Patents by Inventor Haruzo Miyashita

Haruzo Miyashita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9581513
    Abstract: A diaphragm-type pressure gauge which is attached to a vessel to be measured and measures a pressure by introducing a gas inside the vessel includes a housing into which the gas is introduced, and a sensor unit which is arranged in the housing, and includes a diaphragm electrode, a measurement surface of which is arranged parallel to an introduction direction of the gas. When the housing is attached to the vessel, the measurement surface of the diaphragm electrode is arranged parallel to a direction of gravitational force.
    Type: Grant
    Filed: April 3, 2014
    Date of Patent: February 28, 2017
    Assignee: CANON ANELVA CORPORATION
    Inventor: Haruzo Miyashita
  • Patent number: 9383284
    Abstract: A pressure gauge includes a first sensor for detecting a pressure in a first range, a second sensor for detecting a pressure in a second range, and a processing unit for determining a pressure value based on outputs from the first sensor and the second sensor. The first and the second ranges have an overlapping range, an upper limit of the second range is higher than that of the first range, the processing unit determines a correction value based on outputs from the first sensor and the second sensor when a pressure falls within the overlapping range, and the processing unit determines a pressure value based on an output from the second sensor and the correction value, when measuring, by using the second sensor, a pressure in the second range, higher than that of the first pressure range.
    Type: Grant
    Filed: April 3, 2014
    Date of Patent: July 5, 2016
    Assignee: CANON ANELVA CORPORATION
    Inventor: Haruzo Miyashita
  • Publication number: 20140208859
    Abstract: A pressure gauge includes a first sensor for detecting a pressure in a first range, a second sensor for detecting a pressure in a second range, and a processing unit for determining a pressure value based on outputs from the first sensor and the second sensor. The first and the second ranges have an overlapping range, an upper limit of the second range is higher than that of the first range, the processing unit determines a correction value based on outputs from the first sensor and the second sensor when a pressure falls within the overlapping range, and the processing unit determines a pressure value based on an output from the second sensor and the correction value, when measuring, by using the second sensor, a pressure in the second range, higher than that of the first pressure range.
    Type: Application
    Filed: April 3, 2014
    Publication date: July 31, 2014
    Applicant: CANON ANELVA CORPORATION
    Inventor: Haruzo Miyashita
  • Publication number: 20140208860
    Abstract: A diaphragm-type pressure gauge which is attached to a vessel to be measured and measures a pressure by introducing a gas inside the vessel includes a housing into which the gas is introduced, and a sensor unit which is arranged in the housing, and includes a diaphragm electrode, a measurement surface of which is arranged parallel to an introduction direction of the gas. When the housing is attached to the vessel, the measurement surface of the diaphragm electrode is arranged parallel to a direction of gravitational force.
    Type: Application
    Filed: April 3, 2014
    Publication date: July 31, 2014
    Applicant: CANON ANELVA CORPORATION
    Inventor: Haruzo MIYASHITA
  • Patent number: 8230746
    Abstract: The present invention allows manufacturing of a capacitive diaphragm pressure gauge and a Pirani pressure gauge on a single silicon substrate, which makes it possible to reduce the manufacturing cost by the miniaturization of products and mass production. According to an embodiment of the present invention, the manufacturing method of a combined type pressure gauge is a manufacturing method of a combined type pressure gauge including a capacitive diaphragm pressure gauge and a Pirani pressure gauge, the method including a groove-forming step of forming a first groove portion and a second groove portion on a first surface side of a silicon substrate by etching, and a bonding step to bond a glass substrate to the silicon substrate so as to cover the first groove portion and the second groove portion on the first surface side of the silicon substrate.
    Type: Grant
    Filed: February 3, 2011
    Date of Patent: July 31, 2012
    Assignee: Canon Anelva Corporation
    Inventor: Haruzo Miyashita
  • Publication number: 20110209554
    Abstract: The present invention allows manufacturing of a capacitive diaphragm pressure gauge and a Pirani pressure gauge on a single silicon substrate, which makes it possible to reduce the manufacturing cost by the miniaturization of products and mass production. According to an embodiment of the present invention, the manufacturing method of a combined type pressure gauge is a manufacturing method of a combined type pressure gauge including a capacitive diaphragm pressure gauge and a Pirani pressure gauge, the method including a groove-forming step of forming a first groove portion and a second groove portion on a first surface side of a silicon substrate by etching, and a bonding step to bond a glass substrate to the silicon substrate so as to cover the first groove portion and the second groove portion on the first surface side of the silicon substrate.
