Patents by Inventor Hironori Yamamoto

Hironori Yamamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10430275
    Abstract: In general, according to an embodiment, a memory system includes a memory device including a memory cell; and a controller. The controller is configured to: receive first data from the memory cell in a first data reading; receive second data from the memory cell in a second data reading that is different from the first data reading; convert a first value that is based on the first data and the second data, to a second value in accordance with a first relationship; and convert the first value to a third value in accordance with a second relationship that is different from the first relationship.
    Type: Grant
    Filed: March 9, 2018
    Date of Patent: October 1, 2019
    Assignee: Toshiba Memory Corporation
    Inventors: Tsukasa Tokutomi, Masanobu Shirakawa, Marie Takada, Masamichi Fujiwara, Kazumasa Yamamoto, Naoaki Kokubun, Tatsuro Hitomi, Hironori Uchikawa
  • Publication number: 20190207060
    Abstract: Provided is a substrate with transparent electrode, which is capable of achieving both acceleration of crystallization dining a heat treatment and suppression of crystallization under a normal temperature environment. In the substrate with transparent electrode, a transparent electrode thin-film formed of a transparent conductive oxide is formed on a film substrate. An underlayer that contains a metal oxide as a main component is formed between the film substrate and the transparent electrode thin-film. The underlayer and the transparent electrode thin-film are in contact with each other. The transparent electrode thin-film is amorphous, and the base layer is dielectric and crystalline.
    Type: Application
    Filed: March 6, 2019
    Publication date: July 4, 2019
    Inventors: Takashi Kuchiyama, Hironori Hayakawa, Hiroaki Ueda, Yuji Motohara, Kenji Yamamoto
  • Patent number: 10329631
    Abstract: An object of the present invention is to provide a constitutive 1,4-dioxane-degrading bacteria offering excellent maximum relative rates of degradation of 1,4-dioxane. As a means for achieving the object, the present invention provides a constitutive 1,4-dioxane-degrading bacteria being strain N23 deposited as Accession No. NITE BP-02032.
    Type: Grant
    Filed: April 25, 2016
    Date of Patent: June 25, 2019
    Assignee: TAISEI CORPORATION
    Inventors: Norifumi Yamamoto, Yuji Saito, Hironori Taki
  • Publication number: 20190031843
    Abstract: The present invention provides, in one aspect, a method for producing a molded article, the method comprising exposing a molded article precursor comprising a protein to an environment with a relative humidity of 90% or more to obtain the molded article.
    Type: Application
    Filed: January 27, 2017
    Publication date: January 31, 2019
    Applicants: Riken, Spiber Inc.
    Inventors: Keiji Numata, Kana Ishida, Hironori Yamamoto
  • Publication number: 20190031842
    Abstract: The present invention provides, in one aspect, a method for producing a molded article, the method comprising exposing a molded article precursor comprising a protein to an environment with a relative humidity of 80% or more to obtain the molded article.
    Type: Application
    Filed: January 27, 2017
    Publication date: January 31, 2019
    Applicants: Riken, Spiber Inc., Kojima Industries Corporation
    Inventors: Keiji Numata, Kana Ishida, Hironori Yamamoto
  • Publication number: 20180127553
    Abstract: A polar solvent solution of the present invention is a polar solvent solution in which a solute containing a polyamine acid is dissolved in a polar solvent. An inorganic salt is added to the solution, and a mole ratio of moisture to the inorganic salt in the solution is 2.5×m×n or less, where m represents the number of cations forming the inorganic salt and n represents a charge number of the cation. A production method of the present invention is a method for producing the above solution, including: changing at, least one of a moisture content and a content of the inorganic salt in the solution to adjust a viscosity of the solution. Thus, the present invention provides a polar solvent solution whose viscosity can be easily adjusted to a desired value and thus enables stable spinning and casting when used as dopes for spinning, film, etc., and methods for producing the same.
    Type: Application
    Filed: April 4, 2016
    Publication date: May 10, 2018
    Inventors: Kana ISHIDA, Hironori YAMAMOTO, Hiroaki SUZUMURA, Kazuhide SEKIYAMA
  • Publication number: 20180080147
    Abstract: A polar solvent solution of the present invention is a polar solvent solution in which a solute containing a polyamino acid is dissolved in a polar solvent. The solution has a moisture content of less than 5 mass % based on 100 mass % of the solution. A method for producing a polar solvent solution of the present invention includes changing a moisture content of the solution to adjust the viscosity of the solution. Further, another method for producing a polar solvent solution includes reducing a moisture content of the solution to increase the viscosity of the solution. Thus, the present invention provides a polar solvent solution that enables stable spinning and casting without lowering its viscosity when used as dopes for spinning, film, etc., and methods for producing the same.
