Patents by Inventor Hidekazu Suzuki

Hidekazu Suzuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210277345
    Abstract: A cell-containing container includes at least one recessed part accommodating cells, in which the cells adhere to a bottom surface of the recessed part, and a cell density in a first region of the bottom surface is 250 to 20,000 cells/mm2, and a cell density in a second region surrounding a periphery of the first region is less than 250 cells/mm2.
    Type: Application
    Filed: March 3, 2021
    Publication date: September 9, 2021
    Inventors: Tomoyuki ARATANI, Daisuke TAKAGI, Hidekazu YAGINUMA, Waka LIN, Shinnosuke KOSHIZUKA, Ryuya MASHIKO, Tomoaki NAKAYAMA, Atsushi MIYAOKA, Takeru SUZUKI, Minoru KO
  • Patent number: 11107892
    Abstract: A method for producing a SiC epitaxial wafer according to the present embodiment includes: an epitaxial growth step of growing the epitaxial layer on the SiC single crystal substrate by feeding an Si-based raw material gas, a C-based raw material gas, and a gas including a Cl element to a surface of a SiC single crystal substrate, in which the epitaxial growth step is performed under growth conditions that a film deposition pressure is 30 torr or less, a Cl/Si ratio is in a range of 8 to 12, a C/Si ratio is in a range of 0.8 to 1.2, and a growth rate is 50 ?m/h or more from an initial growth stage.
    Type: Grant
    Filed: April 19, 2018
    Date of Patent: August 31, 2021
    Assignees: SHOWA DENKO K.K., Central Research Institute Of Electric Power Industry, DENSO CORPORATION
    Inventors: Keisuke Fukada, Naoto Ishibashi, Akira Bando, Masahiko Ito, Isaho Kamata, Hidekazu Tsuchida, Kazukuni Hara, Masami Naito, Hideyuki Uehigashi, Hiroaki Fujibayashi, Hirofumi Aoki, Toshikazu Sugiura, Katsumi Suzuki
  • Publication number: 20210066024
    Abstract: An object of the invention is to provide a technique of capturing images at higher speed and higher magnification when acquiring continuous tilted images with an electron microscope. The electron microscope of the invention includes a first spherical receiver fixed to a column of the electron microscope and configured to slide with a spherical fulcrum provided at a tip end of a sample holder; a spherical surface part provided on the column; and a second spherical receiver provided outside the column. The spherical surface part and the second spherical receiver slide on a contact part between the spherical surface part and the second spherical receiver, and a track of the slide is along a spherical surface centered on a central axis of the first spherical receiver, so that a view shift and a focus shift from an observation position of a sample can be reduced.
    Type: Application
    Filed: March 23, 2018
    Publication date: March 4, 2021
    Inventors: Hideki KIKUCHI, Tadao FURUTSU, Kouichirou SAITOU, Hidekazu SUZUKI, Ryoji NAMEKAWA
  • Patent number: 10750087
    Abstract: An image processing system is provided that includes an image capturing apparatus configured to generate a plurality of captured images and at least one information processing apparatus connected to the image capturing apparatus. The information processing apparatus includes processing circuitry configured to input at least a first captured image and a second captured image from among the plurality of captured images, acquire first conversion data to be used for converting the first captured image and second conversion data to be used for converting the second captured image, and generate an output image by stitching converted images generated by converting the first captured image based on the first conversion data and the second captured image based on the second conversion data.
    Type: Grant
    Filed: September 19, 2018
    Date of Patent: August 18, 2020
    Assignee: Ricoh Company, Ltd.
    Inventors: Masato Takada, Makoto Shohara, Hidekazu Suzuki, Koui Sagawa
  • Publication number: 20200126755
    Abstract: Disclosed are a charged particle beam apparatus and a sample processing observation method, the method including: a sample piece formation process in which a sample is irradiated with a focused ion beam such that a sample piece is cut out from the sample; a cross-section processing process in which the sample piece support holds the sample piece and a cross section thereof is irradiated with the ion beam to process the cross section; a sample piece approach movement process in which the sample piece support holds the sample piece and the sample piece is moved to a position that is closer to an electron beam column than an intersection point of beam optical axes of the ion beam and an electron beam is; and a SEM image acquisition process in which the cross section is irradiated with the electron beam to acquire the SEM image of the cross section.
