Abstract: Provided are a paper feeding device that can stably feed one sheet of paper at a time to a paper feeding unit hopper of a printer or die cutting device. A paper feeding device comprising a paper feeding tray on which a plurality of sheets are stacked in the vertical direction, a sheet feeding means that sends, in the horizontal direction, the sheet that is located at the top of the plurality of sheets stacked on the paper feeding tray, and a pair of feeding rollers that deliver the sheet by grasping the leading edge of the sheet that is sent by the sheet feeding means, wherein the feeding rollers are variable speed rollers for which the circumferential speed can be increased and decreased while sending one sheet from the leading edge to the trailing edge.

Abstract: A resist composition and a method of forming a resist pattern that enable contamination within the exposure apparatus to be prevented in lithography processes using an electron beam or EUV (extreme ultraviolet light). In this method, an organic solvent containing, as the principal component, one or more compounds selected from a group consisting of propylene glycol monomethyl ether (PGME), methyl amyl ketone (MAK), butyl acetate (BuOAc), and 3-methyl methoxy propionate (MMP) is used as the resist solvent.

Abstract: A photosensitive resin realizes formation of a pattern having a good shape, without introducing poor compatibility between an acid generator and a photoresist primary-component polymer having an acid-dissociable group, and a photosensitive composition containing the photosensitive resin. The photosensitive resin includes a repeating unit represented by formula (1): (wherein R1 represents a C2-C9 linear or branched divalent hydrocarbon group; each of R2 to R5 represents a hydrogen atom or a C1-C3 linear or branched hydrocarbon group; each of R6 and R7 represents an organic group, wherein R6 and R7 may together form a divalent organic group; and X?represents an anion); at least one of a repeating unit represented by formula (2): (wherein R8 represents a C2-C9 linear or branched hydrocarbon group) and a repeating unit represented by formula (3): a repeating unit represented by formula (4): optionally, a repeating unit represented by formula (5).

Abstract: A resist composition for electron beam or extreme ultraviolet (EUV), comprising a resin component (A) which exhibits changed alkali solubility under action of acid, and a photoacid generator component (B) that generates acid on exposure, wherein the component (B) comprises at least one onium salt selected from the group consisting of onium salts having an anion represented by formula (b-0-1) or (b-0-2) shown below: wherein X represents an alkylene group having 2 to 6 carbon atoms, in which at least one hydrogen atom is substituted with a fluorine atom; and each of Y and Z independently represents an alkyl group having 1 to 10 atoms, in which at least one hydrogen atom is substituted with a fluorine atom.

Abstract: To provide a photosensitive resin which realizes formation of a pattern having a good shape, without involving a problem in terms of poor compatibility between an acid generator and a photoresist primary-component polymer having an acid dissociable group, and a photosensitive composition containing the photosensitive resin.

Abstract: A calixresorcinarene compound represented by the following formula (1): wherein eight Rs are n (n is an integer of 1 to 7) substituents that are one or more types of substituents selected from groups represented by the following formula (2), and m (m is an integer shown by 8-n) hydrogen atoms; and R's, which may be the same or different, are each a straight-chain aliphatic hydrocarbon group having 2 to 12 carbon atoms, a branched aliphatic hydrocarbon group having 3 to 12 carbon atoms, a phenyl group, a p-phenylphenyl group, a p-tert-butylphenyl group, and an aromatic group represented by the following formula (3), or a substituent formed by combining two or more of these substituents: wherein R? is a hydrogen atom or a substituent selected from the substituents represented by the formula (2).

Abstract: A resist composition and a method of forming a resist pattern that enable contamination within the exposure apparatus to be prevented in lithography processes using an electron beam or EUV (extreme ultraviolet light). In this method, an organic solvent containing, as the principal component, one or more compounds selected from a group consisting of propylene glycol monomethyl ether (PGME), methyl amyl ketone (MAK), butyl acetate (BuOAc), and 3-methyl methoxy propionate (MMP) is used as the resist solvent.

