Patents by Inventor Hans-Juergen Mann

Hans-Juergen Mann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10634886
    Abstract: In a method for three-dimensionally measuring a 3D aerial image in the region around an image plane during the imaging of a lithography mask, which is arranged in an object plane, a selectable imaging scale ratio in mutually perpendicular directions (x, y) is taken into account. For this purpose, an electromagnetic wavefront of imaging light is reconstructed after interaction thereof with the lithography mask. An influencing variable that corresponds to the imaging scale ratio is included. Finally, the 3D aerial image measured with the inclusion of the influencing variable is output. This results in a measuring method with which lithography masks that are optimized for being used with an anamorphic projection optical unit during projection exposure can also be measured.
    Type: Grant
    Filed: July 27, 2018
    Date of Patent: April 28, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Ulrich Matejka, Christoph Husemann, Johannes Ruoff, Sascha Perlitz, Hans-Jürgen Mann
  • Patent number: 10606048
    Abstract: An imaging optical unit serves within a metrology system for examining a lithography mask. The lithography mask can be arranged in an object field of the imaging optical unit. The object field is defined by two mutually perpendicular object field coordinates. The imaging optical unit has an aperture stop of which the aspect ratio in the direction of the two object field coordinates differs from 1. This results in an imaging optical unit which can be used for the examination of lithography masks that are designed for projection exposure with an anamorphic projection optical unit.
    Type: Grant
    Filed: January 20, 2017
    Date of Patent: March 31, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Johannes Ruoff, Ralf Müller, Susanne Beder, Ulrich Matejka, Hans-Jürgen Mann, Jens Timo Neumann
  • Patent number: 10481500
    Abstract: An imaging optical system has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field and the image field has a through-opening for the passage of the imaging light. A penultimate mirror of the imaging optical system in the beam path of the imaging light between the object field and the image field has no through-opening for the passage of the imaging light. The result is an imaging optical system that provides a combination of small imaging errors, manageable production and a good throughput for the imaging light.
    Type: Grant
    Filed: August 3, 2011
    Date of Patent: November 19, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Hans-Juergen Mann, Wilhelm Ulrich, Erik Loopstra, David R. Shafer
  • Patent number: 10408765
    Abstract: A magnifying imaging optical unit serves for inspecting lithography masks which are used in EUV projection exposure. The imaging optical unit comprises at least two mirrors (M1 to M4) which can be displaced relative to one another for changing a magnification value. According to a further aspect, a magnifying imaging optical unit comprises at least one mirror (M1 to M4) and a magnification value, which can be changed by displacement of at least two mirrors (M1 to M4) relative to one another. Here, the magnification value can be changed between a minimum magnification value, which is greater than 100, and a maximum magnification value, which is greater than 200. An imaging optical unit emerges, which can be adapted to, in particular, mask structures with different sizes.
    Type: Grant
    Filed: August 25, 2015
    Date of Patent: September 10, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Hans-Juergen Mann
  • Publication number: 20190025710
    Abstract: An imaging optical system for a projection exposure system has at least one anamorphically imaging optical element. This allows a complete illumination of an image field in a first direction with a large object-side numerical aperture in this direction, without the extent of the reticle to be imaged having to be enlarged and without a reduction in the throughput of the projection exposure system occurring.
    Type: Application
    Filed: June 18, 2018
    Publication date: January 24, 2019
    Inventor: Hans-Juergen Mann
  • Publication number: 20180357758
    Abstract: In a method for three-dimensionally measuring a 3D aerial image in the region around an image plane during the imaging of a lithography mask, which is arranged in an object plane, a selectable imaging scale ratio in mutually perpendicular directions (x, y) is taken into account. For this purpose, an electromagnetic wavefront of imaging light is reconstructed after interaction thereof with the lithography mask. An influencing variable that corresponds to the imaging scale ratio is included. Finally, the 3D aerial image measured with the inclusion of the influencing variable is output. This results in a measuring method with which lithography masks that are optimized for being used with an anamorphic projection optical unit during projection exposure can also be measured.
    Type: Application
    Filed: July 27, 2018
    Publication date: December 13, 2018
    Inventors: Ulrich Matejka, Christoph Husemann, Johannes Ruoff, Sascha Perlitz, Hans-Jürgen Mann
  • Patent number: 10068325
    Abstract: In a method for three-dimensionally measuring a 3D aerial image in the region around an image plane during the imaging of a lithography mask, which is arranged in an object plane, a selectable imaging scale ratio in mutually perpendicular directions (x, y) is taken into account. For this purpose, an electromagnetic wavefront of imaging light is reconstructed after interaction thereof with the lithography mask. An influencing variable that corresponds to the imaging scale ratio is included. Finally, the 3D aerial image measured with the inclusion of the influencing variable is output. This results in a measuring method with which lithography masks that are optimized for being used with an anamorphic projection optical unit during projection exposure can also be measured.