    Type: Application
    Filed: February 3, 2011
    Publication date: September 1, 2011
    Applicant: CANON ANELVA CORPORATION
    Inventor: Haruzo Miyashita
  • Patent number: 7841239
    Abstract: In an electrostatic capacitance diaphragm vacuum gauge, a diaphragm and a detection electrode opposing the diaphragm are arranged in a vacuum. The electrostatic capacitance diaphragm vacuum gauge measures pressure by measuring the change degree of an electrostatic capacitance between the diaphragm and detection electrode. The electrostatic capacitance diaphragm vacuum gauge includes atmospheric pressure variation factor detection units which detect atmospheric pressure variation factors as external factors that varies the pressure of the vacuum. The pressure of the vacuum is measured by subtracting information detected by the atmospheric pressure variation factor detection units.
    Type: Grant
    Filed: March 16, 2009
    Date of Patent: November 30, 2010
    Assignee: Canon Anelva Technix Corporation
    Inventor: Haruzo Miyashita
  • Publication number: 20100154552
    Abstract: A capacitance diaphragm gauge includes an inclination angle sensor which detects the inclination angle of the gauge. The pressure dependences of capacitance obtained when the capacitance diaphragm gauge is mounted on a vacuum apparatus at the first inclination angle (+90°), the second inclination angle (0°), and the third inclination angle (?90°) are stored in a storage unit in advance. A pressure measurement value is then corrected based on the inclination angle information detected by the inclination angle sensor and the capacitance-pressure characteristic data is actually measured at the first, second and third inclination angles, and stored in the gauge.
    Type: Application
    Filed: December 23, 2009
    Publication date: June 24, 2010
    Applicant: CANON ANELVA TECHNIX CORPORATION
    Inventor: Haruzo Miyashita
  • Publication number: 20090235752
    Abstract: In an electrostatic capacitance diaphragm vacuum gauge, a diaphragm and a detection electrode opposing the diaphragm are arranged in a vacuum. The electrostatic capacitance diaphragm vacuum gauge measures pressure by measuring the change degree of an electrostatic capacitance between the diaphragm and detection electrode. The electrostatic capacitance diaphragm vacuum gauge includes atmospheric pressure variation factor detection units which detect atmospheric pressure variation factors as external factors that varies the pressure of the vacuum. The pressure of the vacuum is measured by subtracting information detected by the atmospheric pressure variation factor detection units.
    Type: Application
    Filed: March 16, 2009
    Publication date: September 24, 2009
    Applicant: CANON ANELVA TECHNIX CORPORATION
    Inventor: Haruzo Miyashita
  • Patent number: 7270009
    Abstract: A diaphragm pressure sensor includes a first insulating substrate, a conductive substrate with a diaphragm, and a second insulating substrate with a gas inlet are bonded so as to form a pressure reference room between the diaphragm and the first insulating substrate and a pressure measuring room between the diaphragm and the second insulating substrate. The deformation of the diaphragm caused by the pressure difference between the pressure measuring room and the pressure reference room is measured to obtain the pressure of a space which is communicated with the pressure measuring room through the gas inlet. Furthermore, a plate is adhered to a surface of at least one of the first and second insulating substrates and the plate has a lower thermal expansion rate in an ambient temperature than that of the insulating substrate to which the plate is adhered.
    Type: Grant
    Filed: February 10, 2006
    Date of Patent: September 18, 2007
    Assignee: Canon Anelva Technix Corporation
    Inventor: Haruzo Miyashita
  • Publication number: 20060174710
    Abstract: A diaphragm pressure sensor includes a first insulating substrate, a conductive substrate with a diaphragm, and a second insulating substrate with a gas inlet are bonded so as to form a pressure reference room between the diaphragm and the first insulating substrate and a pressure measuring room between the diaphragm and the second insulating substrate. The deformation of the diaphragm caused by the pressure difference between the pressure measuring room and the pressure reference room is measured to obtain the pressure of a space which is communicated with the pressure measuring room through the gas inlet. Furthermore, a plate is adhered to a surface of at least one of the first and second insulating substrates and the plate has a lower thermal expansion rate in an ambient temperature than that of the insulating substrate to which the plate is adhered.