Abstract: A resist composition and a method of forming a resist pattern that enable contamination within the exposure apparatus to be prevented in lithography processes using an electron beam or EUV (extreme ultraviolet light). In this method, an organic solvent containing, as the principal component, one or more compounds selected from a group consisting of propylene glycol monomethyl ether (PGME), methyl amyl ketone (MAK), butyl acetate (BuOAc), and 3-methyl methoxy propionate (MMP) is used as the resist solvent.

Abstract: The present invention provides a hyperbranched polymer that is capable of being used as a polymer material for nanofabrication including lithography, has enhanced dry etching resistance, sensitivity and surface smoothness, has a core shell structure and has an acid degradable repeating unit of tert-butyl vinylbenzoate ester in a shell portion, and a resist composition containing the hyperbranched polymer.

Abstract: A resist composition for electron beam or extreme ultraviolet (EUV), comprising a resin component (A) which exhibits changed alkali solubility under action of acid, and a photoacid generator component (B) that generates acid on exposure, wherein the component (B) comprises at least one onium salt selected from the group consisting of onium salts having an anion represented by formula (b-0-1) or (b-0-2) shown below: wherein X represents an alkylene group having 2 to 6 carbon atoms, in which at least one hydrogen atom is substituted with a fluorine atom; and each of Y and Z independently represents an alkyl group having 1 to 10 atoms, in which at least one hydrogen atom is substituted with a fluorine atom.

Abstract: A resist composition and a method of forming a resist pattern that enable contamination within the exposure apparatus to be prevented in lithography processes using an electron beam or EUV (extreme ultraviolet light). In this method, an organic solvent containing, as the principal component, one or more compounds selected from a group consisting of propylene glycol monomethyl ether (PGME), methyl amyl ketone (MAK), butyl acetate (BuOAc), and 3-methyl methoxy propionate (MMP) is used as the resist solvent.

Abstract: A static pressure lead screw includes a porous ceramic body having fluid flow paths as part of a flank. The porous ceramic body is fixed by a tubular base member through which the fluid does not flow. Fluid guide holes for supplying the fluid to the porous body extend through the tubular base member and are connected to the porous body. In a preferred embodiment, an electroless-plated layer is formed in a surface layer of the flank or an inner portion continuous with the surface layer, thereby obtaining various high-accuracy static pressure guides with high statical stiffness.

Abstract: A monolithic catalyst, for the purification of exhaust gases from an internal combustion engine, comprising: an inert carrier; a film of alumina and rare earth oxides coated onto the surface of said inert carrier, wherein Ce and La are present in said film at an atomic ratio of Ce/La of 0.05-0.3 and the total content of rare earth oxides in said film is 2-50 wt. %, measured as R.sub.2 O.sub.3, wherein R is an element of the lanthanide series of the Periodic Table; and said film carries a catalyst component containing at least one element of the platinum family.

Abstract: Exhaust gas purifying catalyst characterized in that a carrier carries as the catalytic elements, a Pt-family element or elements containing over 50 weight % of Pt and an alkaline metal in proportions of 0.001.about.1 mole per 1 kg of catalyst; or the carrier carries Ce additionally.

Abstract: A catalyst for purifying exhaust gas composed of a catalyst carrier coated with a metal oxide material containing a spinel metal oxide of the formula: MAl.sub.2 O.sub.4 wherein M is Sr, Mg, Cu, Mn, Mo, Zn, Fe, Co or Ni the metal oxide coated carrier further being coated with rhodium and platinum and/or palladium as catalytically active components. The catalytically active components also can include cerium.

Abstract: A catalyst for the purification of exhaust gases, comprising:an active component of Pt, Pd or mixtures thereof deposited on a catalyst support of a carrier coated with a metal oxide having a spinel structure of the formula: MAl.sub.2 O.sub.4 wherein M is Sr, Mg, Cu, Mn, Mo, Zn, Fe, Ni or Co.The active component of the catalyst can optionally contain cerium.