Patents by Inventor Hironori Matsunaga
Hironori Matsunaga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240115720Abstract: The present invention provides a novel anti-DLL3 antibody-pyrrolodiazepine derivative and a novel anti-DLL3 anti-body-pyrrolodiazepine derivative conjugate using the same.Type: ApplicationFiled: January 13, 2022Publication date: April 11, 2024Applicants: MEMORIAL SLOAN KETTERING CANCER CENTER, TRI-INSTITUTIONAL THERAPEUTICS DISCOVERY INSTITUTE, DAIICHI SANKYO COMPANY, LIMITEDInventors: John T. POIRIER, Charles RUDIN, Jason LEWIS, Abdul KHAN, David ANDREW, Xinlei CHEN, Ivo LORENZ, Hironori MATSUNAGA
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Publication number: 20240115721Abstract: It is an object of the present invention to provide an antibody-drug conjugate of an antibody binding to DLL3 and a drug having antitumor activity, a pharmaceutical composition comprising the antibody-drug conjugate and having therapeutic effects on a tumor, a method for treating a tumor using the antibody-drug conjugate or the pharmaceutical composition, and the like. The present invention provides an antibody-drug conjugate of an antibody binding to DLL3 and a drug having antitumor activity, a pharmaceutical composition comprising the antibody or the antibody-drug conjugate, and a method for treating a tumor.Type: ApplicationFiled: January 13, 2022Publication date: April 11, 2024Applicants: MEMORIAL SLOAN KETTERING CANCER CENTER, TRI-INSTITUTIONAL THERAPEUTICS DISCOVERY INSTITUTE, DAIICHI SANKYO COMPANY, LIMITEDInventors: John T. POIRIER, Charles RUDIN, Jason LEWIS, Abdul KHAN, David ANDREW, Xinlei CHEN, Ivo LORENZ, Hironori MATSUNAGA
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Patent number: 10040791Abstract: It has been found that a compound of the general formula (I) having an isoxazole skeleton has excellent inhibitory activity against mutant IDH1 protein and inhibits the production of 2-HG by this protein, while the compound is also capable of effectively inhibiting the growth of various tumors expressing the protein. In the formula, R1, R2, R3, Y, and Z are as defined in claim 1.Type: GrantFiled: October 1, 2015Date of Patent: August 7, 2018Assignees: Daiichi Sankyo Company, Limited, National Cancer CenterInventors: Shoichi Saito, Masao Itoh, Tetsunori Fujisawa, Hironao Saito, Yohei Kiyotsuka, Hideaki Watanabe, Hironori Matsunaga, Yoshiko Kagoshima, Tetsuya Suzuki, Yoko Ogawara, Kazuo Kitabayashi
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Publication number: 20170313696Abstract: It has been found that a compound of the general formula (I) having an isoxazole skeleton has excellent inhibitory activity against mutant IDH1 protein and inhibits the production of 2-HG by this protein, while the compound is also capable of effectively inhibiting the growth of various tumors expressing the protein. In the formula, R1, R2, R3, Y, and Z are as defined in claim 1.Type: ApplicationFiled: October 1, 2015Publication date: November 2, 2017Applicants: Daiichi Sankyo Company, Limited, National Cancer CenterInventors: Shoichi Saito, Masao Itoh, Tetsunori Fujisawa, Hironao Saito, Yohei Kiyotsuka, Hideaki Watanabe, Hironori Matsunaga, Yoshiko Kagoshima, Tetsuya Suzuki, Yoko Ogawara, Kazuo Kitabayashi
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Patent number: 8785438Abstract: A compound represented by formula (I) having mTOR inhibitory activity or a pharmacologically acceptable salt thereof.Type: GrantFiled: March 13, 2013Date of Patent: July 22, 2014Assignee: Daiichi Sankyo Company, LimitedInventors: Masami Ohtsuka, Noriyasu Haginoya, Masanori Ichikawa, Hironori Matsunaga, Hironao Saito, Yoshihiro Shibata, Tomoyuki Tsunemi
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Patent number: 8436012Abstract: A compound represented by formula (I) having mTOR inhibitory activity or a pharmacologically acceptable salt thereof.Type: GrantFiled: November 24, 2010Date of Patent: May 7, 2013Assignee: Daiichi Sankyo Company, LimitedInventors: Masami Ohtsuka, Noriyasu Haginoya, Masanori Ichikawa, Hironori Matsunaga, Hironao Saito, Yoshihiro Shibata, Tomoyuki Tsunemi