    Type: Application
    Filed: April 4, 2016
    Publication date: March 22, 2018
    Inventors: Kana ISHIDA, Hironori YAMAMOTO, Hiroaki SUZUMURA, Kazuhide SEKIYAMA
  • Patent number: 9802262
    Abstract: A thread forming tap includes a screw thread formed into a male thread shape with margin portions disposed to project in radial direction and relief portions having a diameter smaller than the margin portions, the margin portions and relief portions alternatively arranged and, thread forming tap causes the margin portions of the screw thread to cut into a surface layer portion of a prepared hole formed in a work to plastically deform the surface layer portion to form a female thread, margin portions are formed into a ridge line shape with a width dimension of zero at least at a thread bottom of the screw thread, and margin portions are formed into a ridge line shape with a width dimension of zero in a range from a thread bottom of the screw thread to a position between the thread bottom and an effective diameter position of the screw thread.
    Type: Grant
    Filed: June 22, 2012
    Date of Patent: October 31, 2017
    Assignee: OSG Corporation
    Inventors: Kazumitsu Harada, Hironori Yamamoto, Toshihiro Satoh
  • Patent number: 9236430
    Abstract: The deposition rate of a porous insulation film is increased, and the film strength of the porous insulation film is improved. Two or more organic siloxane raw materials each having a cyclic SiO structure as a main skeleton thereof, and having mutually different structures, are vaporized, and transported with a carrier gas to a reactor (chamber), and an oxidant gas including an oxygen atom is added thereto. Thus, a porous insulation film is formed by a plasma CVD (Chemical Vapor Deposition) method or a plasma polymerization method in the reactor (chamber). In the step, the ratio of the flow rate of the added oxidant gas to the flow rate of the carrier gas is more than 0 and 0.08 or less.
    Type: Grant
    Filed: May 1, 2015
    Date of Patent: January 12, 2016
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventors: Hironori Yamamoto, Fuminori Ito, Yoshihiro Hayashi
  • Patent number: 9220560
    Abstract: A treatment instrument for an endoscope is provided that is suitable for cutting submucosa in endoscopic submucosal dissection. The treatment instrument for an endoscope includes a treatment portion having a cutting unit at a tip of an insertion portion that is to be inserted into the body. The main unit of the treatment portion is formed in a sawtooth shape having a peak portion and a valley portion. An electrode plate serving as the cutting unit is provided in the valley portion.
    Type: Grant
    Filed: September 12, 2006
    Date of Patent: December 29, 2015
    Assignee: JICHI MEDICAL UNIVERSITY
    Inventor: Hironori Yamamoto
  • Publication number: 20150236091
    Abstract: The deposition rate of a porous insulation film is increased, and the film strength of the porous insulation film is improved. Two or more organic siloxane raw materials each having a cyclic SiO structure as a main skeleton thereof, and having mutually different structures, are vaporized, and transported with a carrier gas to a reactor (chamber), and an oxidant gas including an oxygen atom is added thereto. Thus, a porous insulation film is formed by a plasma CVD (Chemical Vapor Deposition) method or a plasma polymerization method in the reactor (chamber). In the step, the ratio of the flow rate of the added oxidant gas to the flow rate of the carrier gas is more than 0 and 0.08 or less.
    Type: Application
    Filed: May 1, 2015
    Publication date: August 20, 2015
    Inventors: Hironori YAMAMOTO, Fuminori ITO, Yoshihiro HAYASHI
  • Publication number: 20150158102
    Abstract: A thread forming tap includes a screw thread formed into a male thread shape with margin portions disposed to project in radial direction and relief portions having a diameter smaller than the margin portions, the margin portions and relief portions alternatively arranged and, thread forming tap causes the margin portions of the screw thread to cut into a surface layer portion of a prepared hole formed in a work to plastically deform the surface layer portion to form a female thread, margin portions are formed into a ridge line shape with a width dimension of zero at least at a thread bottom of the screw thread, and margin portions are formed into a ridge line shape with a width dimension of zero in a range from a thread bottom of the screw thread to a position between the thread bottom and an effective diameter position of the screw thread.
    Type: Application
    Filed: June 22, 2012
    Publication date: June 11, 2015
    Applicant: OSG CORPORATION
    Inventors: Kazumitsu Harada, Hironori Yamamoto, Toshihiro Satoh
  • Patent number: 9034740
    Abstract: The deposition rate of a porous insulation film is increased, and the film strength of the porous insulation film is improved. Two or more organic siloxane raw materials each having a cyclic SiO structure as a main skeleton thereof, and having mutually different structures, are vaporized, and transported with a carrier gas to a reactor (chamber), and an oxidant gas including an oxygen atom is added thereto. Thus, a porous insulation film is formed by a plasma CVD (Chemical Vapor Deposition) method or a plasma polymerization method in the reactor (chamber). In the step, the ratio of the flow rate of the added oxidant gas to the flow rate of the carrier gas is more than 0 and 0.08 or less.
    Type: Grant
    Filed: May 6, 2013
    Date of Patent: May 19, 2015
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventors: Hironori Yamamoto, Fuminori Ito, Yoshihiro Hayashi
  • Patent number: 8998734
    Abstract: A thread forming tap has a full thread portion and a leading portion contiguous with the full thread portion and reducing in diameter toward its tip. The full thread and leading portions are provided with external thread on which lobes and recesses are alternately formed. When ? represents an angle around a tool center line toward a thread forming side, the shape of the lobe varies along a quadratic curve relative to angle ? so that relief amount increases toward inflection point angle ?. However, in a rough plastic deformation section where angle ? is greater than inflection point angle ? and exceeds the working region, the shape varies along an Archimedean curve with clearance angle ?1 so that the relief amount increases linearly relative to angle ?, and a margin section is substantially zero or within a range where angle ? is less than or equal to 1°.
