Patents by Inventor Hiroaki Kitayama

Hiroaki Kitayama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8444875
    Abstract: The burned composite metal oxide of the present invention is a burned composite metal oxide which is porous and particulate and which is obtained by subjecting a slurry comprising at least one metal oxide (a), at least one metal compound (b) and a solvent to spray granulation to obtain granules, and burning the granules, the metal oxide (a) selected from the group consisting of a transition metal oxide and an oxide of a metal belonging to 3B, 4B and 5B of a periodic table, the metal compound (b) selected from the group consisting of an alkali metal compound and an alkali earth metal compound, wherein the metal oxide (a) and the metal compound (b) are sparingly soluble in the solvent; the burning is conducted after a heat-maintaining step of heating the granules obtained by the spray granulation at a temperature in a range of ±200° C.
    Type: Grant
    Filed: December 3, 2008
    Date of Patent: May 21, 2013
    Assignee: Kao Corporation
    Inventors: Kazuo Oki, Minoru Sawai, Hiroaki Kitayama, Takamitsu Saito, Tamaki Miura, Kyoichi Watanabe
  • Patent number: 8426064
    Abstract: The present invention provides a composite material for positive electrodes of lithium batteries, which provides a lithium battery having excellent high rate electrical discharge characteristics, has a sufficiently secured diffusion passage for Li, and has high conductivity, a process for producing the same, as well as a positive electrode and a battery using the composite material for positive electrodes of lithium batteries. The present invention relates to a composite material for positive electrodes of lithium batteries, comprising composite particles containing positive electrode active material particles and fibrous carbons, wherein the composite particles have a form in which the positive electrode active material particles are supported by the fibrous carbons.
    Type: Grant
    Filed: December 3, 2008
    Date of Patent: April 23, 2013
    Assignee: Kao Corporation
    Inventors: Kazuo Oki, Minoru Sawai, Hiroaki Kitayama, Takamitsu Saito, Tamaki Miura, Kyoichi Watanabe
  • Publication number: 20120263883
    Abstract: The present invention provides a resin modifier capable of obtaining a coating film having satisfactory basic performances such as antistatic properties, water resistance and transparency, a method for producing a coating film using the resin modifier, and a coating film obtained by the production method. The resin modifier of the present invention is a resin modifier represented by R31—O-(AO)n—SO3?, R32—OSO3?, or R33—SO3? and an ammonium ion that has a polymerizable unsaturated group.
    Type: Application
    Filed: December 13, 2010
    Publication date: October 18, 2012
    Inventors: Hiroaki Kitayama, Shinya Goto, Toshiki Sowa
  • Patent number: 8241516
    Abstract: A method for manufacturing a substrate for a magnetic disk, including the steps of (a) polishing a substrate with a polishing composition A containing alumina abrasives having an average particle size of from 0.05 to 0.5 ?m, and an oxidizing agent, and (b) polishing the substrate with a polishing composition B containing silica particles having an average particle size of from 0.005 to 0.1 ?m; a substrate for a magnetic disk, obtainable by the method for manufacturing a substrate for a magnetic disk; and a substrate for a magnetic disk having the following surface properties of a long-wavelength waviness of 0.05 nm or more and 0.3 nm or less, and an AFM surface roughness of 0.03 nm or more and 0.2 nm or less. The substrate for a magnetic disk may be suitably used in the manufacture of a hard disk having a high recording density. Especially, a hard disk having a recording density of 50 G bits or more per square inch may be industrially manufactured.
    Type: Grant
    Filed: May 16, 2008
    Date of Patent: August 14, 2012
    Assignee: Kao Corporation
    Inventors: Shigeo Fujii, Hiroaki Kitayama
  • Publication number: 20110206990
    Abstract: A sintered lithium complex oxide characterized in that the sintered lithium complex oxide is constituted by sintering fine particles of a lithium complex oxide, the peak pore size giving the maximum differential pore volume is 0.80-5.00 ?m, the total pore volume is 0.10-2.00 mL/g, the average particle size is not less than the above-specified peak pore size but not more than 20 ?m, there is a sub-peak giving a differential pore volume not less than 10% of the maximum differential pore volume on the smaller pore size side with respect to the above-specified peak pore size, the pore size corresponding to the sub-peak is more than 0.50 ?m but not more than 2.00 ?m, the BET specific surface area of the sintered lithium complex oxide is 1.0-10.0 m2/g, and the half width of the maximum peak among X-ray diffraction peaks in an X-ray diffraction measurement is 0.12-0.30 deg.