    Type: Application
    Filed: February 10, 2006
    Publication date: August 10, 2006
    Applicant: Canon ANELVA Technix Corporation
    Inventor: Haruzo Miyashita
  • Patent number: 6948374
    Abstract: A capacitive pressure sensor and its manufacturing method can simplify the alignment and the bonding process in a vacuum, and stably carry out the bonding process. The capacitive pressure sensor includes an insulating, first substrate with a capacitance electrode, a second substrate which has a diaphragm electrode so as to separate a vacuum chamber and a pressure-measuring chamber on respective surfaces, and an insulating, third substrate with a gas inlet. The substrates are bonded in a manner that the capacitance electrode faces the diaphragm electrode and the pressure-measuring chamber leads to the gas inlet. In addition, a getter chamber is formed in the same surface of the second substrate as the pressure-measuring chamber, and the getter chamber is connected to the vacuum chamber.
    Type: Grant
    Filed: February 17, 2004
    Date of Patent: September 27, 2005
    Assignee: Anelva Corporation
    Inventor: Haruzo Miyashita
  • Patent number: 6935181
    Abstract: A capacitive vacuum sensor includes an elastic diaphragm electrode and a rigid fixed electrode opposite the elastic diaphragm electrode. An internal space is defined between the elastic diaphragm electrode and the rigid fixed electrode. The elastic diaphragm electrode deflects elastically in response to any change in the pressure of a gas applied on the elastic diaphragm electrode, and the capacitive vacuum sensor is responsive to any change in the capacitance between the elastic diaphragm electrode and the rigid fixed electrode that may occur in accordance with the deflection of the elastic diaphragm electrode so that it can measure the pressure of the gas. The vacuum sensor can include an anticorrosive diaphragm electrode that can resist the corrosive action of the reactive gas when it is exposed to such gas, and can be fabricated by the micromachining technology.
    Type: Grant
    Filed: May 11, 2004
    Date of Patent: August 30, 2005
    Assignees: Anelva Corporation
    Inventors: Haruzo Miyashita, Yasuyuki Kitamura, Masayoshi Esashi
  • Patent number: 6912910
    Abstract: A pressure sensor includes a capacitive pressure sensor chip mounted with the intervention of a sealing member on a base adaptor so as to be detachable. The sensor chip being constructed in a manner that a second substrate with a diaphragm electrode is placed between a first substrate with a fixed electrode and a third substrate with a pressure inlet and is bonded to the first and the third substrate so as to overlap the fixed electrode, the diaphragm electrode and the pressure inlet with a prescribed gap between the fixed electrode and the diaphragm electrode. Moreover, the third substrate is larger than the second substrate to make place which extends outside the second substrate and plays a role as a sealing surface to be in contact with the sealing member, and the sealing surface is pressed to the base adaptor with the intervention of the sealing member.
    Type: Grant
    Filed: December 19, 2003
    Date of Patent: July 5, 2005
    Assignee: Anelva Corporation
    Inventor: Haruzo Miyashita
  • Publication number: 20040206185
    Abstract: A capacitive vacuum sensor includes an elastic diaphragm electrode and a rigid fixed electrode opposite the elastic diaphragm electrode. An internal space is defined between the elastic diaphragm electrode and the rigid fixed electrode. The elastic diaphragm electrode deflects elastically in response to any change in the pressure of a gas applied on the elastic diaphragm electrode, and the capacitive vacuum sensor is responsive to any change in the capacitance between the elastic diaphragm electrode and the rigid fixed electrode that may occur in accordance with the deflection of the elastic diaphragm electrode so that it can measure the pressure of the gas. The vacuum sensor can include an anticorrosive diaphragm electrode that can resist the corrosive action of the reactive gas when it is exposed to such gas, and can be fabricated by the micromachining technology.
