Patents by Inventor Harmen Klaas Van Der Schoot

Harmen Klaas Van Der Schoot has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10747127
    Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
    Type: Grant
    Filed: August 11, 2017
    Date of Patent: August 18, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Frits Van Der Meulen, Erik Johan Arlemark, Hendrikus Herman Marie Cox, Martinus Agnes Willem Cuijpers, Joost De Hoogh, Gosse Charles De Vries, Paul Comé Henri De Wit, Sander Catharina Reinier Derks, Ronald Cornelis Gerardus Gijzen, Dries Vaast Paul Hemschoote, Christiaan Alexander Hoogendam, Adrianus Hendrik Koevoets, Raymond Wilhelmus Louis Lafarre, Alain Louis Claude Leroux, Patrick Willem Paul Limpens, Jim Vincent Overkamp, Christiaan Louis Valentin, Koos Van Berkel, Stan Henricus Van Der Meulen, Jacobus Cornelis Gerardus Van Der Sanden, Harmen Klaas Van Der Schoot, David Ferdinand Vles, Evert Auke Rinze Westerhuis
  • Patent number: 10481510
    Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
    Type: Grant
    Filed: May 8, 2018
    Date of Patent: November 19, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Harmen Klaas Van Der Schoot, Lucas Henricus Johannes Stevens, Maarten Van Kampen
  • Publication number: 20190227445
    Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
    Type: Application
    Filed: August 11, 2017
    Publication date: July 25, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Frits VAN DER MEULEN, Erik Johan ARLEMARK, Hendrikus Herman Marie COX, Martinus Agnes Willem CUIJPERS, Joost DE HOOGH, Gosse Charles DE VRIES, Paul Comé Henri DE WIT, Sander Catharina Reinier DERKS, Ronald Comelis Gerardus GIJZEN, Dries Vaast Paul HEMSCHOOTE, Christiaan Alexander HOOGENDAM, Adrianus Hendrik KOEVOETS, Raymond Wilhelmus Louis LAFARRE, Alain Louis Claude LEROUX, Patrick Willem Paul LIMPENS, Jim Vincent OVERKAMP, Christiaan Louis VALENTIN, Koos VAN BERKEL, Stan Henricus VAN DER MEULEN, Jacobus Comelis Gerardus VAN DER SANDEN, Harmen Klaas VAN DER SCHOOT, David Ferdinand VLES, Evert Auke Rinze WESTERHUIS
  • Publication number: 20180259846
    Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
    Type: Application
    Filed: May 8, 2018
    Publication date: September 13, 2018
    Inventors: Andrei Mikhailovich YAKUNIN, Vadim Yevgenyevich BANINE, Erik Roelof LOOPSTRA, Harmen Klaas VAN DER SCHOOT, Lucas Henricus Johannes STEVENS, Maarten VAN KAMPEN
  • Patent number: 10007197
    Abstract: A sensor system configured to determine a position of a substrate having an edge. The sensor system includes a radiation source arranged to emit a radiation bundle, a reflective element, a detector device and a substrate table having a supporting surface for supporting the substrate. The supporting surface is at least partly along a plane. The radiation source and the detector device are arranged on a first side of the plane. The reflective element is arranged on a second side of the plane other than the first side. The reflective element is arranged to create a reflected bundle by reflecting the radiation bundle. The reflective element is arranged to illuminate the edge with the reflected bundle. The detector device is arranged to receive the reflected bundle.