    Type: Application
    Filed: October 7, 2009
    Publication date: August 25, 2011
    Inventors: Ryuichi Akagi, Hiroaki Kitayama, Yoshinobu Ishikawa, Kenichi Nishimura, Takamitsu Saito, Tamaki Miura, Hiroshi Miyakubo
  • Publication number: 20100270496
    Abstract: The burned composite metal oxide of the present invention is a burned composite metal oxide which is porous and particulate and which is obtained by subjecting a slurry comprising at least one metal oxide (a), at least one metal compound (b) and a solvent to spray granulation to obtain granules, and burning the granules, the metal oxide (a) selected from the group consisting of a transition metal oxide and an oxide of a metal belonging to 3B, 4B and 5B of a periodic table, the metal compound (b) selected from the group consisting of an alkali metal compound and an alkali earth metal compound, wherein the metal oxide (a) and the metal compound (b) are sparingly soluble in the solvent; the burning is conducted after a heat-maintaining step of heating the granules obtained by the spray granulation at a temperature in a range of ±200° C.
    Type: Application
    Filed: December 3, 2008
    Publication date: October 28, 2010
    Inventors: Kazuo Oki, Minoru Sawai, Hiroaki Kitayama, Takamitsu Saito, Tamaki Miura, Kyoichi Watanabe
  • Publication number: 20100248034
    Abstract: The present invention provides a composite material for positive electrodes of lithium batteries, which provides a lithium battery having excellent high rate electrical discharge characteristics, has a sufficiently secured diffusion passage for Li, and has high conductivity, a process for producing the same, as well as a positive electrode and a battery using the composite material for positive electrodes of lithium batteries. The present invention relates to a composite material for positive electrodes of lithium batteries, comprising composite particles containing positive electrode active material particles and fibrous carbons, wherein the composite particles have a form in which the positive electrode active material particles are supported by the fibrous carbons.
    Type: Application
    Filed: December 3, 2008
    Publication date: September 30, 2010
    Inventors: Kazuo Oki, Minoru Sawai, Hiroaki Kitayama, Takamitsu Saito, Tamaki Miura, Kyoichi Watanabe
  • Patent number: 7666238
    Abstract: A polishing composition comprising an abrasive and water, wherein the polishing composition has an index of degree of sedimentation of 80 or more and 100 or less; a process for producing a substrate comprising polishing a substrate to be polished using the above-mentioned composition; a process for preventing clogging of a polishing pad comprising applying the above-mentioned composition; a process for preventing clogging of a polishing pad comprising applying the above-mentioned composition to polishing with a polishing pad for a nickel-containing object to be polished; and a process for preventing clogging of a polishing pad comprising applying a composition comprising a hydrophilic polymer having two or more hydrophilic groups in its molecule and a molecular weight of 300 or more, or a compound capable of dissolving nickel hydroxide at a pH of 8.0, and water to polishing with a polishing pad for a nickel-containing object to be polished.
    Type: Grant
    Filed: November 30, 2007
    Date of Patent: February 23, 2010
    Assignee: Kao Corporation
    Inventors: Shigeo Fujii, Hiroyuki Yoshida, Toshiya Hagihara, Hiroaki Kitayama
  • Patent number: 7553345
    Abstract: A microwaviness reducing agent for polishing a substrate for a precision part, containing either a surfactant having two or more ionic hydrophilic groups, or a polycarboxylic acid compound having 2 to 15 total carbon atoms and having either OH group or groups or SH group or groups, or a salt thereof; a polishing composition for a substrate for a precision part, containing the microwaviness reducing agent, an abrasive and water; a polishing composition comprising water, an abrasive, an organic acid or a salt thereof, and a surfactant, wherein the organic acid is a polycarboxylic acid compound having 2 to 15 total carbon atoms and having either OH group or groups or SH group or groups, and wherein the surfactant has two or more ionic hydrophilic groups in its molecule and has a molecular weight of 300 or more; a method of reducing microwaviness of a substrate for a precision part; and a method for manufacturing a substrate for a precision part.
    Type: Grant
    Filed: December 18, 2003
    Date of Patent: June 30, 2009
    Assignee: KAO Corporation
    Inventors: Hiroaki Kitayama, Shigeo Fujii
  • Publication number: 20080227370
    Abstract: A method for manufacturing a substrate for a magnetic disk, including the steps of (a) polishing a substrate with a polishing composition A containing alumina abrasives having an average particle size of from 0.05 to 0.5 ?m, and an oxidizing agent, and (b) polishing the substrate with a polishing composition B containing silica particles having an average particle size of from 0.005 to 0.1 ?m; a substrate for a magnetic disk, obtainable by the method for manufacturing a substrate for a magnetic disk; and a substrate for a magnetic disk having the following surface properties of a long-wavelength waviness of 0.05 nm or more and 0.3 nm or less, and an AFM surface roughness of 0.03 nm or more and 0.2 nm or less. The substrate for a magnetic disk may be suitably used in the manufacture of a hard disk having a high recording density. Especially, a hard disk having a recording density of 50 G bits or more per square inch may be industrially manufactured.
