Patents by Inventor Hiroshi Horikoshi

Hiroshi Horikoshi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210024478
    Abstract: The present invention makes it possible to provide a method for producing a polyfunctional sulfur-containing epoxy compound, the method being characterized in that a polyfunctional thiol is reacted with an epihalohydrin in the presence of a reducing agent to form a polyfunctional sulfur-containing halohydrin, which is then reacted with a basic compound. The reducing agent is preferably at least one selected from the group consisting of sodium borohydride, lithium borohydride, lithium aluminum hydride, diisobutylaluminum hydride, and hydrazine.
    Type: Application
    Filed: June 11, 2019
    Publication date: January 28, 2021
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yousuke IMAGAWA, Hiroshi HORIKOSHI
  • Publication number: 20210009553
    Abstract: The present invention enables provision of a production method for 1,2,3,5,6-pentathiepane, the method comprising, in the following order, step A for reacting a trithiocarbonate, sulfur, and a methane dihalide together using a phase-transfer catalyst in a multilayer system having a water layer and an organic layer, step B for separating the water layer from the organic layer, and step C for stopping the reaction using an acid.
    Type: Application
    Filed: March 5, 2019
    Publication date: January 14, 2021
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Hiroyuki TANAGI, Kouhei TAKEMURA, Hiroshi HORIKOSHI
  • Patent number: 10767015
    Abstract: The present invention makes it possible to provide an optical material composition containing an episulfide compound (A), a polythiol compound (B), and a photochromic compound (C). The episulfide compound (A) is preferably a compound represented by formula (1), and the polythiol compound (B) is preferably a compound represented by formula (6). (In formula (1), m represents an integer of 0 to 4, and n represents an integer of 0 to 2.) (In formula (6), n represents an integer of 4 to 20, and R1 and R2 may be the same or different and represent H, SH, C1-10 alkyl groups, or C1-10 alkylthiol groups.
    Type: Grant
    Filed: July 5, 2016
    Date of Patent: September 8, 2020
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kota Kinjo, Yoshiaki Yamamoto, Hiroshi Horikoshi
  • Publication number: 20200270421
    Abstract: Provided is an optical resin material for chromatic aberration correction, comp including at least 5 mass % of a compound (component A) represented by general formula (1) or general formula (3). (In the formula, R1 to R6 each independently represent a structure represented by general formula (2).) (In the formula, the broken line represents a binding site, n1 represents an integer of 0-3, n2 represents an integer of 0 or 1, n3 represents an integer of 0-4, R7 represents hydrogen, an acryl group, a methacryl group, a cyanoacryl group, a cyclic ether group, an allyl group, a propargyl group, a hydroxy group, an isocyanate group, chlorine, or an optionally branched alkyl group having 1-8 carbon atoms, and X represents a lactone-modified ketone chain or an alkylene glycol chain having 2-7 carbon atoms.) (In the formula, R1 to R6 each independently represent a structure represented by general formula (2).
    Type: Application
    Filed: December 17, 2018
    Publication date: August 27, 2020
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kosuke NAMIKI, Sunao NOJIMA, Shoko SUZUKI, Noriyuki KATO, Hiroshi HORIKOSHI
  • Publication number: 20200243591
    Abstract: [Object] To further improve performance of a solid-state imaging device. [Solution] There is provided a solid-state imaging device including: a first substrate; a second substrate; and a third substrate that are stacked in this order. The first substrate includes a first semiconductor substrate and a first multi-layered wiring layer stacked on the first semiconductor substrate. The first semiconductor substrate has a pixel unit formed thereon. The pixel unit has pixels arranged thereon. The second substrate includes a second semiconductor substrate and a second multi-layered wiring layer stacked on the second semiconductor substrate. The second semiconductor substrate has a circuit formed thereon. The circuit has a predetermined function. The third substrate includes a third semiconductor substrate and a third multi-layered wiring layer stacked on the third semiconductor substrate. The third semiconductor substrate has a circuit formed thereon. The circuit has a predetermined function.
