Patents by Inventor Haruyoshi Osaki
Haruyoshi Osaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6383708Abstract: A positive resist composition comprising, in admixture, an alkali-soluble resin, a quinone diazide compound and a mixed solvent of (B) at least one organic solvent selected from the group consisting of &ggr;-butyrolactone, 3-methoxybutanol and cyclohexanone and (A) an organic solvent other than the solvents (B) which does not have simultaneously an alkylcarbonyl group and an alkoxy group in a molecule and has a boiling point of from 140 to 180° C. under atmospheric pressure (B), which composition has a large &ggr;-value and provides an improved profile and a large depth of focus.Type: GrantFiled: December 2, 1993Date of Patent: May 7, 2002Assignee: Sumitomo Chemical Company, LimitedInventors: Yasunori Uetani, Yasunori Doi, Kazuhiko Hashimoto, Haruyoshi Osaki, Ryotaro Hanawa
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Patent number: 5965748Abstract: N-(10-camphorsulfonyloxy)-succinimide represented by the formula (I): ##STR1## is provided, which can be produced by reacting N-hydroxysuccinimide with 10-camphorsulfonic acid, a salt thereof or a halide thereof. Using the compound as an acid generating agent, a resist composition can be obtained by including an alkali-soluble resin having a protective group removable by the action of an acid; and the resist composition is excellent in heat resistance, ratio of residual film thickness after developing, uniformity of film thickness, profile, photospeed and resolution and is improved in the time delay effect and attachment of pattern.Type: GrantFiled: April 3, 1998Date of Patent: October 12, 1999Assignee: Sumitomo Chemical Company, LimitedInventors: Akira Kamabuchi, Naoki Takeyama, Jun Tomioka, Haruyoshi Osaki
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Patent number: 5866724Abstract: A positive photoresist compositions comprising, as a photosensitizer, a quinonediazide sulfonic acid ester of a phenol compound represented by the following formula (I): ##STR1## wherein Q.sup.1, Q.sup.2, Q.sup.3, Q.sup.4, Q.sup.5, Q.sup.6, Q.sup.7, Q.sup.8, Q.sup.9 and Q.sup.10 independently represent hydrogen, alkyl having 1-6 carbon atoms or phenyl, or Q.sup.1 and Q.sup.2, Q.sup.3 and Q.sup.4, Q.sup.5 and Q.sup.6, Q.sup.7 and Q.sup.8, or Q.sup.9 and Q.sup.10 may form a cycloalkane ring having 6 or less carbon atoms together with a carbon atoms to which they are connected, R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8, R.sup.9, R.sup.10, R.sup.11, R.sup.12, R.sup.13, R.sup.14, R.sup.15 and R.sup.16 independently represent hydrogen, hydroxyl, alkyl having 1-6 carbon atoms or phenyl; andm and n independently represent a number of 0 or 1;and an alkali soluble resin;and a quinonediazide sulfonic acid ester of a phenol compound of formula (I).Type: GrantFiled: October 17, 1996Date of Patent: February 2, 1999Assignee: Sumitomo Chemical Company, LimitedInventors: Koji Ichikawa, Haruyoshi Osaki, Hiroki Inoue
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Patent number: 5861229Abstract: A positive resist composition which comprises a 1,2-quinone diazide compound and an alkali-soluble resin containing a polyphenol compound (I) of the general formula:X--.alpha.--H (I)wherein x is a group of the formula: ##STR1## and .alpha. is a divalent group which comprises a repeating unit of the formula: ##STR2## in which n is a number of not less than 1; a, b, c, d, e and f are the same or different and a number of 0-3, provided that d+f is not less than 1; R.sub.1, R.sub.2 and R.sub.3 are the same or different and a C.sub.1 -C.sub.18 alkyl group, a C.sub.1 -C.sub.18 alkoxy group, a carboxyl group or a halogen atom; R.sub.4 is a hydrogen atom, a C.sub.1 -C.sub.18 alkyl group or an aryl group, which resist composition is sensitive to radiation and has good balance of sensitivity, resolving power and heat resistance.Type: GrantFiled: September 22, 1992Date of Patent: January 19, 1999Assignee: Sumitomo Chemical Company, LimitedInventors: Haruyoshi Osaki, Fumio Oi, Yasunori Uetani, Makoto Hanabata, Takeshi Hioki