    Type: Application
    Filed: May 16, 2008
    Publication date: September 18, 2008
    Inventors: Shigeo Fujii, Hiroaki Kitayama
  • Publication number: 20080160881
    Abstract: A polishing composition comprising an abrasive and water, wherein the polishing composition has an index of degree of sedimentation of 80 or more and 100 or less; a process for producing a substrate comprising polishing a substrate to be polished using the above-mentioned composition; a process for preventing clogging of a polishing pad comprising applying the above-mentioned composition; a process for preventing clogging of a polishing pad comprising applying the above-mentioned composition to polishing with a polishing pad for a nickel-containing object to be polished; and a process for preventing clogging of a polishing pad comprising applying a composition comprising a hydrophilic polymer having two or more hydrophilic groups in its molecule and a molecular weight of 300 or more, or a compound capable of dissolving nickel hydroxide at a pH of 8.0, and water to polishing with a polishing pad for a nickel-containing object to be polished.
    Type: Application
    Filed: November 30, 2007
    Publication date: July 3, 2008
    Inventors: Shigeo Fujii, Hiroyuki Yoshida, Toshiya Hagihara, Hiroaki Kitayama
  • Patent number: 7204936
    Abstract: A polishing composition comprising 0.03 to 0.5% by weight of an organic acid or a salt thereof, an abrasive and water, wherein the abrasive has a surface potential of from ?140 to 200 mV; a roll-off reducing agent comprising an inorganic compound having a property of controlling a surface potential of an abrasive in a polishing composition, wherein a surface potential of the abrasive in a standard polishing composition is controlled to ?110 to 250 mV by the presence of the inorganic compound, wherein the standard polishing composition is prepared which comprises 20 parts by weight of an abrasive, the abrasive being high-purity alumina having Al2O3 purity of 98.0% by weight or more composed of ?-type corundum crystal, 1 part by weight of citric acid, 78 parts by weight of water and 1 part by weight of an inorganic compound. The polishing composition or the roll-off reducing agent composition can be favorably used in polishing the substrate for precision parts.
    Type: Grant
    Filed: July 24, 2003
    Date of Patent: April 17, 2007
    Assignee: Kao Corporation
    Inventors: Hiroaki Kitayama, Shigeo Fujii, Toshiya Hagihara
  • Patent number: 7202394
    Abstract: The present application provides a human gene over-expressing animal, which is a non-human animal carrying a human hematopoietic prostaglandin D2 synthase gene in its somatic cell chromosome and expressing a large amount of human prostaglandin D2 synthase, wherein the animal is one obtained through ontogenesis of a totipotency cell of a non-human animal or offspring of the obtained animal, and the totipotency cell is introduced with said synthase gene. The present application also provides a method of using the transgenic animal for testing in vivo activity of a candidate for anti-allergy medicines, sleep-controlling substances and candidates for anti-obesity.
    Type: Grant
    Filed: October 5, 2000
    Date of Patent: April 10, 2007
    Assignees: Japan Science and Technology Corporation, Osaka Bioscience Institute, Oriental Yeast Co., Ltd.
    Inventors: Yoshihiro Urade, Yasushi Fujitani, Hiroaki Kitayama, Naoki Hayashi
  • Publication number: 20050136807
    Abstract: A polishing composition for a magnetic disk, comprising alumina, water, a peroxide and an organic acid; a polishing process for a substrate to be polished, comprising the step of polishing the substrate to be polished with the polishing composition; and a process for manufacturing a substrate, comprising the step of polishing a substrate to be polished with the polishing composition. The polishing composition can be suitably used for the manufacture of a magnetic disk substrate for high-quality hard disks and the like.
    Type: Application
    Filed: February 22, 2005
    Publication date: June 23, 2005
    Inventors: Hiroaki Kitayama, Shigeo Fujii
  • Publication number: 20050132660
    Abstract: A polishing composition containing an ?-alumina, an intermediate alumina, an oxidizing agent and water; a method for reducing waviness of a substrate to be polished, including the step of applying the polishing composition to the substrate to be polished; and a method for manufacturing a substrate, including the step of polishing a substrate to be polished with the polishing composition. The polishing composition is suitable for polishing substrates for precision parts such as substrates for magnetic recording media for magnetic discs, optical discs, opto-magnetic discs, and the like; photomask substrates; glass for liquid crystals; optical lenses; optical mirrors; optical prisms; and semiconductor substrates.
