Patents by Inventor Hans-Joachim Merrem

Hans-Joachim Merrem has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5358823
    Abstract: A radiation-sensitive composition is disclosed comprising a polymeric binder which is insoluble in water, but soluble or at least swellable in aqueous alkaline solution and a 2,3,4,4'-tetrahydroxybenzophenone which is partially esterified with (1,2-naphthoquinone 2-diazide)-4- and/or -5-sulfonic acid, which additionally contains either a dihydroxybenzophenone which is completely esterified with (1,2-naphthoquinone 2-diazide)-4- and/or -5-sulfonic acid or a trihydroxybenzophenone which is partially or completely esterified with (1,2-naphthoquinone 2-diazide)-4- and/or -5-sulfonic acid. The weight ratio of esterified 2,3,4,4'-tetrahydroxybenzophenone to esterified di- or trihydroxybenzophenone varies between about 4:6 and 7:3 and the esterified hydroxybenzophenones, as a whole, are present in a proportion of 5 to 40% by weight, based on the total weight of solids contained in the composition.
    Type: Grant
    Filed: April 1, 1992
    Date of Patent: October 25, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Wolfgang Zahn, Hans-Joachim Merrem, Fritz Erdmann, Axel Schmitt
  • Patent number: 5340682
    Abstract: A positive-working radiation-sensitive mixture is disclosed which contains as essential constituents:a) an .alpha.-carbonyl-.alpha.-sulfonyl-diazomethane, which forms a strong acid on irradiation, of the general formula I ##STR1## in which R.sup.1 and R.sup.2, independently of one another, denote an alkyl-, cycloalkyl-, aryl- or heteroaryl radicalb) a compound having at least one C--O--C or C--O--Si bond which can be cleaved by acid, andc) a water-insoluble binder which is soluble or at least swellable in aqueous-alkaline solutions.The radiation-sensitive mixture according to the invention is notable for a high sensitivity over a wide spectral range. It also exhibits a high thermal stability and does not form any corrosive photoylsis products on exposure to light.
    Type: Grant
    Filed: April 9, 1993
    Date of Patent: August 23, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Georg Pawlowski, Hans-Joachim Merrem, Juergen Lingnau, Ralph Dammel, Horst Roeschert
  • Patent number: 5338641
    Abstract: A positive-working radiation-sensitive mixture is disclosed which contains as essential constituents:a) an .alpha.,.alpha.-bis(sulfonyl)diazomethane, which forms a strong acid on irradiation, of the general formula ##STR1## in which R is an optionally substituted alkyl, cycloalkyl, aryl or heteroaryl radical,b) a compound having at least one C--O--C or C--O--Si--bond which can be cleaved by acid, andc) a water-insoluble binder which is soluble or at least swellable in aqueous alkaline solutions.The radiation-sensitive mixture according to the invention is notable for a high sensitivity over a wide spectral range. It also exhibits a high thermal stability and does not form any corrosive photolysis products on exposure to light.
    Type: Grant
    Filed: March 4, 1993
    Date of Patent: August 16, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Georg Pawlowski, Hans-Joachim Merrem, Juergen Lingnau, Ralph Dammel, Horst Roeschert
  • Patent number: 5326826
    Abstract: Radiation-sensitive polymers, a mixture containing these radiation-sensitive polymers as binder, and a process for the preparation of the radiation-sensitive polymer binders are disclosed. A positive radiation-sensitive recording material containing the radiation-sensitive polymer is also disclosed.
    Type: Grant
    Filed: February 26, 1992
    Date of Patent: July 5, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Horst Roeschert, Hans-Joachim Merrem, Georg Pawlowski, Juergen Fuchs, Ralph Dammel
  • Patent number: 5302488
    Abstract: A radiation-sensitive polymer and a mixture containing this radiation-sensitive polymer as a binder are disclosed. A process for the preparation of the radiation-sensitive polymer binder and a positive-working radiation-sensitive recording material which is prepared using the radiation-sensitive mixture are also disclosed.