    Type: Grant
    Filed: July 7, 2009
    Date of Patent: April 7, 2015
    Assignee: OSG Corporation
    Inventors: Kentaroh Norimatsu, Takayuki Matsushita, Hironori Yamamoto
  • Patent number: 8828178
    Abstract: A sealing device which comprises a slinger fixedly fitted to the rotary side member, a core member fixedly fitted to the stationary side member, and an elastic sealing member fixed to the core member and having a seal lip which elastically and slidably contacts the slinger. The slinger comprises a fitting cylindrical portion to be fitted into the rotary side member, a brim portion extending its radial direction at one end of its outside relative to a sealed portion of the fitting cylindrical portion, and a rotary side fixing member fixed to the brim portion. Further, the slinger is made in such a manner that an adhesive layer is formed on its whole surface including a contacting side surface where the seal lip contacts by applying adhesive agent thereon, then the fixing member is integrally fixed thereto, thereafter the adhesive layer is partially removed only in the contacting side surface.
    Type: Grant
    Filed: March 12, 2012
    Date of Patent: September 9, 2014
    Assignee: Uchiyama Manufacturing Corp.
    Inventors: Hironori Yamamoto, Koki Ishida, Tatsuo Katayama, Tadashi Kasamoto, Yoshihiko Yamaguchi, Chihiro Asanuma
  • Patent number: 8790785
    Abstract: A method of forming a porous insulation film uses an organic silica material gas having a 3-membered SiO cyclic structure and a 4-membered SiO cyclic structure, or an organic silica material gas having a 3-membered SiO cyclic structure and a straight-chain organic silica structure, and uses a plasma reaction in the filming process. A porous interlevel dielectric film having a higher strength and a higher adhesive property can be obtained.
    Type: Grant
    Filed: July 23, 2007
    Date of Patent: July 29, 2014
    Assignee: Renesas Electronics Corporation
    Inventors: Hironori Yamamoto, Fuminori Ito, Munehiro Tada, Yoshihiro Hayashi
  • Patent number: 8598706
    Abstract: A method for forming an interlayer dielectric film by a plasma CVD method, including turning off a radio frequency power and purging with an inert gas simultaneously.
    Type: Grant
    Filed: September 17, 2008
    Date of Patent: December 3, 2013
    Assignee: Renesas Electronics Corporation
    Inventors: Hironori Yamamoto, Fuminori Ito, Yoshihiro Hayashi
  • Publication number: 20130299952
    Abstract: The deposition rate of a porous insulation film is increased, and the film strength of the porous insulation film is improved. Two or more organic siloxane raw materials each having a cyclic SiO structure as a main skeleton thereof, and having mutually different structures, are vaporized, and transported with a carrier gas to a reactor (chamber), and an oxidant gas including an oxygen atom is added thereto. Thus, a porous insulation film is formed by a plasma CVD (Chemical Vapor Deposition) method or a plasma polymerization method in the reactor (chamber). In the step, the ratio of the flow rate of the added oxidant gas to the flow rate of the carrier gas is more than 0 and 0.08 or less.
    Type: Application
    Filed: May 6, 2013
    Publication date: November 14, 2013
    Applicant: Renesas Electronics Corporation
    Inventors: Hironori YAMAMOTO, Fuminori ITO, Yoshihiro HAYASHI
  • Patent number: 8435828
    Abstract: A method of manufacturing a semiconductor device includes forming a first insulating film over an underlying film by plasma polymerization of cyclic siloxane, and forming a second insulating film on the first insulating film by plasma polymerization of the cyclic siloxane continuously, after forming the first insulating film. The deposition rate of the first insulating film is slower than the deposition rate of the second insulating film.
    Type: Grant
    Filed: January 13, 2011
    Date of Patent: May 7, 2013
    Assignee: Renesas Electronics Corporation
    Inventors: Hironori Yamamoto, Yoshihiro Hayashi, Jun Kawahara, Tatsuya Usami, Koichi Ohto
  • Patent number: 8425510
    Abstract: A treatment instrument for an endoscope includes: an operation portion; a cylindrical sheath that is connected to the operation portion and that also comprises an insertion portion; an axial electrode that is protruded from and retracted into a distal end opening portion of the sheath by an operation of the operation portion; and a distal end electrode portion that is provided at a distal end portion of the axial electrode; wherein a tapered portion is formed at a distal end portion of the sheath, the tapered portion being in a tapered shape that a distal end side of the distal end portion is narrower than a proximal end side of the distal end portion.
    Type: Grant
    Filed: September 29, 2009
    Date of Patent: April 23, 2013
    Assignees: Jichi Medical University, Fujifilm Corporation
    Inventors: Hironori Yamamoto, Ryo Ishikawa