    Type: Grant
    Filed: March 2, 2015
    Date of Patent: June 26, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Joost Kauffman, Martin Dieter Nico Peters, Petrus Theodorus Rutgers, Martijn Hendrikus Wilhelmus Stopel, Gerard Van Den Eijkel, Harmen Klaas Van Der Schoot, Raimond Visser
  • Patent number: 9989844
    Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
    Type: Grant
    Filed: September 29, 2016
    Date of Patent: June 5, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Harmen Klaas Van Der Schoot, Lucas Henricus Johannes Stevens, Maarten Van Kampen
  • Publication number: 20170017150
    Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
    Type: Application
    Filed: September 29, 2016
    Publication date: January 19, 2017
    Inventors: Andrei Mikhailovich YAKUNIN, Vadim Yevgenyevich BANINE, Erik Roelof LOOPSTRA, Harmen Klaas VAN DER SCHOOT, Lucas Henricus Johannes STEVENS, Maarten VAN KAMPEN
  • Publication number: 20160370716
    Abstract: A sensor system configured to determine a position of a substrate having an edge. The sensor system includes a radiation source arranged to emit a radiation bundle, a reflective element, a detector device and a substrate table having a supporting surface for supporting the substrate. The supporting surface is at least partly along a plane. The radiation source and the detector device are arranged on a first side of the plane. The reflective element is arranged on a second side of the plane other than the first side. The reflective element is arranged to create a reflected bundle by reflecting the radiation bundle. The reflective element is arranged to illuminate the edge with the reflected bundle. The detector device is arranged to receive the reflected bundle.
    Type: Application
    Filed: March 2, 2015
    Publication date: December 22, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Joeri LOF, Joost KAUFFMAN, Martin Dieter Nico PETERS, Petrus Theodorus RUTGERS, Martijn Hendrikus Wilhelmus STOPEL, Gerard VAN DEN EIJKEL, Harmen Klaas VAN DER SCHOOT, Raimond VISSER
  • Patent number: 9494869
    Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.
    Type: Grant
    Filed: December 5, 2012
    Date of Patent: November 15, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Hans Butler, Arno Jan Bleeker, Pieter Renaat Maria Hennus, Martinus Hendricus Henricus Hoeks, Sven Antoin Johan Hol, Harmen Klaas Van Der Schoot, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Marc Wilhelmus Maria Van Der Wijst, Koen Jacobus Johannes Maria Zaal, Theodorus Petrus Maria Cadee, Ruud Antonius Catharina Maria Beerens, Olof Martinus Josephus Fischer, Wilhelmus Henricus Theodorus Maria Aangenent, Niels Johannes Maria Bosch
  • Patent number: 9482960
    Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
    Type: Grant
    Filed: February 14, 2014
    Date of Patent: November 1, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Harmen Klaas Van Der Schoot, Lucas Henricus Johannes Stevens, Maarten Van Kampen
  • Patent number: 9395630
    Abstract: A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles through the membrane. A particle trapping structure is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles from inside the chamber to outside the chamber.
    Type: Grant
    Filed: March 17, 2011
    Date of Patent: July 19, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Harmen Klaas Van Der Schoot, Lucas Henricus Johannes Stevens, Maarten Van Kampen
  • Publication number: 20140340666
    Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.
    Type: Application
    Filed: December 5, 2012
    Publication date: November 20, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Hans Butler, Arno Jan Bleeker, Pieter Renaat Marie Hennus, Martinus Hendricus Henricus Hoeks, Sven Antoin Johan Hol, Harmen Klaas Van Der Schoot, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Marc Wilhelmus Maria Van Der Wijst, Koen Jacobus Johannes Maria Zaal, Theodorus Petrus Maria Cadee, Ruud Antonius Catharina Maria Beerens, Olof Martinus Josephus Fischer, Wilhelmus Henricus Theodorus Maria Aangenent, Niels Johannes Maria Bosch
  • Patent number: 8781775
    Abstract: A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.
    Type: Grant
    Filed: January 31, 2011
    Date of Patent: July 15, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Butler, Emiel Jozef Melanie Eussen, Willem Herman Gertruda Anna Koenen, Engelbertus Antonius Fransiscus Van Der Pasch, Harmen Klaas Van Der Schoot, Marc Wilhelmus Maria Van Der Wijst, Marcus Martinus Petrus Adrianus Vermeulen, Cornelius Adrianus Lambertus De Hoon
  • Publication number: 20140192337
    Abstract: A lithographic apparatus having a programmable patterning device and a projection system. The programmable patterning device is configured to provide a plurality of radiation beams. The projection system has a lens group array configured to project the plurality of radiation beams onto a substrate. The projection system further includes a focus adjuster in an optical path corresponding to a lens group of the lens group array. The focus adjuster has an optical element having substantially zero optical power.
