Patents by Inventor Hayato Namai

Hayato Namai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160370700
    Abstract: A photoresist composition containing (A) a polymer having a structural unit (I) that includes an acid-labile group, and (I) a compound represented by the following formula (1). In the following formula (1), R1, R2, R3 and R represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. X represents a single bond, an oxygen atom or —NRa—. Ra represents a hydrogen atom, a hydroxy group or a monovalent organic group having 1 to 20 carbon atoms, and optionally taken together represents a ring structure by binding with R each other. A? represents —SO3? or —CO2?. M+ represents a monovalent onium cation.
    Type: Application
    Filed: August 31, 2016
    Publication date: December 22, 2016
    Applicant: JSR CORPORATION
    Inventors: Hayato NAMAI, Norihiko IKEDA, Takanori KAWAKAMI
  • Publication number: 20160363859
    Abstract: A radiation-sensitive resin composition comprises: a polymer having a structural unit that comprises an acid-labile group; a radiation-sensitive acid generator; and a salt that comprises an onium cation, and HCO3?, CO32? or a combination thereof. The onium cation is preferably a sulfonium cation, an ammonium cation, an iodonium cation, a phosphonium cation, a diazonium cation or a combination thereof. The onium cation is preferably a cation represented by formula (b-1) or formula (b-2). The acid generated from the radiation-sensitive acid generator is preferably a sulfonic acid, an imide acid, an amide acid, a methide acid or a combination thereof.
    Type: Application
    Filed: May 16, 2016
    Publication date: December 15, 2016
    Applicant: JSR CORPORATION
    Inventor: Hayato NAMAI
  • Patent number: 9477149
    Abstract: A photoresist composition containing (A) a polymer having a structural unit (I) that includes an acid-labile group, and (I) a compound represented by the following formula (1). In the following formula (1), R1, R2, R3 and R represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. X represents a single bond, an oxygen atom or —NRa—. Ra represents a hydrogen atom, a hydroxy group or a monovalent organic group having 1 to 20 carbon atoms, and optionally taken together represents a ring structure by binding with R each other. A? represents —SO3? or —CO2?. M+ represents a monovalent onium cation.
    Type: Grant
    Filed: September 19, 2014
    Date of Patent: October 25, 2016
    Assignee: JSR CORPORATION
    Inventors: Hayato Namai, Norihiko Ikeda, Takanori Kawakami
  • Patent number: 9465291
    Abstract: A radiation-sensitive resin composition includes a polymer that includes a structural unit represented by a formula (1), and an acid generator. R1 is a hydrogen atom, a fluorine atom, or the like. R2 is a hydrogen atom or a monovalent hydrocarbon group. R3 is a hydrogen atom, a monovalent chain hydrocarbon group, or the like. R4 is a hydrogen atom, a monovalent chain hydrocarbon group, or the like. R5 is a hydrogen atom, a monovalent chain hydrocarbon group, or the like. R6 is a monovalent chain hydrocarbon group. R6 is bonded to R3 to form a first alicyclic structure, or R6 is bonded to R5 to form a second alicyclic structure. At least one hydrogen atom of R2, R3, or R4 is optionally substituted with a fluorine atom.
    Type: Grant
    Filed: March 7, 2014
    Date of Patent: October 11, 2016
    Assignee: JSR CORPORATION
    Inventor: Hayato Namai
  • Patent number: 9412593
    Abstract: A composition for film formation includes a compound represented by formula (1), and a solvent. R1 represents a monovalent group including an aromatic ring. n is an integer of 3 to 6. At least one monovalent group represented by R1 further includes a group including an ethylenic double bond. a plurality of R1s are identical or different. A part or all of hydrogen atoms on the benzene ring in the formula (1) and on the aromatic ring are unsubstituted or substituted with a halogen atom or an alkyl group having 1 to 10 carbon atoms.
