Patents by Inventor Heinrich Kirchauer

Heinrich Kirchauer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask absorber for extreme ultraviolet lithography
    Patent number: 6479195
    Abstract: The present invention discloses a reflective mask for Extreme Ultraviolet Lithography to produce tight CD control on a wafer and a process for fabricating such a mask. In one embodiment, the upper corners of the edges of the absorber layer are rounded or smooth. In another embodiment, the upper surface of the absorber layer is rough. In a further embodiment, an antireflective coating is disposed on the absorber layer.
    Type: Grant
    Filed: September 15, 2000
    Date of Patent: November 12, 2002
    Assignee: Intel Corporation
    Inventors: Heinrich Kirchauer, Pei-Yang Yan