Patents by Inventor Hikaru Imamura
Hikaru Imamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11951125Abstract: One drug (solid preparation) 100 of the present invention is a drug for a disease of kidney that contains a silicon fine particle, an aggregate of the silicon fine particles, or a crystal grain of silicon having a hydrogen-generating ability. Hydrogen generated from the silicon fine particle in the drug can contribute to the prevention and/or treatment of the kidney disease.Type: GrantFiled: April 21, 2021Date of Patent: April 9, 2024Assignee: OSAKA UNIVERSITYInventors: Hikaru Kobayashi, Yuki Kobayashi, Ryoichi Imamura, Norio Nonomura
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Publication number: 20240005624Abstract: A target detection device includes: a first image acquiring unit configured to acquire a first image depicting a subject, which is generated by irradiating the subject with light belonging to a first wavelength group; a second image acquiring unit configured to acquire a second image depicting the subject, which is generated by irradiating the subject with light belonging to a second wavelength group other than the first wavelength group and having a different wavelength from the light with which the subject has been irradiated to generate the first image; and a target detecting unit configured to detect a target included in the subject using the first image and the second image.Type: ApplicationFiled: October 13, 2021Publication date: January 4, 2024Inventors: Hikaru IMAMURA, Masaru TOKUMOTO, Hiroaki MURANAMI
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Patent number: 10271443Abstract: An anchoring structure for an annular member includes a housing including a first casing and a second casing, and the annular member. The annular member is partially interposed between the first casing and the second casing. The annular member includes an external member that protrudes to an outside of the housing, and an internal member connected to the external member and located on an inside of the housing. The first casing includes a first engagement portion into which a first end of the internal member is inserted, the first engagement portion limiting the first end from moving in a direction away from the first casing. The first casing includes a second engagement portion limiting a second end of the internal member from moving in the direction away from the first casing while the first end of the internal member is engaged with the first engagement portion.Type: GrantFiled: March 17, 2016Date of Patent: April 23, 2019Assignee: DENSO CORPORATIONInventors: Shinji Kajiura, Hikaru Imamura
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Patent number: 10059305Abstract: A vehicle communication system includes a vehicle mounted device equipped to a vehicle, a mobile device carried by a user and performing a wireless communication with the vehicle side communication unit, a mobile terminal carried by the user and performing a wireless communication with the mobile device. The mobile terminal acquires a parking position of the vehicle when the user gets off the vehicle, detects a position of the mobile terminal, and calculates a distance between the parking position and the mobile terminal based on the parking position and the position of the mobile terminal. When the calculated distance falls within a predetermined range, the mobile terminal transmits, to the mobile device, distance information including the calculated distance. When receiving the distance information, the mobile device transmits, to the vehicle mounted device, approach information including the distance information.Type: GrantFiled: July 10, 2015Date of Patent: August 28, 2018Assignee: DENSO CORPORATIONInventor: Hikaru Imamura
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Publication number: 20180063976Abstract: An anchoring structure for an annular member includes a housing including a first casing and a second casing, and the annular member. The annular member is partially interposed between the first casing and the second casing. The annular member includes an external member that protrudes to an outside of the housing, and an internal member connected to the external member and located on an inside of the housing. The first casing includes a first engagement portion into which a first end of the internal member is inserted, the first engagement portion limiting the first end from moving in a direction away from the first casing. The first casing includes a second engagement portion limiting a second end of the internal member from moving in the direction away from the first casing while the first end of the internal member is engaged with the first engagement portion.Type: ApplicationFiled: March 17, 2016Publication date: March 1, 2018Inventors: Shinji KAJIURA, Hikaru IMAMURA
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Patent number: 9761741Abstract: There is provided a novel material used for solar cells that can contribute to the improvement in maximum output of solar cells. A film-forming material for forming a light-collecting film on a transparent electrode of a solar cell, including an aromatic group-containing organic polymer compound (A), wherein the film-forming material exhibits an index of refraction of 1.5 to 2.0 at a wavelength of 633 nm and a transmittance of 95% or more with respect to light having a wavelength of 400 nm, and a solar cell obtained by coating a cured film made from the film-forming material on a surface of a transparent electrode.Type: GrantFiled: December 1, 2011Date of Patent: September 12, 2017Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Kazuya Ebara, Hikaru Imamura, Rikimaru Sakamoto