    Type: Grant
    Filed: March 19, 2015
    Date of Patent: August 9, 2016
    Assignee: JSR CORPORATION
    Inventors: Hayato Namai, Goji Wakamatsu
  • Publication number: 20160202608
    Abstract: A radiation-sensitive resin composition comprises: a polymer, and a radiation-sensitive acid generator. The polymer comprises a structural unit comprising: an acid-labile group; and an oxoacid group or phenolic hydroxyl group protected by the acid-labile group. The acid-labile group is represented by formula (1). R1 and R2 each independently represent a divalent organic group having 1 to 20 carbon atoms. R3 represents a monovalent group having 1 to 40 atoms and having at least one selected from the group consisting of an oxygen atom, a sulfur atom and a nitrogen atom. * denotes a binding site to the oxy group in the oxoacid group or phenolic hydroxyl group protected.
    Type: Application
    Filed: March 24, 2016
    Publication date: July 14, 2016
    Applicant: JSR CORPORATION
    Inventor: Hayato NAMAI
  • Publication number: 20160185999
    Abstract: A resin composition comprises a polymer comprising a structural unit that comprises a group represented by formula (1), and a solvent. In the formula (1), R1 to R4 each independently represent a hydrogen atom, a fluorine atom or a monovalent organic group having 1 to 20 carbon atoms, wherein at least one of R1 to R4 has the fluorine atom or a group including the fluorine atom. R5 represents a substituted or unsubstituted trivalent chain hydrocarbon group having 1 to 7 carbon atoms. * denotes a binding site to other moiety of the structural unit. The structural unit is preferably represented by any one of formulae (2-1) to (2-3). In the formulae (2-1) to (2-3), Z represents a group represented by formula (1).
    Type: Application
    Filed: March 10, 2016
    Publication date: June 30, 2016
    Applicant: JSR CORPORATION
    Inventor: Hayato NAMAI
  • Patent number: 9323146
    Abstract: A photoresist composition containing a polymer having a structural unit including an acid-labile group, and a compound represented by the formula (1). In the formula (1), R1 represents a hydrogen atom or a monovalent acid-labile group. R2 represents an alicyclic hydrocarbon group having 3 to 20 carbon atoms and a valency of (m+1). m is an integer of 2 to 5. R3 and R4 each independently represent a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group having 1 to 20 carbon atoms or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms. n is an integer of 0 to 5. At least two of a plurality of R1s optionally taken together represent a ring structure, together with a plurality of oxygen atoms bonding to R1 and the carbon atom(s) constituting R2 and bonding to these oxygen atoms. M+ represents a monovalent radiation-degradable onium cation.
    Type: Grant
    Filed: August 27, 2014
    Date of Patent: April 26, 2016
    Assignee: JSR CORPORATION
    Inventors: Hayato Namai, Kazuo Nakahara, Norihiko Ikeda
  • Patent number: 9233840
    Abstract: A method for processing a structure. The structure is formed and includes a substrate, a substructure having a sidewall and disposed on the substrate, a first polymer structure disposed on the substrate, and a second polymer structure disposed on the substrate such that the first polymer structure is disposed between the sidewall and the second polymer structure. An aspect ratio of the first polymer structure, the second polymer structure, or both is reduced in a reducing step. One polymer structure (i.e., the first polymer structure or the second polymer structure) is selectively removed from the structure such that a remaining polymer structure (i.e., the second polymer structure or the first polymer structure) remains disposed on the external surface of the substrate after the one polymer structure has been selectively removed, wherein the aspect ratio of the remaining polymer structure was reduced in the reducing step.
    Type: Grant
    Filed: October 28, 2010
    Date of Patent: January 12, 2016
    Assignees: International Business Machines Corporation, JSR Corporation
    Inventors: Joy Cheng, Hayato Namai, Daniel P. Sanders
  • Publication number: 20150355539
    Abstract: A radiation-sensitive resin composition includes a polymer including a structural unit that includes an acid-labile group; and a compound represented by formula (1). R1 represents a monovalent organic group having 1 to 30 carbon atoms. L represents a single bond, an oxygen atom or a sulfur atom. M+ represents a monovalent radioactive ray-labile onium cation. The monovalent organic group represented by R1 is preferably a monovalent hydrocarbon group or a monovalent fluorinated hydrocarbon group, and L preferably represents a single bond. The monovalent organic group represented by R1 is preferably a monovalent hydrocarbon group, a monovalent fluorinated hydrocarbon group, a monovalent aliphatic heterocyclic group or a monovalent fluorinated aliphatic heterocyclic group, and L preferably represents an oxygen atom or a sulfur atom. The monovalent radioactive ray-labile onium cation represented by M+ is preferably represented by the formula (X).
