Patents by Inventor Hiroshige Okinoshima

Hiroshige Okinoshima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6312553
    Abstract: An adhesive silicone elastomer film obtained by forming a radiation-curable silicone rubber composition into a film and curing the resulting film by radiation; the composition including (A) an oily organopolysiloxane, (B) a radiation sensitizer and (C) an alkoxysilane and/or a partial hydrolysis-condensation product thereof. The oily organopolysiloxane includes, e.g., a compound represented by the formula: This film can be produced in a short time as clean films easy to handle and having a uniform shape, can rationalize work steps when used, and also has a low elasticity and sufficient heat resistance, adhesiveness and workability. This film is useful in the covering or bonding of articles.
    Type: Grant
    Filed: December 20, 1999
    Date of Patent: November 6, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshige Okinoshima, Tsutomu Kashiwagi
  • Patent number: 6069186
    Abstract: A radiation-curable silicone rubber composition is provided which includes:(A) a specific organopolysiloxane having radiation-sensitive (meth)acryloyl groups at the both terminals of the molecular chain,(B) a photosensitizer;(C) a tetraalkoxysilane or a partial hydrolysis-condensation product thereof; and(D) optionally together with a specific organic titanium compound. This composition is curable upon irradiation by ultraviolet rays for a short time and exhibits adhesion quickly. Hence, it is useful for the bonding, coating and potting of various substrates. This composition also has a relatively weak adhesion immediately after curing, and can be peeled from the substrate with ease for a while. Hence, it is also suited for uses where repair is required. Because of a high curing rate, it can be effective for, e.g., making a process short, improving productivity and saving energy in the manufacture of electric and electronic parts.
    Type: Grant
    Filed: December 17, 1998
    Date of Patent: May 30, 2000
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshige Okinoshima, Tsutomu Kashiwagi, Shinsuke Yamaguchi
  • Patent number: 6069201
    Abstract: A zinc oxide-filled addition-curable silicone rubber composition comprises (A) a diorganopolysiloxane containing at least two alkenyl groups in its molecule, (B) an organohydrogenpolysiloxane containing at least two hydrogen atoms bonded to silicon atoms in its molecule, (C) a platinum family metal catalyst, and (D) a zinc oxide powder surface treated with a tetraalkoxy silane and/or a partial hydrolysis-condensation product thereof. The composition can further comprise (E) a high thermal-conductive filler. The composition scarcely generates hydrogen gas during storage so as to have an excellent storage stability and provides a cured product excellent in heat resistance, electrical insulating properties, and adhesion to various metals, semiconductors, etc. while keeping good physical properties as a rubber.
    Type: Grant
    Filed: September 11, 1998
    Date of Patent: May 30, 2000
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshige Okinoshima, Tsutomu Kashiwagi
  • Patent number: 5738976
    Abstract: The composition comprises a (meth)acryloyloxyl group-containing organopolysiloxane having an average molecular weight of 3,000 to 100,000, in terms of polystyrene, and a photosensitizer. Such an organopolysiloxane having an average molecular weight of 3,000 or more is produced by subjecting (meth)acryloyloxypropyltrimethoxysilane and phenyltrimethoxysilane to cohydrolysis and subsequent condensation polymerization to produce a cohydrolysis-condensation polymerization product and then reacting and silylating the same product with a silylating agent such as hexamethyldisilazane. The composition containing such a high molecular weight (meth)acryloyloxyl-group-containing organopolysiloxane is excellent in sensitivity, resolution and storage stability and has little tackiness in uncured state after being coated, as well as being excellent in heat resistance after being cured.
    Type: Grant
    Filed: March 18, 1996
    Date of Patent: April 14, 1998
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshige Okinoshima, Tsutomu Kashiwagi, Shinsuke Yamaguchi
  • Patent number: 5441845
    Abstract: A photosensitive resin composition which is adapted for protecting articles and particularly, electronic parts, therewith comprises a polyimide precursor of the following general formula ##STR1## wherein each X individually represents a tetravalent organic group, each Y individually represents a divalent organic group, R.sup.1, R.sup.2 and R.sup.3 may be the same or different and represent a hydrogen atom or a monovalent organic group having form 1 to 10 carbon atoms, and p, q and m are, respectively, an integer of 1 or over, and a photosensitive diazoquinone compound.
    Type: Grant
    Filed: February 16, 1994
    Date of Patent: August 15, 1995
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshige Okinoshima, Hideto Kato
  • Patent number: 5376733
    Abstract: A polyimidesilicone resin precursor composition which comprises a polysiloxane of the following general formula ##STR1## wherein R is a monovalent organic group having up to 10 carbon atoms, R.sup.1 represents a hydrogen atom or a monovalent organic group having up to 10 carbon atoms, and m is an integer not smaller than 3, and a polyamic acid or a polyimide obtained from the polyamic acid. The composition is cured at a relatively low temperature within a short time to provide a cured film having improved solvent and heat resistances and good adhesion to various substrates.