    Type: Grant
    Filed: February 26, 1992
    Date of Patent: April 12, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Horst Roeschert, Hans-Joachim Merrem, Georg Pawlowski, Juergen Fuchs, Ralph Dammel
  • Patent number: 5256517
    Abstract: A positive-working radiation-sensitive mixture is described which essentially contains a photoactive component and a water-insoluble binder which is soluble, or at least swellable, in aqueous alkaline solution, wherein a compound is used, as photoactive component, which contains .alpha.-diazo-.beta.-keto ester units and sulfonate units of the formula I ##STR1## in which R.sup.1 and R.sup.2, independently of one another, are an unsubstituted or substituted aliphatic, cycloaliphatic, araliphatic or aromatic radical having 4 to 20 carbon atoms, it being possible for individual CH.sub.2 groups to be replaced by oxygen or sulfur atoms or by N or NH groups and/or contain keto groups,X is an unsubstituted or substituted aliphatic, cycloaliphatic, carbocyclic, heterocyclic or araliphatic radical having 2 to 22 carbon atoms, it being possible for individual CH.sub.2 groups to be replaced by oxygen or sulfur atoms or by the groups --NR.sup.3 --, --C(O)--0--, --C(O)--NR.sup.3 --, ##STR2## --NR.sup.3 --C(O)--NR.sup.
    Type: Grant
    Filed: May 1, 1991
    Date of Patent: October 26, 1993
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Horst Roeschert, Georg Pawlowski, Hans-Joachim Merrem, Ralph Dammel, Walter Spiess
  • Patent number: 5198322
    Abstract: A positively operating radiation-sensitive mixture comprising a binder which is insoluble in water but soluble or at least swellable in aqueous alkaline solution, and as a photoactive component a polyfunctional .alpha.-diazo-.beta.-keto ester of the general formula I ##STR1## in which R.sup.1 denotes an aliphatic, cycloaliphatic or araliphatic or aromatic radical having 4 to 20 carbon atoms, in which individual CH.sub.2 groups can be replaced by oxygen or sulfur atoms or by ##STR2## or NH groups and/or contain keto groups, X denotes an aliphatic, cycloaliphatic, carbocyclic, heterocyclic or araliphatic radical having 2 to 22 carbon atoms, in which individual CH.sub.2 groups can be replaced by oxygen or sulfur atoms or by the groups --NR.sup.2 --, --C(O)--O--, --C(O)--NR.sup.2 --, --C(O)-- ##STR3## --NR.sup.2 --C(O)--NR.sup.3 --, --O--C(O)--NR.sup.2 --, --C(O)-- ##STR4## or --O--C(O)--O--, or CH groups can be replaced by ##STR5## in which R.sup.2 and R.sup.
    Type: Grant
    Filed: January 12, 1990
    Date of Patent: March 30, 1993
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Peter Wilharm, Hans-Joachim Merrem, Georg Pawlowski, Ralph Dammel
  • Patent number: 5191069
    Abstract: Polyfunctional compounds containing .alpha.-diazo-.beta.-keto ester units and sulfonate units are disclosed. The polyfunctional compounds have high sensitivity in the deep UV and high thermal stability. Processes for producing the compounds are disclosed. A preferred process first synthesizes .beta.-ketoester/sulfonate precursors and then uses diazo transfer to convert the precursors into the novel compounds. Radiation-sensitive mixtures containing the compounds are also disclosed.
    Type: Grant
    Filed: May 1, 1991
    Date of Patent: March 2, 1993
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Horst Roeschert, Georg Pawlowski, Hans-Joachim Merrem, Ralph Dammel
  • Patent number: 5066567
    Abstract: A positive-working photosensitive composition is disclosed that comprises a photosensitive compound which is either of the o-quinone diazide type or comprises a photolytic acid donor in combination with a compound containing a C-O-C group, a binder which is soluble or swellable in an aqueous-alkaline solution and a dye of the general formula I ##STR1## The photosensitive composition of the present invention has a higher photosensitivity than comparable compositions containing other dyes.
    Type: Grant
    Filed: March 28, 1990
    Date of Patent: November 19, 1991
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hans-Joachim Merrem, Gerhard Buhr, Ruediger Lenz
  • Patent number: 4996301
    Abstract: Polyfunctional .alpha.-diazo-.beta.-keto esters of the general formula I are described ##STR1## in which R.sup.1 denotes an aliphatic, cycloaliphatic or araliphatic or aromatic radical having 4 to 20 carbon atoms, in which individual CH.sub.2 groups can be replaced by oxygen or sulfur atoms or by N-- or NH groups and/or contain keto groups,X denotes an aliphatic, cycloaliphatic, carbocyclic, heterocyclic or araliphatic radical having 2 to 22 carbon atoms, in which individual CH.sub.2 groups can be replaced by oxygen or sulfur atoms or by the groups ##STR2## in which R.sup.2 and R.sup.3 independently of one another represent hydrogen or an aliphatic, carbocyclic or araliphatic radical,m denotes an integer from 2 to 10 andn denotes an integer from 0 to 2,whereinm-n is .gtoreq.2.The compounds mentioned are used as photoactive components in radiation-sensitive mixtures.
