Abstract: According to one embodiment, an electric-vehicle testing apparatus includes processing circuitry. The circuitry generates a first signal corresponding to accelerator operation amount and a second signal corresponding to brake operation amount in accordance with test conditions. The circuitry controls torque of a test motor included in a test object. The circuitry computes running resistance to be assumed using a rotation speed of the test motor. The circuitry computes braking force using the second signal and an actual vehicle speed obtained from the rotation speed of the test motor. The circuitry controls torque of a load motor coupled to the test motor, based on a second command value corresponding to the running resistance and the braking force.

Abstract: According to an embodiment, a particle beam treatment system includes a storage, an estimator, a target value generator, and a particle beam treatment device. The storage stores therein a respiratory movement model obtained by synchronizing amount of displacement of an affected area of a subject with a signal related to respiration of the subject and performing modeling. The estimator estimates, based on the measured signal related to respiration and the respiratory movement model, amount of displacement of the affected area corresponding to the measured signal. The target value generator generates a target value, which is used for performing movement control on a platform on which the subject is lying down, corresponding to the estimated amount of displacement of the affected area. The particle beam treatment device irradiates, with particle beams, the affected area of the subject on the platform subjected to movement control according to the target value.

Abstract: An operation system includes: an operation device manually operated by a user and inputting a command of an operation content to a command target apparatus selected from multiple apparatuses; a selection device selecting one apparatus as the command target apparatus according to multiple visual line regions individually set in relation to the apparatuses and a visual line direction of the user detected by a visual line detection sensor, the one device relating to one visual line region disposed in the visual line direction; and a selection maintaining device maintaining a selection state of the command target apparatus even when the visual line direction is changed to another direction pointing to none of the visual line regions while the command target apparatus is selected.

Abstract: An image reading device includes a camera, an acquisition processing portion, a still image extraction processing portion, and a combining processing portion. The acquisition processing portion acquires data of a moving image photographed by the camera. The still image extraction processing portion extracts a plurality of pieces of still image data from the data of the moving image. The combining processing portion generates composite image data by combining the plurality of pieces of still image data such that common parts of a subject included in two arbitrary pieces of still image data among the plurality of pieces of still image data overlap each other at least in part.

Abstract: A method of manufacturing a semiconductor device includes: forming an insulating film above a semiconductor substrate; forming a conductive film on the insulating film; forming a dielectric film on the conductive film; forming a plurality of upper electrodes at intervals on the dielectric film; forming a first protective insulating film on the upper electrodes and the dielectric film by a sputtering method; forming a second protective insulating film on the first protective insulating film by an atomic layer deposition method, thereby filling gaps of a grain boundary of the dielectric film with the second protective insulating film; and patterning the conductive film after the second protective insulating film is formed to provide a lower electrode.

Abstract: Provide a cooking device capable of processing food with a simple configuration while inhibiting oxidation of food and also inhibiting pressure inside a cooking container from rising excessively. A cooking device processes food in an accommodation space by a processing tool rotated by a motor while an air in the accommodation space in which the processing tool to process the food is arranged is exhausted and includes a driving device (a closing member) and a check valve. The driving device opens/closes the accommodation space. The check valve allows an outflow of the air out of the accommodation space when the air in the accommodation space closed by the driving device is exhausted and also stops an opposite flow of the air after the air is exhausted.

Abstract: Provide a cooking device capable of processing food with a simple configuration while inhibiting oxidation of food and also inhibiting pressure inside a cooking container from rising excessively. A cooking device processes food in an accommodation space by a processing tool rotated by a motor while an air in the accommodation space in which the processing tool to process the food is arranged is exhausted and includes a driving device (a closing member) and a check valve. The driving device opens/closes the accommodation space. The check valve allows an outflow of the air out of the accommodation space when the air in the accommodation space closed by the driving device is exhausted and also stops an opposite flow of the air after the air is exhausted.

Abstract: The object is to provide a liquid crystal display reducing degradation in image quality. A liquid crystal display apparatus comprises a first planar electrode, a first insulator layered over an upper surface of the first planar electrode, a planar pixel electrode layered over an upper surface of the first insulator, a second insulator layered over an upper surface of the pixel electrode, a second planar electrode that covers the pixel electrode and that is layered over an upper surface of the second insulator, and a liquid crystal layer disposed over an upper surface of the second planar electrode.

Abstract: A combination meter including a first meter and a second meter, which are visible from a front side, and a half-silvered mirror disposed in front of the combination meter and having semi-transparent property are provided. Also, an image output device displays an image toward the half-silvered mirror is provided. The half-silvered mirror reflects the image displayed by the image output device to display a virtual image in front of the meter. Thus, the virtual image is overlappedly displayed with respect to the combination meter, whereby a use intuitively recognizes high priority information.

Abstract: A vapor phase growth apparatus has a reaction chamber to form a film on an upper surface of a substrate by a vapor growth reaction, a gas supplier to supply a gas to the reaction chamber, a heater to heat the substrate from a back side of the substrate, and a controller to control an output of the heater. The controller has an electrical characteristics measuring instrument which measures electrical characteristics of the heater at predetermined time intervals and detects a variation value of the electrical characteristics between a newly value and previous value, and a threshold determiner which extracts a maximum value and a minimum value of a predetermined number of detected variation values and newly variation value of the electrical characteristics, calculates differences between the maximum value and the minimum value at the predetermined time intervals, and determines whether the difference exceeds a predetermined threshold.

