Patents by Inventor Heinz Schuster

Heinz Schuster has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050157400
    Abstract: A projection objective has at least five lens groups (G1 to G5) and has several lens surfaces. At least two aspheric lens surfaces are arranged so as to be mutually adjacent. These mutually adjacently arranged lens surfaces are characterized as a double asphere. This at least one double asphere (21) is mounted at a minimum distance from an image plane (0?) which is greater than the maximum lens diameter (D2) of the objective.
    Type: Application
    Filed: March 15, 2005
    Publication date: July 21, 2005
    Inventors: Karl-Heinz Schuster, David Shafer, Wilhelm Ulrich, Helmut Beierl, Wolfgang Singer
  • Publication number: 20050141098
    Abstract: A very high-aperture, purely refractive projection objective having a multiplicity of optical elements has a system diaphragm (5) arranged at a spacing in front of the image plane. The optical element next to the image plane (3) of the projection objective is a planoconvex lens (34) having a substantially spherical entrance surface and a substantially flat exit surface. The planoconvex lens has a diameter that is at least 50% of the diaphragm diameter of the system diaphragm (5). It is preferred to arrange only positive lenses (32, 33, 34) between the system diaphragm (5) and image plane (3). The optical system permits imaging in the case of very high apertures of NA?0.85, if appropriate of NA?1.
    Type: Application
    Filed: September 8, 2004
    Publication date: June 30, 2005
    Inventor: Karl-Heinz Schuster
  • Publication number: 20050134825
    Abstract: An illumination system for a projection exposure machine, operating with ultraviolet light, for microlithography has an angle-conserving light mixing device with at least one integrator rod that has an entrance surface for receiving light from a light source, and an exit surface for outputting exit light mixed by the integrator rod. At least one prism arrangement for receiving exit light and for varying the state of polarization of the exit light is placed downstream of the integrator rod. A preferred prism arrangement has a polarization splitter surface, aligned transversely to the direction of propagation of the exit light, which passes light fractions with p-polarization without hindrance, and reflects fractions with s-polarization. The separated beams with orthogonal polarization are parallelized by means of a reflecting surface aligned parallel to the polarization splitter surface, and the same state of polarization is set for both partial beams by means of a suitable retarder.
    Type: Application
    Filed: August 9, 2004
    Publication date: June 23, 2005
    Inventor: Karl-Heinz Schuster
  • Patent number: 6903802
    Abstract: A projection objective has at least five lens groups (G1 to G5) and has several lens surfaces. At least two aspheric lens surfaces are arranged so as to be mutually adjacent. These mutually adjacently arranged lens surfaces are characterized as a double asphere. This at least one double asphere (21) is mounted at a minimum distance from an image plane (0?) which is greater than the maximum lens diameter (D2) of the objective.
    Type: Grant
    Filed: November 7, 2003
    Date of Patent: June 7, 2005
    Assignee: Carl-Zeiss-Stiftung
    Inventors: Karl-Heinz Schuster, David R. Shafer, Wilhelm Ulrich, Helmut Beierl, Wolfgang Singer
  • Publication number: 20050111108
    Abstract: A very-high aperture, purely refractive projection objective is designed as a two-belly system with an object-side belly, an image-side belly and a waist (7) situated therebetween. The system diaphragm (5) is seated in the image-side belly at a spacing in front of the image plane. Arranged between the waist and the system diaphragm in the region of divergent radiation is a negative group (LG5) which has an effective curvature with a concave side pointing towards the image plane. The system is distinguished by a high numerical aperture, low chromatic aberrations and compact, material-saving design.
    Type: Application
    Filed: September 1, 2004
    Publication date: May 26, 2005
    Inventor: Karl-Heinz Schuster
  • Patent number: 6891683
    Abstract: A refractive projection objective for use in microlithography with lenses made exclusively of one and the same material has an image-side numerical aperture larger than 0.7. A light bundle defined by the image-side numerical aperture and by the image field has within the objective a variable light-bundle diameter smaller than or equal to a maximum light-bundle diameter. In a length interval measured on the optical axis from the system diaphragm towards the object field and at least equaling the maximum light-bundle diameter, the variable light-bundle diameter exceeds 85% of the maximum light-bundle diameter.