    Type: Application
    Filed: February 22, 2005
    Publication date: June 23, 2005
    Inventors: Shigeo Fujii, Hiroaki Kitayama
  • Patent number: 6902591
    Abstract: A polishing composition comprising an abrasive, water and an organic acid or a salt thereof, wherein the composition has a specified viscosity of from 1.0 to 2.0 mPa·s at a shearing rate of 1500 s?1 and 25° C.; a roll-off reducing agent comprising a Brönsted acid or a salt thereof, having an action of lowering viscosity so that the amount of viscosity lowered is 0.01 mPa·s or more, wherein the amount of viscosity lowered is expressed by the following equation: (Amount of Viscosity Lowered)=(Viscosity of Standard Polishing Composition)?(Viscosity of Roll-Off Reducing Agent-Containing Polishing Composition), wherein the standard polishing composition is prepared which comprises 20 parts by weight of an abrasive, said abrasive being high-purity alumina having Al2O3 purity of 98.
    Type: Grant
    Filed: July 24, 2003
    Date of Patent: June 7, 2005
    Assignee: Kao Corporation
    Inventors: Hiroaki Kitayama, Shigeo Fujii, Yoshiaki Oshima, Toshiya Hagihara
  • Publication number: 20050054273
    Abstract: A polishing kit for a magnetic disk containing (A) a slurry containing an alumina, (B) an oxidizing agent solution containing an oxidizing agent, and (C) an acid agent solution containing an acid; a polishing kit for a magnetic disk containing (A) a slurry containing an alumina, and (D) an additive solution containing an oxidizing agent and an inorganic acid; and a polishing kit for a magnetic disk containing (A) a slurry containing an alumina, and (C) an acid agent solution containing an acid, wherein the polishing kit is used with an oxidizing agent solution (B) containing an oxidizing agent; and a polishing process for a magnetic disk substrate, including the steps of feeding a liquid mixture containing components of a specified polishing kit to a space between the magnetic disk substrate and a polishing cloth; and polishing the magnetic disk substrate with the liquid mixture. The polishing composition kit can be suitably used for the manufacture of high-quality magnetic disk substrates such as hard disks.
    Type: Application
    Filed: August 24, 2004
    Publication date: March 10, 2005
    Inventors: Kiyoteru Osawa, Hiroaki Kitayama, Toshiya Hagihara
  • Publication number: 20050032465
    Abstract: A method for manufacturing a substrate for a magnetic disk, including the steps of (a) polishing a substrate with a polishing composition A containing alumina abrasives having an average particle size of from 0.05 to 0.5 ?m, and an oxidizing agent, and (b) polishing the substrate with a polishing composition B containing silica particles having an average particle size of from 0.005 to 0.1 ?m; a substrate for a magnetic disk, obtainable by the method for manufacturing a substrate for a magnetic disk; and a substrate for a magnetic disk having the following surface properties of a long-wavelength waviness of 0.05 nm or more and 0.3 nm or less, and an AFM surface roughness of 0.03 nm or more and 0.2 nm or less. The substrate for a magnetic disk may be suitably used in the manufacture of a hard disk having a high recording density. Especially, a hard disk having a recording density of 50 G bits or more per square inch may be industrially manufactured.
    Type: Application
    Filed: July 27, 2004
    Publication date: February 10, 2005
    Inventors: Shigeo Fujii, Hiroaki Kitayama
  • Publication number: 20050032463
    Abstract: A polishing composition for a magnetic disk, comprising alumina, water, a peroxide and an organic acid; a polishing process for a substrate to be polished, comprising the step of polishing the substrate to be polished with the polishing composition; and a process for manufacturing a substrate, comprising the step of polishing a substrate to be polished with the polishing composition. The polishing composition can be suitably used for the manufacture of a magnetic disk substrate for high-quality hard disks and the like.
    Type: Application
    Filed: July 23, 2004
    Publication date: February 10, 2005
    Inventors: Hiroaki Kitayama, Shigeo Fujii
  • Publication number: 20050003746
    Abstract: A polishing composition containing an ?-alumina, an intermediate alumina, an oxidizing agent and water; a method for reducing waviness of a substrate to be polished, including the step of applying the polishing composition to the substrate to be polished; and a method for manufacturing a substrate, including the step of polishing a substrate to be polished with the polishing composition. The polishing composition is suitable for polishing substrates for precision parts such as substrates for magnetic recording media for magnetic discs, optical discs, opto-magnetic discs, and the like; photomask substrates; glass for liquid crystals; optical lenses; optical mirrors; optical prisms; and semiconductor substrates.
    Type: Application
    Filed: June 25, 2004
    Publication date: January 6, 2005
    Inventors: Shigeo Fujii, Hiroaki Kitayama