Patents by Inventor Hiromi Kobayashi

Hiromi Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190153669
    Abstract: Provided are an inkjet textile printing method including a step of performing direct printing on a textile by an inkjet method with an inkjet ink including an aqueous dispersion of a dye polymer having a structure derived from a dye having a quinophthalone skeleton; a coloring composition and an inkjet ink including the aqueous dispersion of the dye polymer; an ink cartridge including the inkjet ink filling the ink cartridge; and the dye polymer.
    Type: Application
    Filed: January 28, 2019
    Publication date: May 23, 2019
    Applicant: FUJIFILM Corporation
    Inventors: YUKIO TANI, YOSHIHIKO FUJIE, HIROMI KOBAYASHI
  • Publication number: 20180327619
    Abstract: Provided are an inkjet printing method including at least a step of directly printing an inkjet ink containing an aqueous dispersion of a dye polymer having a repeating unit containing a structure derived from a dye on a fabric by an inkjet method; an inkjet ink containing the aqueous dispersion of a dye polymer; an ink cartridge filled with the inkjet ink; and a colored fabric.
    Type: Application
    Filed: July 26, 2018
    Publication date: November 15, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Yoshihiko FUJIE, Yoshiaki NAGATA, Yukio TANI, Minako HARA, Keiichi TATEISHI, Hiromi KOBAYASHI
  • Patent number: 9963605
    Abstract: Provided are a coloring composition, an ink jet recording ink, and an ink jet recording method, the coloring composition including a betaine compound and at least one xanthene compound of a compound represented by Formula (1), a compound represented by Formula (2), a compound having a repeating unit represented by Formula (3), or a compound represented by Formula (4).
    Type: Grant
    Filed: March 21, 2017
    Date of Patent: May 8, 2018
    Assignee: FUJIFILM CORPORATION
    Inventors: Yoshihiko Fujie, Yusuke Sakai, Takashi Saitou, Keiichi Tateishi, Hiromi Kobayashi
  • Patent number: 9835945
    Abstract: A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group selected from the groups (x) to (z); and (F) a solvent, and a method of pattern formation with the composition: (x) an alkali-soluble group; (y) a group which decomposes by an action of an alkaline developing solution to enhance a solubility in an alkaline developing solution; and (z) a group which decomposes by an action of an acid.
    Type: Grant
    Filed: November 23, 2016
    Date of Patent: December 5, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Hiromi Kobayashi, Shinichi Kanna, Haruki Inabe
  • Patent number: 9798235
    Abstract: A resist composition contains (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid, (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation, (C) particular an alkali soluble compound, and (D) a solvent.
    Type: Grant
    Filed: May 17, 2017
    Date of Patent: October 24, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Hiromi Kobayashi, Haruki Inabe
  • Publication number: 20170255098
    Abstract: A resist composition contains (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid, (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation, (C) particular an alkali soluble compound, and (D) a solvent.
    Type: Application
    Filed: May 17, 2017
    Publication date: September 7, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Hiromi KOBAYASHI, Haruki INABE
  • Publication number: 20170210928
    Abstract: Provided are a coloring composition including a xanthene compound which is soluble in water and a compound represented by the following Formula (A); an ink jet recording ink; and an ink jet recording method. In Formula (A), Q represents a benzene ring or a naphthalene ring. P1 represents —CO2M or —SO3M. Ra1 represents a substituent, and Ra2, Ra3, and Ra4 each independently represent a hydrogen atom or a substituent. na represents an integer of 0 to 3. When na is 2 or more, a plurality of Ra1's may be the same as or different from each other. M represents a counter cation.
    Type: Application
    Filed: March 20, 2017
    Publication date: July 27, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Yoshihiko FUJIE, Yusuke SAKAI, Keiichi TATEISHI, Hiromi KOBAYASHI
  • Patent number: 9701839
    Abstract: The present invention relates to a compound which is represented by General Formula (1), a coloring composition which includes the compound, an ink jet recording ink, an ink jet recording method using the ink jet recording ink, an ink jet printer cartridge, an ink jet recording material, a color filter, a color toner, and a transfer ink.
    Type: Grant
    Filed: July 5, 2016
    Date of Patent: July 11, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Yoshihiko Fujie, Yusuke Sakai, Keiichi Tateishi, Hiromi Kobayashi
  • Patent number: 9703196
    Abstract: A method for producing a resist composition includes at least a step of filtering a solution obtained by dissolving (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid, (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation, and (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms into (D) a solvent, through a filter.
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: July 11, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Hiromi Kobayashi, Haruki Inabe
  • Publication number: 20170190928
    Abstract: Provided are a coloring composition, an ink jet recording ink, and an ink jet recording method, the coloring composition including a betaine compound and at least one xanthene compound of a compound represented by Formula (1), a compound represented by Formula (2), a compound having a repeating unit represented by Formula (3), or a compound represented by Formula (4).
