Abstract: An electronic device of the present invention includes a first substrate provided with a thin film active element, having a thickness of 200 ?m or lower, and a second substrate formed with a high thermal conductivity portion. The second substrate is applied to one surface of the two surfaces of the first substrate, i.e., the surface being the side other than the side that formed with the thin film active element. The thin film active element has a maximum power consumption of 0.01 to 1 mW. The high thermal conductivity portion is a region that corresponds to the position of the thin film active element and whose thermal conductivity falls within the range from 0.1 to 4 W/cm·deg.

Abstract: An electronic device of the present invention includes a first substrate provided with a thin film active element, having a thickness of 200 ?m or lower, and a second substrate formed with a high thermal conductivity portion. The second substrate is applied to one surface of the two surfaces of the first substrate, i.e., the surface being the side other than the side that formed with the thin film active element. The thin film active element has a maximum power consumption of 0.01 to 1 mW. The high thermal conductivity portion is a region that corresponds to the position of the thin film active element and whose thermal conductivity falls within the range from 0.1 to 4 W/cm·deg.

Abstract: An electronic device of the present invention includes a first substrate provided with a thin film active element, having a thickness of 200 ?m or lower, and a second substrate formed with a high thermal conductivity portion. The second substrate is applied to one surface of the two surfaces of the first substrate, i.e., the surface being the side other than the side that formed with the thin film active element. The thin film active element has a maximum power consumption of 0.01 to 1 mW. The high thermal conductivity portion is a region that corresponds to the position of the thin film active element and whose thermal conductivity falls within the range from 0.1 to 4 W/cm·deg.

Abstract: A switching element is formed on a substrate disposed proximate a liquid crystal layer. A two layer insulation film is formed on the substrate, including a lower film and an upper film. The two layer insulation film overlays the switching element. A convex/concave structure is formed on an upper surface of the two layer insulation film by removing portions of the upper film. A reflection electrode is formed on a surface of the convex/concave structure.

Abstract: A reflection-type liquid crystal display according to the invention includes two glass substrates, a transparent electrode provided on one glass substrate, an insulator film which is provided on another glass substrate and on which an uneven structure is formed, a reflecting electrode provided on the insulator film, and a liquid crystal layer sandwiched between a side of the transparent electrode and a side of the reflecting electrode. The insulator film includes a first insulating layer in which a large number of depressions isolated as surrounded by protrusions are irregularly arranged and a second insulating layer covering the insulating layer entirely. The protrusions are all connected in a network, so that if some of these protrusions have weaker adherence with an underlying layer, they can be supported by the surrounding protrusions.

Abstract: At least either above or below a memory transistor formed on an insulating substrate, a shielding layer which has an area larger than that of the semiconductor layer of the memory transistor and has either an electromagnetic wave shielding effect or a light shielding effect or both of these is provided, and by this shielding layer, electromagnetic waves or light is prevented from entering the semiconductor layer. Or, the regional area of at least one of the gate and the charge accumulation layer of the memory transistor is made larger than the semiconductor layer to prevent electromagnetic waves or light from entering the semiconductor layer by the gate or the charge accumulation layer.

Abstract: A reflection-type liquid crystal display according to the invention includes two glass substrates, a transparent electrode provided on one glass substrate, an insulator film which is provided on another glass substrate and on which an uneven structure is formed, a reflecting electrode provided on the insulator film, and a liquid crystal layer sandwiched between a side of the transparent electrode and a side of the reflecting electrode. The insulator film includes a first insulating layer in which a large number of depressions isolated as surrounded by protrusions are irregularly arranged and a second insulating layer covering the insulating layer entirely. The protrusions are all connected in a network, so that if some of these protrusions have weaker adherence with an underlying layer, they can be supported by the surrounding protrusions.