    Type: Grant
    Filed: August 21, 2003
    Date of Patent: May 10, 2005
    Assignee: Carl Zeiss SMT AG
    Inventor: Karl-Heinz Schuster
  • Publication number: 20050088760
    Abstract: There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength?193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.
    Type: Application
    Filed: August 17, 2004
    Publication date: April 28, 2005
    Inventors: Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger, Martin Antoni, Wilhelm Ulrich
  • Patent number: 6885502
    Abstract: An optical arrangement is disclosed wherein an entering beam is converted into an exiting beam having a total cross section of light which is linearly polarized essentially in the radial direction by rotation. For this purpose, rasters of half-wave plates (41, 42, 4i), a combination of birefringent quarter-wave plate 420 and a circular plate 430 is suggested in combination with a conical polarizer 21?. This arrangement is preferably utilized in the illumination portion of a microlithographic projection exposure system. It is important that the arrangement be mounted behind all asymmetric or polarizing component elements 103a.
    Type: Grant
    Filed: May 9, 2002
    Date of Patent: April 26, 2005
    Assignee: Carl-Zeiss-Stiftung
    Inventor: Karl-Heinz Schuster
  • Publication number: 20050083506
    Abstract: A method and an arrangement for microlithographic projection exposure at high aperture achieve a contrast increase by the polarization of the light perpendicular to the plane of incidence on the resist. Arrangements are provided which influence the tangential polarization or the linear polarization adapted to the dipole illumination in the illuminating system and in the reduction objective.
    Type: Application
    Filed: November 9, 2004
    Publication date: April 21, 2005
    Applicant: Carl-Zeiss-Stiftung
    Inventors: Karl-Heinz Schuster, Christian Wagner, Martin Schriever
  • Publication number: 20050083507
    Abstract: A method and an arrangement for microlithographic projection exposure at high aperture achieve a contrast increase by the polarization of the light perpendicular to the plane of incidence on the resist. Arrangements are provided which influence the tangential polarization or the linear polarization adapted to the dipole illumination in the illuminating system and in the reduction objective.
    Type: Application
    Filed: November 9, 2004
    Publication date: April 21, 2005
    Applicant: Carl-Zeiss-Stiftung
    Inventors: Karl-Heinz Schuster, Christian Wagner, Martin Schriever
  • Patent number: 6878916
    Abstract: A microlithographic projection illumination system has a focus-detection system for optically detecting deviations of the image plane of a projection lens from the upper surface of a substrate arranged in the vicinity of its image plane. The focus-detection system has a system for coupling in at least one measuring beam that is obliquely incident on, and to be reflected at, the substrate surface into an intermediate zone between the final optical surface of the imaging system and the substrate surface and a system for coupling out the measuring beam and detecting it following its reflection at the substrate surface.
    Type: Grant
    Filed: August 2, 2002
    Date of Patent: April 12, 2005
    Assignee: Carl Zeiss SMT AG
    Inventor: Karl-Heinz Schuster
  • Publication number: 20050068499
    Abstract: A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.
    Type: Application
    Filed: August 13, 2004
    Publication date: March 31, 2005
    Inventors: Aurelian Dodoc, Karl-Heinz Schuster, Jorg Mallmann, Wilhelm Ulrich, Hans-Jurgen Rostalski
  • Patent number: 6867923
    Abstract: A projection lens (3), in particular for microlithography, is provided with an object plane (7), with an image plane (9), with a lens arrangement (4) and with at least one gas chamber filled with gas or through which gas flows. The gas chamber is constructed as an approximately plane-parallel manipulation chamber (13). The refractive index can be varied in the manipulation chamber (13) by pressure changes and/or changes in gas composition.
    Type: Grant
    Filed: May 2, 2001
    Date of Patent: March 15, 2005
    Assignee: Carl-Zeiss-Shiftung
    Inventors: Wolfgang Singer, Karl-Heinz Schuster
  • Patent number: 6855380
    Abstract: A method is described for the production of optical components, particularly of crystalline base material, with elevated stability and an optically active three-dimensional shape, which is defined by its surfaces, of high fit accuracy, by shaping the base material into a blank with a desired three-dimensional shape, and applying a covering layer to the surface of the thus-formed three-dimensional shape and the fit accuracy is obtained by abrasion of the covering layer.