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Patent number: 5843616Abstract: A positive resist composition sensitive to radiations such as ultraviolet rays, far ultraviolet rays, which comprises;an o-quinonediazide compound; anda novolac resin(1) obtained by allowing an aromatic aldehyde of the formula(I) ##STR1## wherein R.sub.4 to R.sub.6 represents hydrogen, alkyl, cycloalkyl, alkoxy, alkenyl or aryl, k'0 represents an integer not smaller than 0 and p represents 1, 2 or 3, to react with a phenol compound of the formula (II) ##STR2## wherein R.sub.7 to R.sub.9 represents hydrogen, hydroxy, alkyl, cycloalkyl, alkoxy, alkenyl or aryl, provided that at least one of R.sub.7 to R.sub.9 is cycloalkyl having 6 or less carbon atoms, in the presence of an acid catalyst to obtain a reaction product(1) containing low molecular weight ingredients;and, then, allowing the reaction product(1) to further react with a phenol compound(1) and formaldehyde.Type: GrantFiled: April 10, 1995Date of Patent: December 1, 1998Assignee: Sumitomo Chemical Company, Ltd.Inventors: Kunishige Edamatsu, Yuji Yoshida, Kazuhiko Hashimoto, Haruyoshi Osaki
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Patent number: 5807656Abstract: A polyhydroxy compound represented by the following formula (I): ##STR1## and a positive resist composition which comprises an alkali-soluble resin, a quinonediazide sulfonic acid ester, and a polyhydroxy compound of formula (I) or a polyhydroxy compound represented by the following formula (C): ##STR2## which is satisfactory in properties such as sensitivity, resolution, .tau.-value and peeling off resistance.Type: GrantFiled: September 4, 1996Date of Patent: September 15, 1998Assignee: Sumitomo Chemical Company, LimitedInventors: Koji Ichikawa, Haruyoshi Osaki, Yasunori Uetani, Yoshiyuki Takata
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Patent number: 5792586Abstract: The present invention provides a positive photoresist composition comprising a 1,2-naphthoquinonediazide compound and a novolac resin obtained through a condensation reaction between an aldehyde compound and a phenol compound represented by the following general formula (I): ##STR1## wherein R.sub.5, R.sub.6 and R.sub.7 each independently represents hydrogen atom, hydroxyl group or alkyl, cycloalkyl, alkoxy or alkenyl group having 6 or less carbon atoms or aryl group, provided that at least one of R.sub.5, R.sub.6 and R.sub.7 represents a cycloalkyl group having 6 or less carbon atoms. The composition of the present invention is excellent in the balance between properties such as sensitivity, resolution, heat resistance, profile, depth of focus, etc. and free from scum.Type: GrantFiled: November 3, 1994Date of Patent: August 11, 1998Assignee: Sumitomo Chemical Company, LimitedInventors: Kazuhiko Hashimoto, Haruyoshi Osaki, Yasunori Uetani
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Patent number: 5792585Abstract: A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, 1, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.Type: GrantFiled: March 25, 1994Date of Patent: August 11, 1998Assignee: Sumitomo Chemical Company, LimitedInventors: Ayako Ida, Haruyoshi Osaki, Takeshi Hioki, Yasunori Doi, Yasunori Uetani, Ryotaro Hanawa
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Patent number: 5783355Abstract: A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, 1, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.Type: GrantFiled: June 14, 1995Date of Patent: July 21, 1998Assignee: Sumitomo Chemical Company, LimitedInventors: Ayako Ida, Haruyoshi Osaki, Takeshi Hioki, Yasunori Doi, Yasunori Uetani, Ryotaro Hanawa