    Type: Application
    Filed: August 17, 2015
    Publication date: December 10, 2015
    Applicant: JSR CORPORATION
    Inventor: Hayato NAMAI
  • Publication number: 20150323866
    Abstract: A radiation-sensitive resin composition contains: a polymer having a structural unit that includes a group represented by formula (1); a radiation-sensitive acid generator; and an organic solvent. In the formula (1), RP represents a hydrogen atom or a monovalent organic group, and * denotes a binding site to a rest of the structural unit other than the group represented by the formula (1). It is preferred that RP in the formula (1) represents a monovalent organic group, and the monovalent organic group is an acid-nonlabile group. It is also preferred that RP in the formula (1) represents a monovalent organic group, and the monovalent organic group is an acid-labile group.
    Type: Application
    Filed: July 22, 2015
    Publication date: November 12, 2015
    Applicant: JSR CORPORATION
    Inventors: Hayato NAMAI, Kota NISHINO
  • Publication number: 20150309406
    Abstract: A photoresist composition containing: a polymer including an acid-labile group; a radiation-sensitive acid generator; and an acid diffusion control agent that contains a compound represented by a formula (1). In the formula (1), R1, R2 and R3 each independently represent a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. A represents a group having a valency of n that is obtained by combining: a hydrogen atom, a linear hydrocarbon group having 1 to 30 carbon atoms, an alicyclic hydrocarbon group having 3 to 30 carbon atoms or a combination thereof; —O—, —CO—, —COO—, —SO2O—, —NRSO2—, —NRSO2O—, —NRCO— or a combination thereof; and n nitrogen atoms as a binding site to the carbonyl group in the formula (1), in which a sum of atomic masses of the atoms constituting A is no less than 120. n is an integer of 1 to 4.
    Type: Application
    Filed: September 15, 2014
    Publication date: October 29, 2015
    Applicant: JSR CORPORATION
    Inventor: Hayato NAMAI
  • Publication number: 20150267046
    Abstract: A composition for film formation includes a compound represented by formula (1), and a solvent. R1 represents a monovalent group including an aromatic ring. n is an integer of 3 to 6. At least one monovalent group represented by R1 further includes a group including an ethylenic double bond. a plurality of R1s are identical or different. A part or all of hydrogen atoms on the benzene ring in the formula (1) and on the aromatic ring are unsubstituted or substituted with a halogen atom or an alkyl group having 1 to 10 carbon atoms.
    Type: Application
    Filed: March 19, 2015
    Publication date: September 24, 2015
    Applicant: JSR CORPORATION
    Inventors: Hayato NAMAI, Goji WAKAMATSU
  • Patent number: 9126231
    Abstract: An insulation pattern-forming method includes forming an organic pattern on a substrate. A space defined by the organic pattern is filled with an insulating material. The organic pattern is removed to obtain an inverted pattern formed of the insulating material. The inverted pattern is cured. An insulation pattern-forming method includes forming a first organic pattern on the substrate. A space defined by the first organic pattern is filled with an insulating material. An upper surface of the first organic pattern is exposed. A second organic pattern that comes in contact with the upper surface of the first organic pattern is formed. A space defined by the second organic pattern is filled with the insulating material. The first organic pattern and the second organic pattern are removed to obtain an inverted pattern formed of the insulating material. The inverted pattern is cured.
    Type: Grant
    Filed: November 27, 2012
    Date of Patent: September 8, 2015
    Assignee: JSR Corporation
    Inventors: Satoshi Dei, Hayato Namai, Kyoyu Yasuda, Koichi Hasegawa
  • Publication number: 20150093703
    Abstract: The present invention relates to a radiation-sensitive resin composition that contains: a compound that has a structure represented by the following formula (1); a first polymer that includes a fluorine atom; and a solvent. In the following formula (1), X represents a carbonyl group, a sulfonyl group or a single bond. Y+ represents a monovalent radiation-degradable onium cation. The first polymer preferably has at least one selected from the group consisting of a structural unit represented by the following formula (2a) and a structural unit represented by the following formula (2b). The first polymer preferably includes an alkali-labile group. The first polymer preferably includes an acid-labile group. It is preferred that a radiation-sensitive acid generator is further contained.