    Type: Application
    Filed: September 17, 2019
    Publication date: April 23, 2020
    Inventors: Hidekazu SUZUKI, Tatsuya ASAHATA
  • Patent number: 10622187
    Abstract: Disclosed are a charged particle beam apparatus wherein the charged particle beam apparatus can efficiently performs finish processing of a sample and acquisition of a high-precision SEM image of a processing surface of the sample in a short time, and a sample processing observation method using the same. The charged particle beam apparatus includes: a gallium ion beam column radiating a gallium ion beam toward a sample to form a cross-section of the sample; an electron beam column having a semi-in-lens type objective lens and radiating an electron beam toward the sample; a gas ion beam column radiating a gas ion beam toward the sample to perform finish processing of the cross-section of the sample, wherein the gas ion beam has a beam diameter larger than a maximum diameter of the cross-section of the sample.
    Type: Grant
    Filed: February 19, 2019
    Date of Patent: April 14, 2020
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Yo Yamamoto, Shota Torikawa, Hidekazu Suzuki, Hiroyuki Suzuki, Mamoru Okabe, Tatsuya Asahata
  • Patent number: 10446370
    Abstract: A charged particle beam apparatus includes: an irradiation unit that irradiates a sample with a charged particle beam; an image formation section that detects a charged particle generated from the sample due to the irradiation with the charged particle beam and forms an image based on a signal obtained by detecting the charged particle; an input reception unit that receives an observation condition; a derivation section that derives second observation parameters proper for the observation condition based on the received observation condition and first observation parameters stored in a storage unit; and a control unit that controls the irradiation unit based on the second observation parameters.
    Type: Grant
    Filed: December 21, 2017
    Date of Patent: October 15, 2019
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventor: Hidekazu Suzuki
  • Publication number: 20190259574
    Abstract: Disclosed are a charged particle beam apparatus wherein the charged particle beam apparatus can efficiently performs finish processing of a sample and acquisition of a high-precision SEM image of a processing surface of the sample in a short time, and a sample processing observation method using the same. The charged particle beam apparatus includes: a gallium ion beam column radiating a gallium ion beam toward a sample to form a cross-section of the sample; an electron beam column having a semi-in-lens type objective lens and radiating an electron beam toward the sample; a gas ion beam column radiating a gas ion beam toward the sample to perform finish processing of the cross-section of the sample, wherein the gas ion beam has a beam diameter larger than a maximum diameter of the cross-section of the sample.
    Type: Application
    Filed: February 19, 2019
    Publication date: August 22, 2019
    Inventors: Yo YAMAMOTO, Shota TORIKAWA, Hidekazu SUZUKI, Hiroyuki SUZUKI, Mamoru OKABE, Tatsuya ASAHATA
  • Publication number: 20190020818
    Abstract: An image processing system is provided that includes an image capturing apparatus configured to generate a plurality of captured images and at least one information processing apparatus connected to the image capturing apparatus. The information processing apparatus includes processing circuitry configured to input at least a first captured image and a second captured image from among the plurality of captured images, acquire first conversion data to be used for converting the first captured image and second conversion data to be used for converting the second captured image, and generate an output image by stitching converted images generated by converting the first captured image based on the first conversion data and the second captured image based on the second conversion data.
    Type: Application
    Filed: September 19, 2018
    Publication date: January 17, 2019
    Applicant: Ricoh Company Ltd.
    Inventors: Masato Takada, Makoto Shohara, Hidekazu Suzuki, Koui Sagawa
  • Patent number: 10089909
    Abstract: A display control method includes: inputting user's image including a drawing portion made by hand drawing and being a display target image; and performing image control including causing the input user's image to emerge from any one of a left end and a right end of a predetermined display region, on which the user's image is to be displayed, and moving the user's image that has emerged.
