Abstract: Methods of fabricating a glass laminate is provided. According to one embodiment, a glass laminate comprised of a microwave absorbing layer and a microwave transparent layer is formed. The microwave absorbing layer is characterized by a microwave loss tangent ?H that is at least a half order of magnitude larger than a loss tangent ?L of the microwave transparent layer. An area of the glass laminate is exposed to microwave radiation. The exposed area comprises a cross-laminate hot zone having a cross-laminate hot zone temperature profile. Substantially all microwave absorbing layer portions of the hot zone temperature profile and substantially all microwave transparent layer portions of the hot zone temperature profile reside above the glass transition temperature TG of the various layers of the glass laminate prior to impingement by the microwave radiation.

Abstract: A glass forming apparatus comprises a forming device configured to form a glass ribbon from a quantity of molten glass. The glass forming apparatus includes a refractory material comprising monazite (REPO4). In another example, a method of forming a glass ribbon with a glass forming apparatus includes the step of supporting a quantity of molten glass with a refractory member comprising a refractory material comprising monazite (REPO4). The method further includes the step of forming the glass ribbon from the quantity of molten glass.

Abstract: Methods of fabricating a glass laminate is provided. According to one embodiment, a glass laminate comprised of a microwave absorbing layer and a microwave transparent layer is formed. The microwave absorbing layer is characterized by a microwave loss tangent ?H that is at least a half order of magnitude larger than a loss tangent ?Lof the microwave transparent layer. An area of the glass laminate is exposed to microwave radiation. The exposed area comprises a cross-laminate hot zone having a cross-laminate hot zone temperature profile. Substantially all microwave absorbing layer portions of the hot zone temperature profile and substantially all microwave transparent layer portions of the hot zone temperature profile reside above the glass transition temperature TG of the various layers of the glass laminate prior to impingement by the microwave radiation.

Abstract: Methods of fabricating a glass laminate is provided. According to one embodiment, a glass laminate comprised of a microwave absorbing layer and a microwave transparent layer is formed. The microwave absorbing layer is characterized by a microwave loss tangent ?H that is at least a half order of magnitude larger than a loss tangent ?L of the microwave transparent layer. An area of the glass laminate is exposed to microwave radiation. The exposed area comprises a cross-laminate hot zone having a cross-laminate hot zone temperature profile. Substantially all microwave absorbing layer portions of the hot zone temperature profile and substantially all microwave transparent layer portions of the hot zone temperature profile reside above the glass transition temperature TG of the various layers of the glass laminate prior to impingement by the microwave radiation.

Abstract: Refractory materials are provided which contain P2O5/R2O3 constituents, where R is Y, Sc, Er, Lu, Yb, Tm, Ho, Dy, Tb, Gd, or a combination thereof, and/or V2O5/R?2O3 constituents where R? is Y, Sc, one or more rare earth elements, or a combination thereof. In certain embodiments, the refractory materials are xenotime-type materials and/or xenotime-stabilized zircon-type materials. The refractory materials can be used in the manufacture of glass and glass-ceramics. For example, the refractory materials, especially those that contain P2O5/R2O3 constituents, can be used as forming structures (“isopipes”) in the fusion process for making flat sheets of glass such as the glass sheets used as substrates in the manufacture of flat panel displays.

Abstract: Methods of fabricating a glass laminate is provided. According to one embodiment, a glass laminate comprised of a microwave absorbing layer and a microwave transparent layer is formed. The microwave absorbing layer is characterized by a microwave loss tangent ?H that is at least a half order of magnitude larger than a loss tangent ?L of the microwave transparent layer. An area of the glass laminate is exposed to microwave radiation. The exposed area comprises a cross-laminate hot zone having a cross-laminate hot zone temperature profile. Substantially all microwave absorbing layer portions of the hot zone temperature profile and substantially all microwave transparent layer portions of the hot zone temperature profile reside above the glass transition temperature TG of the various layers of the glass laminate prior to impingement by the microwave radiation.

Abstract: Refractory materials are provided which contain P2O5/R2O3 constituents, where R is Y, Sc, Er, Lu, Yb, Tm, Ho, Dy, Tb, Gd, or a combination thereof, and/or V2O5/R?2O3 constituents where R? is Y, Sc, one or more rare earth elements, or a combination thereof. In certain embodiments, the refractory materials are xenotime-type materials and/or xenotime-stabilized zircon-type materials. The refractory materials can be used in the manufacture of glass and glass-ceramics. For example, the refractory materials, especially those that contain P2O5/R2O3 constituents, can be used as forming structures (“isopipes”) in the fusion process for making flat sheets of glass such as the glass sheets used as substrates in the manufacture of flat panel displays.

Abstract: Refractory materials are provided which contain P2O5/R2O3 constituents, where R is Y, Sc, Er, Lu, Yb, Tm, Ho, Dy, Tb, Gd, or a combination thereof, and/or V2O5/R?2O3 constituents where R? is Y, Sc, one or more rare earth elements, or a combination thereof. In certain embodiments, the refractory materials are xenotime-type materials and/or xenotime-stabilized zircon-type materials. The refractory materials can be used in the manufacture of glass and glass-ceramics. For example, the refractory materials, especially those that contain P2O5/R2O3 constituents, can be used as forming structures (“isopipes”) in the fusion process for making flat sheets of glass such as the glass sheets used as substrates in the manufacture of flat panel displays.

Abstract: A glass manufacturing system and method are described herein that use a forming apparatus (isopipe) made from or at least coated with a magnesium aluminate spinel material which is a chemically stable and compatible refractory material when used for forming an alkali-containing glass sheet.

Abstract: Disclosed are systems and methods for forming glass sheets. Methods and systems are provided that comprise a refractory body configured to receive glass-based material and means for transmitting energy to selectively heat at least a portion of the refractory body through the glass-based material. In one aspect, the energy transmitted is of a selected frequency that is not fully absorbed by the glass-based material and is at least partially absorbed by the refractory body. The energy can be transmitted by a laser beam array, a scanning laser beam, a microwave generator, a radio frequency generator, or other means.

Abstract: Refractory materials are provided which contain P2O5/R2O3 constituents, where R is Y, Sc, Er, Lu, Yb, Tm, Ho, Dy, Tb, Gd, or a combination thereof, and/or V2O5/R?2O3 constituents where R? is Y, Sc, one or more rare earth elements, or a combination thereof. In certain embodiments, the refractory materials are xenotime-type materials and/or xenotime-stabilized zircon-type materials. The refractory materials can be used in the manufacture of glass and glass-ceramics. For example, the refractory materials, especially those that contain P2O5/R2O3 constituents, can be used as forming structures (“isopipes”) in the fusion process for making flat sheets of glass such as the glass sheets used as substrates in the manufacture of flat panel displays.