Abstract: A reflection-type liquid crystal display according to the invention includes two glass substrates, a transparent electrode provided on one glass substrate, an insulator film which is provided on another glass substrate and on which an uneven structure is formed, a reflecting electrode provided on the insulator film, and a liquid crystal layer sandwiched between a side of the transparent electrode and a side of the reflecting electrode. The insulator film includes a first insulating layer in which a large number of depressions isolated as surrounded by protrusions are irregularly arranged and a second insulating layer covering the insulating layer entirely. The protrusions are all connected in a network, so that if some of these protrusions have weaker adherence with an underlying layer, they can be supported by the surrounding protrusions.

Abstract: An electronic device of the present invention includes a first substrate provided with a thin film active element, having a thickness of 200 ?m or lower, and a second substrate formed with a high thermal conductivity portion. The second substrate is applied to one surface of the two surfaces of the first substrate, i.e., the surface being the side other than the side that formed with the thin film active element. The thin film active element has a maximum power consumption of 0.01 to 1 mW. The high thermal conductivity portion is a region that corresponds to the position of the thin film active element and whose thermal conductivity falls within the range from 0.1 to 4 W/cm·deg.

Abstract: The present invention provides a reflective liquid crystal display (LCD) apparatus including a glass substrate 53, a transparent electrode 55 arranged on the glass substrate, a glass substrate 40, a thin film transistor (TFT) 44 arranged on the glass substrate 40, an insulation film 45 arranged on the TFT 44 and having a convex/concave structure 45a on its surface, a reflection electrode 48 arranged along the convex/concave structure 45a and connected to the TFT 44, and a liquid crystal layer 56 sandwiched between the transparent electrode 55 and the reflection electrode 48. The insulation film 48 protects the TFT transistor 44 after being formed and has the convex/concave structure 45a formed irregular arrangement of regions having different film thickness values. Thus, it is possible to prevent deterioration of the switching element during the production as well as to reduce the number of production steps.

Abstract: An object is to narrow the width a frame part provided to a display device. The display device of the present invention comprises: a main substrate having display pixels being arranged in matrix, a scanning line electrode array, a signal line electrode array, and a frame part formed in an edge of the substrate along the scanning line electrode array and the signal line electrode array; a scanning line driving element mounted to the frame part along the scanning line electrode array; a signal line driving element mounted to the frame part along the signal line electrode array; and a flexible flat cable for supplying a signal and a power to the driving circuits of the scanning line driving element and the signal line driving element.

Abstract: An integrated circuit is formed on a flexible substrate by using an amorphous semiconductor thin film, or a polycrystalline or a monocrystalline semiconductor thin film crystallized by laser annealing. A plurality of such flexible integrated circuit boards and mounted on a separate support substrate. This can enhance the mechanical strength of devices, such as an IC card and a liquid crystal display, and allow those devices to be manufactured at a low cost. It is also possible to provide a semiconductor device with a higher performance, on which a flexible integrated circuit board and an IC chip made from a silicon and/or glass wafer. Adhering a film substrate having a high thermal conductivity, such as a metal, to the bottom side of the flexible integrated circuit board improves the heat discharging characteristic of the integrated circuit and suppress the problem of self-heating.

Abstract: An object is to narrow the width a frame part provided to a display device. The display device of the present invention comprises: a main substrate having display pixels being arranged in matrix, a scanning line electrode array, a signal line electrode array, and a frame part formed in an edge of the substrate along the scanning line electrode array and the signal line electrode array; a scanning line driving element mounted to the frame part along the scanning line electrode array; a signal line driving element mounted to the frame part along the signal line electrode array; and a flexible flat cable for supplying a signal and a power to the driving circuits of the scanning line driving element and the signal line driving element.

Abstract: At least either above or below a memory transistor formed on an insulating substrate, a shielding layer which has an area larger than that of the semiconductor layer of the memory transistor and has either an electromagnetic wave shielding effect or a light shielding effect or both of these is provided, and by this shielding layer, electromagnetic waves or light is prevented from entering the semiconductor layer. Or, the regional area of at least one of the gate and the charge accumulation layer of the memory transistor is made larger than the semiconductor layer to prevent electromagnetic waves or light from entering the semiconductor layer by the gate or the charge accumulation layer.