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Publication number: 20110082138Abstract: A compound represented by formula (I) having mTOR inhibitory activity or a pharmacologically acceptable salt thereof.Type: ApplicationFiled: November 24, 2010Publication date: April 7, 2011Applicant: Daiichi Sankyo Company, LimitedInventors: Masami Ohtsuka, Noriyasu Haginoya, Masanori Ichikawa, Hironori Matsunaga, Hironao Saito, Yoshihiro Shibata, Tomoyuki Tsunemi
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Patent number: 6440591Abstract: A ferroelectric thin film coated substrate is obtained by a producing method of forming a metal oxide buffer layer on a substrate, forming a first crystalline ferroelectric thin film thereon by means of a MOCVD method and forming a second ferroelectric thin film with a film thickness thicker than that of the first ferroelectric thin film thereon by means of the MOCVD method at a temperature lower than that of the first ferroelectric thin film. This producing method makes it possible to produce a ferroelectric thin film, where its surface is dense and even, a leakage current properties are excellent and sufficiently large remanent spontaneous polarization is shown, at a lower temperature.Type: GrantFiled: May 8, 1996Date of Patent: August 27, 2002Assignee: Sharp Kabushiki KaishaInventors: Hironori Matsunaga, Takeshi Kijima, Sakiko Satoh, Masayoshi Koba
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Patent number: 6307225Abstract: A bismuth silicate film (insulating film) 3 of Bi2SiO5 oriented predominantly in the direction of (100) is formed on a Si substrate 2 and a ferroelectric thin film 4 is formed on the bismuth silicate film 3 to create an MFIS structure having a c-axis-oriented ferroelectric thin film 4 formed with good reproducibility. A highly reliable thin film device is produced by applying the MFIS structure to a FET.Type: GrantFiled: June 16, 2000Date of Patent: October 23, 2001Assignee: Sharp Kabushiki KaishaInventors: Takeshi Kijima, Hironori Matsunaga
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Patent number: 6232167Abstract: A ferroelectric thin film coated substrate is obtained by a producing method of forming a crystalline thin film on a substrate by means of a MOCVD method at a substrate temperature at which crystal grows and of forming a ferroelectric thin film on the crystalline thin film by means of the MOCVD method at a film forming temperature, which is lower than the film forming temperature of the crystalline thin film. This producing method makes it possible to produce a ferroelectric thin film, where a surface of the thin film is dense and even, leakage current properties are excellent and sufficiently large remanent spontaneous polarization is shown, at a lower temperature.Type: GrantFiled: November 12, 1997Date of Patent: May 15, 2001Assignee: Sharp Kabushiki KaishaInventors: Sakiko Satoh, Takeshi Kijima, Hironori Matsunaga, Masayoshi Koba
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Patent number: 6197600Abstract: A ferroelectric thin film includes: a bismuth oxide polycrystal thin film constituting a buffer layer, and a bismuth-based layered compound thin film represented by the formula: Bi2Am-1BmO3m+3 wherein A is an atom selected from the group consisting of Na, K, Pb, Ca, Sr, Ba and Bi; B is an atom selected from the group consisting of Fe, Ti, Nb, Ta, W and Mo; and m is an integer of 1 or more. The bismuth oxide polycrystal thin film and the bismuth-based layered compound thin film are formed into a single-phase.Type: GrantFiled: May 5, 1998Date of Patent: March 6, 2001Assignee: Sharp Kabushiki KaishaInventors: Takeshi Kijima, Maho Ushikubo, Hironori Matsunaga
