Patents by Inventor Heung-Ryul Oh

Heung-Ryul Oh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11038184
    Abstract: Disclosed is a porous support including fine porous structures formed between nanofibers, wherein the fine porous structures have a porosity of 50% to 90%, a pore size of 0.01 ?m to 10 ?m and an air permeability of 0.01 to 7 sec/100 cc·air, and the porous support has a thickness of 5 ?m to 50 ?m, a method of manufacturing the same and a reinforced membrane including the same.
    Type: Grant
    Filed: December 14, 2015
    Date of Patent: June 15, 2021
    Assignee: KOLON FASHION MATERIAL. INC.
    Inventors: Jun Young Park, Chui Ki Kim, Sung Jin Kim, Ji Suk Baek, Heung Ryul Oh, Yong Hwan Lee, Hwan Kwon Rho
  • Patent number: 10374247
    Abstract: The present invention relates to a porous support, a preparation method therefor, and a reinforced membrane containing the same, wherein the porous support comprises a nanoweb in which nanofibers are integrated in the form of a nonwoven fabric comprising a plurality of pores, and the nanoweb has an elongation at break of 1-10%. The porous support has excellent air permeability and water permeability, remarkable durability, heat resistance and chemical resistance, and excellent mechanical strength and processability.
    Type: Grant
    Filed: February 24, 2015
    Date of Patent: August 6, 2019
    Assignee: KOLON FASHION MATERIAL. INC.
    Inventors: Heung Ryul Oh, Sung Jin Kim, Yong Hwan Lee, Hwan Kwon Rho, Chul Ki Kim, Jeong Young Choi, Jun Young Park, Ji Suk Baek
  • Publication number: 20170365864
    Abstract: Disclosed is a porous support including fine porous structures formed between nanofibers, wherein the fine porous structures have a porosity of 50% to 90%, a pore size of 0.01 ?m to 10 ?m and an air permeability of 0.01 to 7 sec/100 cc·air, and the porous support has a thickness of 5 ?m to 50 ?m, a method of manufacturing the same and a reinforced membrane including the same.
    Type: Application
    Filed: December 14, 2015
    Publication date: December 21, 2017
    Applicant: KOLON FASHION MATERIAL. INC.
    Inventors: Jun Young PARK, Chul Ki KIM, Sung Jin KIM, Ji Suk BAEK, Heung Ryul OH, Yong Hwan LEE, Hwan Kwon RHO
  • Publication number: 20170030009
    Abstract: The present invention relates to a porous support, a method for manufacturing the same, and a reinforced membrane comprising the same, the porous support comprising a nanoweb in which nanofibers are accumulated in the form of a nonwoven fabric including a plurality of pores, wherein the nanoweb has a moisture saturation time of 1 second to 600 seconds. The porous support not only has excellent durability, heat resistance, and chemical resistance while exhibiting excellent air permeability and water permeability, but also has good hydrophilicity.
    Type: Application
    Filed: February 25, 2015
    Publication date: February 2, 2017
    Applicant: KOLON FASHION MATERIAL. INC.
    Inventors: Sung Jin KIM, Heung Ryul OH, Yong Hwan LEE, Hwan Kwon RHO, Chul Ki KIM, Jeong Young CHOI, Jun Young PARK, Ji Suk BAEK
  • Publication number: 20160359184
    Abstract: The present invention relates to a porous support, a preparation method therefor, and a reinforced membrane containing the same, wherein the porous support comprises a nanoweb in which nanofibers are integrated in the form of a nonwoven fabric comprising a plurality of pores, and the nanoweb has an elongation at break of 1-10%. The porous support has excellent air permeability and water permeability, remarkable durability, heat resistance and chemical resistance, and excellent mechanical strength and processability.
    Type: Application
    Filed: February 24, 2015
    Publication date: December 8, 2016
    Applicant: KOLON FASHION MATERIAL. INC.
    Inventors: Heung Ryul OH, Sung Jin KIM, Yong Hwan LEE, Hwan Kwon RHO, Chul Ki KIM, Jeong Young CHOI, Jun Young PARK, Ji Suk BAEK
  • Patent number: 8808845
    Abstract: The cleansing polyester fabric of the present invention (AAA). The cleansing fabric of the present invention is useful as a makeup cleansing fabric or as a wiping fabric for precision products and optical devices since it exhibits excellent cleansing performance, is soft to the touch and does not damage the surface of a products to be cleansed.
    Type: Grant
    Filed: December 22, 2004
    Date of Patent: August 19, 2014
    Assignee: Kolon Industries, Inc.
    Inventors: Yang-Soo Park, Heung-Ryul Oh, Dong-Eun Lee
  • Publication number: 20130084515
    Abstract: Disclosed is a polyimide porous web with good porosity, good dimensional stability, and uniform pore; a method for manufacturing the same; and an electrolyte membrane with improved ion conductivity and good dimensional stability owing to ion conductors uniformly impregnated in the porous web, the polyimide porous web having a porosity of 60% to 90%, wherein not less than 80% of entire pores of the porous web have a pore diameter which differs from an average pore diameter of the porous web by not more than 1.5 ?m.
    Type: Application
    Filed: May 24, 2011
    Publication date: April 4, 2013
    Applicant: KOLON FASHION MATERIAL, INC.
    Inventors: Yun Kyung Kang, Heung Ryul Oh
  • Patent number: 7850741
    Abstract: The present invention provides a cleansing polyester fabric, which comprises (i) a polyester multifilament consisting of ultra yarns (monofilament) of 0.001 to 0.1 deniers or its false twist yarn as warp and (ii) a false twisted mixing yarn consisting of said polyester multifilament and a high shrinkage polyester multifilament with 10-50% of shrinkage rate in boiling water as a weft, and said fabric satisfies the following properties; sum of warp density and weft density: 220-320 yarns/inch, thickness of the fabric: less than 0.3 mm, and weight of the fabric: 70-180 g/m2. The cleansing fabric of the present invention is useful as a makeup cleansing fabric or as wiping fabric for fine products and optical devices since it exhibits excellent cleansing performance, is soft to the touch and does not damage the surface of products to be cleaned.
    Type: Grant
    Filed: May 18, 2009
    Date of Patent: December 14, 2010
    Assignee: Kolon Industries, Inc.
    Inventors: Yang-Soo Park, Heung-Ryul Oh, Dong-Eun Lee
  • Publication number: 20090223589
    Abstract: The cleansing polyester fabric of the present invention (AAA). The cleansing fabric of the present invention is useful as a makeup cleansing fabric or as a wiping fabric for precision products and optical devices since it exhibits excellent cleansing performance, is soft to the touch and does not damage the surface of a products to be cleansed.
    Type: Application
    Filed: May 18, 2009
    Publication date: September 10, 2009
    Inventors: Yang-Soo PARK, Heung-Ryul OH, Dong-Eun LEE
  • Publication number: 20080227351
    Abstract: The cleansing polyester fabric of the present invention (AAA). The cleansing fabric of the present invention is useful as a makeup cleansing fabric or as a wiping fabric for precision products and optical devices since it exhibits excellent cleansing performance, is soft to the touch and does not damage the surface of a products to be cleansed.
    Type: Application
    Filed: December 22, 2004
    Publication date: September 18, 2008
    Inventors: Yang-Soo Park, Heung-Ryul Oh, Dong-Eun Lee