Abstract: In conventional fluid discharge devices, a discharge head used should be increased in size according to increase in size of a workpiece such as silicon wafer. However, if the discharge head increases in length, a deformation amount of a mask used for discharging the fluid on the workpiece increases, thereby the discharging amount varies. Discharging the fluid in a reciprocating manner is performed using a fluid discharging device including a head unit having a width shorter than a length of the workpiece. A suction port having opening portions each having a slit shape are disposed on the both sides of the discharge nozzle in a vicinity of the discharge nozzle.

Abstract: Example implementations described herein are directed to a meta-data processing system that supports the creation and deployment of the Analytical Solution Modules in development of industrial analytics. The example implementations described herein can involve a first system configured to be directed to a data scientist for receiving flow and operator definitions to generate an analytics library, which is provided to a second system configured to be directed to a domain expert for applying the analytics library to generate analytics modules to be executed on data input to the second system.

Abstract: Provided is a metabolism improving agent that contains, for example, an alkalizing agent such as an acidosis improving agent or a urinary alkalizing agent as an active ingredient, and has actions such as improvement of insulin resistance, improvement of pituitary and adrenal functions, and reduction of visceral fat accumulation.

Abstract: An electrophotographic photoconductor is provided that includes a conductive substrate, an undercoat layer overlying the conductive substrate, and a photosensitive layer overlying the undercoat layer. The undercoat layer contains zinc oxide particles and a binder resin and has a volume resistivity of 0.03×106 ?·cm or less in an electrical field of 5 V/?m at a temperature of 23 degrees C. and a relative humidity of 55%. The photosensitive layer contains a compound represented by the following general formula (1): where each of R1 to R3 independently represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 6 carbon atoms which may have a substituent, or a substituted or unsubstituted aryl group having 6 to 12 carbon atoms.

Abstract: In conventional fluid discharge devices, a discharge head used should be increased in size according to increase in size of a workpiece such as silicon wafer. However, if the discharge head increases in length, a deformation amount of a mask used for discharging the fluid on the workpiece increases, thereby the discharging amount varies. Discharging the fluid in a reciprocating manner is performed using a fluid discharging device including a head unit having a width shorter than a length of the workpiece. A suction port having opening portions each having a slit shape are disposed on the both sides of the discharge nozzle in a vicinity of the discharge nozzle.

Abstract: In conventional fluid discharge devices, a discharge head used should be increased in size according to increase in size of a workpiece such as silicon wafer. However, if the discharge head increases in length, a deformation amount of a mask used for discharging the fluid on the workpiece increases, thereby the discharging amount varies. Discharging the fluid in a reciprocating manner is performed using a fluid discharging device including a head unit having a width shorter than a length of the workpiece. A suction port having opening portions each having a slit shape are disposed on the both sides of the discharge nozzle in a vicinity of the discharge nozzle.

Abstract: Example implementations described herein are directed to a meta-data processing system that supports the creation and deployment of the Analytical Solution Modules in development of industrial analytics. The example implementations described herein can involve a first system configured to be directed to a data scientist for receiving flow and operator definitions to generate an analytics library, which is provided to a second system configured to be directed to a domain expert for applying the analytics library to generate analytics modules to be executed on data input to the second system.

Abstract: An electrophotographic photoconductor is provided that includes a conductive substrate, an undercoat layer overlying the conductive substrate, and a photosensitive layer overlying the undercoat layer. The undercoat layer contains zinc oxide particles and a binder resin and has a volume resistivity of 0.03×106 ?·cm or less in an electrical field of 5 V/?m at a temperature of 23 degrees C. and a relative humidity of 55%. The photosensitive layer contains a compound represented by the following general formula (1): where each of R1 to R3 independently represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 6 carbon atoms which may have a substituent, or a substituted or unsubstituted aryl group having 6 to 12 carbon atoms.

Abstract: An analysis model execution unit executing a part of an analysis model, an analysis model partial execution unit partially executing the analysis model based on intermediate data generated during execution of the analysis model, external storage storing the intermediate data and mapping information which is corresponding relationship between the intermediate data and the analysis model, and an analysis model general processing unit generating the mapping information by associating the intermediate data with the analysis model and reading the intermediate data associated with the analysis model from the external storage based on the mapping information are provided.

Abstract: A pattern formed on a silicon wafer is fine so that solder bumps formed on the silicon wafer are also fine and hence, when a failure occurs, the failure cannot be corrected so that an entire silicon wafer as a workpiece is discarded. Provided is a correction method where, on solder bumps formed on the silicon wafer, a mask in which holes are formed with the same pattern as the solder bumps is placed so as to cover the solder bumps and, thereafter, molten solder is caused to come into contact with the solder bumps through the mask thus filling hole portions of the mask with the molten solder.

