Abstract: Provided herein is a method for forming a periodic microstructure on a surface of zirconia-based ceramics, which are not easily mechanically workable, without causing thermal adverse effects. A zirconia-based ceramic having a surface periodic microstructure is also provided. A linearly or circularly polarized laser beam is irradiated to a zirconia-based ceramic surface, and periodic irregularities are formed in a spot of the laser beam. Stripe-pattern irregularities parallel to the direction of polarization can be formed in a spot of a laser beam by irradiating a linearly polarized ultrashort pulsed-laser beam to a zirconia-based ceramic surface. A mesh-like raised region and a dot-like recessed region can be periodically formed by irradiating a circularly polarized ultrashort pulsed-laser beam to a ceramic surface.

Abstract: Provided herein is a method for forming a periodic microstructure on a surface of zirconia-based ceramics, which are not easily mechanically workable, without causing thermal adverse effects. A zirconia-based ceramic having a surface periodic microstructure is also provided. A linearly or circularly polarized laser beam is irradiated to a zirconia-based ceramic surface, and periodic irregularities are formed in a spot of the laser beam. Stripe-pattern irregularities parallel to the direction of polarization can be formed in a spot of a laser beam by irradiating a linearly polarized ultrashort pulsed-laser beam to a zirconia-based ceramic surface. A mesh-like raised region and a dot-like recessed region can be periodically formed by irradiating a circularly polarized ultrashort pulsed-laser beam to a ceramic surface.

Abstract: A method for the elimination of high-energy ion in an EUV light-radiating device includes irradiating a first target with a first exciting laser to produce a laser-produced plasma EUV light source and causing a high-energy ion generated simultaneously with EUV light to collide against plasma produced by irradiating a second target with a second laser to separate the high-energy ion from the orbit of the EUV light. An apparatus for the elimination of a high-energy ion in an EUV light-radiating device includes a device for irradiating a first target with a first exciting laser to produce a plasma EUV light source and induce emission of EUV light, a device for irradiating a second target with a second laser to produce plasma, and a device for causing a high-energy ion generated simultaneously with the EUV light to be delayed by difference between an ion flight time and plasma expansion time for ion elimination and collide against the plasma to separate the high-energy ion from the orbit of the EUV light.

Abstract: A method for the elimination of high-energy ion in an EUV light-radiating device includes irradiating a first target with a first exciting laser to produce a laser-produced plasma EUV light source and causing a high-energy ion generated simultaneously with EUV light to collide against plasma produced by irradiating a second target with a second laser to separate the high-energy ion from the orbit of the EUV light. An apparatus for the elimination of a high-energy ion in an EUV light-radiating device includes a device for irradiating a first target with a first exciting laser to produce a plasma EUV light source and induce emission of EUV light, a device for irradiating a second target with a second laser to produce plasma, and a device for causing a high-energy ion generated simultaneously with the EUV light to be delayed by difference between an ion flight time and plasma expansion time for ion elimination and collide against the plasma to separate the high-energy ion from the orbit of the EUV light.