle cassette do not come into contact with one another.

Abstract: An apparatus and method of transferring and loading a reticle onto a receiving station (for example, a reticle exposure stage). The reticle is first retrieved from a storage facility with an end effector having an reticle plate coupled to a mounting plate. The mounting plate connects the end effector to a robotic arm. The reticle is aligned in an out-of-plane position in an off-line alignment station. The alignment is in compliance with the alignment requirement at the receiving station. The reticle is mounted onto the reticle plate after undergoing the alignment at the off-line alignment station. The reticle is then transferred from the off-line alignment station to the receiving station while maintaining the previous alignment at the off-line alignment station. The apparatus further provides rigidity of the mounted reticle to ensure compliance with the alignment requirement at the receiving station.

Abstract: A substrate protection and transport system and method for transitioning a substrate from atomospheric pressure to vacuum in a lithography tool. The system includes one or more removable substrate transport cassettes. Each cassette has at least one vent and at least one filter. The system further includes an end effector coupled to a robotic arm to enable the substrate to be positioned within one of the cassettes, thereby forming a cassette-substrate arrangement. The system further includes a box having a base and a lid. The box holds one or more of the cassette-substrate arrangements. In this way, a box-cassette-substrate arrangement is provided. An out of vacuum storage rack having shelves for holding the box-cassette-substrate arrangement is also provided. Still further, an entry-exit module having a loadlock is provided for transitioning the cassette-substrate arrangement from atmospheric pressure to vacuum.

Abstract: An apparatus which securely grasps a wide range of three dimensional objects while relaying digital data about the surface grasped using pneumatically actuated mechanical probes for such grasping and optomechanical encoding for such relaying of data. Such optomechanical encoding employs encoder tubes with columns of patterned slots and holes to selectively transmit light through synthetic plastic fibers. A process of constructing the portion of the apparatus where the optomechanical encoding producing such data occurs which comprises continuously looping the synthetic plastic fibers necessary for light transmission, injecting an adhesive and sealant to enable pneumatic operation of the apparatus, and cutting the adhesive and sealant and synthetic plastic fibers in a circular pattern to allow the passage of the encoder tubes.

Abstract: An algorithm for representing complex three-dimensional objects in a computer for the purpose of robotic recognition of such objects comprises the generation of superquadric volume primitives, the combination of such superquadric volume primitives, the discarding of all vertices making up such volume primitives except for surface vertices, and the automatic generation of a Winged Edge graph structure from the list of surface vertices. The size of the Winged Edge graph structure is reduced by joining adjacent, coplanar faces, removing the common edge of such faces, and joining unidirectional, collinear edges resulting from any joining of adjacent, coplanar faces.

Abstract: An apparatus which securely grasps a wide range of three dimensional objects while relaying digital data about the surface grasped using pneumatically actuated mechanical probes for such grasping and optomechanical encoding for such relaying of data. Such optomechanical encoding employs encoder tubes with columns of patterned slots and holes to selectively transmit light through synthetic plastic fibers. A process of constructing the portion of the apparatus where the optomechanical encoding producing such data occurs which comprises continuously looping the synthetic plastic fibers necessary for light transmission, injecting an adhesive and sealant to enable pneumatic operation of the apparatus, and cutting the adhesive and sealant and synthetic plastic fibers in a circular pattern to allow the passage of the encoder tubes.

Abstract: An amorphous semiconductor device on a silicon substrate having a first level contact and interconnect of aluminum and coextensive layer of molybdenum and a second level contact and interconnect of molybdenum and coextensive layer of aluminum. Contacts to the amorphous device are by the two molybdenum layers and the contact of the second level contacts to the substrate is through the first level contacts.