Patents by Inventor Hee Su Park

Hee Su Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240026485
    Abstract: Provided are a high-strength steel sheet having excellent bendability and formability, and a method for manufacturing same. The steel sheet includes: 0.05 to 0.12% of carbon (C), 2.0 to 3.0% of manganese (Mn), 0.5% or less (excluding 0%) of silicon (Si), 1.0% or less (excluding 0%) of chromium (Cr), 0.1% or less (excluding 0%) of niobium (Nb), 0.1% or less (excluding 0%) of titanium (Ti), 0.0025% or less (excluding 0%) of boron (B), 0.02 to 0.05% of aluminum (sol.Al), 0.05% or less (excluding 0%) of phosphorus (P), 0.01% or less (excluding 0%) of sulfur (S), 0.01% or less (excluding 0%) of nitrogen (N), with a balance of Fe and inevitable impurities, and 35 to 50% of ferrite and 35 to 45% of bainite, and a balance of martensite, the ferrite comprising, by area fraction: 8 to 15% of non-recrystallized ferrite and 27 to 35% of recrystallized ferrite, as a microstructure.
    Type: Application
    Filed: November 22, 2021
    Publication date: January 25, 2024
    Inventors: Kyoung-Rae CHO, Hee-Su PARK, Hyun-Gyu HWANG, Sung-Kyu KIM, Chang-Hyo SEO
  • Patent number: 10948342
    Abstract: The present invention relates to a Bell state measurement apparatus capable of increasing a probability in which a determination that a Bell state measurement fails by using an optical fiber.
    Type: Grant
    Filed: May 22, 2019
    Date of Patent: March 16, 2021
    Assignee: Korea Research Institute of Standards and Science
    Inventors: Sang Min Lee, Hee Su Park
  • Publication number: 20190360861
    Abstract: The present invention relates to a Bell state measurement apparatus capable of increasing a probability in which a determination that a Bell state measurement fails by using an optical fiber.
    Type: Application
    Filed: May 22, 2019
    Publication date: November 28, 2019
    Inventors: Sang Min Lee, Hee Su Park
  • Patent number: 10027426
    Abstract: According to one embodiment of the present invention, there is provided a photon generating apparatus including: a light source configured to emit light; an optical medium configured to generate a pair of photons from the light; a detector configured to detect one photon from the pair of photons and output a detection time of the photon; a buffer including an optical line and an optical switch disposed on an optical path of the photon, which is one photon except for the photon detected by the detector, of the pair of photons; and a processor configured to output a driving signal which controls the optical switch so that a delay occurs at the optical path using the detection time of the photon detected by the detector.
    Type: Grant
    Filed: September 21, 2017
    Date of Patent: July 17, 2018
    Assignee: Korea Research Institute of Standards and Science
    Inventors: Hee Su Park, Eun Joo Lee, Hee Jung Lee, Sang Min Lee
  • Publication number: 20180145768
    Abstract: According to one embodiment of the present invention, there is provided a photon generating apparatus including: a light source configured to emit light; an optical medium configured to generate a pair of photons from the light; a detector configured to detect one photon from the pair of photons and output a detection time of the photon; a buffer including an optical line and an optical switch disposed on an optical path of the photon, which is one photon except for the photon detected by the detector, of the pair of photons; and a processor configured to output a driving signal which controls the optical switch so that a delay occurs at the optical path using the detection time of the photon detected by the detector.
    Type: Application
    Filed: September 21, 2017
    Publication date: May 24, 2018
    Inventors: Hee Su PARK, Eun Joo Lee, Hee Jung Lee, Sang Min Lee
  • Patent number: 8279400
    Abstract: Disclosed herein is a super-resolution lithography apparatus and method based on a multiple light exposure method. The super-resolution lithography apparatus comprises a photographic medium having energy levels of a first ground state, a second ground state, a first excited state, a second excited state and a quenching state; a first light source inducing energy level transition between the first ground state and the first excited state of the photographic medium; a second light source inducing energy level transition between the second ground state and the first excited state of the photographic medium; and a third light source inducing energy level transition between the second ground state and the second excited state of the photographic medium. Accordingly, the resolution of lithography can be improved simply by using a photographic medium having a simple structure and conventional laser beams and increasing the number of exposure steps.
