Patents by Inventor Hajime Ichikawa

Hajime Ichikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20020191195
    Abstract: A method of manufacturing a projection optical system (37) for projecting a pattern from a reticle to a photosensitive substrate, comprising a surface-shape-measuring step wherein the shape of an optical test surface (38) of an optical element (36) which is a component in the projection optical system is measured by causing interference between light from the optical surface (38) and light from an aspheric reference surface (70) while the optical test surface (38) and said reference surface (70) are held in integral fashion in close mutual proximity. A wavefront-aberration-measuring step is included, wherein the optical element is assembled in the projection optical system and the wavefront aberration of the projection optical system is measured.
    Type: Application
    Filed: August 13, 2002
    Publication date: December 19, 2002
    Applicant: Nikon Corporation
    Inventors: Hiroshi Ichihara, Takashi Gemma, Shigerur Nakayama, Hajime Ichikawa
  • Patent number: 6456382
    Abstract: A method of manufacturing a projection optical system (37) for projecting a pattern from a reticle to a photosensitive substrate, comprising a surface-shape-measuring step wherein the shape of an optical test surface (38) of an optical element (36) which is a component in the projection optical system is measured by causing interference between light from the optical surface (38) and light from an aspheric reference surface (70) while the optical test surface (38) and said reference surface (70) are held in integral fashion in close mutual proximity. A wavefront-aberration-measuring step is included, wherein the optical element is assembled in the projection optical system and the wavefront aberration of the projection optical system is measured.
    Type: Grant
    Filed: June 1, 2001
    Date of Patent: September 24, 2002
    Assignee: Nikon Corporation
    Inventors: Hiroshi Ichihara, Takashi Gemma, Shigeru Nakayama, Hajime Ichikawa
  • Patent number: 6344898
    Abstract: Apparatus and methods are disclosed for measuring the surface topography of a test surface, such as a spherical or aspherical surface of a refractive or reflective optical element. The test surface is measured by detecting the state of interference fringes generated by interference of a reference light beam and a measurement light beam that interacts (e.g., reflects from) the test surface. The reference and measurement beams are produced by a point light source having a reflective surface. The point light source is disposed between a source of input light and the test surface. The measurement beam (after interacting with the test surface) and the reference beam are caused to interfere with each other to produce a first interference-fringe state. The distance between the point light source and the test surface can be changed between production of the first interference-fringe state and production of a second interference-fringe state.
    Type: Grant
    Filed: September 14, 1999
    Date of Patent: February 5, 2002
    Assignee: Nikon Corporation
    Inventors: Takashi Gemma, Hiroshi Ichihara, Hajime Ichikawa, Shigeru Nakayama, Bruce Jacobsen
  • Publication number: 20010028462
    Abstract: A method of manufacturing a projection optical system (37) for projecting a pattern from a reticle to a photosensitive substrate, comprising a surface-shape-measuring step wherein the shape of an optical test surface (38) of an optical element (36) which is a component in the projection optical system is measured by causing interference between light from the optical surface (38) and light from an aspheric reference surface (70) while the optical test surface (38) and said reference surface (70) are held in integral fashion in close mutual proximity. A wavefront-aberration-measuring step is included, wherein the optical element is assembled in the projection optical system and the wavefront aberration of the projection optical system is measured.
    Type: Application
    Filed: June 1, 2001
    Publication date: October 11, 2001
    Applicant: NIKON CORPORATION
    Inventors: Hiroshi Ichihara, Takashi Gemma, Shigerur Nakayama, Hajime Ichikawa
  • Patent number: 6100980
    Abstract: A magnification calibration apparatus includes an optical system optically coupled to an object surface for forming an image of the object surface, a detector for detecting the image of the object surface, and a movable support for supporting the object surface, the movable support being capable of laterally moving the object surface by a predetermined distance from a first lateral position to a second lateral position.
    Type: Grant
    Filed: April 3, 1998
    Date of Patent: August 8, 2000
    Assignee: Nikon Corporation
    Inventor: Hajime Ichikawa
  • Patent number: 6032377
    Abstract: A non-spherical surface shape measuring device and method that measures the shapes of object surfaces that have rotationally symmetrical non-spherical surface shapes on the basis of relative deviation values from the shape of a reference surface, the non-spherical surface shape measuring device includes a measuring means for obtaining relative deviation values between a reference surface and an object surface by measuring corresponding sampling points on the surfaces of the reference surface and the object surface and storing predetermined coefficients of variables prior to measurement. A first operating means approximates the partial differential coefficients for the predetermined variables and models the relative displacement, between the object surface and the reference surface and the XY-coordinates of the sampling points, into functional equivalents of the partial differential coefficients.