    Type: Application
    Filed: March 21, 2017
    Publication date: July 6, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Yoshihiko FUJIE, Yusuke SAKAI, Takashi SAITOU, Keiichi TATEISHI, Hiromi KOBAYASHI
  • Patent number: 9690875
    Abstract: Search results are provided for mobile computing devices. Search results are retrieved based on a search term. Each of the search results is assigned to one or more categories. The categories and the assigned search results are provided to the mobile computing device. The mobile computing device is adapted to display each of the categories and a partial list of the search results for each of the categories.
    Type: Grant
    Filed: January 6, 2012
    Date of Patent: June 27, 2017
    Assignee: Microsoft Technology Licensing, LLC
    Inventors: Tuan Huynh, Hiromi Kobayashi, Takeshi Tanaka, Hirokazu Sawada, Tsutomu Kagoshima
  • Publication number: 20170101534
    Abstract: Provided are a coloring composition for dyeing or textile printing including a compound having the following structure, an ink for ink jet textile printing including the above-described coloring composition for dyeing or textile printing, a method of printing on fabric, and a dyed or printed fabric. As a result, the color is excellent, the color optical density is high, the fixing properties are excellent, bleeding is reduced, and light fastness is excellent.
    Type: Application
    Filed: December 22, 2016
    Publication date: April 13, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Yoshihiko FUJIE, Hiromi KOBAYASHI, Keiichi TATEISHI
  • Publication number: 20170101533
    Abstract: Provided are a compound represented by any one of Formulae (1) to (3) (for example, the following compound), a coloring composition for dyeing or textile printing including the compound, an ink jet ink including the coloring composition for dyeing or textile printing, a method of printing on fabric, and a dyed or printed fabric, in which the color is excellent, the color optical density is high, and light fastness, water fastness, and chlorine fastness are excellent.
    Type: Application
    Filed: December 20, 2016
    Publication date: April 13, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Kazunari YAGI, Hiromi KOBAYASHI, Takashi IIZUMI, Yoshiaki NAGATA, Keiichi TATEISHI, Kazushi FURUKAWA
  • Publication number: 20160370701
    Abstract: A method for producing a resist composition includes at least a step of filtering a solution obtained by dissolving (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid, (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation, and (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms into (D) a solvent, through a filter.
    Type: Application
    Filed: August 31, 2016
    Publication date: December 22, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Hiromi KOBAYASHI, Haruki INABE
  • Publication number: 20160312032
    Abstract: The present invention relates to a compound which is represented by General Formula (1), a coloring composition which includes the compound, an ink jet recording ink, an ink jet recording method using the ink jet recording ink, an ink jet printer cartridge, an ink jet recording material, a color filter, a color toner, and a transfer ink.
    Type: Application
    Filed: July 5, 2016
    Publication date: October 27, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Yoshihiko FUJIE, Yusuke SAKAI, Keiichi TATEISHI, Hiromi KOBAYASHI
  • Patent number: 9465292
    Abstract: A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent.
    Type: Grant
    Filed: March 3, 2016
    Date of Patent: October 11, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Hiromi Kobayashi, Haruki Inabe
  • Publication number: 20160238019
    Abstract: A centrifugal compressor 200 used in a gas pipeline 1 has a centrifugal impeller provided with a hub and a plurality of blades. The blade angle distribution of the blade is configured such that a hub side blade angle is maximum on the side closer to a hub side leading edge than a central point of a hub side camber line, and from this part to the hub side leading edge, a hub side blade angle distribution curve is convex in a blade angle increasing direction.
    Type: Application
    Filed: September 11, 2014
    Publication date: August 18, 2016
    Applicant: HITACHI, LTD.
    Inventors: Hiromi KOBAYASHI, Kiyotaka HIRADATE, Kazuyuki SUGIMURA, Toshio ITO, Hideo NISHIDA
  • Publication number: 20160187780
    Abstract: A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent.
    Type: Application
    Filed: March 3, 2016
    Publication date: June 30, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Hiromi KOBAYASHI, Haruki INABE
  • Patent number: 9316912
    Abstract: A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent.
    Type: Grant
    Filed: August 1, 2014
    Date of Patent: April 19, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Hiromi Kobayashi, Haruki Inabe
  • Patent number: 9157450
    Abstract: An impeller includes a hub plate and a plurality of blades circumferentially disposed at intervals on one surface side of the hub plate. Each blade has a shape formed by piling up a plurality of blade sections in a blade height-wise direction of each blade in a reference impeller in which the hub plate intersects with the blades and which includes a linear element blade in the blade height-wise direction so as to form a curvilinear element blade. In piling up the blade sections, amounts of tangential lean and sweep to be applied to the blade sections are increased as it goes from an end face of at least one of a hub plate side end and a counter hub plate side end toward a span intermediate part of the blade.
    Type: Grant
    Filed: April 3, 2012
    Date of Patent: October 13, 2015
    Assignee: HITACHI, LTD.
    Inventors: Kazuyuki Sugimura, Hideo Nishida, Hiromi Kobayashi, Toshio Ito