    Type: Grant
    Filed: January 20, 2017
    Date of Patent: September 4, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Ulrich Matejka, Christoph Husemann, Johannes Ruoff, Sascha Perlitz, Hans-Jürgen Mann
  • Publication number: 20180224585
    Abstract: A reflective optical element and an EUV lithography appliance containing one such element are provided, the appliance displaying a low propensity to contamination. The reflective optical element has a protective layer system includes at least two layers. The optical characteristics of the protective layer system are between those of a spacer and an absorber, or correspond to those of a spacer. The selection of a material with the smallest possible imaginary part and a real part which is as close to 1 as possible in terms of the refractive index leads to a plateau-type reflectivity course according to the thickness of the protective layer system between two thicknesses d1 and d2. The thickness of the protective layer system is selected in such a way that it is less than d2.
    Type: Application
    Filed: February 12, 2018
    Publication date: August 9, 2018
    Inventors: Johann Trenkler, Hans-Juergen Mann, Udo Nothelfer
  • Patent number: 10007187
    Abstract: An imaging optical system for a projection exposure system has at least one anamorphically imaging optical element. This allows a complete illumination of an image field in a first direction with a large object-side numerical aperture in this direction, without the extent of the reticle to be imaged having to be enlarged and without a reduction in the throughput of the projection exposure system occurring.
    Type: Grant
    Filed: February 7, 2017
    Date of Patent: June 26, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Hans-Juergen Mann
  • Publication number: 20180164474
    Abstract: A projection objective with obscurated pupil for microlithography has a first optical surface, which has a first region provided for application of useful light, and at least one second optical surface, which has a second region provided for application of useful light. A beam envelope of the useful light extends between the first region and the second region. At least one tube open on the input side and on the output side in the light propagation direction severs to screen scattered light. The at least one tube is between the first optical surface and the second optical surface. The wall of the tube is opaque in the wavelength range of the useful light. The tube extends in the propagation direction of the useful light over at least a partial length of the beam envelope and circumferentially surrounds the beam envelope.
    Type: Application
    Filed: February 12, 2018
    Publication date: June 14, 2018
    Inventors: Daniel Kraehmer, Aurelian Dodoc, Hans-Juergen Mann, Toralf Gruner
  • Patent number: 9910193
    Abstract: A reflective optical element and an EUV lithography appliance containing one such element are provided, the appliance displaying a low propensity to contamination. The reflective optical element has a protective layer system includes at least two layers. The optical characteristics of the protective layer system are between those of a spacer and an absorber, or correspond to those of a spacer. The selection of a material with the smallest possible imaginary part and a real part which is as close to 1 as possible in terms of the refractive index leads to a plateau-type reflectivity course according to the thickness of the protective layer system between two thicknesses d1 and d2. The thickness of the protective layer system is selected in such a way that it is less than d2.
    Type: Grant
    Filed: October 31, 2014
    Date of Patent: March 6, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Johann Trenkler, Hans-Juergen Mann, Udo Nothelfer
  • Publication number: 20180031815
    Abstract: A projection objective configured to image an object field in an object plane into an image field in an image field plane includes a reflective unit, a first refractive unit, and a second refractive unit. An optical axis of the first refractive unit is parallel to but displaced from an optical axis of the second refractive unit. The reflective unit includes a first curved mirror and a second curved mirror. The second curved mirror is immediately downstream from the first curved mirror in a path of light from the object plane to the image plane. The projection objective is a microlithography projection objective.
    Type: Application
    Filed: August 22, 2017
    Publication date: February 1, 2018
    Inventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Murai Von Buenau, Hans-Juergen Mann, Alexander Epple
  • Patent number: 9772478
    Abstract: A projection objective configured to image an object field in an object plane into an image field in an image field plane includes a reflective unit, a first refractive unit, and a second refractive unit. An optical axis of the first refractive unit is parallel to but displaced from an optical axis of the second refractive unit. The reflective unit includes a first curved mirror and a second curved mirror. The second curved mirror is immediately downstream from the first curved mirror in a path of light from the object plane to the image plane. The projection objective is a microlithography projection objective.
    Type: Grant
    Filed: April 2, 2015
    Date of Patent: September 26, 2017
    Assignee: Carl Zeiss SMT GmbH
    Inventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Murai von Buenau, Hans-Juergen Mann, Alexander Epple
  • Patent number: 9720329
    Abstract: The invention concerns a projection objective of a microlithographic projection exposure apparatus designed for EUV, for imaging an object plane illuminated in operation of the projection exposure apparatus into an image plane. The projection objective has at least one mirror segment arrangement comprising a plurality of separate mirror segments. Associated with the mirror segments of the same mirror segment arrangement are partial beam paths which are different from each other and which respectively provide for imaging of the object plane (OP) into the image plane (IP). The partial beam paths are superposed in the image plane (IP). At least two partial beams which are superposed in the same point in the image plane (IP) were reflected by different mirror segments of the same mirror segment arrangement.