    Type: Application
    Filed: May 11, 2004
    Publication date: October 21, 2004
    Inventors: Haruzo Miyashita, Yasuyuki Kitamura, Masayoshi Esashi
  • Publication number: 20040182165
    Abstract: A capacitive pressure sensor and its manufacturing method can simplify the alignment and the bonding process in a vacuum, and stably carry out the bonding process. The capacitive pressure sensor includes an insulating, first substrate with a capacitance electrode, a second substrate which has a diaphragm electrode so as to separate a vacuum chamber and a pressure-measuring chamber on respective surfaces, and an insulating, third substrate with a gas inlet. The substrates are bonded in a manner that the capacitance electrode faces the diaphragm electrode and the pressure-measuring chamber leads to the gas inlet. In addition, a getter chamber is formed in the same surface of the second substrate as the pressure-measuring chamber, and the getter chamber is connected to the vacuum chamber.
    Type: Application
    Filed: February 17, 2004
    Publication date: September 23, 2004
    Applicant: Anelva Corporation
    Inventor: Haruzo Miyashita
  • Publication number: 20040129947
    Abstract: A pressure sensor includes a capacitive pressure sensor chip mounted with the intervention of a sealing member on a base adaptor so as to be detachable. The sensor chip being constructed in a manner that a second substrate with a diaphragm electrode is placed between a first substrate with a fixed electrode and a third substrate with a pressure inlet and is bonded to. the first and the third substrate so as to overlap the fixed electrode, the diaphragm electrode and the pressure inlet with a prescribed gap between the fixed electrode and the diaphragm electrode. Moreover, the third substrate is larger than the second substrate to make place which extends outside the second substrate and plays a role as a sealing surface to be in contact with the sealing member, and the sealing surface is pressed to the base adaptor with the intervention of the sealing member.
    Type: Application
    Filed: December 19, 2003
    Publication date: July 8, 2004
    Applicant: Anelva Corporation
    Inventor: Haruzo Miyashita
  • Patent number: 6598483
    Abstract: A capacitive vacuum sensor includes a non-conducting substrate, a plurality of fixed electrodes on the non-conducting substrate, and a diaphragm electrode formed by a plurality of elastic structures, each of the elastic structures being arranged to oppose a respective one of the fixed electrodes and having a different physical size (area) that is the same as that of each corresponding fixed electrode. More specifically, the areas of the elastic structures have a specific relationship between them, as defined by a specific ratio, and the areas may differ successively from each other according to the specific ratio. The capacitive vacuum sensor further includes compensation electrodes that are not sensitive to any change in the capacitance that may occur in response to any change in the pressure, but is only sensitive to any change in the capacitance that may occur in response to any change in the temperature.
    Type: Grant
    Filed: March 9, 2001
    Date of Patent: July 29, 2003
    Assignees: Anelva Corporation
    Inventors: Haruzo Miyashita, Masayoshi Esashi
  • Publication number: 20020019711
    Abstract: The present invention concerns the capacitive vacuum sensor that includes an elastic diaphragm electrode and rigid fixed electrodes disposed to face opposite the elastic diaphragm electrode, with an internal space being delimited between the elastic diaphragm electrode and rigid fixed electrodes, wherein the elastic diaphragm electrode deflects elastically in response to any change in the pressure of a gas applied on the said elastic diaphragm electrode, and wherein the capacitive vacuum sensor is responsive to any change in the capacitance between the elastic diaphragm electrode and rigid fixed electrodes that may occur in accordance with the deflection of the elastic diaphragm electrode so that it can measure the pressure of the gas.
    Type: Application
    Filed: March 6, 2001
    Publication date: February 14, 2002
    Inventors: Haruzo Miyashita, Yasuyuki Kitamura, Masayoshi Esashi
  • Publication number: 20020011114
    Abstract: A capacitive vacuum sensor includes a single vacuum sensor device that is capable of measuring a wide range of pressures. The vacuum sensor can measure the pressures with a high reliability by providing an efficient means for compensating any error in measuring the pressure that may occur if the components of the vacuum sensor device are subject to the thermal expansion or contraction that may occur in response to any change in the surrounding temperature.
    Type: Application
    Filed: March 9, 2001
    Publication date: January 31, 2002
    Inventors: Haruzo Miyashita, Masayoshi Esashi