Patents by Inventor Hideyuki Hirakoso

Hideyuki Hirakoso has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200376814
    Abstract: A water/oil repellent layer-provided article, containing a substrate, a water/oil repellent layer containing a hydrolyzed condensate of a fluorinated compound having a hydrolyzable silyl group, and a silicon oxide layer containing alkali metal atoms, present between the substrate and the water/oil repellent layer, where in the silicon oxide layer, the average concentration of the alkali metal atoms in a region with a depth from the surface in contact with the water/oil repellent layer of at least 0.1 nm and at most 0.3 nm, is at least 2.0×1019 atoms/cm3.
    Type: Application
    Filed: August 21, 2020
    Publication date: December 3, 2020
    Applicant: AGC Inc.
    Inventors: Lilin ZHOU, Kumiko SUWA, Kenji ISHIZEKI, Hideyuki HIRAKOSO, Daisuke KOBAYASHI, Michinori SUEHARA, Mio TOKUNAGA
  • Patent number: 10786976
    Abstract: A water/oil repellent layer-provided article, containing a substrate, a water/oil repellent layer containing a hydrolyzed condensate of a fluorinated compound having a hydrolyzable silyl group, and a silicon oxide layer containing alkali metal atoms, present between the substrate and the water/oil repellent layer, where in the silicon oxide layer, the average concentration of the alkali metal atoms in a region with a depth from the surface in contact with the water/oil repellent layer of at least 0.1 nm and at most 0.3 nm, is at least 2.0×1019 atoms/cm3.
    Type: Grant
    Filed: March 26, 2019
    Date of Patent: September 29, 2020
    Assignee: AGC Inc.
    Inventors: Lilin Zhou, Kumiko Suwa, Kenji Ishizeki, Hideyuki Hirakoso, Daisuke Kobayashi, Michinori Suehara, Mio Tokunaga
  • Publication number: 20200095428
    Abstract: To provide a fluorinated ether composition for vapor deposition which can be used to form a vapor-deposited film excellent in frictional durability, and an article with a vapor-deposited film and a method for its production. This fluorinated ether composition for vapor deposition comprises a compound (A) having a poly(oxyperfluoroalkylene) chain and a hydrolyzable silyl group, and a partial condensate (B) of the compound (A), wherein the proportion of the partial condensate (B) to the total amount of the compound (A) and the partial condensate (B) is from 4 to 40 mass %.
    Type: Application
    Filed: November 27, 2019
    Publication date: March 26, 2020
    Applicant: AGO Inc.
    Inventors: Kenji ISHIZEKI, Hideyuki HIRAKOSO
  • Publication number: 20190217580
    Abstract: A water/oil repellent layer-provided article, containing a substrate, a water/oil repellent layer containing a hydrolyzed condensate of a fluorinated compound having a hydrolyzable silyl group, and a silicon oxide layer containing alkali metal atoms, present between the substrate and the water/oil repellent layer, where in the silicon oxide layer, the average concentration of the alkali metal atoms in a region with a depth from the surface in contact with the water/oil repellent layer of at least 0.1 nm and at most 0.3 nm, is at least 2.0×1019 atoms/cm3.
    Type: Application
    Filed: March 26, 2019
    Publication date: July 18, 2019
    Applicant: AGC Inc.
    Inventors: Lilin ZHOU, Kumiko Suwa, Kenji Ishizeki, Hideyuki Hirakoso, Daisuke Kobayashi, Michinori Suehara, Mio Tokunaga
  • Publication number: 20180273424
    Abstract: A wavelength-selective transmissive glass article has light transmittance Tmore than 315 nm and 400 nm or less at a wavelength of more than 315 nm and 400 nm or less of 1% or more. In addition, the wavelength-selective transmissive glass article has light transmittance T315 nm or less at a wavelength of 315 nm or less of 60% or less.
    Type: Application
    Filed: May 30, 2018
    Publication date: September 27, 2018
    Applicants: ASAHI GLASS COMPANY, LIMITED, TSUBOTA LABORATORY, INC.
    Inventors: Hideyuki Hirakoso, Takahiro Mashimo, Kensuke Nagai, Kazuo Tsubota, Toshihide Kurihara, Hidemasa Torii
  • Publication number: 20180105457
    Abstract: There is provided a functional glass article having high abrasion resistance. The functional glass article comprising: a glass substrate having a first face and a second face on a back face of the first face; and a plurality of particles arranged on the first face and made of a material having a Mohs hardness of 7 or higher, each of the plurality of particles having a particle diameter of 1 nm or more and 300 nm or less, and the plurality of particles including a particle located partly inside the glass substrate, the first face with the plurality of particles having a higher Martens hardness by 150 N/mm2 or more than a Martens hardness of the second face.
    Type: Application
    Filed: December 19, 2017
    Publication date: April 19, 2018
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Wakako ITO, Hideyuki HIRAKOSO
  • Publication number: 20160011348
    Abstract: An infrared cut filter is disclosed. This filter includes a transparent substrate and one or more infrared absorbing layers containing an infrared absorbing compound on at least one principal surface of the transparent substrate, wherein a transmittance at a wavelength of 1200 nm measured in a stack composed of the transparent substrate and the one or more infrared absorbing layers is 10% or less.