    Type: Grant
    Filed: March 15, 2016
    Date of Patent: August 1, 2017
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Hartmut Enkisch, Stephan Muellender, Hans-Juergen Mann, Rolf Freimann
  • Publication number: 20170146912
    Abstract: An imaging optical system for a projection exposure system has at least one anamorphically imaging optical element. This allows a complete illumination of an image field in a first direction with a large object-side numerical aperture in this direction, without the extent of the reticle to be imaged having to be enlarged and without a reduction in the throughput of the projection exposure system occurring.
    Type: Application
    Filed: February 7, 2017
    Publication date: May 25, 2017
    Inventor: Hans-Juergen Mann
  • Publication number: 20170131528
    Abstract: An imaging optical unit serves within a metrology system for examining a lithography mask. The lithography mask can be arranged in an object field of the imaging optical unit. The object field is defined by two mutually perpendicular object field coordinates. The imaging optical unit has an aperture stop of which the aspect ratio in the direction of the two object field coordinates differs from 1. This results in an imaging optical unit which can be used for the examination of lithography masks that are designed for projection exposure with an anamorphic projection optical unit.
    Type: Application
    Filed: January 20, 2017
    Publication date: May 11, 2017
    Inventors: Johannes Ruoff, Ralf Müller, Susanne Beder, Ulrich Matejka, Hans-Jürgen Mann, Jens Timo Neumann
  • Publication number: 20170132782
    Abstract: In a method for three-dimensionally measuring a 3D aerial image in the region around an image plane during the imaging of a lithography mask, which is arranged in an object plane, a selectable imaging scale ratio in mutually perpendicular directions (x, y) is taken into account. For this purpose, an electromagnetic wavefront of imaging light is reconstructed after interaction thereof with the lithography mask. An influencing variable that corresponds to the imaging scale ratio is included. Finally, the 3D aerial image measured with the inclusion of the influencing variable is output. This results in a measuring method with which lithography masks that are optimized for being used with an anamorphic projection optical unit during projection exposure can also be measured.
    Type: Application
    Filed: January 20, 2017
    Publication date: May 11, 2017
    Inventors: Ulrich Matejka, Christoph Husemann, Johannes Ruoff, Sascha Perlitz, Hans-Jürgen Mann
  • Patent number: 9639004
    Abstract: An imaging optics has at least six mirrors, which image an object field in an object plane in an image field in an image plane. An entry pupil of the imaging optics is arranged in the imaging beam path in front of the object field. At least one of the mirrors has a through-opening for the passage of imaging light. A mechanically accessible pupil, in which an obscuration stop is arranged for the central shading of the pupil of the imaging optics, is located in a pupil plane in the imaging beam path between the object field and a first of the through-openings. A first imaging part beam directly after a second mirror in the imaging beam path after the object field and a second imaging part beam directly after a fourth mirror in the imaging beam path after the object field intersect one another in an intersection region. The result is an imaging optics, in which a handleable combination of small imaging errors, manageable production and a good throughput for the imaging light is achieved.
    Type: Grant
    Filed: August 26, 2011
    Date of Patent: May 2, 2017
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Hans-Juergen Mann
  • Patent number: 9568845
    Abstract: A mirror including a substrate and a reflective coating that includes a first group of layers and a second group of layers arranged between the substrate and the first group of layers. Both the first and second groups of layers include a plurality of alternating first material layers and second material layers, arranged one above another. The refractive index of the first material for radiation in the range of 5-30 nm is greater than the refractive index of the second material in that wavelength range. The first group of layers is configured to have a number of layers that is greater than 20, such that, upon irradiation with radiation having a wavelength in the range of 5-30 nm, less than 20% of the radiation reaches the second group of layers, which has a layer thickness variation for correcting the surface form of the mirror.
    Type: Grant
    Filed: March 12, 2012
    Date of Patent: February 14, 2017
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Martin Rocktaeschel, Hartmut Enkisch, Franz-Josef Stickel, Oliver Natt, Hans-Juergen Mann, Sascha Migura
  • Patent number: 9568832
    Abstract: An imaging optical system for a projection exposure system has at least one anamorphically imaging optical element. This allows a complete illumination of an image field in a first direction with a large object-side numerical aperture in this direction, without the extent of the reticle to be imaged having to be enlarged and without a reduction in the throughput of the projection exposure system occurring.
    Type: Grant
    Filed: May 16, 2016
    Date of Patent: February 14, 2017
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Hans-Juergen Mann