Patents by Inventor Hiromitsu Nakashima

Hiromitsu Nakashima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10836614
    Abstract: An upper turning body mounted on a lower body for a crane includes a turning frame mounted on the lower body to turn freely, and a boom provided to the turning frame to be raised and lowered freely. The turning frame includes a pair of attachment brackets to which a base end section of the boom is attached such that the boom is free to be raised and lowered, and a frame body to which the pair of attachment brackets are provided with an interval in a left-right direction of the upper turning body. The frame body is formed of a plurality of divided frames arranged side by side in the left-right direction of the upper turning body, adjacent divided frames of the plurality of divided frames being separably joined to each other.
    Type: Grant
    Filed: June 25, 2019
    Date of Patent: November 17, 2020
    Assignees: KOBE STEEL, LTD., KOBELCO CONSTRUCTION MACHINERY CO., LTD.
    Inventors: Yasuto Kataoka, Takunori Yamaguchi, Hiromitsu Hamaguchi, Yasuhiro Nakashima, Yoji Hanawa, Hiroki Nakayama
  • Patent number: 10710850
    Abstract: Lifting performance of a work machine is increased while suppressing an increase in a vehicle weight. When a slewing frame is seen from a side, a first reinforcement member is provided from a boom foot section to a front side part of a slewing bearing, a second reinforcement member is provided from the boom foot section to a mast foot section, and a third reinforcement member is provided from the mast foot section to a rear side part of the slewing bearing. Furthermore, a fourth reinforcement member is provided from a middle region (M) located at an upper end portion of the slewing frame and above a rear portion of the slewing bearing to the front side part of the slewing bearing, and a fifth reinforcement member is provided from the middle region (M) to the rear side part of the slewing bearing.
    Type: Grant
    Filed: March 30, 2017
    Date of Patent: July 14, 2020
    Assignee: KOBELCO CONSTRUCTION MACHINERY CO., LTD.
    Inventors: Kyohei Kawamoto, Yasuhiro Nakashima, Hiromitsu Hamaguchi
  • Publication number: 20200124961
    Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).
    Type: Application
    Filed: December 19, 2019
    Publication date: April 23, 2020
    Applicant: JSR CORPORATION
    Inventors: Hiroki NAKAGAWA, Hiromitsu NAKASHIMA, Gouji WAKAMATSU, Kentarou GOTOU, Yukio NISHIMURA, Takeo SHIOYA
  • Patent number: 10620534
    Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).
    Type: Grant
    Filed: August 17, 2018
    Date of Patent: April 14, 2020
    Assignee: JSR CORPORATION
    Inventors: Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura, Takeo Shioya
  • Patent number: 10564546
    Abstract: A resist pattern-forming method includes applying a photoresist composition directly or indirectly on a front face of a substrate to form a photoresist film. A topcoat layer is laminated directly or indirectly on a front face of the photoresist film. The photoresist film is subjected to liquid immersion lithography in a presence of a liquid immersion liquid on a front face of the topcoat layer. Part of the topcoat layer is removed after subjecting the photoresist film to the liquid immersion lithography. The photoresist film is developed after the part of the topcoat layer is removed.
    Type: Grant
    Filed: May 11, 2017
    Date of Patent: February 18, 2020
    Assignee: JSR CORPORATION
    Inventors: Tomohiko Sakurai, Sousuke Oosawa, Hiromitsu Nakashima, Kousuke Terayama
  • Publication number: 20200031637
    Abstract: Lifting performance of a work machine is increased while suppressing an increase in a vehicle weight. When a slewing frame (1) is seen from a side, a first reinforcement member (11) is provided from a boom foot section (5) to a front side part of a slewing bearing (22), a second reinforcement member (12) is provided from the boom foot section (5) to a mast foot section (6), and a third reinforcement member (13) is provided from the mast foot section (6) to a rear side part of the slewing bearing (22). Furthermore, a fourth reinforcement member (14) is provided from a middle region (M) located at an upper end portion of the slewing frame (1) and above a rear portion of the slewing bearing (22) to the front side part of the slewing bearing (22), and a fifth reinforcement member (15) is provided from the middle region (M) to the rear side part of the slewing bearing (22).