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Patent number: 5736292Abstract: A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, l, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.Type: GrantFiled: June 14, 1995Date of Patent: April 7, 1998Assignee: Sumitomo Chemical Company, LimitedInventors: Ayako Ida, Haruyoshi Osaki, Takeshi Hioki, Yasunori Doi, Yasunori Uetani, Ryotaro Hanawa
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Patent number: 5726217Abstract: A tetraphenol compound represented by the formula (I): ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 represent hydrogen 1,2-naphthoquinonediazide-4-sulfonyl or 1,2-naphthoquinonediazide-5-sulfonyl and a method for producing the compound are provided, and the compound can be used as a photosensitizer for a positive resist which exhibits superior properties.Type: GrantFiled: March 8, 1996Date of Patent: March 10, 1998Assignee: Sumitomo Chemical Company, LimitedInventors: Koji Ichikawa, Haruyoshi Osaki, Jun Tomioka
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Patent number: 5468590Abstract: A positive resist composition containing a quinone diazide compound and an alkali-soluble resin which contains a resin (A) obtained by a condensation reaction of an aldehyde compound, at least one phenol compound of the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are independently a hydrogen atom, or a C.sub.1 -C.sub.4 alkyl or alkoxy group, and j is 1 or 2, and at least one compound of the formula: ##STR2## wherein R'.sub.1, R'.sub.2, R'.sub.3, R'.sub.4, R'.sub.5 and R'.sub.6 are independently a hydrogen atom, or a C.sub.1 -C.sub.4 alkyl or alkoxy group, R'.sub.7 is a hydrogen, a C.sub.1 -C.sub.4 alkyl group or an aryl group, and k, m and n are independently 0, 1 or 2 provided that a sum of k, m and n is larger than 2, which composition is excellent in balance among various properties such as a profile, a sensitivity, heat resistance and a depth of focus.Type: GrantFiled: November 29, 1994Date of Patent: November 21, 1995Assignee: Sumitomo Chemical Company, LimitedInventors: Kazuhiko Hashimoto, Haruyoshi Osaki, Chinehito Ebina, Kyoko Nagase, Hiroshi Moriuma, Yasunori Uetani
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Patent number: 5451484Abstract: A positive resist composition comprising a quinonediazide compound and an alkali-soluble resin containing resin (A) obtainable through a condensation reaction of at least one compound represented by the general formula (I): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and k represents 1 or 2, at least one polyphenol compound represented by the general formula (II): ##STR2## wherein R.sub.4 ' to R.sub.6 ' each represent a hydrogen atom or an alkyl or alkoxy group and n represents 1 or 2, with an aldehyde compound. This positive resist composition is excellent in properties such as profile, resolution, heat resistance, etc.Type: GrantFiled: May 27, 1993Date of Patent: September 19, 1995Assignee: Sumitomo Chemical Company, Ltd.Inventors: Kyoko Nagase, Haruyoshi Osaki, Hiroshi Moriuma
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Patent number: 5429904Abstract: A positive resist composition comprising a quinonediazide compound and an alkali-soluble resin containing resin (A) obtainable through a condensation reaction of at least one compound represented by the general formula (I): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and k represents 1 or 2, at least one polyphenol compound represented by the general formula ( II ): ##STR2## wherein R.sub.4 ' to R.sub.6 ' each represent a hydrogen atom or an alkyl or alkoxy group and n represents 1 or 2, with an aldehyde compound. This positive resist composition is excellent in properties such as profile, resolution, heat resistance, etc.Type: GrantFiled: May 27, 1993Date of Patent: July 4, 1995Assignee: Sumitomo Chemical Company, Ltd.Inventors: Kyoko Nagase, Haruyoshi Osaki, Kazuhiko Hashimoto, Hiroshi Moriuma