    Type: Grant
    Filed: March 23, 1994
    Date of Patent: December 27, 1994
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshige Okinoshima, Hideto Kato, Satoshi Toyoda
  • Patent number: 5346979
    Abstract: A novel curable polyimide resin of structural formula (1) or (2) is provided wherein R.sup.1 and R.sup.2 are independently substituted or unsubstituted monovalent C.sub.1-10 hydrocarbon groups, R.sup.3 is a divalent C.sub.1-10 organic group, X is a tetravalent organic group containing an aromatic or aliphatic ring, Y is a divalent organic group, Z is a divalent organic group containing an aromatic ring, W is a trivalent organic group containing an aromatic ring, m is an integer of 1 to 3, and n is an integer of at least 1. It can be prepared by reacting a polyimide with a silicon compound. The curable resin forms with a solvent a solution having a low viscosity and shelf stability and cures at relatively low temperatures below 300.degree. C. into coatings having heat resistance, mechanical strength, electrical properties, solvent resistance and substrate adherence.
    Type: Grant
    Filed: January 12, 1993
    Date of Patent: September 13, 1994
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshige Okinoshima, Hideto Kato
  • Patent number: 5326589
    Abstract: The invention provides a method of protecting an electronic or electric part by coating the part with a silicone rubber composition comprising an organopolysiloxane, an organohydrogenpolysiloxane, an addition reaction catalyst, and a filler. When metal oxide fine particles obtained by deflagration of metal powder dust in an oxygen-containing atmosphere are blended as the filler, the composition has sufficient purity to cover electronic and electric parts and cured products of the composition are improved in electrical properties and heat resistance, thereby protecting the electronic or electric part.
    Type: Grant
    Filed: February 4, 1993
    Date of Patent: July 5, 1994
    Assignee: Shin-Etsu Chemical Co., Ltd
    Inventors: Hiroshige Okinoshima, Toshio Shiobara, Tsutomu Kashiwagi
  • Patent number: 5314979
    Abstract: A composition comprising (A) an organopolysiloxane having a unit of the formula: R.sup.1 SiO.sub.3/2 wherein R.sup.1 is methyl, phenyl or vinyl in its molecule and having at least 0.05 alkenyl groups each directly attached to a silicon atom per silicon atom, (B) an organohydrogenpolysiloxane having at least 2 hydrogen atoms each directly attached to a silicon atom per molecule, (C) a platinum catalyst, and (D) an organosilane or organopolysiloxane of the formula: R.sup.2.sub.a (R.sup.3 O).sub.b SiO.sub.(4-a-b)/2 wherein R.sup.2 and R.sup.3 are hydrogen, methyl, phenyl or vinyl maintains good light transmission in cured form when exposed to humidity and is thus suitable for forming cores of optical fibers. Similar benefits are obtained with a composition comprising components (A) and (B), (C') a platinum catalyst and/or a radical polymerization initiator, and (E) a carboxylate.
    Type: Grant
    Filed: December 9, 1991
    Date of Patent: May 24, 1994
    Assignees: Shin-Etsu Chemical Co., Ltd., Hitachi Cable Ltd.
    Inventors: Hiroshige Okinoshima, Shohei Kozakai, Tomiya Abe
  • Patent number: 5302856
    Abstract: A semiconductor rectifying device, suitable for installation in vehicles, comprises a cup-shaped metallic container, a semiconductor chip having a pn junction, one of whose main surfaces is bonded to the bottom surface of the container, a lead bonded to the other main surface of the semiconductor chip, and a silicone resin layer containing silica powder, with which layer an exposed portion of the semiconductor chip is covered.
    Type: Grant
    Filed: October 8, 1991
    Date of Patent: April 12, 1994
    Assignees: Hitachi, Ltd., Shin-Etsu Chemical Co., Ltd., Nippondenso Co., Ltd.
    Inventors: Kazutoyo Narita, Yoichi Nakashima, Hiroshige Okinoshima, Tadashi Nosaka
  • Patent number: 5292619
    Abstract: A photosensitive polymer composition comprising, in admixture, a polymer predominantly comprising a recurring unit of the formula (I): ##STR1## wherein x is a tri- or tetravalent organic group, Y is a divalent organic group, and n is equal to 1 or 2 and a compound having a urea bond of the formula (II): ##STR2## wherein R.sup.1 is a group having a functional group capable of forming a dimer or polymer upon exposure to radiation, R.sup.2 and R.sup.3 are independently a hydrogen atom or a monovalent organic group is shelf stable and applicable as relatively thick coatings having sufficient photosensitivity to form semiconductor element surface protective films.