    Type: Grant
    Filed: March 12, 2009
    Date of Patent: October 2, 2012
    Assignee: Korea Research Institute of Standards and Science
    Inventors: Hee Su Park, Sun Kyung Lee, Jae Yong Lee, Sang-Kyung Choi, Dong-Hoon Lee
  • Publication number: 20100123889
    Abstract: Disclosed herein is a super-resolution lithography apparatus and method based on a multiple light exposure method. The super-resolution lithography apparatus comprises a photographic medium having energy levels of a first ground state, a second ground state, a first excited state, a second excited state and a quenching state; a first light source inducing energy level transition between the first ground state and the first excited state of the photographic medium; a second light source inducing energy level transition between the second ground state and the first excited state of the photographic medium; and a third light source inducing energy level transition between the second ground state and the second excited state of the photographic medium. Accordingly, the resolution of lithography can be improved simply by using a photographic medium having a simple structure and conventional laser beams and increasing the number of exposure steps.
    Type: Application
    Filed: March 12, 2009
    Publication date: May 20, 2010
    Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE
    Inventors: Hee Su PARK, Sun Kyung LEE, Jae Yong LEE, Sang-Kyung CHOI, Dong-Hoon LEE
  • Patent number: 6640024
    Abstract: An add-drop wavelength filter is described which separates specific wavelength components from optical signals propagating through an optical waveguide or adds specific wavelength components thereto. In general, add-drop wavelength filters serve to separate or add specific channels in channels comprising several different wavelengths in a wavelength division optical communication system, and require good wavelength selectivity, stability and etc. Up to now, several types of add-drop wavelength filters are proposed, however disadvantageously they were not stable or were difficult to fabricate. The add-drop wavelength filter of the present invention comprising a mode discrimination coupler, Bragg gratings in which mode conversion occurs and etc., utilizes mode conversion in a dual mode waveguide and has low loss and stability.
    Type: Grant
    Filed: November 9, 2000
    Date of Patent: October 28, 2003
    Assignee: Korea Advanced Institue of Science & Technology
    Inventors: Byoung Yoon Kim, Hee Su Park, Seok Hyun Yun
  • Patent number: 6343165
    Abstract: An optical add/drop multiplexer includes a mode converter. A first mode coupler is coupled to an input of the mode converter. A second mode coupler is coupled to an output of the mode converter. The mode converter includes an optical fiber with multiple cladding modes and a single core mode guided along a core. An acoustic wave propagation member is coupled to the optical fiber. The acoustic wave propagation member propagates an acoustic wave from its proximal to its distal end. At least one acoustic wave generator is coupled to the proximal end of the acoustic wave propagation member.
    Type: Grant
    Filed: May 23, 2000
    Date of Patent: January 29, 2002
    Assignee: Novera Optics, Inc.
    Inventors: Byoung Yoon Kim, Seok Hyun Yun, Hee Su Park, Wayne V. Sorin
  • Patent number: 5534728
    Abstract: A semiconductor device includes a metal wiring layer having a plurality of parallel, actual metal lines, with an endmost one of the actual metal lines being disposed adjacent a wiring-free region. The actual metal lines are electrically connected to an active circuit portion of the semiconductor device. At least one dummy metal line is interposed between the endmost one of the actual metal lines and the wiring-free region, with the at least one dummy metal line being disconnected from the active circuit portion. The dummy metal line(s) serve to prevent corrosion of the actual metal lines when the metal wiring layer is patterned by an etching process.
    Type: Grant
    Filed: September 21, 1992
    Date of Patent: July 9, 1996
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Tae-ryong Kim, Hee-su Park, Dai-sick Moon