    Type: Grant
    Filed: January 12, 1990
    Date of Patent: February 26, 1991
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Peter Wilharm, Hans-Joachim Merrem, Georg Pawlowski
  • Patent number: 4927732
    Abstract: A positive-working photosensitive composition is disclosed that comprises a photosensitive compound which is either of the o-quinone diazide type or comprises a photolytic acid donor in combination with a compound containing a C--O--C group, a binder which is soluble or swellable in an aqueous-alkaline solution and a dye of the general formula I ##STR1## The photosensitive composition of the present invention has a higher photosensitivity than comparable compositions containing other dyes.
    Type: Grant
    Filed: October 20, 1988
    Date of Patent: May 22, 1990
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hans-Joachim Merrem, Gerhard Buhr, Ruediger Lenz
  • Patent number: 4842901
    Abstract: A coating solution for producing glassy layers on a substrate comprises a silicic acid ester, an aliphatic alcohol as a solvent, an acid in a catalytically active quantity, and water. The alcohol contains at least 4 carbon atoms and the acid has a pK.sub.a of less than +3. The viscosity of the coating solution is table even at elevated temperatures and the amount of water added is increased. The glassy layers produced from the coating solution exhibit no striations.
    Type: Grant
    Filed: February 2, 1988
    Date of Patent: June 27, 1989
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hans-Joachim Merrem, Werner Graf
  • Patent number: 4765844
    Abstract: The invention relates to solvent systems which are based on water-soluble amino derivatives and propylene glycol components, for removing photoresists. These solvent systems are comprised of(a) from about 10 to 100% by weight of at least one water-soluble amine of the general formula ##STR1## in which R.sup.1, R.sup.2, R.sup.3, R.sup.4 denote H or alkyl groupsn,m denote 0 to 2, ando denotes 1 to 3; and(b) from about 0 to 90% by weight of at least one water-soluble propylene glycol derivative of the general formula ##STR2## in which R.sup.3, R.sup.4 denote H, alkyl or ##STR3## and P denotes 1 to 3.
    Type: Grant
    Filed: October 20, 1986
    Date of Patent: August 23, 1988
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hans-Joachim Merrem, Axel Schmitt
  • Patent number: 4576903
    Abstract: A developer suitable for use with positive photoresists is based on a buffered aqueous-alkaline solution containing non-ionic surfactants and contains in the solution 1-100 ppm of the surfactants, preferably of the ethoxylated-alkylphenol type. The resultant photoresist shows outstanding properties with respect to the resolution and edge sharpness obtainable in the developed resist image and with respect to its developing activity, developing capacity and stability.
    Type: Grant
    Filed: December 21, 1984
    Date of Patent: March 18, 1986
    Assignee: Merck Patent Gesellschaft mit beschrankter Haftung
    Inventors: Winfried Baron, Kurt Marquard, Hans-Joachim Merrem, Raimund Sindlinger, Klaus-Peter Thiel
  • Patent number: 4540650
    Abstract: Photoresists suitable for use for forming relief structures of highly heat-resistant polymers and which contain soluble polymeric precursors which carry radiation-reactive radicals bonded through carboxylic ester groups have an increased light-sensitivity when they also contain at least one radiation-reactive, polymerizable allyl compound which has a boiling point above 180.degree., the allyl group thereof being bonded via an oxygen, sulfur and/or nitrogen atom. The highly heat-resistant polymers which can be prepared by means of these photoresists have excellent chemical, electrical and mechanical properties.
    Type: Grant
    Filed: September 13, 1983
    Date of Patent: September 10, 1985
    Assignee: Merck Patent Gesellschaft mit beschrankter Haftung
    Inventors: Rudolf Klug, Hartmut Hartner, Hans-Joachim Merrem, Karl H. Neisius
  • Patent number: 4539288
    Abstract: An improved development process for relief structures based on radiation-crosslinked polymeric precursors of polymers which are resistant to high temperature in which the development fluid used is an aliphatic or cycloaliphatic ketone having 3 to 7 carbon atoms, is distinguished by rapid and complete removal of soluble polymeric material from the substrate with, at the same time, a minimum amount of attack on the radiation-crosslinked polymeric structures.
    Type: Grant
    Filed: December 15, 1983
    Date of Patent: September 3, 1985
    Assignee: Merck Patent Gesellschaft mit beschrankter Haftung
    Inventors: Hans-Joachim Merrem, Karlheinz Neisius, Rudolf Klug, Hartmut Hartner