    Type: Grant
    Filed: January 7, 1998
    Date of Patent: March 7, 2000
    Assignee: Nikon Corporation
    Inventors: Hajime Ichikawa, Takahiro Yamamoto
  • Patent number: 5986760
    Abstract: A method of measuring a surface shape of a target surface, and a lens manufacturing process for manufacturing a lens having a surface shape figured to high-precision. The method and process includes the steps of first, interferometrically measuring the surface shape of the target surface or the lens surface. Then second, measuring a surface shape of a prototype target surface. Then third, determining a rotationally symmetric error component of the difference between the target surface shape or the lens surface shape and the prototype target surface shape. Then fourth, expressing the rotationally symmetric error as a sum of two components, one being slowly varying and the other being a remainder. The slowly varying component is at least determined by performing the third step, while the remainder component is determined by performing the first step.
    Type: Grant
    Filed: June 12, 1998
    Date of Patent: November 16, 1999
    Assignee: Nikon Corporation
    Inventors: Shigeru Nakayama, Takashi Genma, Tetsuji Onuki, Masami Ebi, Hajime Ichikawa
  • Patent number: 5982490
    Abstract: A method is provided for deriving an absolute surface profile of an object having a rotationally symmetric component and a rotationally asymmetric component using a detection system for measuring a relative surface profile of the object with respect to a predetermined reference surface.
    Type: Grant
    Filed: February 4, 1998
    Date of Patent: November 9, 1999
    Assignee: Nikon Corporation
    Inventors: Hajime Ichikawa, Takahiro Yamamoto
  • Patent number: 4988164
    Abstract: An anti-reflective film for synthetic resin optical parts of elements. The film comprises a first SiO layer, a second SiO.sub.2 layer, a third CeO.sub.2 layer and a fourth SiO.sub.2 layer, each layer having a particular optical thickness at a wavelength of .lambda.=400-700 nm.
    Type: Grant
    Filed: April 3, 1989
    Date of Patent: January 29, 1991
    Assignee: Olympus Optical Co., Ltd.
    Inventor: Hajime Ichikawa
  • Patent number: 4979802
    Abstract: A synthetic resin half-mirror comprises a synthetic resin substrate, a first SiO film layer deposited thereon, and further at least two SiO.sub.2 layers and CeO.sub.2 film layers alternately deposited thereon and satisfies a spectral reflectance at incident angle of 45.degree. of not less than 40% as an optical property.
    Type: Grant
    Filed: February 28, 1990
    Date of Patent: December 25, 1990
    Assignee: Olympus Optical Company Limited
    Inventor: Hajime Ichikawa
  • Patent number: 4944581
    Abstract: A rear face mirror comprised of multilayer film for use in a synthetic resin optical part has a five or six layer structure formed on a synthetic resin substrate and made from SiO, (SiO.sub.2), CeO.sub.2, Al(Al) and SiO(Cu) having particular optical or mechanical thickness.
    Type: Grant
    Filed: August 18, 1989
    Date of Patent: July 31, 1990
    Assignee: Olympus Optical Company Limited
    Inventor: Hajime Ichikawa
  • Patent number: 4890245
    Abstract: An apparatus and a method for detecting the temperature of a substrate, and for controlling the radiation-annealing of the substrate, for example, measures the intensity of infrared light from the substrate when the substrate is irradiated by measuring infrared light and also when the substrate is not irradiated by the infrared light. The temperature is calculated from the transmissivity and emissivity of the substrate, which are calculated from the intensity measurements.
    Type: Grant
    Filed: September 17, 1987
    Date of Patent: December 26, 1989
    Assignee: Nikon Corporation
    Inventors: Masahiko Yomoto, Makoto Uehara, Hajime Ichikawa, Shigeru Kato
  • Patent number: 4859832
    Abstract: An apparatus for annealing a substrate includes a plurality of annular light sources concentric about a predetermined axis, a holder for placing the substrate such that the substrate receives radiation from the plurality of annular light sources and is substantially perpendicular to the predetermined axis, and a measuring device having a measuring optical system with an optical axis substantially aligned with the predetermined axis. The measuring device is adapted to receive radiation through the measuring optical system from the substrate placed on the holder and to detect a temperature distribution of the substrate.
    Type: Grant
    Filed: September 2, 1987
    Date of Patent: August 22, 1989
    Assignee: Nikon Corporation
    Inventors: Makoto Uehara, Hajime Ichikawa, Masahiko Yomoto, Shigeru Kato
  • Patent number: 4599272
    Abstract: An anti-reflection coating for an optical component and a method of forming the same are disclosed. The anti-reflection coating is formed on a substrate for an optical component by subjecting a mixture of an evaporating material and 10-30% of SiO.sub.2 to vacuum evaporation at room temperature without heating the substrate. When the anti-reflection coating is a single layer, a mixture of MgF.sub.2 and 10-30% of SiO.sub.2 is used as the evaporating material. When the anit-reflection coating is a multi-layer structure, a mixture of a fluoride or a silicon oxide and 10-30% of SiO.sub.2 for a first layer, and a mixture of a fluoride or an oxide and 10-30% of SiO.sub.2 for middle and last layers are used as the evaporating material.
    Type: Grant
    Filed: September 7, 1984
    Date of Patent: July 8, 1986
    Assignee: Olympus Optical Company Limited
    Inventor: Hajime Ichikawa