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Patent number: 5395727Abstract: A novolak resin made from a carbonyl compound and a specific phenol compound, which resin has good properties, in particular, as a base resin of a photoresist.Type: GrantFiled: November 29, 1993Date of Patent: March 7, 1995Assignee: Sumitomo Chemical Company, LimitedInventors: Yasunori Uetani, Haruyoshi Osaki, Naoki Takeyama, Yuji Ueda, Hiromi Ueki, Takehiro Kusumoto
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Patent number: 5336583Abstract: A positive resist composition containing, in admixture, an alkali-soluble resin, a quinone diazide compound and a mixed solvent of ethyl lactate and at least one solvent selected from the group consisting of (a) n-amyl acetate and (b) 2-heptanone in a weight ratio of 5:95 to 80:20, which composition has a good coating properties and provides an improved profile and a large depth of focus.Type: GrantFiled: December 6, 1993Date of Patent: August 9, 1994Assignee: Sumitomo Chemical Company, LimitedInventors: Yasunori Uetani, Yasunori Doi, Kazuhiko Hashimoto, Haruyoshi Osaki, Ryotaro Hanawa
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Patent number: 5326665Abstract: A positive type resist composition comprising an alkali-soluble resin and a quinonediazide compound, wherein the alkali-soluble resin containing resin (A) is obtainable through a condensation reaction with at least one phenol compound represented by the following general formula (I): ##STR1## wherein R.sub.1 to R.sub.3 independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and k represents 1 or 2, at least one compound represented by the following general formula (II): ##STR2## wherein R.sub.4 represents a hydrogen atom, an alkyl group having 1-4 carbon atoms or a phenyl group, R.sub.5 to R.sub.7 independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and n represents 1 or 2, and an aldehyde compound. This composition is excellent in the balance between performances such as sensitivity, heat resistance and profile, and is free from scum.Type: GrantFiled: March 1, 1993Date of Patent: July 5, 1994Assignee: Sumitomo Chemical Company, LimitedInventors: Haruyoshi Osaki, Hiroshi Moriuma, Yasunori Uetani
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Patent number: 5288587Abstract: A positive resist composition which comprises a 1,2-quinone diazide compound and an alkali-soluble resin containing a polyphenol compound (I) of the general formula: ##STR1## wherein R is a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, and n is a number of 0 to 3, which has good sensitivity, improved resolution and heat resistance.Type: GrantFiled: March 31, 1993Date of Patent: February 22, 1994Assignee: Sumitomo Chemical Co., Ltd.Inventors: Haruyoshi Osaki, Yasunori Uetani
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Patent number: 5188920Abstract: A positive resist composition comprising a radiation-sensitive component and an alkali-soluble resin and a phenol compound of the formula: ##STR1## wherein R is a hydrogen atom, a lower alkyl group or a phenyl group, R' is an alkyl group or an alkoxy group, and n is a number of 0 to 3, which has well balanced good properties such as sensitivity, resolution, heat resistance and adhesiveness.Type: GrantFiled: June 10, 1991Date of Patent: February 23, 1993Assignee: Sumitomo Chemical Company, LimitedInventors: Hiroshi Moriuma, Haruyoshi Osaki, Takeshi Hioki, Yasunori Uetani
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Patent number: 4812551Abstract: A novolak resin for a positive photoresist is provided herein, which resin is produced by the addition condensation reaction of a phenol with formaldehyde. This novolak resin has improved heat resistant and sensitivity properties and the thickness retention of the novolak resins are very high.Type: GrantFiled: November 9, 1987Date of Patent: March 14, 1989Assignee: Sumitomo Chemical Company, LimitedInventors: Fumio Oi, Haruyoshi Osaki, Akihiro Furuta, Yukikazu Uemura, Takao Ninomiya, Yasunori Uetani, Makoto Hanabata