Abstract: A glass article having an excellent heat resistance, capable of preventing any of layers disposed on a glass substrate from peeling off or being clacked even after a long period of time has elapsed after the bending thereof at a high temperature is provided. A glass article according to the present invention includes, on a glass substrate, a carbon-added silicon oxide layer, a transparent conductive oxide layer, and a shielding layer in this order, in which an atomic-composition percentage ratio C/Si of carbon to silicon in the carbon-added silicon oxide layer is 0.1 or more and 0.5 or less, and a linear expansion coefficient ?Sh of the shielding layer is 7.7×10?3/K or less.

Abstract: To provide a fluorinated ether composition for vapor deposition which can be used to form a vapor-deposited film excellent in frictional durability, and an article with a vapor-deposited film and a method for its production. This fluorinated ether composition for vapor deposition comprises a compound (A) having a poly(oxyperfluoroalkylene) chain and a hydrolyzable silyl group, and a partial condensate (B) of the compound (A), wherein the proportion of the partial condensate (B) to the total amount of the compound (A) and the partial condensate (B) is from 4 to 40 mass %.

Abstract: A water/oil repellent layer-provided article, containing a substrate, a water/oil repellent layer containing a hydrolyzed condensate of a fluorinated compound having a hydrolyzable silyl group, and a silicon oxide layer containing alkali metal atoms, present between the substrate and the water/oil repellent layer, where in the silicon oxide layer, the average concentration of the alkali metal atoms in a region with a depth from the surface in contact with the water/oil repellent layer of at least 0.1 nm and at most 0.3 nm, is at least 2.0×1019 atoms/cm3.

Abstract: A water/oil repellent layer-provided article, containing a substrate, a water/oil repellent layer containing a hydrolyzed condensate of a fluorinated compound having a hydrolyzable silyl group, and a silicon oxide layer containing alkali metal atoms, present between the substrate and the water/oil repellent layer, where in the silicon oxide layer, the average concentration of the alkali metal atoms in a region with a depth from the surface in contact with the water/oil repellent layer of at least 0.1 nm and at most 0.3 nm, is at least 2.0×1019 atoms/cm3.

Abstract: To provide a fluorinated ether composition for vapor deposition which can be used to form a vapor-deposited film excellent in frictional durability, and an article with a vapor-deposited film and a method for its production. This fluorinated ether composition for vapor deposition comprises a compound (A) having a poly(oxyperfluoroalkylene) chain and a hydrolyzable silyl group, and a partial condensate (B) of the compound (A), wherein the proportion of the partial condensate (B) to the total amount of the compound (A) and the partial condensate (B) is from 4 to 40 mass %.

Abstract: A water/oil repellent layer-provided article, containing a substrate, a water/oil repellent layer containing a hydrolyzed condensate of a fluorinated compound having a hydrolyzable silyl group, and a silicon oxide layer containing alkali metal atoms, present between the substrate and the water/oil repellent layer, where in the silicon oxide layer, the average concentration of the alkali metal atoms in a region with a depth from the surface in contact with the water/oil repellent layer of at least 0.1 nm and at most 0.3 nm, is at least 2.0×1019 atoms/cm3.

Abstract: A wavelength-selective transmissive glass article has light transmittance Tmore than 315 nm and 400 nm or less at a wavelength of more than 315 nm and 400 nm or less of 1% or more. In addition, the wavelength-selective transmissive glass article has light transmittance T315 nm or less at a wavelength of 315 nm or less of 60% or less.

Abstract: There is provided a functional glass article having high abrasion resistance. The functional glass article comprising: a glass substrate having a first face and a second face on a back face of the first face; and a plurality of particles arranged on the first face and made of a material having a Mohs hardness of 7 or higher, each of the plurality of particles having a particle diameter of 1 nm or more and 300 nm or less, and the plurality of particles including a particle located partly inside the glass substrate, the first face with the plurality of particles having a higher Martens hardness by 150 N/mm2 or more than a Martens hardness of the second face.

Abstract: An infrared cut filter is disclosed. This filter includes a transparent substrate and one or more infrared absorbing layers containing an infrared absorbing compound on at least one principal surface of the transparent substrate, wherein a transmittance at a wavelength of 1200 nm measured in a stack composed of the transparent substrate and the one or more infrared absorbing layers is 10% or less.

Abstract: The present invention relates to a process for manufacturing a copper hydride fine particle dispersion, the process including: reducing a copper(II) salt with a hydrido-based reducing agent in the following solvent (A) in the presence of the following alkylamine (B): solvent (A): a solvent having a solubility parameter (SP value) of from 8 to 12 and being inert to the hydrido-based reducing agent and alkylamine (B): an alkylamine having an alkyl group which has 7 or more carbon atoms and having a boiling point of 250° C. or lower.

