Patents by Inventor Henri Johannes Petrus Vink

Henri Johannes Petrus Vink has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9323070
    Abstract: A manufacturing method for a grating is disclosed for the angular dispersion of light impinging the grating. The grating comprises tapered structures and cavities. A cavity width and/or corrugation amplitude is varied for achieving a desired grating efficiency according to calculation. A method is disclosed for conveniently creating gratings with variable cavity width and/or corrugation amplitude. The method comprises the step of anisotropically etching a groove pattern into a grating master. Optionally a replica is produced that is complementary to the grating master. By variation of an etching resist pattern, the cavity width of the grating may be varied allowing the optimization towards different efficiency goals.
    Type: Grant
    Filed: June 7, 2012
    Date of Patent: April 26, 2016
    Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
    Inventors: Henri Johannes Petrus Vink, Huibert Visser, Aaldert Hidde Van Amerongen
  • Publication number: 20150034591
    Abstract: A manufacturing method for a grating is disclosed for the angular dispersion of light impinging the grating. The grating comprises tapered structures and cavities. A cavity width and/or corrugation amplitude is varied for achieving a desired grating efficiency according to calculation. A method is disclosed for conveniently creating gratings with variable cavity width and/or corrugation amplitude. The method comprises the step of anisotropically etching a groove pattern into a grating master. Optionally a replica is produced that is complementary to the grating master. By variation of an etching resist pattern, the cavity width of the grating may be varied allowing the optimization towards different efficiency goals.
    Type: Application
    Filed: June 7, 2012
    Publication date: February 5, 2015
    Applicants: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO, Stichting SRON Netherlands Institute for Space Research
    Inventors: Henri Johannes Petrus Vink, Huibert Visser, Aaldert Hide Van Amerongen
  • Patent number: 7948606
    Abstract: A system and method are used to form incoherent beams from at least a partially coherent beam, such that interference or speckle patterns are substantially eliminated. A rotating optical element directs the partially coherent beam to reflect from an angular distribution changing element to form an incoherent beam. The partially coherent beam can be directed at varying angles or positions onto the angular distribution changing element through rotation of the rotating optical element. The angles can vary as a function of time.
    Type: Grant
    Filed: April 13, 2006
    Date of Patent: May 24, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Huibert Visser, Johannes Jacobus Matheus Baselmans, Pieter Willem Herman De Jager, Henri Johannes Petrus Vink
  • Patent number: 7898646
    Abstract: A system and method provides high speed variable attenuators. The attenuators can be used within a lithographic apparatus to control intensity of radiation in one or more correction pulses used to correct a dose of the radiation following an initial pulse of radiation.
    Type: Grant
    Filed: October 3, 2007
    Date of Patent: March 1, 2011
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Oscar Franciscus Jozephus Noordman, Justin L. Kreuzer, Henri Johannes Petrus Vink, Teunis Cornelis Van Den Dool, Daniel Perez Calero
  • Patent number: 7880875
    Abstract: An apparatus is described for scanning a circuit structure. The apparatus has a linear sensor (16) for detecting light intensity as a function of position along the sensor. A transport mechanism (12) moves a circuit structure (10), such as a PCB or a wafer relative to the sensor. The circuit structure is illuminated with an illumination system (14) that comprises a hollow cylinder (144) with a mainly diffusively and/or specularly reflecting inner wall surface. The cylinder is arranged in parallel with the sensor and has a first slit (40) and a second slit (42) located so that a virtual plane runs through the sensor, the first and second slit to a location for the circuit structure under inspection. The illumination system furthermore comprises a linear light source (146) in the cylinder or the inner wall of the cylinder. In an embodiment the illumination system comprises a splitting mirror (22) in the cylinder to reflect light to the circuit structure.
    Type: Grant
    Filed: February 28, 2007
    Date of Patent: February 1, 2011
    Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO
    Inventors: Kees Moddemeyer, Henri Johannes Petrus Vink, Pieter Willem Herman de Jager
  • Patent number: 7826037
    Abstract: A system is used to perform fast and slow applications, for example fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam splitter. The radiation source is configured to generate a polarized beam of radiation. The electro-optical modulator, formed of crystalline quartz, is configured to modulate the beam of radiation. The beam splitter is configured to direct a first portion of the beam to a beam dump and to form an output beam from a second portion of the beam.
    Type: Grant
    Filed: August 30, 2007
    Date of Patent: November 2, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Huibert Visser, Oscar Franciscus Jozephus Noordman, Henri Johannes Petrus Vink, Marcus Gerhardus Hendrikus Meijerink, Koenraad Remi André Maria Schreel, Cornelis Cornelia De Bruijn
  • Patent number: 7738079
    Abstract: A system is used to perform fast and slow applications, for example fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam splitter. The radiation source is configured to generate a polarized beam of radiation. The electro-optical modulator, formed of crystalline quartz, is configured to modulate the beam of radiation. The beam splitter is configured to direct a first portion of the beam to a beam dump and to form an output beam from a second portion of the beam.
    Type: Grant
    Filed: November 14, 2006
    Date of Patent: June 15, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Oscar Franciscus Jozephus Noordman, Henri Johannes Petrus Vink, Huibert Visser
  • Patent number: 7714986
    Abstract: A radiation beam conditioning system comprising at least three optical paths in which the radiation is conditioned.