Abstract: An active matrix substrate of a channel protection type having a gate electrode, a drain electrode and a pixel electrode is isolated in each layer by insulating films. The active matrix substrate is to be prepared by four masks. A gate electrode layer, a gate insulating film and an a-Si layer are processed to the same shape on a transparent insulating substrate to form a gate electrode layer and a TFF area. A drain electrode layer is formed by a first passivation film with the first passivation film formed as an upper layer. In a second passivation film, formed above the first passivation film, are bored a first opening through the first and second passivation films and a second opening through the second passivation film. A wiring connection layer is formed by ITO provided as an uppermost layer.

Abstract: The present invention provides a reflective liquid crystal display (LCD) apparatus including a glass substrate 53, a transparent electrode 55 arranged on the glass substrate, a glass substrate 40, a thin film transistor (TFT) 44 arranged on the glass substrate 40, an insulation film 45 arranged on the TFT 44 and having a convex/concave structure 45a on its surface, a reflection electrode 48 arranged along the convex/concave structure 45a and connected to the TFT 44, and a liquid crystal layer 56 sandwiched between the transparent electrode 55 and the reflection electrode 48. The insulation film 48 protects the TFT transistor 44 after being formed and has the convex/concave structure 45a formed irregular arrangement of regions having different film thickness values. Thus, it is possible to prevent deterioration of the switching element during the production as well as to reduce the number of production steps.

Abstract: A reflection-type liquid crystal display according to the invention includes two glass substrates, a transparent electrode provided on one glass substrate, an insulator film which is provided on another glass substrate and on which an uneven structure is formed, a reflecting electrode provided on the insulator film, and a liquid crystal layer sandwiched between a side of the transparent electrode and a side of the reflecting electrode. The insulator film includes a first insulating layer in which a large number of depressions isolated as surrounded by protrusions are irregularly arranged and a second insulating layer covering the insulating layer entirely. The protrusions are all connected in a network, so that if some of these protrusions have weaker adherence with an underlying layer, they can be supported by the surrounding protrusions.

Abstract: A method for fabricating an active matrix LCD panel for use in an active matrix LCD device includes the step of forming a passivation layer acting as a channel protection layer for protecting an amorphous silicon active layer, thereby reducing the number of photolithographic steps. A transparent conductive film is used for forming a gate electrode and a pixel electrode before formation of an amorphous silicon film for the TFTs.

Abstract: The present invention provides a reflective liquid crystal display (LCD) apparatus including a glass substrate 53, a transparent electrode 55 arranged on the glass substrate, a glass substrate 40, a thin film transistor (TFT) 44 arranged on the glass substrate 40, an insulation film 45 arranged on the TFT 44 and having a convex/concave structure 45a on its surface, a reflection electrode 48 arranged along the convex/concave structure 45a and connected to the TFT 44, and a liquid crystal layer 56 sandwiched between the transparent electrode 55 and the reflection electrode 48. The insulation film 48 protects the TFT transistor 44 after being formed and has the convex/concave structure 45a formed irregular arrangement of regions having different film thickness values. Thus, it is possible to prevent deterioration of the switching element during the production as well as to reduce the number of production steps.

Abstract: A reflection-type liquid crystal display according to the invention includes two glass substrates, a transparent electrode provided on one glass substrate, an insulator film which is provided on another glass substrate and on which an uneven structure is formed, a reflecting electrode provided on the insulator film, and a liquid crystal layer sandwiched between a side of the transparent electrode and a side of the reflecting electrode. The insulator film includes a first insulating layer in which a large number of depressions isolated as surrounded by protrusions are irregularly arranged and a second insulating layer covering the insulating layer entirely. The protrusions are all connected in a network, so that if some of these protrusions have weaker adherence with an underlying layer, they can be supported by the surrounding protrusions.