Abstract: To provide an ink composition capable of forming a metallic material which is excellent in adhesion to a substrate and free from ion migration. An ink composition having fine metallic copper particles and/or fine copper hydride particles, and fine silver oxide particles or fine metallic silver particles, dispersed in a water-insoluble organic liquid, which composition has a solid content concentration of from 10 to 80 mass % and contains from 5 to 90 parts by mass of the fine metallic copper particles and/or fine copper hydride particles, and from 10 to 95 parts by mass of the fine silver oxide particles or fine metallic silver particles, per 100 parts by mass of the total solid content in the ink composition.

Abstract: It is to provide fine particles of copper, nickel or palladium hydride having an average particle diameter of at most 50 nm, which are hardly oxidized in the atmosphere and are excellent in storage stability and are thereby very suitable for formation of metallic materials, and their production process. Further, it is to provide a dispersion containing fine particles of copper, nickel or palladium hydride, which is excellent in storage stability, and a metallic material obtained by applying the dispersion, followed by baking. The fine particles of copper, nickel or palladium hydride and the dispersion thereof, to be obtained by the present invention, are applicable to various applications, and they can be used for e.g. formation and repair of printed wiring, etc. employing a dispersion, interlayer wiring in semiconductor packages, and joining of printed wiring boards and electronic components.

Abstract: To provide a dispersion which is excellent in oxidation resistance and dispersion stability, and which contains metal fine particles capable of forming a metal film excellent in conductivity; a process for producing it; and an article having a metal film excellent in conductivity. A process for producing a dispersion of metal fine particles, which comprises heating a dispersion of metal hydride fine particles, comprising a dispersion medium, metal hydride fine particles dispersed in the medium and having an average particle size of at most 50 nm, and an organic compound with from 4 to 1000 carbon atoms, having an amino group, in an inert atmosphere at a temperature of from 60 to 350° C.; a dispersion containing metal fine particles, obtained by such a process; and an article having a metal film formed by applying the dispersion containing metal fine particles on a substrate and firing it.

Abstract: To provide an ink composition capable of forming a metallic material which is excellent in adhesion to a substrate and free from ion migration. An ink composition having fine metallic copper particles and/or fine copper hydride particles, and fine silver oxide particles or fine metallic silver particles, dispersed in a water-insoluble organic liquid, which composition has a solid content concentration of from 10 to 80 mass % and contains from 5 to 90 parts by mass of the fine metallic copper particles and/or fine copper hydride particles, and from 10 to 95 parts by mass of the fine silver oxide particles or fine metallic silver particles, per 100 parts by mass of the total solid content in the ink composition.

Abstract: To provide metal-containing fine particles having good dispersion stability, which have their surface coated with dispersants vaporizable even during firing at low temperatures, a fine particle dispersion having the above metal-containing fine particles dispersed therein, and an electroconductive metal-containing material having an excellent volume resistivity formed by using the fine particle dispersion. Metal-containing fine particles with their surface coated with at least two dispersants having different vaporization temperatures.

Abstract: To provide metal-containing fine particles having good dispersion stability, which have their surface coated with dispersants vaporizable even during firing at low temperatures, a fine particle dispersion having the above metal-containing fine particles dispersed therein, and an electroconductive metal-containing material having an excellent volume resistivity formed by using the fine particle dispersion. Metal-containing fine particles with their surface coated with at least two dispersants having different vaporization temperatures.

Abstract: Bis(cyclopentadienyl)ruthenium complex havimg a content of at least one member selected from among sodium, potassium, calcium, iron, nickel and zinc of 5 ppm or below; and bis(cyclopentadienyl)ruthenium complex incorporated with 10 to 100 ppm of rhenium The complexes are suitable for metalorganic chemical vapor deposition (MOCVD) and can give ruthenium-containing thin film.

Abstract: It is to provide fine particles of copper, nickel or palladium hydride having an average particle diameter of at most 50 nm, which are hardly oxidized in the atmosphere and are excellent in storage stability and are thereby very suitable for formation of metallic materials, and their production process. Further, it is to provide a dispersion containing fine particles of copper, nickel or palladium hydride, which is excellent in storage stability, and a metallic material obtained by applying the dispersion, followed by baking. The fine particles of copper, nickel or palladium hydride and the dispersion thereof, to be obtained by the present invention, are applicable to various applications, and they can be used for e.g. formation and repair of printed wiring, etc. employing a dispersion, interlayer wiring in semiconductor packages, and joining of printed wiring boards and electronic components.

Abstract: The organozirconium composite of the present invention has a decomposition temperature which is near the respective decomposition temperatures of an organolead compound and an organotitanium compound. The raw material solution can precisely control the composition of a PZT thin film over a broad temperature range. The raw material solution is less likely to react an organolead compound even when mixed with the organolead compound. The present invention provides a raw material solution which is less likely to cause vapor phase cracking.

Abstract: Bis(cyclopentadienyl)ruthenium complex havimg a content of at least one member selected from among sodium, potassium, calcium, iron, nickel and zinc of 5 ppm or below; and bis(cyclopentadienyl)ruthenium complex incorporated with 10 to 100 ppm of rhenium The complexes are suitable for metalorganic chemical vapor deposition (MOCVD) and can give ruthenium-containing thin film.