    Type: Grant
    Filed: September 11, 2017
    Date of Patent: October 2, 2018
    Assignee: Ricoh Company, Limited
    Inventors: Atsushi Itoh, Aiko Ohtsuka, Tetsuya Sakayori, Hidekazu Suzuki, Takanobu Tanaka
  • Patent number: 10052732
    Abstract: A cooling gas is fed from an ejection nozzle into the interior of a through-hole which is formed in a radially central portion of a main spindle, and which penetrates through said main spindle in an axial direction. The cooling gas passes through radial venting holes provided in a plurality of locations, in the circumferential direction, in an axially intermediate portion of the main spindle, is fed into axial venting holes provided in a plurality of locations, in the circumferential direction, extending from one axial-direction end of the main spindle to an intermediate portion thereof, is caused to flow through the axial venting holes, and is discharged from discharge holes.
    Type: Grant
    Filed: February 15, 2016
    Date of Patent: August 21, 2018
    Assignee: NSK LTD.
    Inventors: Hidekazu Suzuki, Atsushi Ishikawa
  • Publication number: 20180182596
    Abstract: A charged particle beam apparatus includes: an irradiation unit that irradiates a sample with a charged particle beam; an image formation section that detects a charged particle generated from the sample due to the irradiation with the charged particle beam and forms an image based on a signal obtained by detecting the charged particle; an input reception unit that receives an observation condition; a derivation section that derives second observation parameters proper for the observation condition based on the received observation condition and first observation parameters stored in a storage unit; and a control unit that controls the irradiation unit based on the second observation parameters.
    Type: Application
    Filed: December 21, 2017
    Publication date: June 28, 2018
    Inventor: Hidekazu SUZUKI
  • Patent number: 9881463
    Abstract: Provided is a gaming machine which does not bore the player through reel actions until completion of rearrangement of symbols. Under the condition where predetermined symbols are aligned on a payline when the symbols of a first scroll line of at least one of a plurality of scroll lines are being scrolled and symbols on the remaining second scroll lines are stopped, the gaming machine changes scrolling motion of symbols of the first scroll line.
    Type: Grant
    Filed: September 18, 2013
    Date of Patent: January 30, 2018
    Assignees: Universal Entertainment Corporation, Aruze Gaming America, Inc.
    Inventors: Masumi Fujisawa, Kenta Kitamura, Susumu Mio, Hidekazu Suzuki, Kazuo Okada
  • Publication number: 20180021907
    Abstract: A cooling gas is fed from an ejection nozzle into the interior of a through-hole which is formed in a radially central portion of a main spindle, and which penetrates through said main spindle in an axial direction. The cooling gas passes through radial venting holes provided in a plurality of locations, in the circumferential direction, in an axially intermediate portion of the main spindle, is fed into axial venting holes provided in a plurality of locations, in the circumferential direction, extending from one axial-direction end of the main spindle to an intermediate portion thereof, is caused to flow through the axial venting holes, and is discharged from discharge holes.
    Type: Application
    Filed: February 15, 2016
    Publication date: January 25, 2018
    Applicant: NSK LTD.
    Inventors: Hidekazu SUZUKI, Atsushi ISHIKAWA
  • Publication number: 20170372649
    Abstract: A display control method includes: inputting user's image including a drawing portion made by hand drawing and being a display target image; and performing image control including causing the input user's image to emerge from any one of a left end and a right end of a predetermined display region, on which the user's image is to be displayed, and moving the user's image that has emerged.
    Type: Application
    Filed: September 11, 2017
    Publication date: December 28, 2017
    Applicant: Ricoh Company, Ltd.
    Inventors: Atsushi Itoh, Aiko Ohtsuka, Tetsuya Sakayori, Hidekazu Suzuki, Takanobu Tanaka
  • Patent number: 9786208
    Abstract: A display control method includes: inputting user's image including a drawing portion made by hand drawing and being a display target image; and performing image control including causing the input user's image to emerge from any one of a left end and a right end of a predetermined display region, on which the user's image is to be displayed, and moving the user's image that has emerged.
