Patents by Inventor Hans Butler
Hans Butler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20200225590Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.Type: ApplicationFiled: December 9, 2019Publication date: July 16, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Joeri LOF, Erik Theodorus Maria BIJLAART, Hans BUTLER, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Aleksey Yurievich KOLESNYCHENKO, Erik Roelof LOOPSTRA, Hendricus Johannes Maria MEIJER, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Roelof Aeilko Siebrand RITSEMA, Frank VAN SCHAIK, Timotheus Franciscus SENGERS, Klaus SIMON, Joannes Theodoor DE SMIT, Alexander STRAAIJER, Bob STREEFKERK, Helmar VAN SANTEN, Antonius Theodorus Anna Maria DERKSEN, Hans JANSEN, Jacobus Johannus Leonardus Hendricus VERSPAY
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Publication number: 20200209757Abstract: The present invention relates to a lithographic apparatus, comprising: —a base frame (10), adapted for mounting the lithographic apparatus (1) on a support surface (9), —a projection system (20) comprising: —a force frame (30), —an optical element (21) which is moveable relative to the force frame, —a sensor frame (40), which is separate from the force frame, —at least one sensor which is adapted to monitor the optical element, comprising at least one sensor (25) element which is mounted to the sensor frame, —a force frame support (31), which is adapted to support the force frame on the base frame, —an intermediate frame (45), which is separate from the force frame, —a sensor frame coupler (41), which is adapted to couple the sensor frame to the intermediate frame, —an intermediate frame support (46), which is separate from the force fame support and adapted to support the intermediate frame on the base frame.Type: ApplicationFiled: June 16, 2017Publication date: July 2, 2020Applicants: ASML Netherlands B.V., Carl Zeiss SMT GmbHInventors: Hans BUTLER, Bernhard Mathias GEUPPERT, Erik Roelof LOOPSTRA, Maurice Willem Jozef Etiënn WIJCKMANS
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Publication number: 20200203118Abstract: An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.Type: ApplicationFiled: March 4, 2020Publication date: June 25, 2020Inventors: Marcel Koenraad Marie BAGGEN, Antonius Henricus ARENDS, Lucas KUINDERSMA, Johannes Hubertus, Antonius VAN DE RIJDT, Peter Paul HEMPENIUS, Robertus Jacobus, Theodorus VAN KEMPEN, Niels Johannes, Maria BOSCH, Henricus Martinus, Johannes VAN DE GROES, Kuo-Feng TSENG, Hans BUTLER, Michael Johannes, Christiaan RONDE
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Patent number: 10678139Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.Type: GrantFiled: January 11, 2019Date of Patent: June 9, 2020Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Johannes Catherinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Erik Theodorus Maria Bijlaart, Christiaan Alexander Hoogendam, Helmar Van Santen, Marcus Adrianus Van De Kerkhof, Mark Kroon, Arie Jeffrey Den Boef, Joost Jeroen Ottens, Jeroen Johannes Sophia Maria Mertens
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Patent number: 10663872Abstract: A lithographic apparatus includes a patterning device support to support a patterning device, the patterning device system including a moveable structure movably arranged relative to an object, a patterning device holder movably arranged relative to the movable structure to hold the patterning device, an actuator to move the movable structure relative to the object, and an ultra short stroke actuator to move the patterning device holder with respect to the movable structure; a substrate support to hold a substrate; a projection system to project a patterned radiation beam onto a target portion of the substrate; a transmission image sensor for measuring a position of the patterned radiation beam downstream of the projection system; and a calibrator for determining a relationship between magnitude of an applied control signal to the ultra short stroke actuator and resulting change in position of the patterned radiation beam and/or patterning device holder and/or patterning device.Type: GrantFiled: January 31, 2019Date of Patent: May 26, 2020Assignee: ASML Netherlands B.V.Inventor: Hans Butler
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Publication number: 20200159126Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.Type: ApplicationFiled: January 28, 2020Publication date: May 21, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Hans BUTLER, Engelbertus Antonius Fransiscus VAN DER PASCH, Paul Corné Henri DE WIT
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Patent number: 10649347Abstract: An apparatus having: a system configured to measure an object; a base structure; an object support constructed to hold the object, the object support movably supported on the base structure; a balance mass configured to absorb a reaction force arising from movement of the object support; an actuator connected to the balance mass and the base structure, the actuator configured to apply a force to the balance mass and the base structure; a sensor configured to produce a signal for a measured characteristic of the base structure corresponding to a disturbance, or its effect, acting on the base structure; and a control system configured to determine, based on at least the signal for the measured characteristic of the base structure, a signal for the actuator to apply a force to the base structure and/or the balance mass.Type: GrantFiled: December 13, 2018Date of Patent: May 12, 2020Assignee: ASML Netherlands B.V.Inventors: Michael Johannes Christiaan Ronde, Lucas Kuindersma, Niels Johannes Maria Bosch, Hans Butler, Cornelius Adrianus Lambertus De Hoon, Marc Wilhelmus Maria Van Der Wijst, Thijs Verhees, Sander Kerssemakers