    Type: Application
    Filed: March 23, 2018
    Publication date: July 30, 2020
    Inventors: TADASHI IIJIMA, TAKATOSHI KAMESHIMA, IKUE MITSUHASHI, HIROSHI HORIKOSHI, HIDETO HASHIGUCHI, REIJIROH SHOHJI, MINORU ISHIDA, MASAKI HANEDA
  • Publication number: 20200216616
    Abstract: Provided an optical material composition which makes it possible to design an optical material exhibiting a broad range of properties. This optical material composition contains a compound (A) represented by formula (1) and a polythiol (a), and does not contain 1,2,3,5,6-pentathiepane (b).
    Type: Application
    Filed: February 6, 2018
    Publication date: July 9, 2020
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yoshihiko NISHIMORI, Yosuke IMAGAWA, Kouhei TAKEMURA, Hiroshi HORIKOSHI, Yoshiaki YAMAMOTO
  • Patent number: 10647819
    Abstract: According to the present invention, it is possible to provide a photocurable composition which comprises a cyclic compound (a) represented by formula (1), an episulfide compound (b), and a photopolymerization initiator (c). In a preferred embodiment, the proportion of the cyclic compound (a) in the photocurable composition is 5-80 mass %, the proportion of the episulfide compound (b) is 20-95 mass %, and the proportion of the photopolymerization initiator (c) is 0.1-10 parts by mass per 100 parts by mass of the sum of the cyclic compound (a) and the episulfide compound (b). In the formula, C represents a carbon atom, X represents S, Se, or Te, and a to f are integers of 0-3, provided that 8?(a+c+e)?1, 8?(b+d+f)?2, and (b+d+f)?(a+c+e).
    Type: Grant
    Filed: October 7, 2016
    Date of Patent: May 12, 2020
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kousuke Namiki, Yousuke Imagawa, Eiji Koshiishi, Kikuo Furukawa, Hiroshi Horikoshi
  • Publication number: 20200105813
    Abstract: [Object] To provide a solid-state imaging device and an electronic apparatus with further improved performance. [Solution] A solid-state imaging device including: a first substrate on which a pixel unit is formed, and a first semiconductor substrate and a first multi-layered wiring layer are stacked; a second substrate on which a circuit having a predetermined function is formed, and a second semiconductor substrate and a second multi-layered wiring layer are stacked; and a third substrate on which a circuit having a predetermined function is formed, and a third semiconductor substrate and a third multi-layered wiring layer are stacked. The first substrate, the second substrate, and the third substrate are stacked in this order. The pixel unit has pixels arranged thereon. The first substrate and the second substrate are bonded together in a manner that the first multi-layered wiring layer and the second semiconductor substrate are opposed to each other.
    Type: Application
    Filed: March 23, 2018
    Publication date: April 2, 2020
    Inventors: HIDETO HASHIGUCHI, REIJIROH SHOHJI, HIROSHI HORIKOSHI, IKUE MITSUHASHI, TADASHI IIJIMA, TAKATOSHI KAMESHIMA, MINORU ISHIDA, MASAKI HANEDA
  • Publication number: 20200105814
    Abstract: A solid-state imaging device including: a first substrate having a pixel unit, and a first semiconductor substrate and a first wiring layer; a second substrate with a circuit, and a second semiconductor substrate and a second wiring layer; and a third substrate with a circuit, and a third semiconductor substrate and a third wiring layer. The first and second substrates are bonded together such that the first wiring layer and the second semiconductor substrate are opposed to each other. The device includes a first coupling structure for electrically coupling a circuit of the first substrate and the circuit of the second substrate. The first coupling structure includes a via in which electrically-conductive materials are embedded in a first through hole that exposes a wiring line in the first wiring layer and in a second through hole that exposes a wiring line in the second wiring layer or a film-formed structure.
    Type: Application
    Filed: March 23, 2018
    Publication date: April 2, 2020
    Applicant: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
    Inventors: Hideto HASHIGUCHI, Reijiroh SHOHJI, Hiroshi HORIKOSHI, Ikue MITSUHASHI, Tadashi IIJIMA, Takatoshi KAMESHIMA, Minoru ISHIDA, Masaki HANEDA
  • Publication number: 20200098815
    Abstract: [Object] To further improve performance of a solid-state imaging device.