    Type: Grant
    Filed: March 17, 1992
    Date of Patent: March 8, 1994
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshige Okinoshima, Hideto Kato
  • Patent number: 5272222
    Abstract: A curable resin composition comprising a mixture or cocondensate of a compound containing imide and alkoxysilyl groups and an organosilane or organopolysiloxane is shelf stable and cures into a film which is improved in heat resistance, mechanical strength, electrical properties, solvent resistance and adhesion to substrates and thus suitable as a protective film on electronic parts.
    Type: Grant
    Filed: May 28, 1992
    Date of Patent: December 21, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshige Okinoshima, Hideto Kato
  • Patent number: 5258487
    Abstract: The present polyamido-acid copolymer has a polymerization backbone chain represented by the following formula: ##STR1## wherein q represents a bivalent organic group and R represents a tetravalent aromatic group. This copolymer forms a polyimide resin film excellent in adhesion to various inorganic substances and mechanical strength.
    Type: Grant
    Filed: August 2, 1991
    Date of Patent: November 2, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshige Okinoshima, Hiroshi Kanbara
  • Patent number: 5166293
    Abstract: A silicone rubber composition comprising (A) a vinyl-containing diorganopolysiloxane, (B) an organohydrogenpolysiloxane, and (C) a platinum catalyst is improved in adhesion to metallic, ceramic and plastic substrates by blending therein (D) an alkoxyhydrogensiloxane and (E) a polysiloxane having at least one epoxy group attached to a silicon atom through a carbon atom.
    Type: Grant
    Filed: May 23, 1991
    Date of Patent: November 24, 1992
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshige Okinoshima, Tsutomu Kashiwagi
  • Patent number: 5143948
    Abstract: A polyimide resin is prepared by polymerizing (A) a tetracarboxylic acid dianhydride component consisting essentially of 10 to 50 mol % of 2,2-bis(3,4-benzene-dicarboxylic anhydride)perfluoropropane and 90 to 50 mol % of pyromellitic dianhydride or similar acid dianhydride and (B) a diamine component consisting essentially of 10 to 80 mol % of a silicon diamine and 90 to 20 mol % of an ether diamine. The polyimide resin is dissolved in an organic solvent and blended with finely divided silica to form a composition which is useful for protecting semiconductor elements.
    Type: Grant
    Filed: August 2, 1990
    Date of Patent: September 1, 1992
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshige Okinoshima, Hideto Kato
  • Patent number: 5117001
    Abstract: Siloxane compounds having the general formula [1]: ##STR1## wherein R is a substituted or unsubstituted monovalent hydrocarbon group having from 1 to 10 carbon atoms, and n is an integer of from 0 to 100. The compound, because of the two vinylsilyl groups and two acid anhydride groups introduced into the molecule thereof, is useful as an intermediate or modifying agent in the synthesis of various organic resins such as polyimide resins.
    Type: Grant
    Filed: February 28, 1991
    Date of Patent: May 26, 1992
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshige Okinoshima, Hiroshi Kanbara
  • Patent number: 5109058
    Abstract: A solution composition of a polyimide resin type curable resin having imide and alkoxysilyl groups is prepared by reacting a polyimide with a silicon compound in an organic solvent. The solution can be cured through relatively mild heating into coatings having enhanced substrate adherence and solvent resistance and thus suitable as protective coatings on electronic parts.
    Type: Grant
    Filed: August 2, 1991
    Date of Patent: April 28, 1992
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshige Okinoshima, Hideto Kato
  • Patent number: 5081199
    Abstract: A curable silicone composition comprising an organosilicon compound (A) having at least two alkynyl groups in its molecule and an organosilicon compound (B) having in its molecule at least two organic groups containing a vinyl group. The composition of this invention is advantageous in that it has a high stability particularly at room temperature, and hence a superior storage stability and workability.
    Type: Grant
    Filed: November 24, 1989
    Date of Patent: January 14, 1992
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Hiroshige Okinoshima
  • Patent number: 5059705
    Abstract: Siloxane compounds having the following formula [1]: ##STR1## wherein each R is a substituted or unsubstituted monovalent hydrocarbon group having from 1 to 10 carbon atoms, and n is an integer of from 0 to 100. The compounds are extremely high in reactivity and, therefore, useful as an intermediate or modifying agent in the synthesis of silicone resins and other various organic resins.
    Type: Grant
    Filed: February 28, 1991
    Date of Patent: October 22, 1991
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshige Okinoshima, Hiroshi Kanbara
  • Patent number: 5051467
    Abstract: A silicon rubber composition comprising (I) a vinyl-containing diorganopolysiloxane, (II) an organohydrogenpolysiloxane, and (III) platinum or a platinum compound is improved in adhesive bond to various substrates under low-temperature curing conditions by blending (IV) an ester siloxane compound free of a silicon-to-carbon bond and (V) an epoxy-containing polysiloxane compound.
    Type: Grant
    Filed: November 27, 1989
    Date of Patent: September 24, 1991
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshige Okinoshima, Tsutomu Kashiwagi