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Publication number: 20200124991Abstract: The invention relates to support structure, comprising: a first body; a second body; a first support having a first stiffness; a second support having a second stiffness, wherein the second body supports the first body at a first location via the first support, wherein the second body supports the first body at a second location via the second support; a position measurement system arranged to generate a deformation signal representative of a difference of deformation of the first body and the second body relative to each other; a first actuator to apply a force between the first body and the second body at or near the first location; a second actuator to apply a force between the first body and the second and body at or near the second location; wherein the support structure comprises a controller arranged to determine a deformation compensation signal on the basis of the first stiffness, the second stiffness and the deformation signal and to drive at least one of the first actuator and the second actuator oType: ApplicationFiled: March 28, 2018Publication date: April 23, 2020Applicant: ASML Netherlands B.V.Inventor: Hans Butler
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Patent number: 10578983Abstract: A lithographic apparatus comprises a base frame constructed to form a supporting structure of the lithographic apparatus, an active base frame support arranged between the base frame and a ground floor. The active base frame support is configured to support the base frame on the ground floor. The active base frame support comprises an actuator configured to exert a force in a horizontal direction between the base frame and the ground plane. The lithographic apparatus further comprises a control device configured to drive the actuator, a signal representative of a disturbance force on the base frame being provided to the control device, the control device being configured to drive the actuator using the force sensor signal.Type: GrantFiled: November 17, 2016Date of Patent: March 3, 2020Assignee: ASML NETHERLANDS B.V.Inventors: Hans Butler, Björn Hubertus Maria Bukkems, Cornelius Adrianus Lambertus De Hoon, Maurice Willem Jozef Etiënne Wijckmans
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Patent number: 10571815Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.Type: GrantFiled: August 22, 2019Date of Patent: February 25, 2020Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Engelbertus Antonius Fransiscus Van Der Pasch, Paul Corné Henri De Wit
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Publication number: 20200057390Abstract: A lithographic apparatus (LA) applies a pattern to a substrate (W). The lithographic apparatus includes a height sensor (LS), a substrate positioning subsystem, and a controller configured for causing the height sensor to measure the height (h) of the substrate surface at locations across the substrate. The measured heights are used to control the focusing of one or more patterns applied to the substrate. The height h is measured relative to a reference height (zref). The height sensor is operable to vary the reference height (zref), which allows a wider effective range of operation. Specifications for control of the substrate height during measurement can be relaxed. The reference height can be varied by moving one or more optical elements (566, 572, 576, 504 and/or 512) within the height sensor, or moving the height sensor. An embodiment without moving parts includes a multi-element photodetector (1212).Type: ApplicationFiled: October 12, 2017Publication date: February 20, 2020Inventors: Hans BUTLER, Johannes Petrus Martinus Bernardus VERMEULEN, Marinus Petrus REIJNDERS
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Publication number: 20200050120Abstract: The present invention relates to a lithographic apparatus, comprising: a projection system configured to project a patterned radiation beam onto a substrate, comprising optical elements, a sensor frame, a first position measurement system configured to measure a position of an optical element relative to the sensor frame, comprising a sensor adapted to monitor an optical element, with a sensor element mounted to the sensor frame, a sensor frame support supporting the sensor frame on a reference, a force measurement device adapted to generate force measurement data relating to force exerted on the sensor frame by the sensor frame support, a position control device adapted to control the relative position of the substrate and the patterned radiation beam wherein the position control device is configured to receive the force measurement data and to control said relative position based on at least the force measurement data.Type: ApplicationFiled: January 11, 2018Publication date: February 13, 2020Inventors: Hans BUTLER, Maurice Willem Jozef Etiënne WIJCKMANS