    Type: Application
    Filed: September 25, 2015
    Publication date: January 14, 2016
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Hideyuki HIRAKOSO, Hiroshi KUMAI, Wakako ITO, Satoshi KASHIWABARA
  • Publication number: 20130236637
    Abstract: The present invention relates to a process for manufacturing a copper hydride fine particle dispersion, the process including: reducing a copper(II) salt with a hydrido-based reducing agent in the following solvent (A) in the presence of the following alkylamine (B): solvent (A): a solvent having a solubility parameter (SP value) of from 8 to 12 and being inert to the hydrido-based reducing agent and alkylamine (B): an alkylamine having an alkyl group which has 7 or more carbon atoms and having a boiling point of 250° C. or lower.
    Type: Application
    Filed: April 22, 2013
    Publication date: September 12, 2013
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Satoshi KASHIWABARA, Hideyuki HIRAKOSO, Takashige YONEDA
  • Patent number: 7956103
    Abstract: To provide an ink composition capable of forming a metallic material which is excellent in adhesion to a substrate and free from ion migration. An ink composition having fine metallic copper particles and/or fine copper hydride particles, and fine silver oxide particles or fine metallic silver particles, dispersed in a water-insoluble organic liquid, which composition has a solid content concentration of from 10 to 80 mass % and contains from 5 to 90 parts by mass of the fine metallic copper particles and/or fine copper hydride particles, and from 10 to 95 parts by mass of the fine silver oxide particles or fine metallic silver particles, per 100 parts by mass of the total solid content in the ink composition.
    Type: Grant
    Filed: October 12, 2007
    Date of Patent: June 7, 2011
    Assignee: Asahi Glass Company, Limited
    Inventors: Hideyuki Hirakoso, Keisuke Abe, Yasuhiro Sanada
  • Patent number: 7550513
    Abstract: It is to provide fine particles of copper, nickel or palladium hydride having an average particle diameter of at most 50 nm, which are hardly oxidized in the atmosphere and are excellent in storage stability and are thereby very suitable for formation of metallic materials, and their production process. Further, it is to provide a dispersion containing fine particles of copper, nickel or palladium hydride, which is excellent in storage stability, and a metallic material obtained by applying the dispersion, followed by baking. The fine particles of copper, nickel or palladium hydride and the dispersion thereof, to be obtained by the present invention, are applicable to various applications, and they can be used for e.g. formation and repair of printed wiring, etc. employing a dispersion, interlayer wiring in semiconductor packages, and joining of printed wiring boards and electronic components.
    Type: Grant
    Filed: December 8, 2005
    Date of Patent: June 23, 2009
    Assignee: Asahi Glass Company, Limted
    Inventors: Hideyuki Hirakoso, Keisuke Abe, Yasuhiro Sanada, Kentarou Tsunozaki
  • Publication number: 20090136770
    Abstract: To provide a dispersion which is excellent in oxidation resistance and dispersion stability, and which contains metal fine particles capable of forming a metal film excellent in conductivity; a process for producing it; and an article having a metal film excellent in conductivity. A process for producing a dispersion of metal fine particles, which comprises heating a dispersion of metal hydride fine particles, comprising a dispersion medium, metal hydride fine particles dispersed in the medium and having an average particle size of at most 50 nm, and an organic compound with from 4 to 1000 carbon atoms, having an amino group, in an inert atmosphere at a temperature of from 60 to 350° C.; a dispersion containing metal fine particles, obtained by such a process; and an article having a metal film formed by applying the dispersion containing metal fine particles on a substrate and firing it.
    Type: Application
    Filed: January 27, 2009
    Publication date: May 28, 2009
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Hideyuki HIRAKOSO, Keisuke Abe, Yasuhiro Sanada
  • Publication number: 20080260995
    Abstract: To provide an ink composition capable of forming a metallic material which is excellent in adhesion to a substrate and free from ion migration. An ink composition having fine metallic copper particles and/or fine copper hydride particles, and fine silver oxide particles or fine metallic silver particles, dispersed in a water-insoluble organic liquid, which composition has a solid content concentration of from 10 to 80 mass % and contains from 5 to 90 parts by mass of the fine metallic copper particles and/or fine copper hydride particles, and from 10 to 95 parts by mass of the fine silver oxide particles or fine metallic silver particles, per 100 parts by mass of the total solid content in the ink composition.
    Type: Application
    Filed: October 12, 2007
    Publication date: October 23, 2008
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Hideyuki HIRAKOSO, Keisuke Abe, Yasuhiro Sanada
  • Patent number: 7390440
    Abstract: To provide metal-containing fine particles having good dispersion stability, which have their surface coated with dispersants vaporizable even during firing at low temperatures, a fine particle dispersion having the above metal-containing fine particles dispersed therein, and an electroconductive metal-containing material having an excellent volume resistivity formed by using the fine particle dispersion. Metal-containing fine particles with their surface coated with at least two dispersants having different vaporization temperatures.
