Patents by Inventor Heon Yeong JEONG

Heon Yeong JEONG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Dielectric based reflective color filter and manufacturing method thereof and display device having the same
    Patent number: 11048027
    Abstract: A dielectric-based reflective color filter includes a substrate layer capable of light reflection; and a dielectric layer formed on the substrate layer. The dielectric layer includes a plurality of dielectric units configured by a first structure extending in a first direction and a second structure intersecting the first structure and extending in a second direction. The plurality of the dielectric units is arranged on the substrate layer so as to be spaced apart from each other.
    Type: Grant
    Filed: December 14, 2018
    Date of Patent: June 29, 2021
    Assignee: POSTECH ACADEMY-INDUSTRY FOUNDATION
    Inventors: Jun Suk Rho, Jae Hyuck Jang, Heon Yeong Jeong
  • DIELECTRIC BASED REFLECTIVE COLOR FILTER AND MANUFACTURING METHOD THEREOF AND DISPLAY DEVICE HAVING THE SAME
    Publication number: 20190187346
    Abstract: A dielectric-based reflective color filter includes a substrate layer capable of light reflection; and a dielectric layer formed on the substrate layer. The dielectric layer includes a plurality of dielectric units configured by a first structure extending in a first direction and a second structure intersecting the first structure and extending in a second direction. The plurality of the dielectric units is arranged on the substrate layer so as to be spaced apart from each other.
    Type: Application
    Filed: December 14, 2018
    Publication date: June 20, 2019
    Inventors: Jun Suk Rho, Jae Hyuck Jang, Heon Yeong Jeong
  • Mask manufacturing apparatus and, manufacturing method of mask and, mask for lithography
    Patent number: 10295915
    Abstract: A mask manufacturing apparatus, a method of manufacturing the mask, and a mask for lithography, capable of providing a pattern having a size in nanometer unit using the photo-lithography process are provided. A mask manufacturing apparatus, a method of manufacturing the mask, and an elastic film for a photo-mask lower a critical dimension of the pattern(s) without increasing a manufacturing cost. The mask manufacturing apparatus and the method of manufacturing the mask, and the mask for lithography provide a pattern having a size in nanometer unit using the photo-lithography process.
    Type: Grant
    Filed: July 31, 2018
    Date of Patent: May 21, 2019
    Assignee: POSTECH ACADEMY-INDUSTRY FOUNDATION
    Inventors: Jun Suk Rho, In Ki Kim, Heon Yeong Jeong
  • MASK MANUFACTURING APPARATUS AND, MANUFACTURING METHOD OF MASK AND, MASK FOR LITHOGRAPHY
    Publication number: 20180348651
    Abstract: A mask manufacturing apparatus, a method of manufacturing the mask, and a mask for lithography, capable of providing a pattern having a size in nanometer unit using the photo-lithography process are provided. A mask manufacturing apparatus, a method of manufacturing the mask, and an elastic film for a photo-mask lower a critical dimension of the pattern(s) without increasing a manufacturing cost. The mask manufacturing apparatus and the method of manufacturing the mask, and the mask for lithography provide a pattern having a size in nanometer unit using the photo-lithography process.
    Type: Application
    Filed: July 31, 2018
    Publication date: December 6, 2018
    Applicant: POSTECH Academy-Industry Foundation
    Inventors: Jun Suk RHO, In Ki KIM, Heon Yeong JEONG