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Publication number: 20170190318Abstract: A vehicle communication system includes a vehicle mounted device equipped to a vehicle, a mobile device carried by a user and performing a wireless communication with the vehicle side communication unit, a mobile terminal carried by the user and performing a wireless communication with the mobile device. The mobile terminal acquires a parking position of the vehicle when the user gets off the vehicle, detects a position of the mobile terminal, and calculates a distance between the parking position and the mobile terminal based on the parking position and the position of the mobile terminal. When the calculated distance falls within a predetermined range, the mobile terminal transmits, to the mobile device, distance information including the calculated distance. When receiving the distance information, the mobile device transmits, to the vehicle mounted device, approach information including the distance information.Type: ApplicationFiled: July 10, 2015Publication date: July 6, 2017Inventor: Hikaru IMAMURA
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Patent number: 9660232Abstract: A button cell terminal to electrically connect to a button cell and a circuit board includes: a spring contact terminal; a board joint; and a pressing force absorbing spring portion. The spring contact terminal is arranged into a spring shape deforming elastically in response to pressing force from the button cell in the X-axis direction and the Z-axis direction. The board joint is joined to the circuit board. The pressing force absorbing spring portion includes a bent arm for absorbing pressing force from the button cell through elastic deformation in response to pressing force from the button cell in the X-axis direction and the Y-axis direction.Type: GrantFiled: October 16, 2014Date of Patent: May 23, 2017Assignee: DENSO CORPORATIONInventor: Hikaru Imamura
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Publication number: 20160293911Abstract: A button cell terminal to electrically connect to a button cell and a circuit board includes: a spring contact terminal; a board joint; and a pressing force absorbing spring portion. The spring contact terminal is arranged into a spring shape deforming elastically in response to pressing force from the button cell in the X-axis direction and the Z-axis direction. The board joint is joined to the circuit board. The pressing force absorbing spring portion includes a bent arm for absorbing pressing force from the button cell through elastic deformation in response to pressing force from the button cell in the X-axis direction and the Y-axis direction.Type: ApplicationFiled: October 16, 2014Publication date: October 6, 2016Inventor: Hikaru IMAMURA
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Patent number: 8962996Abstract: An electronic key for a vehicle includes a casing body, a lid, and a decorating member. The decorating member has a fixing part held between the casing body and the lid. The decorating member and one of the casing body and the lid have a restriction section at a position away from a fitting plane position of the casing body and the lid in a fitting direction. The restriction section becomes an engagement state when a force is applied in an engagement direction that crosses the fitting direction and the restriction section restricts release of the engagement state when a force is applied in an engagement releasing direction opposite from the engagement direction.Type: GrantFiled: December 19, 2012Date of Patent: February 24, 2015Assignee: Denso CorporationInventors: Hikaru Imamura, Toshiaki Saito
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Publication number: 20130284262Abstract: There is provided a novel material used for solar cells that can contribute to the improvement in maximum output of solar cells. A film-forming material for forming a light-collecting film on a transparent electrode of a solar cell, including an aromatic group-containing organic polymer compound (A), wherein the film-forming material exhibits an index of refraction of 1.5 to 2.0 at a wavelength of 633 nm and a transmittance of 95% or more with respect to light having a wavelength of 400 nm, and a solar cell obtained by coating a cured film made from the film-forming material on a surface of a transparent electrode.Type: ApplicationFiled: December 1, 2011Publication date: October 31, 2013Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Kazuya Ebara, Hikaru Imamura, Rikimaru Sakamoto
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Patent number: 8283103Abstract: There is provided a composition for forming a resist underlayer film that can be homogeneously applied and a sublimate is suppressed during the thermal curing. There is also provided a composition for forming a resist underlayer film having a high selection ratio of dry etching relative to a resist applied thereon. A composition for forming a resist underlayer film for lithography comprising: a polysilane compound having a unit structure of Formula (1): (where R1 and R2 are independently a group of —X—Y (where X is an oxygen atom, a C1-18 alkylene group or a group of —OCnH2n— (where n is an integer of 1 to 18) and Y is a lactone ring or an adamantane ring), or one of R1 and R2 is the group of —X—Y and another thereof is an aryl group, a methyl group, an ethyl group or a C3-6 cycloalkyl group); and an organic solvent.Type: GrantFiled: August 26, 2008Date of Patent: October 9, 2012Assignee: Nissan Chemical Industries, Ltd.Inventors: Hikaru Imamura, Yasushi Sakaida, Makoto Nakajima, Satoshi Takei