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Patent number: 6165622Abstract: A ferroelectric thin film includes a ferroelectric crystal containing Bi, Ti and O as constituent elements, wherein the composition ratio of Bi/Ti in the ferroelectric thin film is shifted from a stoichiometric composition. Also, a substrate provided with a ferroelectric thin film, a device having a capacitor structure used for a ferroelectric memory device, a pyroelectric sensor device, a piezoelectric device or the like, and a method for manufacturing a ferroelectric thin film are disclosed.Type: GrantFiled: December 27, 1996Date of Patent: December 26, 2000Assignee: Sharp Kabushiki KaishaInventors: Takeshi Kijima, Hironori Matsunaga
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Patent number: 6162293Abstract: A method for manufacturing a ferroelectric thin film having a layered perovskite crystal structure of the general formula: Bi.sub.2 A.sub.m-1 B.sub.m O.sub.3m+3, wherein A is selected from the group consisting of Na.sup.1+, K.sup.1+, Pb.sup.2+, Ca.sup.2+, Sr.sup.2+, Ba.sup.2+ and Bi.sup.3+, B is selected from the group consisting of Fe.sup.3+, Ti.sup.4+, Nb.sup.5+, Ta.sup.5+, W.sup.6+ and Mo.sup.6+, and m represents an integer of 1 or larger, which comprises introducing into a film formation chamber where a substrate is set, gaseous starting materials inclusive of oxygen gas for forming the ferroelectric thin film in which the flow rate of oxygen gas as one component of the gaseous starting materials is controlled to an arbitrary value necessary for the formation of the ferroelectric thin film having a desired orientation while the pressure inside the film formation chamber and the total flow rate of the gaseous starting materials and an optionally introduced carrier gas are maintained constant.Type: GrantFiled: December 18, 1997Date of Patent: December 19, 2000Assignee: Sharp Kabushiki KaishaInventors: Takeshi Kijima, Akira Okutoh, Maho Ushikubo, Hironori Matsunaga
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Patent number: 5851841Abstract: A method for producing a ferroelectric element having a lower electrode layer, a ferroelectric film and an upper electrode layer provided in sequence on the substrate is disclosed. The method comprising the step of applying a metal-contained precursor solution to the surface of the lower electrode layer formed on the substrate, the step of drying the applied precursor solution to remove the solution alone by heating it, a first heat treatment step for heating the dried precursor to form a ferroelectric film, and a second heat treatment step for heating the formed film element in a gas-pressurized atmosphere of lower than 1 atmosphere after forming an upper electrode layer on the ferroelectric film.Type: GrantFiled: September 13, 1996Date of Patent: December 22, 1998Assignee: Sharp Kabushiki KaishaInventors: Maho Ushikubo, Yasuyuki Ito, Seiichi Yokoyama, Hironori Matsunaga, Masayoshi Koba
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Patent number: 5821005Abstract: A ferroelectrics thin-film coated substrate is manufactured in a low-temperature process by using a ferroelectrics having a dense and even surface and exhibiting a large residual spontaneous polarization. A ferroelectrics thin-film coated substrate has a structure with a buffer layer, a growth layer allowing a ferroelectrics thin-film to grow, and a ferroelectrics thin-film made of a ferroelectric material having a layered crystalline structure expressed in the chemical formula Bi.sub.2 A.sub.m-1 B.sub.m O.sub.3m+3 (A is selected from Na.sup.1+, K.sup.1+, Pb.sup.2+, Ca.sup.2+, Sr.sup.2+, Ba.sup.2+, Bi.sup.3+ and the like, B is selected from Fe.sup.3+, Ti.sup.4+, Nb.sup.5+, Ta.sup.5+, W.sup.6+ and Mo.sup.6+, and m is an integer not less than 1) formed in succession.Type: GrantFiled: March 8, 1996Date of Patent: October 13, 1998Assignee: Sharp Kabushiki KaishaInventors: Takeshi Kijima, Sakiko Satoh, Hironori Matsunaga, Masayoshi Koba