Abstract: An operation system includes: an operation device that is manually operated by a user and inputs a command of an action content to a command target apparatus selected from a plurality of apparatuses; a plurality of display units that are individually arranged on the plurality of apparatuses and display information corresponding to the action content; and a selection device that selects one of the plurality of apparatuses as the command target apparatus according to a visual line direction of a user detected by a visual line detection sensor, the one of the plurality of apparatuses corresponding to one of the display units disposed in the visual line direction.

Abstract: An operation system includes: an operation device manually operated by a user; a control device that controls actions of a plurality of apparatuses according to a visual line direction of the user detected by a visual line detection sensor and an operation content of the operation device; and a contact detection device that detects that the user touches the operation device. The control device enables the visual line direction detected by the visual line detection sensor and reflects the visual line direction in a control of the control device when the contact detection device detects that the user touches the operation device.

Abstract: A liquid crystal display apparatus comprises a first planar electrode, a first insulator layered over an upper surface of the first planar electrode, a planar pixel electrode layered over an upper surface of the first insulator, a second insulator layered over an upper surface of the pixel electrode, a second planar electrode that covers the pixel electrode and that is layered over an upper surface of the second insulator, and a liquid crystal layer disposed over an upper surface of the second planar electrode.

Abstract: A vapor growth apparatus has a reaction chamber, a gas supply part to supply a gas to the reaction chamber, a heater to heat the substrate from a surface opposite to a film growth surface of the substrate, an irradiation part to emit an optical signal to the film growth surface, a light receiving part to receive the reflected optical signal, a first light receiving range determination part to determine whether a light receiving position of the optical signal in the light receiving part is out of a predetermined first light receiving range, and a position deviation detection part to judge that the substrate has caused position deviation, a rotation part to rotate the substrate via a susceptor, a purge gas supply part to supply a purge gas into the rotation part, and a control part to control a supply amount of the purge gas.

Abstract: A lateral-electric-field mode liquid crystal display device includes: substrates; a liquid crystal layer; plural scanning lines and plural data lines crossing on one of the substrates; plural pixels formed by the scanning lines and the data lines; at least one strip-shaped pixel electrode arranged in each pixel and extending along the data line or the scanning line; a common electrode located in a layer closer to the liquid crystal layer than the strip-shaped pixel electrodes so as to cover the scanning lines and the data lines; and a first rectangular pixel electrode connected with one end of each of the at least one strip-shaped pixel electrode to from a T shape. The first rectangular pixel electrode overlaps with corner parts of an opening section of the common electrode, where the corners are closer to the first rectangular pixel electrode than the other corners of the opening section.

Abstract: A liquid crystal display apparatus comprises a planar first electrode, multiple second electrodes and third electrodes that overlap with the first electrode and are alternately arranged, in correspondence to one subpixel. The second electrode and the third electrode are independently driven. A voltage for driving the liquid crystal is individually applied between the second electrode and the first electrode and between the third electrode and the first electrode.

Abstract: A method of manufacturing a semiconductor device includes: forming an insulating film above a semiconductor substrate; forming a conductive film on the insulating film; forming a dielectric film on the conductive film; forming a plurality of upper electrodes at intervals on the dielectric film; forming a first protective insulating film on the upper electrodes and the dielectric film by a sputtering method; forming a second protective insulating film on the first protective insulating film by an atomic layer deposition method, thereby filling gaps of a grain boundary of the dielectric film with the second protective insulating film; and patterning the conductive film after the second protective insulating film is formed to provide a lower electrode.

Abstract: A method of manufacturing a semiconductor device includes: forming an insulating film above a semiconductor substrate; forming a conductive film on the insulating film; forming a dielectric film on the conductive film; forming a plurality of upper electrodes at intervals on the dielectric film; forming a first protective insulating film on the upper electrodes and the dielectric film by a sputtering method; forming a second protective insulating film on the first protective insulating film by an atomic layer deposition method, thereby filling gaps of a grain boundary of the dielectric film with the second protective insulating film; and patterning the conductive film after the second protective insulating film is formed to provide a lower electrode.

Abstract: An operation system includes: an operation device manually operated by a user and inputting a command of an operation content to a command target apparatus selected from multiple apparatuses; a selection device selecting one apparatus as the command target apparatus according to multiple visual line regions individually set in relation to the apparatuses and a visual line direction of the user detected by a visual line detection sensor, the one device relating to one visual line region disposed in the visual line direction; and a selection maintaining device maintaining a selection state of the command target apparatus even when the visual line direction is changed to another direction pointing to none of the visual line regions while the command target apparatus is selected.

Abstract: In a silicon carbide semiconductor film forming apparatus, first to third gasses are introduced into first to third separation chambers through first to third inlets, respectively. The first and second gasses are silicon raw material including gas and carbon raw material including gas, and the third gas does not include silicon and carbon. The first and second gasses are independently supplied to growth space through first and second supply paths extending from the first and second separation chambers, respectively. The third gas is introduced through a third supply path from the third separation chamber between the first and second gasses.