    Type: Application
    Filed: March 30, 2017
    Publication date: January 30, 2020
    Applicant: KOBELCO CONSTRUCTION MACHINERY CO., LTD.
    Inventors: Kyohei KAWAMOTO, Yasuhiro NAKASHIMA, Hiromitsu HAMAGUCHI
  • Patent number: 10464789
    Abstract: An upper turning body mounted on a lower body for a crane includes a turning frame mounted on the lower body to turn freely and a boom provided to the turning frame to be raised and lowered freely. The turning frame includes a pair of attachment brackets to which a base end section of the boom is attached such that the boom is free to be raised and lowered, and a main frame to which the pair of attachment brackets are provided with an interval in the left-right direction of the upper turning body. The dimension of the main frame in the front-rear direction of the upper turning body orthogonal to the left-right direction is smaller than the dimension of the main frame in the left-right direction.
    Type: Grant
    Filed: February 27, 2014
    Date of Patent: November 5, 2019
    Assignees: KOBE STEEL, LTD., KOBELCO CONSTRUCTION MACHINERY CO., LTD.
    Inventors: Yasuto Kataoka, Takunori Yamaguchi, Hiromitsu Hamaguchi, Yasuhiro Nakashima, Yoji Hanawa, Hiroki Nakayama
  • Publication number: 20190315605
    Abstract: An upper turning body mounted on a lower body for a crane includes a turning frame mounted on the lower body to turn freely, and a boom provided to the turning frame to be raised and lowered freely. The turning frame includes a pair of attachment brackets to which a base end section of the boom is attached such that the boom is free to be raised and lowered, and a frame body to which the pair of attachment brackets are provided with an interval in a left-right direction of the upper turning body. The frame body is formed of a plurality of divided frames arranged side by side in the left-right direction of the upper turning body, adjacent divided frames of the plurality of divided frames being separably joined to each other.
    Type: Application
    Filed: June 25, 2019
    Publication date: October 17, 2019
    Applicants: KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL, LTD.), KOBELCO CONSTRUCTION MACHINERY CO., LTD.
    Inventors: Yasuto KATAOKA, Takunori YAMAGUCHI, Hiromitsu HAMAGUCHI, Yasuhiro NAKASHIMA, Yoji HANAWA, Hiroki NAKAYAMA
  • Publication number: 20190278175
    Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).
    Type: Application
    Filed: August 17, 2018
    Publication date: September 12, 2019
    Applicant: JSR CORPORATION
    Inventors: Hiroki NAKAGAWA, Hiromitsu NAKASHIMA, Gouji WAKAMATSU, Kentarou GOTOU, Yukio NISHIMURA, Takeo SHIOYA
  • Publication number: 20190249000
    Abstract: A resin composition includes a resin A, a resin C, and a solvent. The resin A includes a sulfonic-acid-group-containing structural unit in an amount exceeding 5 mol % with respect to total structural units included in the resin A. The resin A has a content of a fluorine atom of 30 mass % or less with respect to a total mass of the resin A. The resin C includes a fluorine atom in a larger content per unit mass than the content of a fluorine atom per unit mass in the resin A. A content of the resin A in the resin composition is lower than a content of the resin C in the resin composition in terms of mass.
    Type: Application
    Filed: April 26, 2019
    Publication date: August 15, 2019
    Applicant: JSR Corporation
    Inventors: Tomohiko SAKURAI, Sosuke Osawa, Hiromitsu Nakashima
  • Publication number: 20190025695
    Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).
    Type: Application
    Filed: August 17, 2018
    Publication date: January 24, 2019
    Applicant: JSR CORPORATION
    Inventors: Hiroki NAKAGAWA, Hiromitsu NAKASHIMA, Gouji WAKAMATSU, Kentarou GOTOU, Yukio NISHIMURA, Takeo SHIOYA
  • Patent number: 10082733
    Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).
    Type: Grant
    Filed: October 21, 2016
    Date of Patent: September 25, 2018
    Assignee: JSR CORPORATION
    Inventors: Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura, Takeo Shioya
  • Patent number: 10048586
    Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1. -A-R1??(x).