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Publication number: 20110204292Abstract: It is an object to improve photoelectric conversion efficiency by use of a wavelength conversion film that is formed without dispersion of wavelength conversion substance and by using no rare earth compound. There is provided a composition for easily forming such a wavelength conversion film by spin-coating or the like. The present invention relates to a composition for forming a wavelength conversion film for a photovoltaic device, comprising a polymer or an oligomer in which a fluorescent moiety is incorporated, and a solvent. The fluorescent moiety may be incorporated in a main chain or a side chain of the polymer or the oligomer. The present invention also relates to a wavelength conversion film for a photovoltaic device that is formed from the composition for forming a wavelength conversion film.Type: ApplicationFiled: October 27, 2009Publication date: August 25, 2011Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventor: Hikaru Imamura
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Publication number: 20110045404Abstract: There is provided a composition for forming a resist underlayer film that can be homogeneously applied and a sublimate is suppressed during the thermal curing. There is also provided a composition for forming a resist underlayer film having a high selection ratio of dry etching relative to a resist applied thereon. A composition for forming a resist underlayer film for lithography comprising: a polysilane compound having a unit structure of Formula (1): (where R1 and R2 are independently a group of —X—Y (where X is an oxygen atom, a C1-18 alkylene group or a group of —OCnH2n— (where n is an integer of 1 to 18) and Y is a lactone ring or an adamantane ring), or one of R1 and R2 is the group of —X—Y and another thereof is an aryl group, a methyl group, an ethyl group or a C3-6 cycloalkyl group); and an organic solvent.Type: ApplicationFiled: August 26, 2008Publication date: February 24, 2011Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Hikaru Imamura, Yasushi Sakaida, Makoto Nakajima, Satoshi Takei
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Patent number: 7842620Abstract: There is provided a laminate used as an underlayer layer for a photoresist in a lithography process of a semiconductor device and a method for manufacturing a semiconductor device by using the laminate. The method comprising: laminating each layer of an organic underlayer film (layer A), a silicon-containing hard mask (layer B), an organic antireflective film (layer C) and a photoresist film (layer D) in this order on a semiconductor substrate. The method also comprises: forming a resist pattern in the photoresist film (layer D); etching the organic antireflective film (layer C) with the resist pattern; etching the silicon-containing hard mask (layer B) with the patterned organic antireflective film (layer C); etching the organic underlayer film (layer A) with the patterned silicon-containing hard mask (layer B); and processing the semiconductor substrate with the patterned organic underlayer film (layer A).Type: GrantFiled: October 12, 2007Date of Patent: November 30, 2010Assignee: Nissan Chemical Industries, Ltd.Inventors: Satoshi Takei, Makoto Nakajima, Yasushi Sakaida, Hikaru Imamura, Keisuke Hashimoto, Takahiro Kishioka
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Publication number: 20100022089Abstract: There is provided a laminate used as an underlayer layer for a photoresist in a lithography process of a semiconductor device and a method for manufacturing a semiconductor device by using the laminate. The method comprising: laminating each layer of an organic underlayer film (layer A), a silicon-containing hard mask (layer B), an organic antireflective film (layer C) and a photoresist film (layer D) in this order on a semiconductor substrate. The method also comprises: forming a resist pattern in the photoresist film (layer D); etching the organic antireflective film (layer C) with the resist pattern; etching the silicon-containing hard mask (layer B) with the patterned organic antireflective film (layer C); etching the organic underlayer film (layer A) with the patterned silicon-containing hard mask (layer B); and processing the semiconductor substrate with the patterned organic underlayer film (layer A).Type: ApplicationFiled: October 12, 2007Publication date: January 28, 2010Applicant: NISSIAN CHEMICAL INDUSTRIES, LTD.Inventors: Satoshi Takei, Makoto Nakajima, Yasushi Sakaida, Hikaru Imamura, Keisuke Hashimoto, Takahiro Kishioka
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Patent number: D789305Type: GrantFiled: September 10, 2015Date of Patent: June 13, 2017Assignee: DENSO CORPORATIONInventors: Shinji Kajiura, Hikaru Imamura
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Patent number: D791087Type: GrantFiled: September 10, 2015Date of Patent: July 4, 2017Assignee: DENSO CORPORATIONInventors: Shinji Kajiura, Hikaru Imamura
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Patent number: D802541Type: GrantFiled: September 10, 2015Date of Patent: November 14, 2017Assignee: DENSO CORPORATIONInventors: Shinji Kajiura, Hikaru Imamura