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Patent number: 5811181Abstract: A close a-axis orientating film having a smooth surface and excellent ferroelectric characteristics is manufactured at a low temperature with preferable reproducibility to apply ferroelectric Bi.sub.4 Ti.sub.3 O.sub.12 to development of various kinds of devices such as a ferroelectric non-volatile memory, a pyroelectric sensor, etc. A ferroelectric Bi.sub.4 Ti.sub.3 O.sub.12 thin film is formed on a substrate through a titanium oxide buffer layer so that closeness and surface smoothness of the Bi.sub.4 Ti.sub.3 O.sub.12 thin film manufactured on the titanium oxide buffer layer can be improved.Type: GrantFiled: May 24, 1995Date of Patent: September 22, 1998Assignee: Sharp Kabushiki KaishaInventors: Takeshi Kijima, Sakiko Satoh, Hironori Matsunaga, Masayoshi Koba, Noboru Ohtani
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Patent number: 5757061Abstract: A ferroelectric thin film coated substrate is obtained by a producing method of forming a crystalline thin film on a substrate by means of a MOCVD method at a substrate temperature at which crystal grows and of forming a ferroelectric thin film on the crystalline thin film by means of the MOCVD method at a film forming temperature, which is lower than the film forming temperature of the crystalline thin film. This producing method makes it possible to produce a ferroelectric thin film, where a surface of the thin film is dense and even, leakage current properties are excellent and sufficiently large remanent spontaneous polarization is shown, at a lower temperature.Type: GrantFiled: May 8, 1996Date of Patent: May 26, 1998Assignee: Sharp Kabushiki KaishaInventors: Sakiko Satoh, Takeshi Kijima, Hironori Matsunaga, Masayoshi Koba
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Patent number: 5576564Abstract: The present invention provides a substrate providing a ferroelectric crystal thin film which includes an electrode formed on a semiconductor single crystal substrate and a ferroelectric crystal thin film of Bi.sub.4 Ti.sub.3 O.sub.12 formed on the electrode through the intermediary of a buffer layer.Type: GrantFiled: December 28, 1994Date of Patent: November 19, 1996Assignee: Sharp Kabushiki KaishaInventors: Sakiko Satoh, Hironori Matsunaga, Kenji Nakanishi, Yoshiyuki Masuda, Masayoshi Koba
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Patent number: 5128007Abstract: A method for evaluating a lithium niobate thin film includes measuring an absorption edge wavelength of a lithium niobate thin film and evaluating a lithium-to-niobium composition ratio of the thin film, and an apparatus for preparing a thin film including a thin film-forming body capable of controlling the lithium-to-niobium composition ratio of a lithium niobate thin film being formed and an evaluation device for evaluating the lithium-to-niobium composition ratio, the evaluation device being provided with a monitor substrate, an optical path for spectrometry, an ultraviolet ray source and a measurement part for measuring an absorption edge wavelength of the thin film.Type: GrantFiled: April 25, 1991Date of Patent: July 7, 1992Assignee: Sharp Kabushiki KaishaInventors: Hironori Matsunaga, Hirotaka Ohno, Yasunari Okamoto
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Patent number: 4981714Abstract: A method of producing a ferroelectric thin film comprising the steps of evaporating metal Li or an oxide thereof as a Li source, metal Nb or an oxide thereof as a Nb source and metal Ta or an oxide thereof as a Ta source in a substantially oxygen gas plasma atmosphere while controlling the respective heating temperatures independently from each other and simultaneously depositing the Li, Nb and Ta on a substrate so as to obtain an LiNb.sub.1-x Ta.sub.x O.sub.3 (0<x<1) thin film which shows ferroelectricity.Type: GrantFiled: April 30, 1990Date of Patent: January 1, 1991Assignee: Sharp Kabushiki KaishaInventors: Hirotaka Ohno, Hironori Matsunaga, Yasunari Okamoto, Yoshiharu Nakajima