    Type: Application
    Filed: July 24, 2012
    Publication date: July 10, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Arno Jan Bleeker, Erik Roelof Loopstra, Harmen Klaas Van Der Schoot, Danny Maria Hubertus Philips, Ruud Antonius Catharina Maria Beerens
  • Publication number: 20140160452
    Abstract: A lithographic apparatus is disclosed that includes a modulator to modulate a plurality of beams according to a desired pattern and a donor structure on to which the modulated beams impinge. The donor structure is configured such that the impinging modulated beams cause a donor material to be transferred from the donor structure to the substrate.
    Type: Application
    Filed: July 20, 2012
    Publication date: June 12, 2014
    Applicant: ASML Netherlands B.V
    Inventors: Pieter Willem Herman De Jager, Vadim Yevgenyevich Banine, Arno Jan Bleeker, Harmen Klaas Van Der Schoot, Lucas Henricus Johnannes Stevens, Johannes Petrus Martinus Bernardus Vermeulen, Sander Frederik Wuister
  • Publication number: 20130088699
    Abstract: A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles through the membrane. A particle trapping structure is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles from inside the chamber to outside the chamber.
    Type: Application
    Filed: March 17, 2011
    Publication date: April 11, 2013
    Applicant: ASML Netherlands B.V.
    Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Harmen Klaas Van Der Schoot, Lucas Henricus Johannes Stevens, Maarten Van Kampen
  • Patent number: 8411252
    Abstract: A substrate handler is provided. The substrate handler includes a support surface configured to carry a substrate and a pre-conditioning unit configured to pre-condition the substrate. The substrate handler is configured to move the substrate relative to a substrate table.
    Type: Grant
    Filed: December 16, 2009
    Date of Patent: April 2, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Hernes Jacobs, Bernardus Antonius Johannes Luttikhuis, Harmen Klaas Van Der Schoot, Petrus Matthijs Henricus Vosters
  • Patent number: 8264670
    Abstract: The invention provides a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a transmissive patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the patterning device support is configured to hold a patterning device and wherein the lithographic apparatus includes a clamping device, the clamping device being configured to clamp the patterning device at the top side.
    Type: Grant
    Filed: January 31, 2006
    Date of Patent: September 11, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Bernardus Antonius Johannes Luttikhuis, Harmen Klaas Van Der Schoot, Fransicus Mathijs Jacobs
  • Patent number: 8174680
    Abstract: An apparatus, method, and system is provided to condition a substrate. The apparatus can include a substrate handler, an array of diodes, and a projection system. The substrate handler can include a conditioning device, a float device, and a displacing device. The array of diodes can be configured to provide a patterned radiation beam, where the projection system projects the patterned radiation beam onto a target portion of a conditioned substrate.
    Type: Grant
    Filed: July 30, 2009
    Date of Patent: May 8, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Harmen Klaas Van Der Schoot, Hernes Jacobs, Bernardus Antonius Johannes Luttikhuis, Petrus Matthijs Henricus Vosters, Johannes Martinus Andreas Hazenberg, Aart Adrianus Van Beuzekom
  • Publication number: 20110208459
    Abstract: A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.
    Type: Application
    Filed: January 31, 2011
    Publication date: August 25, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hans Butler, Emiel Jozef Melanie Eussen, Willem Herman Gertruda Anna Koenen, Engelbertus Antonius Fransiscus Van Der Pasch, Harmen Klaas Van Der Schoot, Marc Wilhelmus Maria Van Der Wijst, Marcus Martinus Petrus Adrianus Vermeulen, Cornelius Adrianus Lambertus De Hoon