    Type: Grant
    Filed: October 19, 2016
    Date of Patent: October 10, 2017
    Assignee: RICOH COMPANY, LIMITED
    Inventors: Atsushi Itoh, Aiko Ohtsuka, Tetsuya Sakayori, Hidekazu Suzuki, Takanobu Tanaka
  • Patent number: 9761423
    Abstract: A sputtering apparatus comprises: a target holder; and a magnet unit of a rectangular shape having long and short sides. The magnet unit includes: a first magnet; a second magnet disposed surrounding the first magnet and magnetized in a different and opposite direction from a direction of magnetization of the first magnet, and a third magnet located at part between the first magnet and the second magnet in the short-side direction and at least at a center position between the first magnet and the second magnet, the third magnet being magnetized in the short-side direction. In the third magnet, a surface facing the second magnet has the same polarity as that of a surface of the second magnet on the target holder side, and a surface facing the first magnet has the same polarity as that of a surface of the first magnet on the target holder side.
    Type: Grant
    Filed: December 22, 2014
    Date of Patent: September 12, 2017
    Assignee: Canon Anelva Corporation
    Inventor: Hidekazu Suzuki
  • Patent number: 9730278
    Abstract: In order to provide an induction heating cooking device in which a supporting configuration of a heating coil unit is simple and can be easily assembled, and which can accurately and constantly maintain a distance between a top plate and heating coils, opposite side surfaces of a framework laid out below the top plate are configured to have first vertical parts, first horizontal parts, and second vertical parts. A heating coil supporting member that supports the heating coils is disposed to be bridged between the first horizontal parts of the opposite side surfaces of the framework, and the heating coil unit having the heating coil is configured to be securely supported by the first horizontal parts.
    Type: Grant
    Filed: March 10, 2014
    Date of Patent: August 8, 2017
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Hidekazu Suzuki, Tomoya Takahashi, Kenji Ogawa, Hiroshi Isago, Shumpei Ando, Masahiro Yokono, Ryuuji Nagata, Katsuyuki Aihara, Shozo Ushio
  • Publication number: 20170175216
    Abstract: A method of producing a spring which reduces time required for a heat treatment step of eliminating a machining strain generated by a forming step is provided. This production method is provided with a forming step (S10) of forming a spring steel material into a spring shape and a heat treatment step (S12) of eliminating a machining strain generated in the spring steel material by the forming step. The heat treatment step is executed by electrically heating the spring steel material by applying a current thereto. The heat treatment step has a first step of heating the spring steel material to a predetermined set temperature and a second step of keeping the spring steel material at the set temperature for a predetermined set time period subsequent to the first step. The set temperature is set to be higher than 430° C. but not higher than 500° C.
    Type: Application
    Filed: March 3, 2017
    Publication date: June 22, 2017
    Applicant: Chuo Hatsujo Kabushiki Kaisha
    Inventors: Yuichi Hirata, Hidekazu Suzuki, Hiroyuki Ogiso
  • Patent number: 9623475
    Abstract: A method of producing a spring which reduces time required for a heat treatment step of eliminating a machining strain generated by a forming step is provided. This production method is provided with a forming step (S10) of forming a spring steel material into a spring shape and a heat treatment step (S12) of eliminating a machining strain generated in the spring steel material by the forming step. The heat treatment step is executed by electrically heating the spring steel material by applying a current thereto. The heat treatment step has a first step of heating the spring steel material to a predetermined set temperature and a second step of keeping the spring steel material at the set temperature for a predetermined set time period subsequent to the first step. The set temperature is set to be higher than 430° C. but not higher than 500° C.
    Type: Grant
    Filed: July 12, 2011
    Date of Patent: April 18, 2017
    Assignee: CHUO HATSUJO KABUSHIKI KAISHA
    Inventors: Yuichi Hirata, Hidekazu Suzuki, Hiroyuki Ogiso