    Type: Application
    Filed: March 23, 2018
    Publication date: March 26, 2020
    Inventors: TAKATOSHI KAMESHIMA, HIDETO HASHIGUCHI, IKUE MITSUHASHI, HIROSHI HORIKOSHI, REIJIROH SHOHJI, MINORU ISHIDA, TADASHI IIJIMA, MASAKI HANEDA
  • Publication number: 20200091217
    Abstract: [Object] To provide a solid-state imaging device and an electronic apparatus with further improved performance. [Solution] A solid-state imaging device including: a first substrate on which a pixel unit is formed, and a first semiconductor substrate and a first multi-layered wiring layer are stacked; a second substrate on which a circuit having a predetermined function is formed, and a second semiconductor substrate and a second multi-layered wiring layer are stacked; and a third substrate on which a circuit having a predetermined function is formed, and a third semiconductor substrate and a third multi-layered wiring layer are stacked. The first substrate, the second substrate, and the third substrate are stacked in this order. The pixel unit has pixels arranged thereon. The first substrate and the second substrate are bonded together with the first multi-layered wiring layer and the second semiconductor substrate opposed to each other.
    Type: Application
    Filed: March 23, 2018
    Publication date: March 19, 2020
    Inventors: HIROSHI HORIKOSHI, MINORU ISHIDA, REIJIROH SHOHJI, TADASHI IIJIMA, TAKATOSHI KAMESHIMA, HIDETO HASHIGUCHI, IKUE MITSUHASHI, MASAKI HANEDA
  • Publication number: 20200024450
    Abstract: Provided is an optical material composition which makes it possible to design an optical material exhibiting a broad range of properties. This optical material composition contains a compound (A) represented by formula (1), 1,2,3,5,6-pentathiepane (b), and if necessary, a compound (B) represented by formula (2). The content of the compound (B) constitutes 0-30 mass % of the total mass of the composition: (In the formula, n m represents an integer which is 0-4, and n represents an integer which is 0-2).
    Type: Application
    Filed: February 6, 2018
    Publication date: January 23, 2020
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yoshihiko NISHIMORI, Yosuke IMAGAWA, Kouhei TAKEMURA, Hiroshi HORIKOSHI, Yoshiaki YAMAMOTO
  • Patent number: 10526452
    Abstract: The present invention can provide a method for producing a cured product of an episulfide-based resin, the method having: (A) a step for obtaining a composition for a resin by mixing compound (a), compound (b) and a polymerization catalyst; (B) a step for pouring the composition for a resin into a mold; and (C) a step in which, by increasing the temperature of a heating medium, the composition for a resin is polymerized in the heating medium that contains a liquid having a thermal conductivity of 0.2 W/m·K or higher, or in a shower of the heating medium. The maximum temperature of the heating medium in step (C) is 55 to 110° C. (a) A compound which has two episulfide groups per molecule and which is represented by formula (1): wherein m represents an integer from 0 to 4 and n represents an integer from 0 to 2 (b) A compound having one or more thiol groups per molecule.
    Type: Grant
    Filed: April 20, 2015
    Date of Patent: January 7, 2020
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Kousuke Namiki, Sawako Fuse, Eiji Koshiishi, Kikuo Furukawa, Hiroshi Horikoshi
  • Patent number: 10508173
    Abstract: The present invention provides a composition for an optical material containing a ring compound (a) represented by formula (1), an episulfide compound (b), and sulfur (c), wherein the content of the ring compound (a) in the composition for an optical material is in the range of 5-70 mass %, the content of the episulfide compound (b) is in the range of 20-90 mass %, and the content of the sulfur (c) is in the range of 1-39 mass %. (In the formula, X represents S, Se or Te. a to f=0 to 3, 8?(a+c+e)?1, 8?(b+d+f)?2, and (b+d+f)?(a+c+e).) This composition for an optical material has a high refractive index as an optical characteristic, and has sufficient heat resistance and good mold release characteristics.
    Type: Grant
    Filed: June 10, 2016
    Date of Patent: December 17, 2019
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yousuke Imagawa, Akinobu Horita, Yoshiaki Yamamoto, Hiroshi Horikoshi
  • Patent number: 10472343
    Abstract: The present invention can provide a method for producing 1,2,3,5,6-pentathiepane, comprising Steps A and B: Step A: a step of synthesizing a tetrathiocarbonate in a protic solvent; and Step B: a step of carrying out reaction between the tetrathiocarbonate and a dihalogenated methane in a mixed solvent (where the mass ratio of a protic solvent and an aprotic solvent is 13:87-38:62).