    Type: Grant
    Filed: February 29, 2016
    Date of Patent: August 14, 2018
    Assignee: JSR CORPORATION
    Inventors: Yuusuke Asano, Mitsuo Sato, Hiromitsu Nakashima, Kazuki Kasahara, Yoshifumi Oizumi, Masafumi Hori, Takanori Kawakami, Yasuhiko Matsuda, Kazuo Nakahara
  • Publication number: 20170329228
    Abstract: A resist pattern-forming method includes applying a photoresist composition directly or indirectly on a front face of a substrate to form a photoresist film. A topcoat layer is laminated directly or indirectly on a front face of the photoresist film. The photoresist film is subjected to liquid immersion lithography in a presence of a liquid immersion liquid on a front face of the topcoat layer. Part of the topcoat layer is removed after subjecting the photoresist film to the liquid immersion lithography. The photoresist film is developed after the part of the topcoat layer is removed.
    Type: Application
    Filed: May 11, 2017
    Publication date: November 16, 2017
    Applicant: JSR CORPORATION
    Inventors: Tomohiko SAKURAI, Sousuke OOSAWA, Hiromitsu NAKASHIMA, Kousuke TERAYAMA
  • Publication number: 20170199453
    Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).
    Type: Application
    Filed: October 21, 2016
    Publication date: July 13, 2017
    Applicant: JSR CORPORATION
    Inventors: Hiroki NAKAGAWA, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura, Takeo Shioya
  • Patent number: 9688523
    Abstract: It is an objective of the present invention to provide a cap opening tool set that enables the user of a container to reduce surely an inner pressure of the container and loosen smoothly a screw cap even if the user has only a weak arm power. A cap opening tool set according to the present invention includes a ring and a cap opener. The ring includes a guide section for facing a circumferential surface section of a screw cap. The cap opener includes a head to be placed over the screw cap and arms extending from the head. The head includes a contact section, a top-surface facing section, and a needle. The contact section enters a space formed between the screw cap and the guide section and presses the circumferential surface section of the screw cap. The needle penetrates the top surface section of the screw cap.
    Type: Grant
    Filed: September 9, 2011
    Date of Patent: June 27, 2017
    Assignee: UCC Ueshima Coffee Co., Ltd.
    Inventors: Takayuki Kamakura, Shinichi Nomura, Osamu Nakagiri, Hiromitsu Nakashima
  • Patent number: 9598520
    Abstract: A radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation-sensitive acid generator. The first polymer has a structure unit represented by a following formula (1-1), a structure unit represented by a following formula (1-2), or both thereof, and has a content of fluorine atoms of no less than 5% by mass to a total mass of the first polymer. The second polymer has an acid-dissociable group, and has a content of fluorine atoms of less than 5% by mass to a total mass of the second polymer.
    Type: Grant
    Filed: May 17, 2012
    Date of Patent: March 21, 2017
    Assignee: JSR Corporation
    Inventors: Yuko Kiridoshi, Takehiko Naruoka, Yukio Nishimura, Yusuke Asano, Takanori Kawakami, Hiromitsu Nakashima
  • Patent number: 9513548
    Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1.
    Type: Grant
    Filed: April 2, 2014
    Date of Patent: December 6, 2016
    Assignee: JSR CORPORATION
    Inventors: Yuusuke Asano, Mitsuo Satou, Hiromitsu Nakashima, Kazuki Kasahara, Yoshifumi Oizumi, Masafumi Hori, Takanori Kawakami, Yasuhiko Matsuda, Kazuo Nakahara
  • Patent number: 9500950
    Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).
    Type: Grant
    Filed: November 5, 2015
    Date of Patent: November 22, 2016
    Assignee: JSR CORPORATION
    Inventors: Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura, Takeo Shioya
  • Publication number: 20160179003
    Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1.
    Type: Application
    Filed: February 29, 2016
    Publication date: June 23, 2016
    Applicant: JSR Corporation
    Inventors: Yuusuke ASANO, Mitsuo Sato, Hiromitsu Nakashima, Kazuki Kasahara, Yoshifumi Oizumi, Masafumi Hori, Takanori Kawakami, Yasuhiko Matsuda, Kazuo Nakahara