Abstract: A defect may occur in which as the amount of fluid discharged by a fluid discharge device decreases, a mask is not filled with the fluid even when the fluid is discharged. In order to fill a workpiece with the fluid, it is necessary to replace air in the workpiece corresponding to a discharge part with the fluid. The air in the workpiece is removed in advance, thereby filling the workpiece with the discharged fluid. A fluid discharge device in which, at one end of a discharge head, a suction port for sucking air in the mask on the workpiece, and a fluid discharge device having a discharge nozzle formed thereon for discharging the fluid are formed is used.

Abstract: A flow preparation assisting apparatus calculates a difference between one or more flow data sets and a template flow data set having been a base of the one or more flow data sets, and calculates a dependency relation between node attributes for a template flow indicated by the template flow data set, from the calculated difference. The flow preparation assisting apparatus issues a notification according to the calculated dependency relation.

Abstract: A heating cooking device includes a heater, a heating chamber, an imaging unit, a lighting unit, an image processor, and a lighting controller. The heating chamber accommodates an object to be heated. The imaging unit take images of the inside of the heating chamber. The lighting unit illuminates the inside of the heating chamber. The image processor analyzes an image to detect the brightness of the object to be heated in the image. The lighting controller controls the lighting unit in response to the brightness of the object to be heated. This aspect allows the heating cooking device to accurately determine a cooking state of the object to be heated on the basis of the image of the inside of the heating chamber taken to control the heater in response to the cooking state.

Abstract: This geopolymer molding production method comprises: a mixing step (S1) for mixing a first material containing aluminum and silicon with a hydrate of an alkali stimulant containing a hydrate of an alkaline hydroxide and/or a hydrate of an alkaline silicate; a compaction step (S2) for compacting the mixture obtained in the mixing step (S1) into a compacted mixture; and a curing step (S3) for curing the compacted mixture.

Abstract: A flow preparation assisting apparatus calculates a difference between one or more flow data sets and a template flow data set having been a base of the one or more flow data sets, and calculates a dependency relation between node attributes for a template flow indicated by the template flow data set, from the calculated difference. The flow preparation assisting apparatus issues a notification according to the calculated dependency relation.

Abstract: A design pattern discovery assist apparatus presents one or more second node candidates, which are one or more candidates of a second node, when a first node is selected regarding a flow in the middle of being edited. The first node is any node corresponding to one type of node between an input node and an output node. The second node is a node corresponding to the first node among nodes corresponding to any type between the other type of node between the input node and the output node and an input/output node, which serves as both the input and the output nodes. When any second node candidate is selected as the second node, the assist apparatus presents one or more partial flow candidates which are one or more candidates of a partial flow between the first node and the second node.

Abstract: An analysis model execution unit executing a part of an analysis model, an analysis model partial execution unit partially executing the analysis model based on intermediate data generated during execution of the analysis model, external storage storing the intermediate data and mapping information which is corresponding relationship between the intermediate data and the analysis model, and an analysis model general processing unit generating the mapping information by associating the intermediate data with the analysis model and reading the intermediate data associated with the analysis model from the external storage based on the mapping information are provided.

Abstract: A pattern formed on a silicon wafer is fine so that solder bumps formed on the silicon wafer are also fine and hence, when a failure occurs, the failure cannot be corrected so that an entire silicon wafer as a workpiece is discarded. Provided is a correction method where, on solder bumps formed on the silicon wafer, a mask in which holes are formed with the same pattern as the solder bumps is placed so as to cover the solder bumps and, thereafter, molten solder is caused to come into contact with the solder bumps through the mask thus filling hole portions of the mask with the molten solder.

Abstract: A traction machine base includes a top member, a bottom member, a bottom member, first bolts, and second bolts. The top member is intended for supporting a traction machine. A plurality of attachment holes for fixing the top member are formed in the bottom member. A plurality of attachment holes for fixing the top member are formed in the bottom member. The first bolts pass through the attachment holes and fix the top member to the bottom member. The second bolts pass through the attachment holes and fix the top member to the bottom member. The top member is fixed to the bottom member using a smaller number of the first bolts than the number of the attachment holes. The top member is fixed to the bottom member using a smaller number of the second bolts than the number of the attachment holes.

Abstract: In conventional fluid discharge devices, a discharge head used should be increased in size according to increase in size of a workpiece such as silicon wafer. However, if the discharge head increases in length, a deformation amount of a mask used for discharging the fluid on the workpiece increases, thereby the discharging amount varies. Discharging the fluid in a reciprocating manner is performed using a fluid discharging device including a head unit having a width shorter than a length of the workpiece. A suction port having opening portions each having a slit shape are disposed on the both sides of the discharge nozzle in a vicinity of the discharge nozzle.