    Type: Application
    Filed: September 30, 2014
    Publication date: April 2, 2015
    Applicant: JSR CORPORATION
    Inventors: Hiromu MIYATA, Hayato NAMAI, Masafumi HORI
  • Publication number: 20150079520
    Abstract: An acid diffusion control agent includes a compound represented by a formula (1), a compound represented by a formula (2) or both thereof. R1 represents a hydrocarbon group comprising a monovalent alicyclic structure, or the like. R2 and R3 each independently represent a monovalent hydrocarbon group, or the like. R4 and R5 each independently represent a monovalent hydrocarbon group, or the like. R6 and R7 each independently represent a monovalent hydrocarbon group, or the like. R8 represents a monocyclic heterocyclic group together with the ester group and with the carbon atom. n is an integer of 1 to 6. R9 represents a monovalent hydrocarbon group, or the like. R10 represents a monovalent hydrocarbon group having 1 to 10 carbon atoms. R11 and R12 each independently represent a monovalent hydrocarbon group, or the like. R13 and R14 each independently represent a monovalent hydrocarbon group, or the like.
    Type: Application
    Filed: November 14, 2014
    Publication date: March 19, 2015
    Applicant: JSR CORPORATION
    Inventors: Hayato NAMAI, Norihiko IKEDA
  • Patent number: 8968586
    Abstract: A pattern-forming method includes forming a prepattern on a substrate. A space other than a space in which the prepattern is formed on the substrate is filled with a resin composition containing a compound which is diffusible into the prepattern. The compound is diffused into a part of the prepattern. Portions in which the compound is undiffused in the prepattern are removed using a removing liquid.
    Type: Grant
    Filed: February 15, 2012
    Date of Patent: March 3, 2015
    Assignee: JSR Corporation
    Inventor: Hayato Namai
  • Publication number: 20150010866
    Abstract: A resist pattern-forming method includes forming a resist film using a photoresist composition. The resist film is exposed. The exposed resist film is developed. The photoresist composition includes an acid generator and a polymer. The acid generator generates a protonic acid upon application of exposure light. The protonic acid generates a proton. The polymer includes a first structural unit which includes a first group. The first group and the proton form a cationic group. The polymer substantially does not include a structural unit which includes an acid-labile group.
    Type: Application
    Filed: September 19, 2014
    Publication date: January 8, 2015
    Applicant: JSR Corporation
    Inventors: Hitoshi Osaki, Hayato Namai, Shinya Minegishi
  • Publication number: 20150004544
    Abstract: A photoresist composition containing: a polymer including an acid-labile group; a radiation-sensitive acid generator; and an acid diffusion control agent that contains a compound represented by a formula (1). In the formula (1), R1, R2 and R3 each independently represent a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. A represents a group having a valency of n that is obtained by combining: a hydrogen atom, a linear hydrocarbon group having 1 to 30 carbon atoms, an alicyclic hydrocarbon group having 3 to 30 carbon atoms or a combination thereof; —O—, —CO—, —COO—, —SO2O—, —NRSO2—, —NRSO2O—, —NRCO— or a combination thereof; and n nitrogen atoms as a binding site to the carbonyl group in the formula (1), in which a sum of atomic masses of the atoms constituting A is no less than 120. n is an integer of 1 to 4.
    Type: Application
    Filed: September 15, 2014
    Publication date: January 1, 2015
    Applicant: JSR CORPORATION
    Inventor: Hayato NAMAI
  • Publication number: 20150004545
    Abstract: A photoresist composition containing (A) a polymer having a structural unit (I) that includes an acid-labile group, and (I) a compound represented by the following formula (1). In the following formula (1), R1, R2, R3 and R represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. X represents a single bond, an oxygen atom or —NRa—. Ra represents a hydrogen atom, a hydroxy group or a monovalent organic group having 1 to 20 carbon atoms, and optionally taken together represents a ring structure by binding with R each other. A? represents —SO3? or —CO2?. M+ represents a monovalent onium cation.
    Type: Application
    Filed: September 19, 2014
    Publication date: January 1, 2015
    Applicant: JSR CORPORATION
    Inventors: Hayato NAMAI, Norihiko IKEDA, Takanori KAWAKAMI