    Type: Grant
    Filed: May 24, 2007
    Date of Patent: May 11, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Huibert Visser, Pieter Willem Herman De Jager, Henri Johannes Petrus Vink, Marcus Gerhardus Hendrikus Meijerink
  • Publication number: 20090219519
    Abstract: An apparatus is described for scanning a circuit structure. The apparatus has a linear sensor (16), for detecting light intensity as a function of position along the sensor. A transport mechanism (12) moves a circuit structure (10), such as a PCB or a wafer relative to the sensor. The circuit structure is illuminated with an illumination system (14) that comprises a hollow cylinder (144) with a mainly diffusively and/or specularly reflecting inner wall surface. The cylinder is arranged in parallel with the sensor and has a first slit (40) and a second slit (42) located so that a virtual plane runs through the sensor, the first and second slit to a location for the circuit structure under inspection. The illumination system furthermore comprises a linear light source (146) in the cylinder or the inner wall of the cylinder. In an embodiment the illumination system comprises a splitting mirror (22) in the cylinder to reflect light to the circuit structure.
    Type: Application
    Filed: February 28, 2007
    Publication date: September 3, 2009
    Applicant: Nederlandse Organisatie voor toegepast- natuurwetenschappelijk Onderzoek TNO
    Inventors: Kees Moddemeyer, Henri Johannes Petrus Vink, Pieter Willem Herman de Jager
  • Publication number: 20090091734
    Abstract: A coherence remover is provided. In an embodiment the coherence remover includes a first mirror and a second mirror coupled to the first mirror. The coherence remover is configured to receive an input beam. Each of the first and second mirrors is configured to reflect a respective portion of the input beam to produce respective one or more intermediate beams. The intermediate beams collectively form an output beam that has a reduced coherence compared to the input beam.
    Type: Application
    Filed: December 4, 2008
    Publication date: April 9, 2009
    Applicant: ASML Netherlands B.V. and ASML Holding N.V.
    Inventors: Huibert VISSER, Jacob Fredrik Friso Klinkhamer, Lev Ryzhikov, Scott D. Coston, Adel Joobeur, Henri Johannes Petrus Vink, Yevgeniy Konstantinovich Shmarev
  • Publication number: 20080291417
    Abstract: A radiation beam conditioning system comprising at least three optical paths in which the radiation is conditioned.
    Type: Application
    Filed: May 24, 2007
    Publication date: November 27, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Huibert Visser, Pieter Willem Herman De Jager, Henri Johannes Petrus Vink, Marcus Gerhardus Hendrikus Meijerink
  • Publication number: 20080112030
    Abstract: A system is used to perform fast and slow applications, for example fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam splitter. The radiation source is configured to generate a polarized beam of radiation. The electro-optical modulator, formed of crystalline quartz, is configured to modulate the beam of radiation. The beam splitter is configured to direct a first portion of the beam to a beam dump and to form an output beam from a second portion of the beam.
    Type: Application
    Filed: November 14, 2006
    Publication date: May 15, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Oscar Franciscus Jozephus Noordman, Henri Johannes Petrus Vink, Huibert Visser
  • Publication number: 20080111981
    Abstract: A system is used to perform fast and slow applications, for example fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam splitter. The radiation source is configured to generate a polarized beam of radiation. The electro-optical modulator, formed of crystalline quartz, is configured to modulate the beam of radiation. The beam splitter is configured to direct a first portion of the beam to a beam dump and to form an output beam from a second portion of the beam.
    Type: Application
    Filed: August 30, 2007
    Publication date: May 15, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Huibert VISSER, Oscar Franciscus Jozephus Noordman, Henri Johannes Petrus Vink, Marcus Gerhardus Hendrikus Meijerink, Koenraad Remi Andre Maria Schreel, Cornelis Cornelia De Bruijn
  • Patent number: 7342644
    Abstract: A lithographic illumination apparatus and method includes receiving a plurality of source radiation beams from a plurality of corresponding radiation sources, deflecting the plurality of source radiation beams along a common beam path, thereby generating a projection beam of radiation, imparting the projection beam of radiation with a cross-section pattern, and projecting the patterned projection beam of radiation onto a target portion of a substrate.
    Type: Grant
    Filed: December 29, 2004
    Date of Patent: March 11, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus Baselmans, Anastasius Jacobus Anicetus Bruinsma, Pieter Willem Herman De Jager, Robert-Han Munnig Schmidt, Henri Johannes Petrus Vink
  • Patent number: 7330239
    Abstract: A system and method utilize a lithographic apparatus comprising an illumination system, an array of individually controllable elements, and a projection system. The illumination system conditions a radiation beam. The array of individually controllable elements modulates the beam. At least one group of elements in the array of individually controllable elements being tilted to at least a same tilt direction with a same tilt sign. For example, the tilting can form one or more blazing portions (e.g., blazing super-pixel portions) in the array of individually controllable elements. The projection system projects the modulated beam onto a target portion of a substrate. The projection system includes an aperture that filters out undesired diffraction orders of the modulated beam.
    Type: Grant
    Filed: April 8, 2005
    Date of Patent: February 12, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus Baselmans, Huibert Visser, Henri Johannes Petrus Vink
  • Patent number: 7079225
    Abstract: Use of a refraction grating to divide a beam of radiation into a plurality of sub-beams that are each directed onto an array of individually controllable elements, modulated thereby and projected onto a substrate as an array of spots.
    Type: Grant
    Filed: September 14, 2004
    Date of Patent: July 18, 2006
    Assignee: ASML Netherlands B.V
    Inventors: Johannes Jacobus Matheus Baselmans, Anastasius Jacobus Anicetus Bruinsma, Pieter Willem Herman De Jager, Henri Johannes Petrus Vink