Patents by Inventor Hiroshi Yamasaki
Hiroshi Yamasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9768470Abstract: Provided is a method for manufacturing a nonaqueous electrolyte secondary cell which can maintain and demonstrate an excellent cell characteristic over a long period of time. The method for manufacturing a nonaqueous electrolyte secondary cell provided by the present invention includes: a step of preparing a positive electrode having a positive electrode mix layer and a negative electrode having a negative electrode mix layer; and a step of housing the positive electrode and the negative electrode together with a nonaqueous electrolytic solution in a cell case. The nonaqueous electrolytic solution includes a Compound (I) constituted by lithium tris(oxalate)phosphate. When a BET specific surface area of the negative electrode mix layer is denoted by X (m2/g) and the amount of the Compound (I) added to the entire amount of the nonaqueous electrolytic solution is denoted by Y (% by mass), the following relationships are satisfied: 3?X?4.3; 0.4?Y?1.5; and (Y/X)?0.35.Type: GrantFiled: August 2, 2016Date of Patent: September 19, 2017Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHAInventors: Hiroshi Yamasaki, Tatsuya Hashimoto
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Publication number: 20170182837Abstract: A processing apparatus for performing not only cutting and drawing, but also other processing, and a cartridge used for the processing apparatus are provided. The processing apparatus includes a first cartridge including: a first processing tool to form a machining mark by grinding or cutting a surface of a sheet-like object; an actuator to operate by an external power supply and drive the first processing tool; and a first housing to accommodate the first processing tool where a tip of the first processing tool is exposed and accommodate the actuator. The processing apparatus also includes a carriage including a mounting section which the first cartridge is detachably mounted; a transfer mechanism to move the object and the carriage relatively to each other; and a control circuit to control driving of the transfer mechanism to form the machining mark on the surface of the object by the first processing tool.Type: ApplicationFiled: March 17, 2017Publication date: June 29, 2017Inventors: Hironori Matsushita, Hiroshi Yamasaki
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Publication number: 20170040641Abstract: Provided is a method for manufacturing a nonaqueous electrolyte secondary cell which can maintain and demonstrate an excellent cell characteristic over a long period of time. The method for manufacturing a nonaqueous electrolyte secondary cell provided by the present invention includes: a step of preparing a positive electrode having a positive electrode mix layer and a negative electrode having a negative electrode mix layer; and a step of housing the positive electrode and the negative electrode together with a nonaqueous electrolytic solution in a cell case. The nonaqueous electrolytic solution includes a Compound (I) constituted by lithium tris(oxalate)phosphate. When a BET specific surface area of the negative electrode mix layer is denoted by X (m2/g) and the amount of the Compound (I) added to the entire amount of the nonaqueous electrolytic solution is denoted by Y (% by mass), the following relationships are satisfied: 3?X?4.3; 0.4?Y?1.5; and (Y/X)?0.35.Type: ApplicationFiled: August 2, 2016Publication date: February 9, 2017Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHAInventors: Hiroshi YAMASAKI, Tatsuya HASHIMOTO
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Publication number: 20160351685Abstract: Metal contact openings are etched in the barrier layer of a group III-N HEMT with a first gas combination that etches down into the barrier layer, and a second gas combination that etches further down into the barrier layer to a depth that lies above the top surface of a channel layer that touches and lies below the barrier layer.Type: ApplicationFiled: August 15, 2016Publication date: December 1, 2016Inventors: Yoshikazu Kondo, Shoji Wada, Hiroshi Yamasaki, Masahiro Iwamoto
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Publication number: 20160294011Abstract: Provided is a method of manufacturing a lithium secondary battery. This method includes: a step of preparing a positive electrode including a positive electrode mixture layer, a negative electrode including a negative electrode mixture layer, and a nonaqueous electrolyte; and a step of accommodating the positive electrode, the negative electrode, and the nonaqueous electrolyte in a battery case. The nonaqueous electrolyte contains a compound (I) represented by the following formula (I) LiO3S—R—SO3Li (wherein R represents a linear hydrocarbon group having 1 to 10 carbon atoms). When a BET specific surface area of the negative electrode mixture layer is represented by X (m2/g) and when an addition amount of the compound (I) with respect to the total amount of the nonaqueous electrolyte is represented by Y (mass %), the following relationships 3?X?4.3, 0.2?Y?0.4, and (Y/X)?0.093 are satisfied.Type: ApplicationFiled: March 30, 2016Publication date: October 6, 2016Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHAInventors: Hiroshi YAMASAKI, Tatsuya HASHIMOTO