    Type: Grant
    Filed: May 17, 2002
    Date of Patent: February 15, 2005
    Assignee: Carl Zeiss SMT AG
    Inventor: Karl-Heinz Schuster
  • Patent number: 6856379
    Abstract: A polarizer suitable for transforming incident linearly polarized or circularly polarized light into exiting radially or tangentially polarized light with virtually no transmission losses has, in one of its embodiments, a plate fabricated from birefringent material on whose entrance and exit faces small zones (11, 12) with deflecting structures (8, 9) in the form of gratings or Fresnel surfaces have been created. The crystal axis (5) of said birefringent material is aligned parallel to the incident light beam. Said deflecting structures deflect light along a transmission direction (13) that is inclined with respect to said crystal axis (5), causing a phase shift between the field components of the transmitted light.
    Type: Grant
    Filed: May 22, 2002
    Date of Patent: February 15, 2005
    Assignee: Carl Zeiss SMT AG
    Inventor: Karl-Heinz Schuster
  • Publication number: 20050030635
    Abstract: The invention relates to a projection lens comprising a lens assembly that has at least one first narrowing of the group of light beams. A lens with a non-spherical surface is located in front of and/or behind the first narrowing.
    Type: Application
    Filed: September 16, 2004
    Publication date: February 10, 2005
    Inventor: Karl-Heinz Schuster
  • Publication number: 20050030506
    Abstract: In a method for manufacturing semiconductor devices and other finely structured parts, a projection objective (5) is used in order to project the image of a pattern arranged in the object plane of the projection objective onto a photosensitive substrate which is arranged in the region of the image plane (12) of the projection objective. In this case, there is set between an exit surface (15), assigned to the projection objective, for exposing light and an incoupling surface (11), assigned to the substrate, for exposing light a small finite working distance (16) which is at least temporarily smaller in size and exposure time interval than a maximum extent of an optical near field of the light emerging from the exit surface. As a result, projection objectives with very high numerical apertures in the region of NA>0.8 or more can be rendered useful for contactless projection lithography.
    Type: Application
    Filed: July 9, 2004
    Publication date: February 10, 2005
    Inventor: Karl-Heinz Schuster
  • Publication number: 20050030634
    Abstract: A projection exposure machine comprises a projection lens with a lens arrangement and at least one stop. The lens arrangement comprises a group of optical elements which is arranged between the stop and the image plane. An optical element of the group situated close to the image plane has a thickness of at least 6.5% of the entire stop diameter.
    Type: Application
    Filed: August 11, 2004
    Publication date: February 10, 2005
    Applicant: Carl Zeiss SMT AG
    Inventor: Karl-Heinz Schuster
  • Patent number: 6831794
    Abstract: A lens has at least one aspheric lens surface, an objective with at least one aspheric lens surface, and a projection exposure device for microlithography and a method for the production of microstructured components with an objective having at least one aspheric lens surface. The object of the invention is to provide a method by which new designs with aspheric lens surfaces can be generated without consultation with manufacturing, with this object attained by the measure of describing the aspheric lens surfaces by Zernike polynomials, which makes it is possible to undertake a classification of aspheric lens surfaces such that the respective aspheric lens surface can be polished and tested at a justifiable cost when at least two of three, or all three, of certain conditions are present.
    Type: Grant
    Filed: June 21, 2003
    Date of Patent: December 14, 2004
    Assignee: Carl Zeiss SMT AG
    Inventors: Karl-Heinz Schuster, Frank Schillke, Franz-Josef Stickel, Alexander Epple
  • Patent number: 6825913
    Abstract: An illumination equipment for microlithography has an illumination system, and a reticle with magnesium fluoride as the support material. The illumination system provides radially polarized light, and the magnesium fluoride is oriented with its principal axis about in the direction of the optical axis (A) at the reticle. In addition, a suitable cooling system is described.
    Type: Grant
    Filed: March 2, 1999
    Date of Patent: November 30, 2004
    Assignee: Carl Zeiss SMT AG
    Inventors: Karl-Heinz Schuster, Christian Wagner