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Publication number: 20200049203Abstract: The invention relates to a bearing device arranged to support in a vertical direction a first part of an apparatus with respect to a second part of the apparatus, comprising a magnetic gravity compensator.Type: ApplicationFiled: February 15, 2018Publication date: February 13, 2020Inventors: Maarten Hartger KIMMAN, Hans BUTLER, Olof Martinus Josephus FISCHER, Christiaan Alexander HOOGENDAM, Theodorus Mattheus Joannus Maria HUIZINGA, Johannes Marinus Maria ROVERS, Eric Pierre-Yves VENNAT, Maurice Willem Jozef Etiënne WIJCKMANS
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Patent number: 10551751Abstract: A lithography apparatus and device manufacturing methods are disclosed. A lithography apparatus includes a support stage, and a measurement system including a sensor part and a reference part, the measurement system being configured to determine the position and/or orientation of the support stage, or of a component mounted on the support stage, relative to a reference frame by using the sensor part to interact with the reference part, wherein: the reference frame comprises N sub-frames coupled together so as to behave predominantly as a single rigid body with respect to vibrations below a first reference frequency and predominantly as an N-body system with respect to vibrations above a second reference frequency, where N is an integer greater than 1.Type: GrantFiled: March 18, 2013Date of Patent: February 4, 2020Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Marc Wilhelmus Maria Van Der Wijst
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Publication number: 20190384184Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.Type: ApplicationFiled: June 5, 2019Publication date: December 19, 2019Applicant: ASML Netherlands B.V.Inventors: Nitesh Pandey, Arie Jeffrey Den Boef, Duygu Akbulut, Marinus Johannes Maria Van Dam, Hans Butler, Hugo Augustinus Joseph Cramer, Engelbertus Antonius Fransiscu Van Der Pasch, Ferry Zijp, Jeroen Arnoldus Leonardus Raaymakers, Marinus Petrus Reijnders
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Publication number: 20190377266Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.Type: ApplicationFiled: August 22, 2019Publication date: December 12, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Hans BUTLER, Engelbertus Antonius Fransiscus VAN DER PASCH, Paul Corné Henri DE WIT
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Patent number: 10503086Abstract: A lithographic apparatus is described, the lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a projection system configured to project the patterned radiation beam onto a target portion of a substrate, a stage assembly comprising: a substrate table constructed to hold the substrate; and a positioning device configured to displace the substrate table relative to the projection system; a base frame onto which stage assembly and the projection system are mounted; the base frame comprising a first portion configured to support the stage assembly and a second portion configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion of the base frame.Type: GrantFiled: December 7, 2016Date of Patent: December 10, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Hans Butler, Cornelius Adrianus Lambertus De Hoon, Fransiscus Mathijs Jacobs, Pavel Kagan, Jeroen Pieter Starreveld, Maurice Willem Jozef Etiënne Wijckmans
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Patent number: 10503084Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.Type: GrantFiled: April 12, 2019Date of Patent: December 10, 2019Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen, Antonius Theodorus Anna Maria Derksen, Hans Jansen, Jacobus Johannus Leonardus Hendricus Verspay
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Publication number: 20190354021Abstract: A lithographic apparatus is described, the apparatus comprising: a projection system configured to project a patterned beam of radiation onto a substrate; the projection system comprising a plurality of optical elements; a sensor frame; a first position measurement system configured to measure a position of the plurality of optical elements relative to the sensor frame; wherein the sensor frame comprises: N sub-frames, N being an integer >1, a coupling system coupling the N sub-frames and a second position measurement system configured to determine a relative position of the N sub-frames.Type: ApplicationFiled: January 11, 2018Publication date: November 21, 2019Inventors: Hans BUTLER, Michael Johannes VERVOORDELDONK, Maurice Willem Jozef Etiënne WIJCKMANS
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Patent number: 10466599Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.Type: GrantFiled: April 20, 2017Date of Patent: November 5, 2019Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Engelbertus Antonius Fransiscus Van Der Pasch, Paul Corné Henri De Wit