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Publication number: 20160293941Abstract: A manufacturing method of the invention includes: a process of preparing a positive electrode which includes a positive electrode mixture layer, a negative electrode which includes a negative electrode mixture layer, and a non-aqueous electrolyte; and a process of accommodating the positive electrode, the negative electrode, and the non-aqueous electrolyte in a battery case. The non-aqueous electrolyte contains lithium sulfate. In addition, when a BET specific surface area of the negative electrode mixture layer is referred to as X (m2/g) and an addition amount of the lithium sulfate with respect to a total amount of the non-aqueous electrolyte is referred to as Y (mass %), the following relationships are satisfied: 3?X?4.3; 0.02?Y?0.1; and Y/X?0.023.Type: ApplicationFiled: March 28, 2016Publication date: October 6, 2016Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHAInventors: Hiroshi YAMASAKI, Tatsuya HASHIMOTO
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Patent number: 9443737Abstract: Metal contact openings are etched in the barrier layer of a group III-N HEMT with a first gas combination that etches down into the barrier layer, and a second gas combination that etches further down into the barrier layer to a depth that lies above the top surface of a channel layer that touches and lies below the barrier layer.Type: GrantFiled: April 3, 2013Date of Patent: September 13, 2016Assignee: TEXAS INSTRUMENTS INCORPORATEDInventors: Yoshikazu Kondo, Shoji Wada, Hiroshi Yamasaki, Masahiro Iwamoto
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Publication number: 20160190645Abstract: Provided is a method for producing a non-aqueous electrolyte secondary battery with which resistance increase is inhibited during high-temperature storage while good battery properties are retained. The production method of this invention comprises a step of obtaining a positive electrode, a negative electrode and a non-aqueous electrolyte; and a step of placing the positive electrode, the negative electrode and the non-aqueous electrolyte in a battery case. Herein, the non-aqueous electrolyte comprises a fluorine atom-containing supporting salt and a benzothiophene oxide.Type: ApplicationFiled: December 21, 2015Publication date: June 30, 2016Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHAInventors: Hiroshi YAMASAKI, Tomoko NAGAO, Tomohiro NAKANO, Tatsuya HASHIMOTO
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Patent number: 9290869Abstract: A sewing machine includes a needle bar, a needle bar up-and-down movement mechanism, a swinging mechanism, a lower shaft, an outer shuttle, a thread cutting mechanism, a rotation speed adjustment mechanism, and an actuator. The needle bar up-and-down movement mechanism is configured to move the needle bar up and down. The swinging mechanism is configured to swing the needle bar in a left-right direction. The lower shaft is configured to rotate in synchronization with up-down movement of the needle bar. The outer shuttle is configured to rotate along with rotation of the lower shaft. The thread cutting mechanism is configured to cut at least an upper thread. The rotation speed adjustment mechanism is configured to adjust a rotation speed of the outer shuttle. The actuator is a driving source of the thread cutting mechanism and the rotation speed adjustment mechanism.Type: GrantFiled: February 20, 2014Date of Patent: March 22, 2016Assignee: BROTHER KOGYO KABUSHIKI KAISHAInventors: Daisuke Ueda, Hiroshi Yamasaki, Toshiyuki Mamiya, Mitsuhiro Iida, Kazusa Kondo
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Patent number: 9200509Abstract: The present invention discloses an improved system for measurement of the liquid flow rate and totalized liquid production of a producing well. In the method of the present invention, liquid production rate in a pumping well is determined by calculation based upon wellbore geometry and continuously monitoring the depth of the fluid level within the wellbore. It is applicable to any pump lifted well where it is possible to shut the pump off periodically. Accuracy is enhanced with this method by properly accounting for pump leakage and where pump leakage is either known or can be estimated within reasonable limits or where it is measured during the pump shut off cycle.Type: GrantFiled: February 21, 2013Date of Patent: December 1, 2015Assignee: Chevron USA Inc.Inventors: Mark Hiroshi Yamasaki, David King Anderson, II, Richard Paul Rubbo, Mitcell Carl Smithson