    Type: Grant
    Filed: August 10, 2006
    Date of Patent: June 24, 2008
    Assignee: Asahi Glass Company, Limited
    Inventors: Hideyuki Hirakoso, Keisuke Abe, Yasuhiro Sanada
  • Publication number: 20060266156
    Abstract: To provide metal-containing fine particles having good dispersion stability, which have their surface coated with dispersants vaporizable even during firing at low temperatures, a fine particle dispersion having the above metal-containing fine particles dispersed therein, and an electroconductive metal-containing material having an excellent volume resistivity formed by using the fine particle dispersion. Metal-containing fine particles with their surface coated with at least two dispersants having different vaporization temperatures.
    Type: Application
    Filed: August 10, 2006
    Publication date: November 30, 2006
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Hideyuki Hirakoso, Keisuke Abe, Yasuhiro Sanada
  • Patent number: 7045645
    Abstract: Bis(cyclopentadienyl)ruthenium complex havimg a content of at least one member selected from among sodium, potassium, calcium, iron, nickel and zinc of 5 ppm or below; and bis(cyclopentadienyl)ruthenium complex incorporated with 10 to 100 ppm of rhenium The complexes are suitable for metalorganic chemical vapor deposition (MOCVD) and can give ruthenium-containing thin film.
    Type: Grant
    Filed: January 8, 2003
    Date of Patent: May 16, 2006
    Assignee: Mitsubishi Materials Corporation
    Inventors: Hideyuki Hirakoso, Masayuki Ishikawa, Akio Yanagisawa, Katsumi Ogi
  • Publication number: 20060070493
    Abstract: It is to provide fine particles of copper, nickel or palladium hydride having an average particle diameter of at most 50 nm, which are hardly oxidized in the atmosphere and are excellent in storage stability and are thereby very suitable for formation of metallic materials, and their production process. Further, it is to provide a dispersion containing fine particles of copper, nickel or palladium hydride, which is excellent in storage stability, and a metallic material obtained by applying the dispersion, followed by baking. The fine particles of copper, nickel or palladium hydride and the dispersion thereof, to be obtained by the present invention, are applicable to various applications, and they can be used for e.g. formation and repair of printed wiring, etc. employing a dispersion, interlayer wiring in semiconductor packages, and joining of printed wiring boards and electronic components.
    Type: Application
    Filed: December 8, 2005
    Publication date: April 6, 2006
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Hideyuki Hirakoso, Keisuke Abe, Yasuhiro Sanada, Kentarou Tsunozaki
  • Patent number: 6987197
    Abstract: The organozirconium composite of the present invention has a decomposition temperature which is near the respective decomposition temperatures of an organolead compound and an organotitanium compound. The raw material solution can precisely control the composition of a PZT thin film over a broad temperature range. The raw material solution is less likely to react an organolead compound even when mixed with the organolead compound. The present invention provides a raw material solution which is less likely to cause vapor phase cracking.
    Type: Grant
    Filed: August 6, 2003
    Date of Patent: January 17, 2006
    Assignee: Mitsubishi Materials Corporation
    Inventors: Shingo Okamura, Hideyuki Hirakoso, Nobuyuki Soyama, Katsumi Ogi, Yoshinori Takayama
  • Publication number: 20050090679
    Abstract: Bis(cyclopentadienyl)ruthenium complex havimg a content of at least one member selected from among sodium, potassium, calcium, iron, nickel and zinc of 5 ppm or below; and bis(cyclopentadienyl)ruthenium complex incorporated with 10 to 100 ppm of rhenium The complexes are suitable for metalorganic chemical vapor deposition (MOCVD) and can give ruthenium-containing thin film.
    Type: Application
    Filed: January 8, 2003
    Publication date: April 28, 2005
    Inventors: Hideyuki Hirakoso, Masayuki Ishikawa, Akio Yanagisawa, Katsumi Ogi
  • Publication number: 20040034245
    Abstract: The organozirconium composite of the present invention has a decomposition temperature which is near the respective decomposition temperatures of an organolead compound and an organotitanium compound. The raw material solution can precisely control the composition of a PZT thin film over a broad temperature range. The raw material solution is less likely to react an organolead compound even when mixed with the organolead compound. The present invention provides a raw material solution which is less likely to cause vapor phase cracking.
    Type: Application
    Filed: August 6, 2003
    Publication date: February 19, 2004
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventors: Shingo Okamura, Hideyuki Hirakoso, Nobuyuki Soyama, Katsumi Ogi, Yoshinori Takayama
  • Patent number: 6521770
    Abstract: An organozirconium compound comprises zirconium complexed with a &bgr;-diketone compound and an alkoxy group having a branched alkyl group, and which has formula (1): wherein R is a branched alkyl group having 4 or 5 carbons; and L1, L2, and L3, the same or different from each other, are each a &bgr;-diketone compound.
    Type: Grant
    Filed: April 23, 2001
    Date of Patent: February 18, 2003
    Assignee: Mitsubishi Materials Corporation
    Inventors: Hideyuki Hirakoso, Shingo Okamura, Hiroto Uchida, Katsumi Ogi