    Type: Grant
    Filed: January 15, 2018
    Date of Patent: November 12, 2019
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Hiroyuki Tanagi, Yoshiaki Yamamoto, Hiroshi Horikoshi
  • Publication number: 20190127530
    Abstract: A composition for a high refractive index, and low dispersion resin for a close-contact double layer-type composite diffractive optical element that is highly photocurable and provides a high productivity, and a close-contact double layer-type composite diffractive optical element using such composition are provided. A composition for a high refractive index, and low dispersion resin for a close-contact double layer-type composite diffractive optical element includes a thiol compound represented by general formula (1) or an oligomer synthesized by use of a thiol compound represented by general formula (1) (A component); and an ene compound including two or more polymerizable unsaturated bonds (B component). (In the formula, p represents an integer of 2 to 5; Xp and Zp independently represent a hydrogen atom or a mercaptomethyl group; a ratio of sulfur atoms in a molecule is 40 to 80% by mass; and the number of thiol groups is 3 or larger.
    Type: Application
    Filed: April 6, 2017
    Publication date: May 2, 2019
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kousuke NAMIKI, Eiji KOSHIISHI, Kikuo FURUKAWA, Hiroshi HORIKOSHI
  • Publication number: 20190115414
    Abstract: [Object] To enable further reducing a chip area. [Solution] Provided is a display module including: a display device configured such that a pixel region in which a plurality of pixels for displaying an image are arranged is formed on an upper surface of a substrate, and a device-side signal electrode for exchanging a signal related to the pixels with an outside is disposed on a side surface of the substrate; and a module casing configured to store the display device and have a casing-side signal electrode electrically connected to the device-side signal electrode in a spot facing the device-side signal electrode.
    Type: Application
    Filed: April 14, 2017
    Publication date: April 18, 2019
    Inventors: Hiroshi Horikoshi, Masato Kawashima, Kaori Takimoto, Masaya Nagata
  • Publication number: 20190040035
    Abstract: The present invention can provide a method for producing 1,2,3,5,6-pentathiepane, comprising Steps A and B: Step A: a step of synthesizing a tetrathiocarbonate in a protic solvent; and Step B: a step of carrying out reaction between the tetrathiocarbonate and a dihalogenated methane in a mixed solvent (where the mass ratio of a protic solvent and an aprotic solvent is 13:87-38:62).
    Type: Application
    Filed: January 15, 2018
    Publication date: February 7, 2019
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Hiroyuki TANAGI, Yoshiaki YAMAMOTO, Hiroshi HORIKOSHI
  • Patent number: 10131749
    Abstract: According to one preferred embodiment of the present invention, a composition for optical materials, which contains a compound represented by formula (1) and a compound represented by formula (2), is able to be provided. This composition for optical materials enables stable storage of a compound represented by formula (2) at low cost, and also enables stable storage thereof with respect to temperature change. In addition, this composition for optical materials enables the achievement of an optical material which has good light resistance. (In formula (1), in represents an integer of 0-4; and n represents an integer of 0-2.) (In formula (2), m represents an integer of 0-4; and n represents an integer of 0-2.
    Type: Grant
    Filed: March 1, 2016
    Date of Patent: November 20, 2018
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yoshihiko Nishimori, Teruo Kamura, Hiroshi Horikoshi
  • Publication number: 20180265638
    Abstract: According to the present invention, it is possible to provide a photocurable composition which comprises a cyclic compound (a) represented by formula (1), an episulfide compound (b), and a photopolymerization initiator (c). In a preferred embodiment, the proportion of the cyclic compound (a) in the photocurable composition is 5-80 mass %, the proportion of the episulfide compound (b) is 20-95 mass %, and the proportion of the photopolymerization initiator (c) is 0.1-10 parts by mass per 100 parts by mass of the sum of the cyclic compound (a) and the episulfide compound (b). In the formula, C represents a carbon atom, X represents S, Se, or Te, and a to f are integers of 0-3, provided that 8?(a+c+e)?1, 8?(b+d+f)?2, and (b+d+f)?(a+c+e).
    Type: Application
    Filed: October 7, 2016
    Publication date: September 20, 2018
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kousuke NAMIKI, Yousuke IMAGAWA, Eiji KOSHIISHI, Kikuo FURUKAWA, Hiroshi HORIKOSHI