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Patent number: 8910704Abstract: An outer peripheral sealing surface of an inner surface of a core plate of a header tank is configured into a loop and extends along an outer peripheral edge portion of the core plate and clamps a packing in cooperation with an outer peripheral end portion of a tank main body of the header tank. A transition section of the outer peripheral sealing surface connects between a primary section and a secondary section, which are located in two different planes, respectively, and the plane of the secondary section is the same as a plane of a boundary portion sealing surface held between two tube connecting surfaces in the core plate.Type: GrantFiled: March 28, 2012Date of Patent: December 16, 2014Assignee: Denso CorporationInventors: Yasuhiro Mizuno, Ryutaro Nozaki, Hiroshi Yamasaki, Hirotaka Ishikawa, Ryuji Shirakawa, Shuhei Yamazaki, Syunji Itou
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Publication number: 20140302673Abstract: Metal contacts with low contact resistances are formed in a group III-N HEMT by forming metal contact openings in the barrier layer of the group III-N HEMT to have depths that correspond to low contact resistances. The metal contact openings are etched in the barrier layer with a first gas combination that etches down into the barrier layer, and a second gas combination that etches further down into the barrier layer.Type: ApplicationFiled: April 3, 2013Publication date: October 9, 2014Applicant: Texas Instruments IncorporatedInventors: Yoshikazu Kondo, Shoji Wada, Hiroshi Yamasaki, Masahiro Iwamoto
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Publication number: 20140302672Abstract: Metal contact openings are etched in the barrier layer of a group III-N HEMT with a first gas combination that etches down into the barrier layer, and a second gas combination that etches further down into the barrier layer to a depth that lies above the top surface of a channel layer that touches and lies below the barrier layer.Type: ApplicationFiled: April 3, 2013Publication date: October 9, 2014Applicant: Texas Instruments IncorporatedInventors: Yoshikazu Kondo, Shoji Wada, Hiroshi Yamasaki, Masahiro Iwamoto
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Publication number: 20140283723Abstract: A sewing machine includes a needle bar, a needle bar up-and-down movement mechanism, a swinging mechanism, a lower shaft, an outer shuttle, a thread cutting mechanism, a rotation speed adjustment mechanism, and an actuator. The needle bar up-and-down movement mechanism is configured to move the needle bar up and down. The swinging mechanism is configured to swing the needle bar in a left-right direction. The lower shaft is configured to rotate in synchronization with up-down movement of the needle bar. The outer shuttle is configured to rotate along with rotation of the lower shaft. The thread cutting mechanism is configured to cut at least an upper thread. The rotation speed adjustment mechanism is configured to adjust a rotation speed of the outer shuttle. The actuator is a driving source of the thread cutting mechanism and the rotation speed adjustment mechanism.Type: ApplicationFiled: February 20, 2014Publication date: September 25, 2014Applicant: BROTHER KOGYO KABUSHIKI KAISHAInventors: Daisuke UEDA, Hiroshi YAMASAKI, Toshiyuki MAMIYA, Mitsuhiro IIDA, Kazusa KONDO
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Patent number: 8752491Abstract: A sewing machine is disclosed that includes a needle bar allowing attachment of a sewing needle including a needle eye to a lower end of thereof; a needle-bar lifting/lowering mechanism that moves the needle bar up and down; a presser foot; a presser foot lifting/lowering mechanism that moves the presser foot up and down; a hook that is provided with a beak for seizing a needle thread loop formed at the needle eye and that rotates in coordination with the up and down movement of the needle bar; and a controller that controls the presser foot lifting/lowering mechanism so as to resize a needle thread loop by lifting the presser foot to a predetermined height in coordination with a swing position of the needle bar and a predetermined height of the needle bar where the beak meets the needle thread loop.Type: GrantFiled: February 17, 2011Date of Patent: June 17, 2014Assignee: Brother Kogyo Kabushiki KaishaInventors: Masahiko Nagai, Masaru Jimbo, Eiichi Hamajima, Toru Imaeda, Hiroshi Yamasaki, Daisuke Ueda, Yasuhiro Ishiyama
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Patent number: 8664080Abstract: A method for forming a vertical electrostatic discharge (ESD) protection device includes depositing a multi-layer n-type epitaxial layer on a substrate having p-type surface including first epitaxial depositing to form a first n-type epitaxial layer on the p-type surface, and second epitaxial depositing to form a second n-type epitaxial layer formed on the first n-type epitaxial layer. The first type epitaxial layer has a peak doping level which is at least double that of the second n-type epitaxial layer. A p+ layer is formed on the second n-type epitaxial layer. An etch step etches through the p+ layer and multi-layer n-type epitaxial layer to reach the substrate to form a trench. The trench is filled with a filler material to form a trench isolation region. A metal contact is formed on the p+ layer for providing contact to the p+ layer.Type: GrantFiled: May 22, 2012Date of Patent: March 4, 2014Assignee: Texas Instruments IncorporatedInventors: Toshiyuki Tani, Hiroshi Yamasaki, Kentaro Takahashi, Lily Springer
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Patent number: 8561560Abstract: A workpiece holder is usable with an embroidery sewing machine including a needle bar movable upward and downward and a transfer mechanism transferring the workpiece in two directions. The workpiece holder holds the workpiece when the workpiece is engraved by striking the workpiece by a striking needle attached to the needle bar while the workpiece is transferred by the transfer mechanism. The workpiece holder includes a pair of connecting portions detachably attached to the transfer mechanism, a placement member on which the workpiece is placed and a holding mechanism which is located on the placement member to hold a part of the workpiece other than a worked surface of the workpiece which is engraved, so that the part is fixed.Type: GrantFiled: February 1, 2010Date of Patent: October 22, 2013Assignee: Brother Kogyo Kabushiki KaishaInventors: Yasuhiko Kawaguchi, Hiroshi Yamasaki
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Patent number: 8404138Abstract: An electrode of a secondary battery is treated to remove an electrode material adhering to the current collector of the electrode. The electrode is treated by exposing to a stripping agent, which is constituted as an aqueous solution containing at least one of an organic sulfonic acid and derivative thereof, and the electrode exposure to each other to strip the electrode material from the current collector constituting the electrode.Type: GrantFiled: February 19, 2008Date of Patent: March 26, 2013Assignee: Toyota Jidosha Kabushiki KaishaInventors: Kazutaka Arimura, Hiroshi Yamasaki
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Publication number: 20120299146Abstract: A method for forming a vertical electrostatic discharge (ESD) protection device includes depositing a multi-layer n-type epitaxial layer on a substrate having p-type surface including first epitaxial depositing to form a first n-type epitaxial layer on the p-type surface, and second epitaxial depositing to form a second n-type epitaxial layer formed on the first n-type epitaxial layer. The first type epitaxial layer has a peak doping level which is at least double that of the second n-type epitaxial layer. A p+ layer is formed on the second n-type epitaxial layer. An etch step etches through the p+ layer and multi-layer n-type epitaxial layer to reach the substrate to form a trench. The trench is filled with a filler material to form a trench isolation region. A metal contact is formed on the p+ layer for providing contact to the p+ layer.Type: ApplicationFiled: May 22, 2012Publication date: November 29, 2012Applicant: TEXAS INSTRUMENTS INCORPORATEDInventors: TOSHIYUKI TANI, HIROSHI YAMASAKI, KENTARO TAKAHASHI, LILY SPRINGER
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Publication number: 20120247742Abstract: An outer peripheral sealing surface of an inner surface of a core plate of a header tank is configured into a loop and extends along an outer peripheral edge portion of the core plate and clamps a packing in cooperation with an outer peripheral end portion of a tank main body of the header tank. A transition section of the outer peripheral sealing surface connects between a primary section and a secondary section, which are located in two different planes, respectively, and the plane of the secondary section is the same as a plane of a boundary portion sealing surface held between two tube connecting surfaces in the core plate.Type: ApplicationFiled: March 28, 2012Publication date: October 4, 2012Applicant: DENSO CORPORATIONInventors: Yasuhiro Mizuno, Ryutaro Nozaki, Hiroshi Yamasaki, Hirotaka Ishikawa, Ryuji Shirakawa, Shuhei Yamazaki, Syunji Itou